| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/27/2011 | CN102135731A Leveling mechanism for aligning proximity contact photoetching machine with workbench |
| 07/27/2011 | CN102135730A Blue photoresistance composition and colorful optical filter |
| 07/27/2011 | CN102135729A Preparation method of carbon micro-nano integrated structure |
| 07/27/2011 | CN102135728A Method for manufacturing three-dimensional nano grid structure based on one-dimensional soft template nanoimprinting |
| 07/27/2011 | CN102135727A Method for overcoming pattern defects in ultra-low light transmittance dry etching process |
| 07/27/2011 | CN102135726A Photoetching process method of direct photoresist mask for silicon substrate wet etching |
| 07/27/2011 | CN102134429A Liquid resin composition for producing optical waveguide and producing method of the optical waveguide |
| 07/27/2011 | CN102134403A Pigment particle dispersion, light-cured composition, color filter, pigment derivative compound and the preparing method of the pigment derivative compound |
| 07/27/2011 | CN102134262A Pyridine ketone complex |
| 07/27/2011 | CN102134217A Pyridine ketone complex |
| 07/27/2011 | CN102134216A Pyridine ketone complex |
| 07/27/2011 | CN101697337B Low-silver photosensitive silver paste for PDP site selection electrodes, and preparation method thereof |
| 07/27/2011 | CN101676752B Manufacturing method of color filter |
| 07/27/2011 | CN101604124B Mold, pattern forming method, and pattern forming apparatus |
| 07/27/2011 | CN101546733B Method for manufacturing TFT-LCD array substrate and color film substrate |
| 07/27/2011 | CN101446762B Micro-complex type method for inducing electric field under the restrict of non-contact moulding board |
| 07/27/2011 | CN101436002B Exposure apparatus, method for manufacturing device, and method for controlling exposure apparatus |
| 07/27/2011 | CN101410421B Photopolymerization initiator, photosensitive composition, photosensitive film, photosensitive laminate, method of forming permanent pattern and printed board |
| 07/27/2011 | CN101379132B Curable composition, color filter, and liquid crystal display device |
| 07/27/2011 | CN101364044B Minuteness processing method for upper substrate of glass |
| 07/27/2011 | CN101308326B Sensitized material, light resistance material and semiconductor assembly manufacture method |
| 07/27/2011 | CN101276153B Exposure drawing device |
| 07/27/2011 | CN101263432B Illumination system of a microlithographic exposure system |
| 07/27/2011 | CN101223483B Removing solution for photosensitive composition |
| 07/27/2011 | CN101216671B Polyester film for flexible printing plate |
| 07/27/2011 | CN101114577B Substrate processing apparatus |
| 07/27/2011 | CN101018835B Coating composition for film with low refractive index and film prepared therefrom |
| 07/27/2011 | CN101013267B Illumination system |
| 07/27/2011 | CN101013219B Method of manufacturing a black matrix of color filter |
| 07/26/2011 | USRE42570 Catadioptric objective |
| 07/26/2011 | US7985698 Methods of forming patterned photoresist layers over semiconductor substrates |
| 07/26/2011 | US7985535 Image-forming method and lithographic printing plate precursor |
| 07/26/2011 | US7985534 Pattern forming method |
| 07/26/2011 | US7985530 Etch-enhanced technique for lift-off patterning |
| 07/26/2011 | US7985529 Mask patterns including gel layers for semiconductor device fabrication |
| 07/26/2011 | US7985528 Positive resist composition and patterning process |
| 07/26/2011 | US7985527 Conductive film and method of producing thereof |
| 07/26/2011 | US7985515 Method and apparatus for performing model-based layout conversion for use with dipole illumination |
| 07/26/2011 | US7985477 Liquid-repellent, alkali-resistant coating composition and coating suitable for pattern forming |
| 07/26/2011 | US7985299 Solvent compositions containing chlorofloroolefins or fluoroolefins |
| 07/26/2011 | CA2544198C Alkaline, post plasma etch/ash residue removers and photoresist stripping compositions containing metal-halide corrosion inhibitors |
| 07/21/2011 | WO2011087144A1 Pattern forming method, pattern, chemical amplification resist composition and resist film |
| 07/21/2011 | WO2011087114A1 Pigment dispersion composition, colored curable composition, color filter for solid-state image sensor and method of producing the same, and solid-state image sensor |
| 07/21/2011 | WO2011087011A1 Novel sulfonic acid derivative compound and novel naphthalic acid derivative compound |
| 07/21/2011 | WO2011086997A1 Photosensitive resin composition, method for forming cured film, cured film, organic el display device, and liquid crystal display device |
| 07/21/2011 | WO2011086981A1 Negative photosensitive resin composition, cured film using same, and method for producing substrate |
| 07/21/2011 | WO2011086933A1 Bicyclohexane derivative and production method for same |
| 07/21/2011 | WO2011086892A1 Method for exposing color filter base |
| 07/21/2011 | WO2011086882A1 Method for exposing color filter base |
| 07/21/2011 | WO2011086757A1 Composition for production of photosensitive resist underlayer film, and method for formation of resist pattern |
| 07/21/2011 | WO2011085719A1 Method for controlling the electron beam exposure of wafers and masks using proximity correction |
| 07/21/2011 | WO2011085584A1 Surface metalizing method, method for preparing plastic article and plastic article made therefrom |
| 07/21/2011 | WO2011068960A3 Block copolymer-assisted nanolithography |
| 07/21/2011 | WO2011049735A3 Method for fracturing a pattern for writing with a shaped charged particle beam writing system using dragged shots |
| 07/21/2011 | WO2011006265A3 Copolymers for near-infrared radiation-sensitive coating compositions for positive-working thermal lithographic printing plates |
| 07/21/2011 | US20110177518 Methods and devices for micro-isolation, extraction, and/or analysis of microscale components |
| 07/21/2011 | US20110177464 Chemically amplified negative resist composition and patterning process |
| 07/21/2011 | US20110177463 Illumination system for euv microlithography |
| 07/21/2011 | US20110177462 Patterning process |
| 07/21/2011 | US20110177461 Movable body drive method, movable body apparatus, exposure method, exposure apparatus, and device manufacturing method |
| 07/21/2011 | US20110177460 process for producing an image on a substrate |
| 07/21/2011 | US20110177459 Resist underlayer film-forming composition, process for forming resist underlayer film and patterning process |
| 07/21/2011 | US20110177458 Exposure determining method, method of manufacturing semiconductor device, and computer program product |
| 07/21/2011 | US20110177457 Mask pattern generating method, manufacturing method of semiconductor device, and computer program product |
| 07/21/2011 | US20110177456 Method of making lithographic printing plates |
| 07/21/2011 | US20110177455 Polymer, resist composition, and patterning process |
| 07/21/2011 | US20110177454 Resist material and pattern formation method using the resist material |
| 07/21/2011 | US20110177453 Fluorine-Containing Sulfonates Having Polymerizable Anions and Manufacturing Method Therefor, Fluorine-Containing Resins, Resist Compositions, and Pattern-Forming Method Using Same |
| 07/21/2011 | US20110177332 Nanofiber-nanowire composite and fabrication method thereof |
| 07/21/2011 | US20110177302 Positive photosensitive resin composition and method of forming cured film from the same |
| 07/21/2011 | US20110176234 High positioning reproducible low torque mirror - actuator interface |
| 07/21/2011 | US20110175247 Semiconductor integrated circuit pattern verification method, photomask manufacturing method, semiconductor integrated circuit device manufacturing method, and program for implementing semiconductor integrated circuit pattern verification method |
| 07/21/2011 | US20110175118 Method of manufacturing optical component, optical component, method of manufacturing display device, and display device |
| 07/21/2011 | US20110174529 Structure having multi-trace via substrate and method of fabricating the same |
| 07/21/2011 | US20110174178 Improvements in or relating to printing |
| 07/21/2011 | DE102010004939A1 Verfahren zur Steuerung der Elektronenstrahl-Belichtung von Wafern und Masken mit Proximity-Korrektur Method for controlling the electron beam exposure of wafers and masks with proximity correction |
| 07/21/2011 | DE102007038056B4 Verfahren zum Bestimmen einer polarisationsoptischen Eigenschaft eines Beleuchtungssystems einer mikrolithographischen Projektionsbelichtungsanlage A method for determining a polarization optical characteristic of an illumination system of a microlithographic projection exposure apparatus |
| 07/21/2011 | DE102006046392B4 Fotolithografievorrichtung und -verfahren Photolithography apparatus and method |
| 07/21/2011 | DE102006031561B4 Fotomaskenanordnung, optisches Abbildungssystem, Verfahren zum Bestimmen der Gitterparameter und Absorptionseigenschaften für ein diffraktives optisches Element und Verfahren zum Herstellen eines diffraktiven optischen Elements Photomask assembly, optical imaging system method for determining the lattice parameters and absorption properties for a diffractive optical element and method for manufacturing a diffractive optical element |
| 07/21/2011 | DE102005044697B4 Verfahren zur Herstellung von CAF2-Einkristalle mit erhöhter Laserstabilität, CAF2-Einkristalle mit erhöhter Laserstabilität und ihre Verwendung A process for the production of CaF2 single crystals with high laser resistance, CaF2 single crystals with high laser resistance, and their use |
| 07/21/2011 | CA2786489A1 Nanopatterning method and apparatus |
| 07/20/2011 | EP2345934A2 Negative resist composition and patterning process |
| 07/20/2011 | EP2345933A1 Positive photosensitive resin composition for spray coating and method for producing through electrode using same |
| 07/20/2011 | EP2345932A1 Thermally reactive resist material, laminated body for thermal lithography using the material, and mold manufacturing method using the material and the laminated body |
| 07/20/2011 | EP2345676A1 Curable composition for transfer material and pattern formation method |
| 07/20/2011 | EP2344927A2 Bottom antireflective coating compositions |
| 07/20/2011 | EP2344926A2 Large area patterning of nano-sized shapes |
| 07/20/2011 | EP1876495B1 Composition comprising polymer having ethylene-dicarbonyl structure for use in forming anti-reflective coating for lithography |
| 07/20/2011 | EP1853972B1 Norbornene-type polymers and their manufacture process |
| 07/20/2011 | EP1476452B1 Acyl- and bisacylphosphine derivatives |
| 07/20/2011 | CN201903755U Exposure machine |
| 07/20/2011 | CN1977360B Exposure apparatus, exposure method |
| 07/20/2011 | CN1975572B Resist composition |
| 07/20/2011 | CN1920672B Stripping solution composition for removing transparent conductive film and photoresist |
| 07/20/2011 | CN1862380B Balancing system for balancing a printing drum |
| 07/20/2011 | CN1828414B Polymer for forming anti-reflective coating layer |
| 07/20/2011 | CN1784633B Photosensitive resin composition and dry film resist using the same |
| 07/20/2011 | CN1773673B Substrate processing apparatus and substrate processing method |
| 07/20/2011 | CN102132218A Process for producing lithographic printing plate |
| 07/20/2011 | CN102132217A Processing of positive-working lithographic printing plate precursor |