| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 12/23/2014 | US8916333 Radiation-sensitive resin composition |
| 12/23/2014 | US8916332 Resist composition, method of forming resist pattern, and polymeric compound |
| 12/23/2014 | US8916331 Resist composition and patterning process |
| 12/23/2014 | US8916330 Chemically amplified photoresist composition and method for forming resist pattern |
| 12/23/2014 | US8916329 Hardmask composition and associated methods |
| 12/23/2014 | US8916327 Underlayer coating forming composition containing dextrin ester compound |
| 12/23/2014 | US8916315 Method for fracturing and forming a pattern using shaped beam charged particle beam lithography |
| 12/23/2014 | US8916314 Reduced lens heating methods, apparatus, and systems |
| 12/23/2014 | US8916200 Nanoimprint lithography formation of functional nanoparticles using dual release layers |
| 12/23/2014 | US8916054 High fidelity patterning employing a fluorohydrocarbon-containing polymer |
| 12/23/2014 | US8916053 Pattern forming method |
| 12/23/2014 | US8916018 Apparatus for fabricating organic light emitting display panel and method of fabricating organic light emitting display panel using the same |
| 12/18/2014 | US20140371466 Pattern-forming method, and composition for forming resist underlayer film |
| 12/18/2014 | US20140371412 Resist copolymer and resist composition |
| 12/18/2014 | US20140370709 Methods for reducing line width roughness and/or critical dimension nonuniformity in a patterned photoresist layer |
| 12/18/2014 | US20140370447 Semiconductor device resolution enhancement by etching multiple sides of a mask |
| 12/18/2014 | US20140370446 Composition for photoresist development and method of developing photoresist using the same |
| 12/18/2014 | US20140370445 Method for manufacturing semiconductor device |
| 12/18/2014 | US20140370444 Antireflective coating composition and process thereof |
| 12/18/2014 | US20140370443 Gum solution containing specific poly siloxane compound |
| 12/18/2014 | US20140370442 Block copolymers and lithographic patterning using same |
| 12/18/2014 | US20140370441 Developer for photosensitive resist material and patterning process |
| 12/18/2014 | US20140370440 Photosensitive resin composition for ctp flexographic printing original plate and printing original plate prepared therefrom |
| 12/18/2014 | US20140370439 Methods and systems for reducing bubbles in layers of photoresist material |
| 12/18/2014 | US20140370433 Polymerized toner and a method for preparing the same |
| 12/18/2014 | US20140370425 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film, photomask blank and method of forming pattern |
| 12/18/2014 | US20140370247 Laser Absorbing Compounds |
| 12/18/2014 | US20140369901 Flexible Microreactors |
| 12/18/2014 | US20140369373 Two-stage laser system for aligners |
| 12/18/2014 | US20140368933 Positioning unit and apparatus for adjustment of an optical element |
| 12/18/2014 | US20140368806 Grid Refinement Method |
| 12/18/2014 | US20140368805 Design method of extreme ultraviolet lithography projection objective |
| 12/18/2014 | US20140368804 Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder |
| 12/18/2014 | US20140368803 Illumination optical unit for euv projection lithography, and optical system comprising such an illumination optical unit |
| 12/18/2014 | US20140368802 Radiation source |
| 12/18/2014 | US20140368800 Lithographic Apparatus With A Metrology System For Measuring A Position Of A Substrate Table |
| 12/18/2014 | US20140368799 Lithographic apparatus and device manufacturing method |
| 12/18/2014 | US20140368748 Light exposure system and light exposure process |
| 12/18/2014 | US20140367869 Enhanced FinFET Process Overlay Mark |
| 12/18/2014 | US20140367358 Composition for forming pattern and in-plane printing method using the same |
| 12/18/2014 | US20140367248 Extreme ultraviolet radiation (euv) pellicle formation apparatus |
| 12/17/2014 | CN204029765U 一种用于调整半导体设备的喷嘴位置的装置 An apparatus for adjusting the position of the semiconductor device of the nozzle |
| 12/17/2014 | CN204028567U 一种显影机的热敏胶印版防水装置 A developing thermal offset printing machine waterproof device |
| 12/17/2014 | CN204028566U 硅片显影定影装置 Wafer developing fixing device |
| 12/17/2014 | CN204028565U 一种投影物镜波像差在线检测干涉仪 A projection lens wavefront interferometer online testing |
| 12/17/2014 | CN204028564U 一种测焦传感器 One kind of measurement focus sensor |
| 12/17/2014 | CN204028563U 用于激光数码版的曝光一体机 Digital version of the exposure for laser machine |
| 12/17/2014 | CN204028562U 光学成像装置 Optical imaging device |
| 12/17/2014 | CN204028561U 一种基于光流控的光束扫描型动态光学微加工平台 Based on optical flow control dynamic optical beam scanning micromachining platform |
| 12/17/2014 | CN204028560U 激光数码版的真空自动回收设备 Laser digital version of vacuum automatic recovery equipment |
| 12/17/2014 | CN204028556U 一种led灯源曝光机 One kind of led light source Exposure |
| 12/17/2014 | CN204028439U 傅里叶变换物镜 Fourier transform lens |
| 12/17/2014 | CN204022491U 废剥离液回收装置 Waste stripping liquid recovery |
| 12/17/2014 | CN104221176A 用于微电子和光电子器件及其组件的热氧化稳定的、侧链聚醚官能化的聚降冰片烯 Thermal oxidation for microelectronic and optoelectronic devices and their components stable, side-chain polyether functionalized polynorbornene |
| 12/17/2014 | CN104221128A 移动体装置、曝光装置、平面显示器的制造方法、及元件制造方法 Moving body apparatus, exposure apparatus, method for manufacturing flat panel displays, and device manufacturing method |
| 12/17/2014 | CN104220932A 检查设备和方法 Inspection apparatus and method |
| 12/17/2014 | CN104220931A 补偿微光刻投射曝光系统的通道缺陷的设备及方法 Compensation microlithography projection exposure system channel defective equipment and methods |
| 12/17/2014 | CN104220446A 硅氧烷类化合物、包含其的光敏性组合物及光敏性材料 Silicone compound, comprising the same photosensitive composition and photosensitive material |
| 12/17/2014 | CN104217652A 显示面板、彩色滤光基板及其制造方法、制造设备 A display panel, the color filter substrate and manufacturing method, manufacturing apparatus |
| 12/17/2014 | CN104216242A 用于彩色光阻和有机绝缘膜的剥离组合物 Release composition for color resist and an organic insulating film |
| 12/17/2014 | CN104216241A 一种基于Keyence实时聚焦方法及装置 Keyence a method and apparatus for real time focusing on |
| 12/17/2014 | CN104216240A 一种投影式曝光设备及使用方法 A projection type exposure apparatus and method of use |
| 12/17/2014 | CN104216239A 适用于大面积奈米结构制作的拼接式雷射干涉微影设备 Suitable for large-area nanostructures produced by laser interference lithography tiled equipment |
| 12/17/2014 | CN104216238A 一种在fpga中实现直写式光刻机数据倾斜的方法 An implementation of direct write lithography method data skew in the fpga |
| 12/17/2014 | CN104216237A 一种解耦的光刻投影物镜中透镜偏心调节装置 A Decoupled lithographic projection objective lens eccentric adjustment device |
| 12/17/2014 | CN104216236A 适合影像转移曝光机的菲林与工件密着方法 Film and workpiece exposure machine for image transfer method of adhesion |
| 12/17/2014 | CN104216235A 图形预处理方法以及测量图形密度的方法 Graphical preprocessing, and a method of measuring the pattern density |
| 12/17/2014 | CN104216234A 光刻系统光源对称性的检测方法 Source symmetry detection method lithography system |
| 12/17/2014 | CN104216233A 曝光方法 Exposure method |
| 12/17/2014 | CN104216232A 改善光刻胶固化后变形及半导体器件保护层曝光的方法 After curing the resist deformation and improve semiconductor device protection layer exposure method |
| 12/17/2014 | CN104216231A 涂布装置和涂布方法 Coating apparatus and coating method |
| 12/17/2014 | CN104216230A 圆筒形掩模板的涂布装置和涂布方法 Cylindrical mask coating apparatus and coating method |
| 12/17/2014 | CN104216229A Lcd印刷用柔性树脂版及其制备方法 Lcd printing flexible resin version of its preparation method |
| 12/17/2014 | CN104216228A 负型感光性树脂组合物、电子装置和聚合物 The negative photosensitive resin composition, electronic device and polymers |
| 12/17/2014 | CN104216227A 感光性树脂组合物 The photosensitive resin composition |
| 12/17/2014 | CN104216226A 一种感光材料的制作方法 A method of making a photosensitive material |
| 12/17/2014 | CN104216225A 激光雕刻用树脂组合物、激光雕刻用柔性印刷版原版及其制法、以及柔性印刷版及其制版法 The resin composition for laser engraving, laser engraving flexographic printing plate precursor preparation method, and flexographic printing plate and plate method |
| 12/17/2014 | CN104216224A 包含氨基甲酸酯组分的光刻胶 Photoresist composition containing urethane |
| 12/17/2014 | CN104216223A 间隔物形成用感光性树脂组合物及由其制造的间隔物 Spacer with spacer-forming composition and a photosensitive resin made therefrom |
| 12/17/2014 | CN104216222A 感光性树脂组合物和电子装置 The photosensitive resin composition and the electronic apparatus |
| 12/17/2014 | CN104216221A 感光性树脂组成物及其应用 The photosensitive resin composition and its application |
| 12/17/2014 | CN104216220A 光敏树脂组合物、通过使用该组合物制造的黑色间隔物、及具有该黑色间隔物的彩色滤光片 Color filter The photosensitive resin composition, the composition is manufactured by using black spacers, and a spacer having the black |
| 12/17/2014 | CN104216219A 压印设备、压印方法和制造产品的方法 The method of imprint apparatus, and a method of manufacture of imprint |
| 12/17/2014 | CN104216218A 无缺陷模仁的制造方法 Defect-free method of producing mold Jen |
| 12/17/2014 | CN104216089A 一种具有自重补偿功能的光刻投影物镜中透镜支撑装置 A weight compensation function in a lithographic projection objective lens supporting device having |
| 12/17/2014 | CN104212201A 聚合物染料及其制备方法、光阻组合物和显示装置 Dye polymer and its preparation method, photoresist compositions and display devices |
| 12/17/2014 | CN104211867A 一种分子量窄分布的丙烯酸酯类共聚物及其光刻胶组合物 Having a molecular weight narrow distribution of acrylic copolymer and a photoresist composition |
| 12/17/2014 | CN104210047A 微细图案形成用积层体及微细图案形成用积层体的制造方法 Fine pattern forming method for producing the laminate and the laminate is formed with a fine pattern |
| 12/17/2014 | CN104210046A 微细图案形成用积层体 Fine pattern formation laminate |
| 12/17/2014 | CN103502363B 染料分散液、彩色滤光片用感光性树脂组合物、彩色滤光片、液晶显示装置及有机发光显示装置 Dye dispersion, color filter, photosensitive resin composition, a color filter, liquid crystal display devices and organic light emitting display device |
| 12/17/2014 | CN103293884B 用于光刻设备的离轴对准系统及对准方法 Off-axis alignment system for a lithographic apparatus and alignment method |
| 12/17/2014 | CN103268057B 掩模系统、掩模方法、曝光系统和曝光方法 Mask system, the mask method, exposure system and exposure method |
| 12/17/2014 | CN103217875B Pcb曝光机及其纠偏机构 Pcb Exposure Machine and corrective institutions |
| 12/17/2014 | CN103209770B 制造精细结构化表面的方法 The method of manufacturing the fine structure of the surface |
| 12/17/2014 | CN103207530B 光刻机光瞳整形光学系统及产生离轴照明模式的方法 Pupil shaping optical system and method for generating off-axis illumination pattern lithography |
| 12/17/2014 | CN103163741B 光刻机可变狭缝最佳位置的测量方法 Lithography variable slit measurement method best location |
| 12/17/2014 | CN103149809B 光刻机设备用离轴照明装置 Lithography equipment with off-axis illumination device |
| 12/17/2014 | CN103145908B 一种碱可溶性树脂、制备方法以及其用途 An alkali-soluble resin, preparation and use thereof |
| 12/17/2014 | CN103034065B 磁浮重力补偿器及光刻装置 Magnetic and gravity compensator lithographic apparatus |
| 12/17/2014 | CN103012652B 含有乙烯基醚基团的共聚物及其制备方法和应用 Containing copolymer and its preparation method and application of vinyl ether groups |