| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/03/2011 | CN101142252B (meth)acryloyl group-containing aromatic isocyanate compound and production process thereof |
| 08/03/2011 | CN101027610B Antireflective compositions for photoresists |
| 08/02/2011 | USRE42593 Photo-curable resin composition used for photo-fabrication of three-dimensional object |
| 08/02/2011 | USRE42588 Control system for a two chamber gas discharge laser system |
| 08/02/2011 | US7990517 Immersion exposure apparatus and device manufacturing method with residual liquid detector |
| 08/02/2011 | US7990516 Immersion exposure apparatus and device manufacturing method with liquid detection apparatus |
| 08/02/2011 | US7989156 Substrate treatment method and substrate treatment apparatus |
| 08/02/2011 | US7989155 Lithographic method |
| 08/02/2011 | US7989154 Polymer or resist pattern, and metal film pattern, metal pattern and plastic mold using the same, and fabrication methods thereof |
| 08/02/2011 | US7989153 Method and apparatus for selectively patterning free standing quantum DOT (FSQDT) polymer composites |
| 08/02/2011 | US7989150 Manufacturing method of optical waveguide |
| 08/02/2011 | US7989149 Mold core and method for fabricating mold core |
| 08/02/2011 | US7989148 Method for forming photoelectric composite board |
| 08/02/2011 | US7989147 Method for fabricating liquid crystal display device |
| 08/02/2011 | US7989146 Component fabrication using thermal resist materials |
| 08/02/2011 | US7989145 Method for forming fine pattern of semiconductor device |
| 08/02/2011 | US7989144 Antireflective coating composition |
| 08/02/2011 | US7989143 Method of manufacturing a semiconductor device having an organic thin film transistor |
| 08/02/2011 | US7989140 Curable composition, image forming material, and planographic printing plate precursor |
| 08/02/2011 | US7989138 Fluorine-containing compound, resist composition for immersion exposure, and method of forming resist pattern |
| 08/02/2011 | US7989137 Resist composition and pattern-forming method using the same |
| 08/02/2011 | US7989136 Photoresist composition and method of forming a photoresist pattern using the same |
| 08/02/2011 | US7989122 Photomask blank, photomask, and methods of manufacturing the same |
| 08/02/2011 | US7989032 UV-photopolymerizable composition for producing organic conductive layers, patterns or prints |
| 08/02/2011 | US7988818 Device for liquid treatment of wafer-shaped articles |
| 08/02/2011 | US7988136 Stage device for a vacuum chamber |
| 08/02/2011 | US7987977 Hearing aid package |
| 07/28/2011 | WO2011091228A1 Liquid radiation curable resins capable of curing into layers with selective visual effects and methods for the use thereof |
| 07/28/2011 | WO2011090233A1 Method for fabricating a porous carbon structure using optical interference lithography, and porous carbon structure fabricated by same |
| 07/28/2011 | WO2011090217A1 Black curable composition for wafer-level lens, and wafer-level lens |
| 07/28/2011 | WO2011090114A1 Developing solution for photoresist on substrate including conductive polymer, and method for forming pattern |
| 07/28/2011 | WO2011089967A1 Photosensitive resin composition, cured film, method for forming cured film, organic el display device, and liquid crystal display device |
| 07/28/2011 | WO2011089895A1 Light-sensitive polymer composition, method for producing pattern, and electronic component |
| 07/28/2011 | WO2011089894A1 Light-sensitive polymer composition, method for producing pattern, and electronic component |
| 07/28/2011 | WO2011089877A1 Positive photosensitive resin composition, method for producing patterned cured film and electronic component |
| 07/28/2011 | WO2011089867A1 Rendering device and rendering method |
| 07/28/2011 | WO2011089828A1 Light irradiation device, light irradiation method and liquid crystal panel manufacturing method |
| 07/28/2011 | WO2011089772A1 Exposure apparatus, liquid crystal display device, and method for manufacturing liquid crystal display device |
| 07/28/2011 | WO2011089368A1 System and method for assessing inhomogeneous deformations in multilayer plates |
| 07/28/2011 | WO2011089033A1 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same |
| 07/28/2011 | WO2011020690A3 Method for producing a mirror having at least two mirror surfaces, mirror of a projection exposure apparatus for microlithography, and projection exposure apparatus |
| 07/28/2011 | US20110184139 Metal compositions and methods of making same |
| 07/28/2011 | US20110183273 Water Mark Defect Prevention for Immersion Lithography |
| 07/28/2011 | US20110183272 Method for fabricating microbeads and microbeads |
| 07/28/2011 | US20110183271 Method of manufacturing mask for depositing thin film |
| 07/28/2011 | US20110183270 Method for forming three-dimensional pattern |
| 07/28/2011 | US20110183269 Methods Of Forming Patterns, And Methods For Trimming Photoresist Features |
| 07/28/2011 | US20110183268 Process for making contained layers and devices made with same |
| 07/28/2011 | US20110183267 Method of producing multilayer printed wiring board and photosensitive dry film used therefor |
| 07/28/2011 | US20110183266 Semiconductor Device Manufacturing Methods |
| 07/28/2011 | US20110183265 Polymer-based long life fusers and their methods of making |
| 07/28/2011 | US20110183264 Resist processing method and use of positive type resist composition |
| 07/28/2011 | US20110183263 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition |
| 07/28/2011 | US20110183262 Positive resist compositions and patterning process |
| 07/28/2011 | US20110183261 Developer composition |
| 07/28/2011 | US20110183260 Flexographic processing solution and use |
| 07/28/2011 | US20110183259 Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same |
| 07/28/2011 | US20110183258 Positive resist composition, pattern forming method using the composition, and compound for use in the composition |
| 07/28/2011 | US20110183257 Lithographic apparatus and device manufacturing method |
| 07/28/2011 | US20110183115 Positive typed photosensitive composition |
| 07/28/2011 | US20110181859 Lithographic apparatus and device manufacturing method |
| 07/28/2011 | US20110181823 Production method of liquid crystal display including scanning exposure |
| 07/28/2011 | US20110180097 Thermal isolation assemblies for wafer transport apparatus and methods of use thereof |
| 07/28/2011 | DE112005003585B4 Verfahren und System für die Fotolithografie A method and system for lithography |
| 07/28/2011 | DE10333248B4 Verwendung einer zweiten Belichtung zum Unterstützen einer PSM-Belichtung beim Drucken eines engen Bereichs angrenzend an eine grosse Struktur Using a second exposure for supporting PSM exposure when printing a narrow range adjacent to a large structure |
| 07/28/2011 | DE102010056555A1 Colled spider and method for grazing-incidence collectors Colled spider and method for grazing-incidence collectors |
| 07/28/2011 | DE102010000169A1 Photosensitive Substanz mit Thioxanthonen als photodeaktivierbarem Photoinitiator zur Herstellung von kleinen Strukturen The photosensitive substance thioxanthones as photodeaktivierbarem photoinitiator for the production of small structures |
| 07/28/2011 | DE102008050446B4 Verfahren und Vorrichtungen zur Ansteuerung von Mikrospiegeln Methods and devices for the control of micromirrors |
| 07/28/2011 | DE102006017938B4 Fokusüberwachungsverfahren, Photomaske und photolithographisches System Focus monitoring method, photomask and photolithography system |
| 07/28/2011 | DE102006017336B4 Beleuchtungssystem mit Zoomobjektiv Lighting system with zoom lens |
| 07/27/2011 | EP2348514A1 Method for producing substrate having patterned conductive polymer film and substrate having patterned conductive polymer film |
| 07/27/2011 | EP2348361A1 Negative-type dye-containing curable composition, color filter and method for production thereof both utilizing the composition, and solid imaging element |
| 07/27/2011 | EP2348360A1 Photoresist comprising nitrogen-containing compound |
| 07/27/2011 | EP2348359A1 Roller type nano-imprint device, mold roll for the roller type nano-imprint device, fixed roll for the roller type nano-imprint device, and nano-imprint sheet manufacturing method |
| 07/27/2011 | EP2347892A2 Method for producing very wide defect-free micro-optical light diverter elements |
| 07/27/2011 | EP2347305A1 A method and installation for writing large gratings |
| 07/27/2011 | EP2347304A1 Methods for performing photolithography using barcs having graded optical properties |
| 07/27/2011 | EP2347303A1 Surface patterning with functional polymers |
| 07/27/2011 | EP2347302A1 Composition for producing optical elements having gradient structure |
| 07/27/2011 | EP2347036A1 Heterogenous liga method |
| 07/27/2011 | EP2346672A1 System and resin for rapid prototyping |
| 07/27/2011 | EP2346671A1 Improvements for rapid prototyping apparatus |
| 07/27/2011 | EP1930382B1 Coating materials consisting of low- or medium-molecular organic compounds |
| 07/27/2011 | EP1860477B1 Projection optical system, exposure equipment and device manufacturing method |
| 07/27/2011 | EP1700341B1 Wafer with optical control modules in ic fields |
| 07/27/2011 | EP1470207B1 Aqueous stripping and cleaning composition |
| 07/27/2011 | EP1177479B1 Streamlined ic mask layout optical and process correction through correction reuse |
| 07/27/2011 | CN1983025B Fabrication method for photomask, fabrication method for device and monitoring method for photomask |
| 07/27/2011 | CN1719338B Ultraviolet ray solidification cation type etching glue for nano embossing |
| 07/27/2011 | CN102138201A Method for optical proximity correction, design and manufacturing of a reticle using variable shaped beam lithography |
| 07/27/2011 | CN102138106A Method for optical proximity correction, design and manufacturing of a reticle using character projection lithography |
| 07/27/2011 | CN102138105A Detection of contaminating substances in an EUV lithography apparatus |
| 07/27/2011 | CN102138104A Photosensitive resin composition for protective film of printed wiring board for semiconductor package |
| 07/27/2011 | CN102136484A Indium columns for face-down bonding interconnection of infrared focal plane and preparation method thereof |
| 07/27/2011 | CN102136447A Method of manufacturing semiconductor integrated circuit device |
| 07/27/2011 | CN102136415A Method for improving roughness of line edge of photoetching pattern in semiconductor process |
| 07/27/2011 | CN102135735A Microelectronic cleaning and arc remover compositions |
| 07/27/2011 | CN102135734A Photoresistance removing method |
| 07/27/2011 | CN102135733A Method for removing photoresistance |
| 07/27/2011 | CN102135732A Light irradiation device |