G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/2011
08/04/2011	WO2011092994A1 Method for producing semiconductor light-emitting element, semiconductor light-emitting element, and photosensitive composition used for said method for producing semiconductor light-emitting element
08/04/2011	WO2011092950A1 Polymerizable composition for solder resist, and solder resist pattern formation method
08/04/2011	WO2011092241A2 Mold for nanoprinting lithography, and methods for producing same
08/04/2011	WO2011092020A2 Arrangement for use in a projection exposure tool for microlithography having a reflective optical element
08/04/2011	WO2011091900A2 Faceted mirror for use in microlithography
08/04/2011	WO2011091891A2 Arrangement for and method of characterising the polarisation properties of an optical system
08/04/2011	WO2011091877A1 Holographic mask inspection system with spatial filter
08/04/2011	WO2011040749A3 Dry film photoresist
08/04/2011	WO2011037438A3 Dry film photoresist
08/04/2011	WO2011031092A3 Cleaning solution composition for substrate for preparation of flat panel display
08/04/2011	WO2010147244A3 Exposure apparatus and device manufacturing method
08/04/2011	US20110189847 Method for metal gate n/p patterning
08/04/2011	US20110189719 Methods of generating patterned soft substrates and uses thereof
08/04/2011	US20110189618 Resist processing method
08/04/2011	US20110189617 Method of forming organic thin film and exposure method
08/04/2011	US20110189616 Pattern formation method
08/04/2011	US20110189615 Semiconductor processing method of manufacturing mos transistor
08/04/2011	US20110189614 Lithographic apparatus and device manufacturing method with double exposure overlay control
08/04/2011	US20110189613 Exposure apparatus, exposure method, and device fabrication method
08/04/2011	US20110189612 Method for fixing a flexographic plate
08/04/2011	US20110189611 Plate recognition system for automated control of processing parameters
08/04/2011	US20110189610 Photoresist composition
08/04/2011	US20110189609 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition
08/04/2011	US20110189608 Photoresist composition for fabricating probe array, method of fabricating probe array using the photoresist composition, composition for photosensitive type developed bottom anti-reflective coating, fabricating method of patterns using the same and fabricating method of semiconductor device using the same
08/04/2011	US20110189607 Novel sulfonium salt, polymer, method for producing the polymer, resist composition and patterning process
08/04/2011	US20110189602 Heating device, coating/developing system, heating method, coating/developing method, and recording medium having program for executing heating method or coating/developing method
08/04/2011	US20110189601 Method of forming pattern, system for calculating resist coating distribution and program for calculating the same
08/04/2011	US20110189600 Method for automated control of processing parameters
08/04/2011	US20110189599 Method for producing a color filter
08/04/2011	US20110189598 Dye-containing negative curable composition, color filter using same, method of producing color filter, and solid-state imaging device
08/04/2011	US20110189597 Method of forming exposure patterns
08/04/2011	US20110189595 Method of manufacturing a substrate for a mask blank, method of manufacturing a mask blank, method of manufacturing a transfer mask , and method of manufacturing a semiconductor device
08/04/2011	US20110189591 Prepolymer-based polyurethane formulations for producing holographic media
08/04/2011	US20110188801 Semiconductor hollow-core waveguide using photonic crystal gratings
08/04/2011	US20110188037 Concentrator and locator device of a solute and method for concentrating and locating a solute
08/04/2011	US20110188023 Lithographic imaging and printing without defects of electrostatic origin
08/04/2011	US20110188011 Particle cleaning of optical elements for microlithography
08/04/2011	US20110187395 Corrosion sensors
08/04/2011	US20110187010 Semiconductor cleaning using superacids
08/04/2011	DE102010006326A1 Anordnung zur Verwendung in einer Projektionsbelichtungsanlage für die Mikrolithographie mit einem reflektiven optischen Element Assembly for use in a projection exposure system for microlithography with a reflective optical element
08/04/2011	DE102010001388A1 Facettenspiegel zum Einsatz in der Mikrolithografie Facet mirror used in microlithography
08/03/2011	EP2352065A1 Photosensitive resin composition, photosensitive adhesive film, and light-receiving device
08/03/2011	EP2351115A1 Method and apparatus for the formation of an electronic device
08/03/2011	EP2350742A1 Apparatus and method for thermally developing flexographic printing elements
08/03/2011	EP2350741A2 Strain and kinetics control during separation phase of imprint process
08/03/2011	EP2349993A1 Sulfonium derivatives and the use therof as latent acids
08/03/2011	EP2349638A1 A positioning system and method
08/03/2011	EP2025698B1 Crosslinkable prepolymer, process for production thereof, and use thereof
08/03/2011	EP1730591B1 Nanoscale electric lithography
08/03/2011	EP1671182B1 Spin-printing of electronic and display components
08/03/2011	EP1478512B1 Method and device for printing wherein a hydrophilic layer is produced and structured
08/03/2011	CN201917777U PCB (Printed circuit board) turn board developing machine adopted by high-density interconnection circuit board technology
08/03/2011	CN201917776U 光罩盒的定位结构 Positioning structure mask box
08/03/2011	CN201917775U 曝光装置 Exposure device
08/03/2011	CN1965268B Antireflection film for semiconductor containing condensation type polymer
08/03/2011	CN1862392B Composition of removing photoresistance layer and use method thereof
08/03/2011	CN1815366B Photoresist composition, method for forming film pattern using the same, and method for manufacturing thin film transistor array panel using the same
08/03/2011	CN1702560B Diluent composition for removing light sensitive resin
08/03/2011	CN1673861B Chemically amplified positive resist composition
08/03/2011	CN1639643B Device, EUV-lithographic device and method for preventing and cleaning contamination on optical elements
08/03/2011	CN1550889B Multilayer photoresist system
08/03/2011	CN102144192A Radiation system and lithographic apparatus
08/03/2011	CN102144191A Radiation source and lithographic apparatus
08/03/2011	CN102144190A Protection module for EUV lithography apparatus, and EUV lithography apparatus
08/03/2011	CN102144189A Photosensitive resin composition, photosensitive resin laminate, method for forming resist pattern, conductive pattern, printed wiring board, lead frame, base, and method for manufacturing semiconductor package
08/03/2011	CN102144188A Improved nanoimprint method
08/03/2011	CN102143981A Low outgassing photoresist compositions
08/03/2011	CN102143843A Negative-working imageable element and method of use
08/03/2011	CN102142445A Array substrate of active component and production method thereof
08/03/2011	CN102142395A Manufacturing methods for dual damascene process and integrated circuit
08/03/2011	CN102142367A Method for fabricating integrated circuit
08/03/2011	CN102141743A Photoresist peeling solution composition with metal protection
08/03/2011	CN102141742A Method for trimming photoresist pattern
08/03/2011	CN102141741A Micro leveling mechanism of projection objective of lithography machine
08/03/2011	CN102141740A Lithographic apparatus
08/03/2011	CN102141739A Double-stage exchange system for lithography machine silicon wafer stages
08/03/2011	CN102141738A Nanometer-level automatic focusing system for projection lithography
08/03/2011	CN102141737A Lithographic apparatus and device manufacturing method
08/03/2011	CN102141736A Auxiliary detection device and method for ultraviolet laser interference fringe
08/03/2011	CN102141735A Silicon chip edge protection device and application method thereof
08/03/2011	CN102141734A Gravity compensator and micropositioner adopting same
08/03/2011	CN102141733A Vibration absorption device and photolithographic device using same
08/03/2011	CN102141732A Positive typed photosensitive composition
08/03/2011	CN102141731A Toluylene-containing meta-substituted sulfonium salt photoproduction acid agent and preparation method thereof
08/03/2011	CN102141730A Coloring composition, color filter and display element
08/03/2011	CN102141729A Manufacturing method of cured film, photosensitive resin composition, cured film, organic EL display device and liquid crystal display device
08/03/2011	CN102141728A Method for forming three-dimensional pattern
08/03/2011	CN102141726A Manufacturing method of photomask, photomask and manufacturing method of display device
08/03/2011	CN102141639A Method for manufacturing micro lens array based on digital mask lithography technology
08/03/2011	CN102140169A Novel water-soluble polyimide resin as well as preparation method and application thereof
08/03/2011	CN102140116A Method for synthesizing silicon-containing polymerizing monomer terminated by vinyl ether and allyl ether
08/03/2011	CN102139138A Preparation method of solid metal microneedle array
08/03/2011	CN101775207B Optical direct writing patterned organic thin film transistor insulating layer material
08/03/2011	CN101622130B Positive-working radiation-sensitive compositions and elements
08/03/2011	CN101561639B Lithographic apparatus
08/03/2011	CN101546117B Masstone photomask and pattern transfer method using the same
08/03/2011	CN101390453B Method and device for generating in particular EUV radiation and/or soft X-ray radiation
08/03/2011	CN101344726B Stepping arrangement type interference microlithography and device thereof
08/03/2011	CN101308334B High erosion-resistant glue developing solution and method for making same
08/03/2011	CN101183217B Photosensitive composition

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