| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/11/2011 | US20110192633 Photosensitive ink compositions and transparent conductors and method of using the same |
| 08/11/2011 | DE4243750C5 Verfahren zur Herstellung einer Druckform für den Tiefdruck, Siebdruck, Flexodruck oder Offsetdruck A process for preparing a printing form for gravure printing, screen printing, flexographic printing or offset printing |
| 08/11/2011 | DE102011003145A1 Optisches System mit Blendeneinrichtung Optical system with aperture means |
| 08/11/2011 | DE102011003035A1 Polarisationsbeeinflussende optische Anordnung, sowie optisches System einer mikrolithographischen Projektionsbelichtungsanlage Polarization influencing optical arrangement, as well as optical system of a microlithography projection exposure apparatus |
| 08/11/2011 | DE10105978B4 Mehrstrahl-Abtastvorrichtung zur Abtastung eines fotoempfindlichen Materials mit einem Multi-Spot-Array sowie Verfahren zur Korrektur der Position von Bildpunkten des Multi-Spot-Arrays Multi-beam scanning device for scanning a photosensitive material with a multi-spot array and method for correcting the position of pixels of the multi-spot array |
| 08/11/2011 | DE10085017B4 Datenpfad für Hochleistungs-Mustergenerator Data path for high-performance pattern generator |
| 08/10/2011 | EP2355136A2 Method for manufacturing micro structure using x-ray exposure |
| 08/10/2011 | EP2354854A1 Method of making lithographic printing plate |
| 08/10/2011 | EP2354853A1 Optical raster element, optical integrator and illumination system of a microlithographic projection exposure apparatus |
| 08/10/2011 | EP2354852A1 Lithographic printing plate precursor and method of preparing lithographic printing plate |
| 08/10/2011 | EP2354851A2 Lithographic printing plate precursor and method of preparing lithographic printing plate |
| 08/10/2011 | EP2354847A1 Mould for lithography by UV-assisted nanoprinting and methods for manufacturing such a mould |
| 08/10/2011 | EP2354846A2 Optical irradiation equipment and optical irradiation method for nanoimprint lithography |
| 08/10/2011 | EP2354845A1 (Meth)acrylate writing monomers |
| 08/10/2011 | EP2354187A1 Dispersed composition, polymerizable composition, light shielding color filter, solid-state imaging element, liquid crystal display device, wafer-level lens, and imaging unit |
| 08/10/2011 | EP2353048A2 Pattern forming method using developer containing organic solvent and rinsing solution for use in the pattern forming method |
| 08/10/2011 | EP2352812A1 Gluconic acid containing photoresist cleaning composition for multi-metal device processing |
| 08/10/2011 | EP2203784B1 Displacement device with precision position measurement |
| 08/10/2011 | CN201926867U 浸没光刻机的浸液温度控制和测量装置 Immersion temperature control and measurement devices immersion lithography machine |
| 08/10/2011 | CN201926866U 光刻机的操作台 Station lithography |
| 08/10/2011 | CN201926865U 整片晶圆纳米压印的装置 Entire wafer nanoimprinting device |
| 08/10/2011 | CN1965389B Substrate holding device, exposure device having the same, exposure method, method for producing element |
| 08/10/2011 | CN1910494B Catadioptric projection objective |
| 08/10/2011 | CN1904742B Photoresist stripper composition and methods for forming wire structures and for fabricating thin film transistor substrate using composition |
| 08/10/2011 | CN1821870B Photosensitive paste composition and plasma display panel manufactured using the same |
| 08/10/2011 | CN1782878B Positive type photo-sensitive siloxane composition, cured film formed from the composition and device incorporating the cured film |
| 08/10/2011 | CN102150234A Film-forming apparatus, film-forming method and semiconductor device |
| 08/10/2011 | CN102150218A Method for smoothing optical member for EUVL and optical member for EUVL having smoothed optical surface |
| 08/10/2011 | CN102150169A Multi-coloured codes |
| 08/10/2011 | CN102150085A Substrate treating solution and method employing the same for treating a resist substrate |
| 08/10/2011 | CN102150084A Radiation source, lithographic apparatus, and device manufacturing method |
| 08/10/2011 | CN102150083A Radiation-sensitive resin composition, and resist pattern formation method |
| 08/10/2011 | CN102150082A Radiation-sensitive resin composition |
| 08/10/2011 | CN102150068A Imaging optical system |
| 08/10/2011 | CN102147576A Photoresist stripping liquid composite |
| 08/10/2011 | CN102147575A Grayscale exposure method for direct-writing photo-etching machine |
| 08/10/2011 | CN102147574A Lithographic apparatus and device manufacturing method |
| 08/10/2011 | CN102147573A Light irradiation unit |
| 08/10/2011 | CN102147572A Wafer edge exposure module and wafer edge exposure method |
| 08/10/2011 | CN102147571A Lithography method |
| 08/10/2011 | CN102147570A Radioactive ray sensitivity composition, solidified film and forming method thereof |
| 08/10/2011 | CN102147569A Processing method of micro-component in multi-layer structure and solidified SU-8 photoresist sheet |
| 08/10/2011 | CN102147568A Photolithography method and double patterning strategy |
| 08/10/2011 | CN102147567A Cell-based hierarchical optical proximity correction (OPC) method |
| 08/10/2011 | CN102147498A Solution to optical constraint on microtruss processing |
| 08/10/2011 | CN102146217A Pigment particle dispersion, light-cured composition and novel compound used in the dispersion |
| 08/10/2011 | CN102146064A Salt and photoresist composition containing the same |
| 08/10/2011 | CN102145875A Preparation method of polydimethylsiloxane micro-nanofluidic chip |
| 08/10/2011 | CN101813895B Exposure machine and exposure method using same |
| 08/10/2011 | CN101614963B Processing method of lithography machine silicon slice alignment signals |
| 08/10/2011 | CN101613076B Method for preparing and duplicating three-dimensional micro-nano structure stamps in batches |
| 08/10/2011 | CN101609262B Temperature control device of projection object lens of lithography machine |
| 08/10/2011 | CN101561640B Method for determining exposure settings and lithographic exposure apparatus |
| 08/10/2011 | CN101555318B Water-soluble negative light-sensitive polyamic acid salt as well as a preparation method and a developing method thereof |
| 08/10/2011 | CN101520607B Double-faced exposure architecture and double-faced exposure method of printed circuit board |
| 08/10/2011 | CN101506738B Exposure device for the production of screen print stencils |
| 08/10/2011 | CN101495539B Polyester containing terpene phenol unit |
| 08/10/2011 | CN101430508B Device and method for supplying fluid for immersion lithography |
| 08/10/2011 | CN101405659B Projecting optical system, scanning exposure device, and method of manufacturing micro device |
| 08/10/2011 | CN101374886B Curable composition containing thiol compound |
| 08/10/2011 | CN101344730B Position control method and device based on H type structure two-sided driving system |
| 08/10/2011 | CN101322075B Method of making a lithographic printing plate |
| 08/10/2011 | CN101311792B Display substrate and its manufacture method and display device possessing the display substrate |
| 08/10/2011 | CN101271275B Horn net manufacturing technique by etching method |
| 08/10/2011 | CN101180580B Coating-type underlayer film forming composition containing naphthalene resin derivative for lithography |
| 08/10/2011 | CN101178548B Alkaline-based developer composition |
| 08/10/2011 | CN101162314B Display device and method for manufacturing mask plate and display device |
| 08/10/2011 | CN101114578B Substrate processing method and substrate processing apparatus |
| 08/10/2011 | CN101097400B Soft mold and method of fabricating the same |
| 08/10/2011 | CN101073034B Method for imprint lithography at constant temperature |
| 08/10/2011 | CN101034263B Method and system for enhanced lithographic alignment |
| 08/09/2011 | US7995884 Device consisting of at least one optical element |
| 08/09/2011 | US7995296 Replacement apparatus for an optical element |
| 08/09/2011 | US7995186 Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure method, device manufacturing method |
| 08/09/2011 | US7995182 Array substrate for a liquid crystal display device and method of manufacturing the same |
| 08/09/2011 | US7994108 Composition useful for removal of post-etch photoresist and bottom anti-reflection coatings |
| 08/09/2011 | US7993817 Structure with self aligned resist layer on an insulating surface and method of making same |
| 08/09/2011 | US7993816 Method for fabricating self-aligned nanostructure using self-assembly block copolymers, and structures fabricated therefrom |
| 08/09/2011 | US7993814 controlling the focal length of an exposure apparatus to a focusing and defocusing positions to form a pattern having the same shape as the photomask on the wafer and reverse images using the same photomask, with respect to the pattern on the wafer |
| 08/09/2011 | US7993812 Calixarene blended molecular glass photoresists and processes of use |
| 08/09/2011 | US7993811 Positive resist compositions and patterning process |
| 08/09/2011 | US7993810 (Meth)acrylate compound having aromatic acid labile group, photosensitive polymer, resist composition, and associated methods |
| 08/09/2011 | US7993809 Photosensitive resin composition, photosensitive element, method for forming resist pattern and method for producing printed wiring board |
| 08/09/2011 | US7993808 TARC material for immersion watermark reduction |
| 08/09/2011 | US7993807 Compositions, systems, and methods for imaging |
| 08/09/2011 | US7993806 Transfer substrate, and fabrication process of organic electroluminescent devices |
| 08/09/2011 | US7993706 Method of forming a nano-structure and the nano-structure |
| 08/09/2011 | US7993008 Optical element and exposure apparatus |
| 08/04/2011 | WO2011094696A2 Ultra-compliant nanoimprint lithography template |
| 08/04/2011 | WO2011094672A2 Nanoimprint lithography processes for forming nanoparticles |
| 08/04/2011 | WO2011094383A2 Methods and systems of material removal and pattern transfer |
| 08/04/2011 | WO2011094317A2 Micro-conformal templates for nanoimprint lithography |
| 08/04/2011 | WO2011094014A1 Roll-to-roll imprint lithography and purging system |
| 08/04/2011 | WO2011093980A1 Flexographic processing solution and use |
| 08/04/2011 | WO2011093520A1 Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method |
| 08/04/2011 | WO2011093479A1 Polymerizable composition, color filter, method of producing color filter and solid-state image sensor |
| 08/04/2011 | WO2011093448A1 Photosensitive composition, photosensitive film, photosensitive laminate, method for forming permanent pattern, and printed board |
| 08/04/2011 | WO2011093280A1 Radiation-sensitive resin composition |
| 08/04/2011 | WO2011093188A1 Positive-type resist composition and method for producing microlens |
| 08/04/2011 | WO2011093139A1 Sulfonic acid derivative and photoacid generator |