Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/2011
08/17/2011CN102159996A Vibration damping in projection exposure apparatuses for semiconductor lithography
08/17/2011CN102159995A 正性光敏树脂组合物 A positive photosensitive resin composition
08/17/2011CN102157645A Light emitting diode and preparation method thereof
08/17/2011CN102157643A Method for preparing GaN-based photonic crystal LED based on nanoimprint lithography
08/17/2011CN102157642A Nanoimprint based preparation method of LED with high light-emitting efficiency
08/17/2011CN102157629A Method for manufacturing graphical sapphire substrate
08/17/2011CN102157361A Method for preparing semiconductor T-shaped gate electrode by utilizing photon beam super-diffraction technology
08/17/2011CN102157357A Method for cleaning semiconductor silicon wafer
08/17/2011CN102157350A Manufacturing method for semiconductor device
08/17/2011CN102156848A Device for automatically recognizing positioning of exposure machine vault
08/17/2011CN102156391A Lithographic apparatus
08/17/2011CN102156390A Methods relating to immersion lithography and an immersion lithographic apparatus
08/17/2011CN102156389A Maintenance method, exposure method and apparatus, and device manufacturing method
08/17/2011CN102156388A Object with an improved suitability for a plasma cleaning treatment
08/17/2011CN102156387A Radiation-sensitive composition and cured film
08/17/2011CN102156386A Positive radiation-sensitive composition, interlayer insulating film and method for forming the same
08/17/2011CN102156385A Chemical amplification type i-linear positive photoresist composition containing 2,1,4-diazo naphthoquinone sulphonic acid phenolic ester
08/17/2011CN102156384A Electro-deposition photoresist and preparation method and film forming method thereof
08/17/2011CN102156383A Coloring composition, color filter and color liquid crystal display element
08/17/2011CN102153695A Photosensitive compositions
08/17/2011CN102152536A Process for manufacturing metal label with multi-level colorful patterns
08/17/2011CN101900862B Axial jog adjustment device for optical element in projection objective system
08/17/2011CN101764053B Photoetching method
08/17/2011CN101752228B Photolithography
08/17/2011CN101694562B Multi-mask photoetching machine silicon wafer stage system
08/17/2011CN101694560B Silicon wafer stage double-stage exchange system by adopting air-floatation planar motor
08/17/2011CN101620384B Photoresist tool cleaning device configured to receive fluid from top part and bottom part
08/17/2011CN101520601B Light shield for manufacturing colored filter and liquid crystal display device
08/17/2011CN101508860B Copper product circuit board etching printing ink, preparation and uses thereof
08/17/2011CN101477304B Stamping method for copying high-resolution nano-structure on complicated shape surface
08/17/2011CN101458463B Ashing method
08/17/2011CN101436003B Exposure apparatus and device manufacturing method
08/17/2011CN101435960B Manufacturing method of liquid crystal display device array substrate
08/17/2011CN101410755B Photosensitive resin composition, photosensitive element using same, method for forming resist pattern, and method for producing printed wiring board
08/17/2011CN101398626B Photo resist supply device
08/17/2011CN101393401B Developing method of photolithographic process
08/17/2011CN101354535B Method for forming and coating multi-layer mask layer
08/17/2011CN101312180B Superposed marker and method for forming same as well as uses
08/17/2011CN101276744B Coating and developing system, coating and developing method
08/17/2011CN101238413B Antireflective hardmask composition and methods for using same
08/17/2011CN101196660B Liquid crystal display and method of manufacturing the same
08/17/2011CN101185026B Photosensitive resin composition and color filters
08/17/2011CN101109899B Resist composition
08/17/2011CN101082783B Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate
08/17/2011CN101080673B Resist composition for liquid immersion exposure and method for resist pattern formation
08/17/2011CN101071279B Lithographic apparatus, calibration method, device manufacturing method
08/17/2011CN101003591B Resin suitable for an acid generator and a chemically amplified positive resist composition containing the same
08/16/2011US7999919 Substrate holding technique
08/16/2011US7998812 Semiconductor device
08/16/2011US7998759 Maunfacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server
08/16/2011US7998664 Processing liquid for resist substrate and method of processing resist substrate using the same
08/16/2011US7998663 Pattern formation method
08/16/2011US7998662 Structure for pattern formation, method for pattern formation, and application thereof
08/16/2011US7998661 Method of nano-patterning using surface plasmon effect and method of manufacturing nano-imprint master and discrete track magnetic recording media using the nano-patterning method
08/16/2011US7998660 Exposure method
08/16/2011US7998659 Photosensitive laminated original printing plate for letterpress printing and process for producing letterpress printing plate using the photosensitive laminated original printing plate
08/16/2011US7998658 Pattern forming method
08/16/2011US7998657 Ester compounds and their preparation, polymers, resist compositions and patterning process
08/16/2011US7998656 Chemically amplified positive resist composition
08/16/2011US7998655 Method of forming patterns
08/16/2011US7998654 Positive resist composition and pattern-forming method
08/16/2011US7998653 Coating compositions comprising a latent activator for marking substrates
08/16/2011US7998652 Lithographic printing plate precursor and lithographic printing method
08/16/2011US7998644 Mask blank providing system, mask blank providing method, mask blank transparent substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method
08/16/2011US7998641 Photomask and pattern formation method using the same
08/16/2011US7998528 Method for direct fabrication of nanostructures
08/16/2011US7998304 Methods of configuring a proximity head that provides uniform fluid flow relative to a wafer
08/16/2011US7997890 Device and method for lithography
08/16/2011US7997495 Precisely tuned RFID antenna
08/16/2011US7997199 Method and apparatus for manufacturing relief material for seamless printing
08/16/2011CA2411198C Methods utilizing scanning probe microscope tips and products therefor or produced thereby
08/11/2011WO2011097514A2 Templates having high contrast alignment marks
08/11/2011WO2011096552A1 Photosensitive resin composition, method for manufacturing structural body, and liquid discharge head
08/11/2011WO2011096458A1 Negative photosensitive resin composition, pattern formation method, and liquid discharge head
08/11/2011WO2011096453A1 Illumination optical device, illumination method, and exposure method and device
08/11/2011WO2011096428A1 Exposure method, exposure apparatus, pattern forming method, and device manufacturing method
08/11/2011WO2011096400A1 Positive photosensitive resin composition and liquid-repellent film
08/11/2011WO2011096385A1 Layered structure and light-sensitive dry film used in same
08/11/2011WO2011096384A1 Layered structure and light-sensitive dry film used in same
08/11/2011WO2011096365A1 Light irradiation device for exposure devices, method for controlling turn-on of same, exposure device, exposure method, and substrate
08/11/2011WO2011096206A1 Photocurable resin composition, dry film, cured article, and printed wiring board
08/11/2011WO2011096195A1 Photosensitive resin composition, method for producing structure, and liquid discharge head
08/11/2011WO2011095442A1 Photopolymer formulation having ester-based writing monomers
08/11/2011WO2011095441A1 Photopolymer formulation having triazine-based writing monomers
08/11/2011WO2011095217A1 Method and process for metallic stamp replication for large area nanopatterns
08/11/2011WO2011095209A1 Microlithographic projection exposure system
08/11/2011WO2011002516A9 A self-imageable film forming polymer, compositions thereof and devices and structures made therefrom
08/11/2011US20110196529 Process for the Production of a Three-Dimensional Object With Resolution Improvement by "Pixel Shift"
08/11/2011US20110196122 (meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it
08/11/2011US20110196121 Fluorine-Containing Compounds and their Polymers Useful for Anti-Reflection Film Materials and Resist Compositions
08/11/2011US20110195363 Layered radiation-sensitive materials with varying sensitivity
08/11/2011US20110195362 Resist underlayer film composition, process for forming resist underlayer film, patterning process and fullerene derivative
08/11/2011US20110195361 Solution to optical constraint on microtruss processing
08/11/2011US20110195360 Methods to fabricate a photoactive substrate suitable for microfabrication
08/11/2011US20110195359 Self-contained proximity effect correction inspiration for advanced lithography (special)
08/11/2011US20110195352 Mask for laser induced thermal imaging and method of fabricating organic electro-luminescence display device using the same
08/11/2011US20110195237 System and resin for rapid prototyping
08/11/2011US20110194095 Exposure apparatus and photomask
08/11/2011US20110194092 Substrate, an Inspection Apparatus, and a Lithographic Apparatus
08/11/2011US20110193202 Methods to achieve 22 nanometer and beyond with single exposure