Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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08/17/2011 | CN102159996A Vibration damping in projection exposure apparatuses for semiconductor lithography |
08/17/2011 | CN102159995A 正性光敏树脂组合物 A positive photosensitive resin composition |
08/17/2011 | CN102157645A Light emitting diode and preparation method thereof |
08/17/2011 | CN102157643A Method for preparing GaN-based photonic crystal LED based on nanoimprint lithography |
08/17/2011 | CN102157642A Nanoimprint based preparation method of LED with high light-emitting efficiency |
08/17/2011 | CN102157629A Method for manufacturing graphical sapphire substrate |
08/17/2011 | CN102157361A Method for preparing semiconductor T-shaped gate electrode by utilizing photon beam super-diffraction technology |
08/17/2011 | CN102157357A Method for cleaning semiconductor silicon wafer |
08/17/2011 | CN102157350A Manufacturing method for semiconductor device |
08/17/2011 | CN102156848A Device for automatically recognizing positioning of exposure machine vault |
08/17/2011 | CN102156391A Lithographic apparatus |
08/17/2011 | CN102156390A Methods relating to immersion lithography and an immersion lithographic apparatus |
08/17/2011 | CN102156389A Maintenance method, exposure method and apparatus, and device manufacturing method |
08/17/2011 | CN102156388A Object with an improved suitability for a plasma cleaning treatment |
08/17/2011 | CN102156387A Radiation-sensitive composition and cured film |
08/17/2011 | CN102156386A Positive radiation-sensitive composition, interlayer insulating film and method for forming the same |
08/17/2011 | CN102156385A Chemical amplification type i-linear positive photoresist composition containing 2,1,4-diazo naphthoquinone sulphonic acid phenolic ester |
08/17/2011 | CN102156384A Electro-deposition photoresist and preparation method and film forming method thereof |
08/17/2011 | CN102156383A Coloring composition, color filter and color liquid crystal display element |
08/17/2011 | CN102153695A Photosensitive compositions |
08/17/2011 | CN102152536A Process for manufacturing metal label with multi-level colorful patterns |
08/17/2011 | CN101900862B Axial jog adjustment device for optical element in projection objective system |
08/17/2011 | CN101764053B Photoetching method |
08/17/2011 | CN101752228B Photolithography |
08/17/2011 | CN101694562B Multi-mask photoetching machine silicon wafer stage system |
08/17/2011 | CN101694560B Silicon wafer stage double-stage exchange system by adopting air-floatation planar motor |
08/17/2011 | CN101620384B Photoresist tool cleaning device configured to receive fluid from top part and bottom part |
08/17/2011 | CN101520601B Light shield for manufacturing colored filter and liquid crystal display device |
08/17/2011 | CN101508860B Copper product circuit board etching printing ink, preparation and uses thereof |
08/17/2011 | CN101477304B Stamping method for copying high-resolution nano-structure on complicated shape surface |
08/17/2011 | CN101458463B Ashing method |
08/17/2011 | CN101436003B Exposure apparatus and device manufacturing method |
08/17/2011 | CN101435960B Manufacturing method of liquid crystal display device array substrate |
08/17/2011 | CN101410755B Photosensitive resin composition, photosensitive element using same, method for forming resist pattern, and method for producing printed wiring board |
08/17/2011 | CN101398626B Photo resist supply device |
08/17/2011 | CN101393401B Developing method of photolithographic process |
08/17/2011 | CN101354535B Method for forming and coating multi-layer mask layer |
08/17/2011 | CN101312180B Superposed marker and method for forming same as well as uses |
08/17/2011 | CN101276744B Coating and developing system, coating and developing method |
08/17/2011 | CN101238413B Antireflective hardmask composition and methods for using same |
08/17/2011 | CN101196660B Liquid crystal display and method of manufacturing the same |
08/17/2011 | CN101185026B Photosensitive resin composition and color filters |
08/17/2011 | CN101109899B Resist composition |
08/17/2011 | CN101082783B Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate |
08/17/2011 | CN101080673B Resist composition for liquid immersion exposure and method for resist pattern formation |
08/17/2011 | CN101071279B Lithographic apparatus, calibration method, device manufacturing method |
08/17/2011 | CN101003591B Resin suitable for an acid generator and a chemically amplified positive resist composition containing the same |
08/16/2011 | US7999919 Substrate holding technique |
08/16/2011 | US7998812 Semiconductor device |
08/16/2011 | US7998759 Maunfacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server |
08/16/2011 | US7998664 Processing liquid for resist substrate and method of processing resist substrate using the same |
08/16/2011 | US7998663 Pattern formation method |
08/16/2011 | US7998662 Structure for pattern formation, method for pattern formation, and application thereof |
08/16/2011 | US7998661 Method of nano-patterning using surface plasmon effect and method of manufacturing nano-imprint master and discrete track magnetic recording media using the nano-patterning method |
08/16/2011 | US7998660 Exposure method |
08/16/2011 | US7998659 Photosensitive laminated original printing plate for letterpress printing and process for producing letterpress printing plate using the photosensitive laminated original printing plate |
08/16/2011 | US7998658 Pattern forming method |
08/16/2011 | US7998657 Ester compounds and their preparation, polymers, resist compositions and patterning process |
08/16/2011 | US7998656 Chemically amplified positive resist composition |
08/16/2011 | US7998655 Method of forming patterns |
08/16/2011 | US7998654 Positive resist composition and pattern-forming method |
08/16/2011 | US7998653 Coating compositions comprising a latent activator for marking substrates |
08/16/2011 | US7998652 Lithographic printing plate precursor and lithographic printing method |
08/16/2011 | US7998644 Mask blank providing system, mask blank providing method, mask blank transparent substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method |
08/16/2011 | US7998641 Photomask and pattern formation method using the same |
08/16/2011 | US7998528 Method for direct fabrication of nanostructures |
08/16/2011 | US7998304 Methods of configuring a proximity head that provides uniform fluid flow relative to a wafer |
08/16/2011 | US7997890 Device and method for lithography |
08/16/2011 | US7997495 Precisely tuned RFID antenna |
08/16/2011 | US7997199 Method and apparatus for manufacturing relief material for seamless printing |
08/16/2011 | CA2411198C Methods utilizing scanning probe microscope tips and products therefor or produced thereby |
08/11/2011 | WO2011097514A2 Templates having high contrast alignment marks |
08/11/2011 | WO2011096552A1 Photosensitive resin composition, method for manufacturing structural body, and liquid discharge head |
08/11/2011 | WO2011096458A1 Negative photosensitive resin composition, pattern formation method, and liquid discharge head |
08/11/2011 | WO2011096453A1 Illumination optical device, illumination method, and exposure method and device |
08/11/2011 | WO2011096428A1 Exposure method, exposure apparatus, pattern forming method, and device manufacturing method |
08/11/2011 | WO2011096400A1 Positive photosensitive resin composition and liquid-repellent film |
08/11/2011 | WO2011096385A1 Layered structure and light-sensitive dry film used in same |
08/11/2011 | WO2011096384A1 Layered structure and light-sensitive dry film used in same |
08/11/2011 | WO2011096365A1 Light irradiation device for exposure devices, method for controlling turn-on of same, exposure device, exposure method, and substrate |
08/11/2011 | WO2011096206A1 Photocurable resin composition, dry film, cured article, and printed wiring board |
08/11/2011 | WO2011096195A1 Photosensitive resin composition, method for producing structure, and liquid discharge head |
08/11/2011 | WO2011095442A1 Photopolymer formulation having ester-based writing monomers |
08/11/2011 | WO2011095441A1 Photopolymer formulation having triazine-based writing monomers |
08/11/2011 | WO2011095217A1 Method and process for metallic stamp replication for large area nanopatterns |
08/11/2011 | WO2011095209A1 Microlithographic projection exposure system |
08/11/2011 | WO2011002516A9 A self-imageable film forming polymer, compositions thereof and devices and structures made therefrom |
08/11/2011 | US20110196529 Process for the Production of a Three-Dimensional Object With Resolution Improvement by "Pixel Shift" |
08/11/2011 | US20110196122 (meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it |
08/11/2011 | US20110196121 Fluorine-Containing Compounds and their Polymers Useful for Anti-Reflection Film Materials and Resist Compositions |
08/11/2011 | US20110195363 Layered radiation-sensitive materials with varying sensitivity |
08/11/2011 | US20110195362 Resist underlayer film composition, process for forming resist underlayer film, patterning process and fullerene derivative |
08/11/2011 | US20110195361 Solution to optical constraint on microtruss processing |
08/11/2011 | US20110195360 Methods to fabricate a photoactive substrate suitable for microfabrication |
08/11/2011 | US20110195359 Self-contained proximity effect correction inspiration for advanced lithography (special) |
08/11/2011 | US20110195352 Mask for laser induced thermal imaging and method of fabricating organic electro-luminescence display device using the same |
08/11/2011 | US20110195237 System and resin for rapid prototyping |
08/11/2011 | US20110194095 Exposure apparatus and photomask |
08/11/2011 | US20110194092 Substrate, an Inspection Apparatus, and a Lithographic Apparatus |
08/11/2011 | US20110193202 Methods to achieve 22 nanometer and beyond with single exposure |