| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/24/2011 | CN101030046B Anticorrdant stripping waste liquor regeneration method and device |
| 08/23/2011 | US8004690 Device and method for the optical measurement of an optical system, measurement structure support, and microlithographic projection exposure apparatus |
| 08/23/2011 | US8004656 Illumination system for a microlithographic projection exposure apparatus |
| 08/23/2011 | US8004653 Exposure apparatus and method for producing device |
| 08/23/2011 | US8004650 Exposure apparatus and device manufacturing method |
| 08/23/2011 | US8004649 Immersion photolithography system and method using microchannel nozzles |
| 08/23/2011 | US8003968 Lithographic apparatus and substrate edge seal |
| 08/23/2011 | US8003960 Reflective optical element, optical system and EUV lithography device |
| 08/23/2011 | US8003919 Substrate heat treatment apparatus |
| 08/23/2011 | US8003311 Integrated circuit system employing multiple exposure dummy patterning technology |
| 08/23/2011 | US8003310 Masking techniques and templates for dense semiconductor fabrication |
| 08/23/2011 | US8003309 Photoresist compositions and methods of use in high index immersion lithography |
| 08/23/2011 | US8003308 Lithographic apparatus and device manufacturing method for writing a digital image |
| 08/23/2011 | US8003307 Rorming an insulation layer over a substrate in a logic circuit and a pixel region;forming a photoresist over the insulation layer;patterning the photoresist where the insulation layer in the pixel region is exposed and the insulation layer in the logic circuit region is not exposed; etching |
| 08/23/2011 | US8003306 Methods of forming electronic devices by ion implanting |
| 08/23/2011 | US8003305 Method for patterning a semiconductor wafer |
| 08/23/2011 | US8003303 Intensity selective exposure method and apparatus |
| 08/23/2011 | US8003302 Method for fabricating patterns using a photomask |
| 08/23/2011 | US8003301 Photomasks; photoresists |
| 08/23/2011 | US8003300 Methods for fabricating complex micro and nanoscale structures and electronic devices and components made by the same |
| 08/23/2011 | US8003299 Photosensitive original printing plate for relief printing, method for producing relief printing plate, and light-shielding ink for performing the method |
| 08/23/2011 | US8003298 Printing resist, method for preparing the same and patterning method using the same |
| 08/23/2011 | US8003297 Polymeric material, containing a latent acid |
| 08/23/2011 | US8003296 Chemically amplified positive resist composition |
| 08/23/2011 | US8003295 Patterning process and resist composition used therein |
| 08/23/2011 | US8003294 disulfoneamines as acid generators capable of generating an acid upon irradiation with actinic ray or radiation; use in making semiconductors, printed circuits; improve Post Exposure Bake temperature dependency and exposure latitude |
| 08/23/2011 | US8003293 Pixelated photoresists |
| 08/23/2011 | US8003292 Method for applying a resist layer, uses of adhesive materials, and adhesive materials and resist layer |
| 08/23/2011 | CA2452566C Sulfonium salts, methods for their preparation and use thereof as photoinitiators for radiation curable systems |
| 08/18/2011 | WO2011100050A2 Process gas confinement for nano-imprinting |
| 08/18/2011 | WO2011099646A2 Manufacturing method of exposure apparatus and device manufacturing method |
| 08/18/2011 | WO2011099235A1 Underlayer film material, and method for formation of multilayer resist pattern |
| 08/18/2011 | WO2011098790A1 Lithography apparatus and method |
| 08/18/2011 | WO2011098604A2 Method and device for active wedge error compensation between two objects that can be positioned substantially parallel to each other |
| 08/18/2011 | WO2011098325A2 Lithographic apparatus and device manufacturing method |
| 08/18/2011 | WO2011098170A1 Spectral purity filter |
| 08/18/2011 | WO2011098169A1 Radiation source, lithographic apparatus and device manufacturing method |
| 08/18/2011 | WO2011097677A1 Printed multi-zone microzone plates |
| 08/18/2011 | WO2011077241A3 Antireflective coating composition and process thereof |
| 08/18/2011 | WO2011068249A3 Exposure apparatus, liquid immersion member, and device manufacturing method |
| 08/18/2011 | WO2011004198A3 Patterning |
| 08/18/2011 | US20110201207 Backplane structures for solution processed electronic devices |
| 08/18/2011 | US20110200953 Developing apparatus, developing method and storage medium |
| 08/18/2011 | US20110200952 Developing apparatus, developing method and storage medium |
| 08/18/2011 | US20110200951 Method for removing photoresist pattern |
| 08/18/2011 | US20110200950 Photocurable composition |
| 08/18/2011 | US20110200949 Substrate processing method |
| 08/18/2011 | US20110200948 Method of Fabricating Micro-Devices |
| 08/18/2011 | US20110200947 Patterning method |
| 08/18/2011 | US20110200946 Microlithography projection exposure apparatus having at least two operating states |
| 08/18/2011 | US20110200945 Method of manufacturing flat panel display |
| 08/18/2011 | US20110200944 Manufacturing method of exposure apparatus and device manufacturing method |
| 08/18/2011 | US20110200943 Method for producing a planographic printing plate |
| 08/18/2011 | US20110200942 Chemically amplified negative resist composition for eb or euv lithography and patterning process |
| 08/18/2011 | US20110200941 Chemically amplified positive resist composition for eb or euv lithography and patterning process |
| 08/18/2011 | US20110200940 Salt and photoresist composition comprising the same |
| 08/18/2011 | US20110200939 Polyamic acid, polyimide, photosensitive resin composition comprising the same and dry film manufactured by the same |
| 08/18/2011 | US20110200938 Antireflective Compositions and Methods of Using Same |
| 08/18/2011 | US20110200937 Positive photosensitive resin composition for spray coating and method for producing through electrode using the same |
| 08/18/2011 | US20110200936 Salt and photoresist composition containing the same |
| 08/18/2011 | US20110200935 Photoresist composition |
| 08/18/2011 | US20110200923 Substrate treatment method |
| 08/18/2011 | US20110200922 Lithographic Apparatus and Method |
| 08/18/2011 | US20110200920 Reflective mask blank for euv lithography |
| 08/18/2011 | US20110200919 Chemically amplified positive resist composition and pattern forming process |
| 08/18/2011 | US20110200918 Photosensitive composition for volume hologram recording and producing method thereof |
| 08/18/2011 | US20110199599 six-mirror euv projection system with low incidence angles |
| 08/18/2011 | US20110199597 Imaging device in a projection exposure facility |
| 08/18/2011 | US20110199594 Exposure apparatus and method for producing device |
| 08/18/2011 | US20110199564 Display device substrate, display device substrate manufacturing method, display device, liquid crystal display device, liquid crystal display device manufacturing method and organic electroluminescent display device |
| 08/18/2011 | DE102010007970A1 Verfahren und Vorrichtung zum aktiven Keilfehlerausgleich zwischen zwei im wesentlichen zueinander parallel positionierbaren Gegenständen Method and device for active wedge error compensation between two substantially parallel repositionable articles |
| 08/18/2011 | DE102009055119A1 Spiegelelement für die EUV-Lithographie und Herstellungsverfahren dafür Mirror element for EUV lithography and manufacturing method thereof |
| 08/17/2011 | EP2357530A2 Method for producing a planographic printing plate |
| 08/17/2011 | EP2357529A2 Optical imaging arrangement |
| 08/17/2011 | EP2356520A2 Technique for marking product housings |
| 08/17/2011 | EP2356519A1 Actuator system, lithographic apparatus, method of controlling the position of a component and device manufacturing method |
| 08/17/2011 | EP2356518A1 Method and device for imaging a radiation-sensitive substrate |
| 08/17/2011 | EP2356517A2 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same |
| 08/17/2011 | EP2356516A2 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the composition |
| 08/17/2011 | EP2356515A1 Photopolymer stamp manufacturing process and preparation system and photopolymer stamp dies |
| 08/17/2011 | EP2356514A1 A method for forming a multi-level surface on a substrate with areas of different wettability and a semiconductor device having the same |
| 08/17/2011 | EP2356186A1 An antireflective coating composition comprising fused aromatic rings |
| 08/17/2011 | EP2356182A1 Radiation curable coating materials |
| 08/17/2011 | EP2356177A1 An antireflective coating composition comprising fused aromatic rings |
| 08/17/2011 | EP2142959B1 Triangulating design data and encoding design intent for microlithographic printing |
| 08/17/2011 | EP2127896B1 Method for producing photosensitive resin plate or relief printing plate having recessed and projected pattern, and plate surface treating liquid used in the production method |
| 08/17/2011 | EP1904898B1 Method for fine line resist stripping |
| 08/17/2011 | EP1152848B1 Method and apparatus for production of a cast component |
| 08/17/2011 | CN201936121U 基板烘烤设备 Board baking equipment |
| 08/17/2011 | CN201936120U 干膜显影新型工作台 The dry film developing new workbench |
| 08/17/2011 | CN201936119U 一种新型线路板阻焊绿油菲林 A new circuit board solder green oil film |
| 08/17/2011 | CN1996153B Heating device and heating method |
| 08/17/2011 | CN1963665B Film peeling off device |
| 08/17/2011 | CN1831646B Light-shielding image-carrying substrate, method of forming light-shielding image, transfer material, color filter, and display device |
| 08/17/2011 | CN1818785B Positive type resist composition and resist pattern formation method using same |
| 08/17/2011 | CN1804725B Apparatus and method for supporting and thermally conditioning a substrate, a support table, a chuck |
| 08/17/2011 | CN1690866B Device and method for treating panel |
| 08/17/2011 | CN1577112B Slushing composition for removing color etch - resistant agent in tft-lcd producing technology |
| 08/17/2011 | CN102160144A Patterning single integrated circuit layer using automatically-generated masks and multiple masking layers |
| 08/17/2011 | CN102159997A Reflective optical element and methods for producing same |