Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/2011
08/25/2011WO2011101183A1 Lithographic apparatus, device manufacturing method and associated data processing apparatus and computer program product
08/25/2011WO2011081215A4 Movable body drive method, movable body apparatus, exposure method, exposure apparatus, and device manufacturing method
08/25/2011WO2010134643A3 Object exchange method, carrier system, exposure and apparatus, and device manufacturing method
08/25/2011US20110208031 Neutral particle nanopatterning for nonplanar multimodal neural probes
08/25/2011US20110207645 Non-aqueous, non-corrosive microelectronic cleaning compositions containing polymeric corrosion inhibitors
08/25/2011US20110207058 Method for developing three dimensional surface patterns for a papermaking belt
08/25/2011US20110207057 Edge Smoothness With Low Resolution Projected Images For Use in Solid Imaging
08/25/2011US20110207056 Contact or proximity printing using a magnified mask image
08/25/2011US20110207055 Fabricating method for touch screen panel
08/25/2011US20110207054 Self-aligned, sub-wavelength optical lithography
08/25/2011US20110207053 Exposure method and method of making a semiconductor device
08/25/2011US20110207052 Sulfonamide-containing photoresist compositions and methods of use
08/25/2011US20110207051 Sulfonamide-Containing Topcoat and Photoresist Additive Compositions and Methods of Use
08/25/2011US20110207049 Asymmetric photo-patternable sol-gel precursors and their methods of preparation
08/25/2011US20110207048 Method of producing electrical component, electrical component production device, and photosensitive resist
08/25/2011US20110207047 Antireflective Hardmask Composition and a Method of Preparing a Patterned Material Using Same
08/25/2011US20110207035 Exposure apparatus and exposure method
08/25/2011US20110207029 Media for volume-holographic recording based on self-developing polymer
08/25/2011US20110206270 Storage medium storing computer program for determining at least one of exposure condition and mask pattern
08/25/2011US20110205505 Line pattern collapse mitigation through gap-fill material application
08/25/2011US20110204768 Light emitting substrate, manufacturing method thereof, and image display apparatus having the light emitting substrate
08/25/2011US20110204528 Postive-type photosensitive resin composition, method for producing resist pattern, and electronic component
08/25/2011US20110204523 Method of fabricating dual damascene structures using a multilevel multiple exposure patterning scheme
08/25/2011US20110204484 Sub-Wavelength Segmentation in Measurement Targets on Substrates
08/25/2011DE102008006438B4 Verfahren und Vorrichtung zum Strukturieren eines strahlungsempfindlichen Materials Method and apparatus for patterning a radiation-sensitive material
08/25/2011DE102007043958B4 Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage Illumination device of a microlithography projection exposure apparatus
08/24/2011EP2360529A1 Method for manufacturing lithographic printing plate, developer for original lithographic printing plate, and replenisher for developing original lithographic printing plate
08/24/2011EP2360528A1 Exposure device for producing print templates and use of same
08/24/2011EP2360527A1 Chemically amplified positive resist composition for EB or EUV lithography and patterning process
08/24/2011EP2360526A1 Chemically amplified negative resist composition for E beam or EUV lithography and patterning process
08/24/2011EP2360525A1 Chemically amplified positive resist composition and pattern forming process
08/24/2011EP2360524A2 Imprint apparatus, template of imprint apparatus, and article manufacturing method
08/24/2011EP2360153A2 Photoacid generators and photoresists comprising same
08/24/2011EP2359962A2 Method and apparatus for production of a cast component
08/24/2011EP2359959A1 Green ceramic casting mold system and refractory casting mold obtainable thereof
08/24/2011EP2359958A1 Method for production of a ceramic casting mold system
08/24/2011EP2359389A2 Laser ablation tooling via sparse patterned masks
08/24/2011EP2359194A1 Image reading and writing using a complex two-dimensional interlace scheme
08/24/2011EP2359193A1 Rotating arm for writing or reading an image on a workpiece
08/24/2011EP2359192A1 Gradient assisted image resampling in micro-lithographic printing
08/24/2011EP2359191A1 Carrier solvent compositions, coatings compositions, and methods to produce thick polymer coatings
08/24/2011EP2359190A2 Flexographic element and method of imaging
08/24/2011EP2171542B1 Method and device for producing structured optical materials
08/24/2011EP1955113B1 Method of forming a structured layer on a substrate
08/24/2011EP1813987B1 Sulfonic-ester-containing composition for formation of antireflection film for lithography
08/24/2011EP1564734B1 Method for producing stamper used for producing optical disc and optical disc producing method
08/24/2011EP1310022B1 Laser wavelength control unit with piezoelectric driver
08/24/2011CN201945800U 晶圆片光刻检测传感器 Wafer lithography detection sensor
08/24/2011CN1862385B System and method for detecting focus change in photolithographic process using test characteristic
08/24/2011CN102165374A Process for producing lithographic printing plate
08/24/2011CN102165373A 投影系统和光刻设备 The projection system of the lithographic apparatus and
08/24/2011CN102165372A Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter
08/24/2011CN102165371A Projection exposure apparatus with optimized adjustment possibility
08/24/2011CN102165370A Photosensitive siloxane polyimide resin composition
08/24/2011CN102164977A Photosensitive resin composition and method for producing photosensitive resin used therein
08/24/2011CN102164751A Bidirectional imaging with varying intensities
08/24/2011CN102163722A Negative electrode base member
08/24/2011CN102163721A Negative electrode base member
08/24/2011CN102163547A Method for depositing photoresist on microelectronic or photoelectronic chip
08/24/2011CN102163011A Stripping liquid composition of photoresist
08/24/2011CN102163010A Method for producing a planographic printing plate
08/24/2011CN102163009A Developing apparatus and developing method
08/24/2011CN102163008A Online detection method of wave aberration of projection objective of lithography machine for self-calibrating system error
08/24/2011CN102163007A Lithography machine imaging system for improving resolution by using photoelectric effect and imaging method thereof
08/24/2011CN102163006A Fully automatic stepping digital lithography device
08/24/2011CN102163005A Exposure apparatus, device producing method, and optical component
08/24/2011CN102163004A Exposure apparatus, exposure method and device producing method
08/24/2011CN102163003A Lithographic apparatus and method for correcting a position of a stage of a lithographic apparatus
08/24/2011CN102163002A Lithographic apparatus and device manufacturing method
08/24/2011CN102163001A Method and apparatus for controlling a lithographic apparatus
08/24/2011CN102163000A Lithographic apparatus and device manufacturing method
08/24/2011CN102162999A Substrate table, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus
08/24/2011CN102162998A Lithographic apparatus and method
08/24/2011CN102162997A Method for fabricating micro-fluidic chip using solar light as exposure light source and application thereof
08/24/2011CN102162996A Manufacture method for negative type photosensitive resin composition and cured relief pattern
08/24/2011CN102162995A Photoresist composition
08/24/2011CN102162994A Manufacture method for red colored cured composition and color filter, color filter, and liquid crystal display element
08/24/2011CN102162993A White solder mask composition for spraying
08/24/2011CN102162992A Imprint apparatus, template of imprint apparatus, and article manufacturing method
08/24/2011CN102162935A Adjustable vacuum sucker device for assembling and adjusting lens of photoetching machine
08/24/2011CN102162900A Device for clamping reflector at high accuracy
08/24/2011CN102162894A Optical element centering device in projection lens system
08/24/2011CN102161641A Pyridone complex
08/24/2011CN102161638A Novel compound and radiation sensitive composition comprising the same
08/24/2011CN102161637A Photoactive compound
08/24/2011CN102161636A Photoactive compound
08/24/2011CN102161635A Photoactive compound
08/24/2011CN102161622A Compound provided with phenol substituent, method for preparing the compound, and resist composition containing the compound
08/24/2011CN101727011B Alignment method of lithography machine
08/24/2011CN101726901B Method for manufacturing liquid crystal display panel
08/24/2011CN101589341B Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
08/24/2011CN101529337B Cleaning method, apparatus and cleaning system
08/24/2011CN101515121B Developing machine
08/24/2011CN101490627B Compositions for removal of etching residues
08/24/2011CN101366107B Oxidizing aqueous cleaner for the removal of post-etch residues
08/24/2011CN101339369B PS plate retouching paste
08/24/2011CN101213493B Photoresist developer and process for producing substrate with the use of the developer
08/24/2011CN101198906B Positive resist composition for thin-film implantation process and method for forming resist pattern
08/24/2011CN101133366B Developer composition, process for producing the same, and method of forming resist pattern
08/24/2011CN101030047B Anticorrdant stripping waste liquor regeneration method and device