| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/01/2011 | US20110212391 Polymer, chemically amplified positive resist composition and pattern forming process |
| 09/01/2011 | US20110212390 Chemically amplified negative resist composition and patterning process |
| 09/01/2011 | US20110212389 Focus test mask, focus measurement method, exposure method and exposure apparatus |
| 09/01/2011 | US20110212388 Advanced phase shift lithography and attenuated phase shift mask for narrow track width d write pole definition |
| 09/01/2011 | US20110212387 Volume Hologram Comprising Expansion Agent Layer or Contraction Agent Layer for Creating Color Patterns |
| 09/01/2011 | US20110211186 Exposure apparatus, exposure method and device manufacturing method |
| 09/01/2011 | US20110211185 Spectral Purity Filter, Radiation Source, Lithographic Apparatus, and Device Manufacturing Method |
| 09/01/2011 | US20110211181 Lithographic apparatus and device manufacturing method |
| 09/01/2011 | DE102011003066A1 Verfahren zum belastungsgerechten Betrieb einer Projektionsbelichtungsanlage sowie entsprechende Projektionsbelichtungsanlage A method for load-oriented operating a projection exposure apparatus and corresponding projection exposure apparatus |
| 08/31/2011 | EP2362268A1 Polymer, chemically amplified positive resist composition and pattern forming process |
| 08/31/2011 | EP2362267A1 Chemically amplified negative resist composition and patterning process |
| 08/31/2011 | EP2362266A2 Colored curable composition, color filter and method of producing color filter, solid-state image sensor and liquid crystal display device |
| 08/31/2011 | EP2361402A1 3d mold for manufacture of sub-micron 3d structures using 2-d photon lithography and nanoimprinting and process thereof |
| 08/31/2011 | EP1449186B1 Laser-transfer film for permanently labeling components |
| 08/31/2011 | CN201955621U 一种同时可实现多槽显影的装置 At the same time developing a multi-slot device can be realized |
| 08/31/2011 | CN201955620U 一种真空双面曝光装置 A vacuum-sided exposure apparatus |
| 08/31/2011 | CN201955619U 半导体制造中光刻套刻图形的版图结构 Layout structure of semiconductor manufacturing lithography overlay graphics |
| 08/31/2011 | CN1900821B Organic inorganic composite photosensitive resin composition |
| 08/31/2011 | CN1892419B Mask pattern inspection method, exposure condition verification method, and manufacturing method of semiconductor device |
| 08/31/2011 | CN1698018B Radiation-curing composition, method for storing same, method for forming cured film, method for forming pattern, method for using pattern, electronic component, and optical waveguide |
| 08/31/2011 | CN1692314B Chemical-amplification positive-working photoresist composition |
| 08/31/2011 | CN102171618A Lithographic focus and dose measurement using a 2-D target |
| 08/31/2011 | CN102171617A Low-contamination optical arrangement |
| 08/31/2011 | CN102171616A Field facet mirror for use in an illumination optics of a projection exposure appratus for EUV microlithography |
| 08/31/2011 | CN102171615A Microlithographic projection exposure apparatus |
| 08/31/2011 | CN102171614A Microlithography projection exposure apparatus having at least two operating states |
| 08/31/2011 | CN102171613A Ultraviolet light absorbing ketones of 2-(2-hydroxyphenyl) benzotriazole |
| 08/31/2011 | CN102171612A Photosensitive resin composition, article using same, and method for forming negative pattern |
| 08/31/2011 | CN102171611A In-situ cleaning of an imprint lithography tool |
| 08/31/2011 | CN102171287A Dispersed composition, polymerizable composition, light shielding color filter, solid-state imaging element, liquid crystal display device, wafer-level lens, and imaging unit |
| 08/31/2011 | CN102171267A Media for volume-holographic recording based on self-developing polymer |
| 08/31/2011 | CN102169995A Negative electrode base member |
| 08/31/2011 | CN102169994A Negative electrode base member |
| 08/31/2011 | CN102169921A Preparation technology for increasing effective photosensitive area of photoelectric material |
| 08/31/2011 | CN102169826A Substrate treatment method |
| 08/31/2011 | CN102169812A Heating device, coating/developing system, heating method and coating/developing method |
| 08/31/2011 | CN102169296A Cleaning liquid for lithography and method for forming wiring |
| 08/31/2011 | CN102169295A Method for determining illumination intensity distribution of light source and mask pattern of photo-etching process |
| 08/31/2011 | CN102169294A Method for measuring scanning inclination of mask table in scanning mask aligner |
| 08/31/2011 | CN102169293A Method for adjusting parallelism of measurement light paths of workpiece table and mask table |
| 08/31/2011 | CN102169292A Method for coating photoresist |
| 08/31/2011 | CN102169291A Film use method |
| 08/31/2011 | CN102169290A Colored curable composition, color filter and method of producing color filter, solid-state image sensor and liquid crystal display device |
| 08/31/2011 | CN102169289A Reverse-roll imprint-moulding method of over-long grating ruler for machine tool |
| 08/31/2011 | CN102169288A Method of photolithography on sapphire substrate |
| 08/31/2011 | CN102169286A A substrate for a mask blank, a mask blank and method of manufacturing a transfer mask |
| 08/31/2011 | CN102169260A TFT-LCD (thin film transistor liquid crystal display) pixel electrode layer structure, preparation method and mask plate thereof |
| 08/31/2011 | CN102169226A Catadioptric projection objective |
| 08/31/2011 | CN102169219A Radial adjustment device for optical system |
| 08/31/2011 | CN102169218A Optical element axial adjusting device with aligning function |
| 08/31/2011 | CN102167760A Cationic polymerization or cation-free radical mixed polymerization type photopolymerization curing system |
| 08/31/2011 | CN102167684A Salt and process for producing acid generator |
| 08/31/2011 | CN102167677A Salt and photoresist composition containing the same |
| 08/31/2011 | CN102167676A Salt and photoresist composition comprising the same |
| 08/31/2011 | CN102166748A Automatic mechanical hand film feeding/fetching device |
| 08/31/2011 | CN101726773B Cambered artificial compound eye and preparation method thereof |
| 08/31/2011 | CN101710074B Micro optical fiber biosensor for detecting nitric oxide concentration in organism |
| 08/31/2011 | CN101620415B Control method of photoetching equipment in semiconductor process and device |
| 08/31/2011 | CN101504917B Method for preventing secondary breakdown of VDMOS tube |
| 08/31/2011 | CN101477311B Exposure method and exposure apparatus for photosensitive film |
| 08/31/2011 | CN101387828B Method for making precoating sensitization etching printing plate |
| 08/31/2011 | CN101295131B Method for producing nano-structure on insulated underlay |
| 08/31/2011 | CN101223477B Silver paste composition, method of forming conductive pattern by using the same, and the conductive pattern formed |
| 08/31/2011 | CN101198907B Antireflective hardmask composition and methods for using same |
| 08/31/2011 | CN101105638B Reflective loop system producing incoherent radiation |
| 08/30/2011 | US8009343 Optical imaging device having at least one system diaphragm |
| 08/30/2011 | US8009275 Movable stage apparatus |
| 08/30/2011 | US8008639 System for processing an object |
| 08/30/2011 | US8007990 Thick film layers and methods relating thereto |
| 08/30/2011 | US8007989 Method and solution for forming a patterned ferroelectric layer on a substrate |
| 08/30/2011 | US8007987 Manufacturing methods of asymmetric bumps and pixel structure |
| 08/30/2011 | US8007986 Immersion lithography fluids |
| 08/30/2011 | US8007985 Semiconductor devices and methods of manufacturing thereof |
| 08/30/2011 | US8007984 Relief imaging; photopolymerization; butadiene-styrene block copolymers; actinic radiation polymerization; dimensional stability; ink jets |
| 08/30/2011 | US8007983 Photosensitive resin composition, photosensitive element using same, method for forming resist pattern, and method for producing printed wiring board |
| 08/30/2011 | US8007981 Resist composition and method of forming resist pattern |
| 08/30/2011 | US8007980 Resist for printing and patterning method using the same |
| 08/30/2011 | US8007979 Acrylic polymer-containing gap fill material forming composition for lithography |
| 08/30/2011 | US8007966 Multiple technology node mask |
| 08/30/2011 | US8007965 Optical wavelength division multiplexed multiplexer/demultiplexer for an optical printed circuit board and a method of manufacturing the same |
| 08/30/2011 | US8007961 Mask blank substrate set and mask blank set |
| 08/25/2011 | WO2011102849A1 Nanoimprint lithography |
| 08/25/2011 | WO2011102800A1 Method for printing product features on a substrate sheet |
| 08/25/2011 | WO2011102546A1 Pattern forming method, chemical amplification resist composition and resist film |
| 08/25/2011 | WO2011102485A1 Process for making lithographic printing plate |
| 08/25/2011 | WO2011102470A1 Composition for formation of resist underlayer film containing silicon having nitrogen-containing ring |
| 08/25/2011 | WO2011102278A1 Method for planarising the rear surface of a substrate |
| 08/25/2011 | WO2011102201A1 Application method and application device |
| 08/25/2011 | WO2011102135A1 Method and device for manufacturing a semiconductor device |
| 08/25/2011 | WO2011102109A1 Light source optimizing method, exposure method, device manufacturing method, program, exposure apparatus, lithography system, light source evaluation method, and light source modulation method |
| 08/25/2011 | WO2011102064A1 METHOD FOR FORMATION OF ELECTRODE ON n-TYPE SEMICONDUCTOR LAYER |
| 08/25/2011 | WO2011101926A1 Manufacturing method for semiconductor device(s) and photomask |
| 08/25/2011 | WO2011101737A1 Antireflective compositions and methods of using same |
| 08/25/2011 | WO2011101450A1 Substrate support structure, clamp preparation unit, and lithography system |
| 08/25/2011 | WO2011101331A1 Illumination system and projection objective of a mask inspection apparatus |
| 08/25/2011 | WO2011101260A2 Sulfonamide-containing photoresist compositions and methods of use |
| 08/25/2011 | WO2011101259A2 Sulfonamide-containing topcoat and photoresist additive compositions and methods of use |
| 08/25/2011 | WO2011101192A1 Estimating substrate model parameters for lithographic apparatus control |
| 08/25/2011 | WO2011101187A1 Lithographic apparatus and device manufacturing method |
| 08/25/2011 | WO2011101184A1 Lithographic apparatus and method of producing a reference substrate |