| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/07/2011 | EP1989061B1 Method for producing lithographic printing plate |
| 09/07/2011 | CN201965402U 一种半自动曝光机绿油菲林 A semi-automatic exposure machine green oil film |
| 09/07/2011 | CN1914561B Photoresist compositions and processess of use |
| 09/07/2011 | CN1881078B Method for forming an anti-etching shielding layer |
| 09/07/2011 | CN1818798B Method and device for producing photon crystal mask layer on LED |
| 09/07/2011 | CN1503059B Lithographic apparatus and device manufacturing method |
| 09/07/2011 | CN102177570A Methods of forming patterns utilizing lithography and spacers |
| 09/07/2011 | CN102177470A Collector assembly, radiation source, lithographic appparatus and device manufacturing method |
| 09/07/2011 | CN102177469A Positive photosensitive resin composition |
| 09/07/2011 | CN102177230A Aqueous acidic formulations for copper oxide etch residue removal and prevention of copper electrodeposition |
| 09/07/2011 | CN102176425A Cartesian robot cluster tool architecture |
| 09/07/2011 | CN102176108A Automatically partitioned vacuumizing mechanism of platemaking roller |
| 09/07/2011 | CN102176107A Offset print water-borne UV (ultraviolet) photo-sensitive resist jetting plate-making method |
| 09/07/2011 | CN102174688A Mask and container and manufacturing apparatus |
| 09/07/2011 | CN102174296A Adhesive composition, adhesive film, adhesive sheet, semiconductor wafer and semiconductor device |
| 09/07/2011 | CN102174155A Polyorganosiloxane composition |
| 09/07/2011 | CN102174059A Sulfydryl-containing low polysiloxane compound, ultraviolet photoresist composition thereof, and impressing process |
| 09/07/2011 | CN102172491A Fluorine-contained surfactant and preparation method thereof |
| 09/07/2011 | CN101738799B TFT-LCD (thin film transistor-liquid crystal display) array substrate and manufacture method thereof |
| 09/07/2011 | CN101701776B Condensing recovery device and process device provided with same |
| 09/07/2011 | CN101634814B Primary aligning device and primary aligning system |
| 09/07/2011 | CN101576689B Electrode structure of smectic LCD baseplate and manufacturing method thereof |
| 09/07/2011 | CN101573409B Binder resin for near-infrared absorbing film, and near-infrared absorbing filter using the same |
| 09/07/2011 | CN101526760B Base plate processing system and developing method |
| 09/07/2011 | CN101520602B Polyurethane which can develop by radiation curing and photoresistance constituent which can develop by radiation curing and contains the polyurethane |
| 09/07/2011 | CN101510050B Method for extracting electron-beam exposure scattering parameter |
| 09/07/2011 | CN101466778B Method for producing plastic lens |
| 09/07/2011 | CN101460298B Embossing device, such as a cylinder or a sleeve |
| 09/07/2011 | CN101446753B Photomask and detecting device, detecting method, manufacturing method and pattern transferring method for the same |
| 09/07/2011 | CN101382732B Method for making pattern material layer |
| 09/07/2011 | CN101371198B Method for chemical reduction of an oxidized contamination material, or reducing oxidation of a contamination material and a conditioning system for doing the same |
| 09/07/2011 | CN101339366B Substrate processing method and device manufacture method |
| 09/07/2011 | CN101310222B Photosensitive composition, phososensitive film, permanent pattern, and method for formation of the permanent pattern |
| 09/07/2011 | CN101290475B Method for improving characteristic line breadth homogeneity |
| 09/07/2011 | CN101264703B Method for manufacturing false-proof signet |
| 09/07/2011 | CN101198903B Pattern replication with intermediate stamp |
| 09/07/2011 | CN101196680B Detecting device, detecting method, manufacturing method and pattern transferring method for photomask |
| 09/07/2011 | CN101122645B Stacked body for color filter and color filter |
| 09/07/2011 | CN101017323B Radiation-sensitive resin composition, protrusion and spacer formed of the same, method of forming the radiation-sensitive resin composition, and liquid crystal display element |
| 09/06/2011 | US8013980 Exposure apparatus equipped with interferometer and exposure apparatus using the same |
| 09/06/2011 | US8013075 Curable composition |
| 09/06/2011 | US8012676 Process for preparing conductive material |
| 09/06/2011 | US8012675 Method of patterning target layer on substrate |
| 09/06/2011 | US8012674 Efficient pitch multiplication process |
| 09/06/2011 | US8012672 Sulphonium salt photoinitiators |
| 09/06/2011 | US8012671 Curable composition, image forming material, and planographic printing plate precursor |
| 09/06/2011 | US8012670 Photoresist systems |
| 09/06/2011 | US8012669 Resist composition and method of forming resist pattern |
| 09/06/2011 | US8012667 Soft mold and method of fabricating the same |
| 09/06/2011 | US8012665 Positive photosensitive composition and pattern forming method using the same |
| 09/06/2011 | US8012664 Light-sensitive component for use in photoresists |
| 09/06/2011 | US8012652 Method of forming a thin film pattern and method of fabricating a liquid crystal display device |
| 09/06/2011 | US8012563 Large-size substrate |
| 09/06/2011 | US8012400 Surface and site-specific polymerization by direct-write lithography |
| 09/06/2011 | US8012385 soft lithographic method without an exposing apparatus; placing a mold having a groove on the substrate and injecting a color resin into the groove |
| 09/06/2011 | US8011807 Method for enabling transmission of substantially equal amounts of energy |
| 09/01/2011 | WO2011106325A1 Azicon beam polarization devices |
| 09/01/2011 | WO2011106040A1 Antireflective hardmask composition and a method of preparing a patterned material using same |
| 09/01/2011 | WO2011105626A1 Pattern forming method and resist composition |
| 09/01/2011 | WO2011105518A1 Photopolymerization initiator, photocurable composition, pattern formation method, colour filter, lcd device, and manufacturing method for photopolymerization initiator |
| 09/01/2011 | WO2011105461A1 Optical projection device for exposure apparatus, exposure apparatus, method for exposure, method for fabricating substrate, mask, and exposed substrate |
| 09/01/2011 | WO2011105443A1 Negative photosensitive resin composition, interlayer insulating film and method of formation of same |
| 09/01/2011 | WO2011105399A1 Fluorine-containing lactone monomeric compound, fluorine -containing lactone polymeric compound, resist fluid and topcoating composition that contain same, and method for pattern formation using same |
| 09/01/2011 | WO2011105384A1 Method for preparing a planographic printing plate and developer solution for master planographic printing plate |
| 09/01/2011 | WO2011105368A1 Silicon-containing resist underlayer-forming composition containing amic acid |
| 09/01/2011 | WO2011105307A1 Measuring method and measuring apparatus of pupil transmittance distribution, exposure method and exposure apparatus, and device manufacturing method |
| 09/01/2011 | WO2011105277A2 Resin composition for polyester base material, and dry film and printed circuit boards using same |
| 09/01/2011 | WO2011105249A1 Pattern forming method |
| 09/01/2011 | WO2011105129A1 Copper oxide etchant and etching method using same |
| 09/01/2011 | WO2011104806A1 Stage device |
| 09/01/2011 | WO2011104713A1 Method and system for measurng in patterned structures |
| 09/01/2011 | WO2011104617A1 Analyses of measurement data |
| 09/01/2011 | WO2011104613A1 Critical dimension uniformity correction by scanner signature control |
| 09/01/2011 | WO2011104389A2 Method for stress-adjusted operation of a projection exposure system and corresponding projection exposure system |
| 09/01/2011 | WO2011104376A1 Method and apparatus for performing pattern alignment |
| 09/01/2011 | WO2011104375A1 Method and apparatus for performing pattern alignment |
| 09/01/2011 | WO2011104374A1 Method and apparatus for performing pattern alignment |
| 09/01/2011 | WO2011104373A1 Method and apparatus for performing pattern alignment |
| 09/01/2011 | WO2011104372A1 Method and apparatus for performing pattern alignment |
| 09/01/2011 | WO2011104180A1 Lithographic apparatus and device manufacturing method |
| 09/01/2011 | WO2011104179A1 Lithographic apparatus and device manufacturing method |
| 09/01/2011 | WO2011104178A1 Lithographic apparatus and device manufacturing method |
| 09/01/2011 | WO2011104177A1 Lithographic apparatus and device manufacturing method |
| 09/01/2011 | WO2011104176A1 Lithographic apparatus and device manufacturing method |
| 09/01/2011 | WO2011104175A1 Lithographic apparatus and device manufacturing method |
| 09/01/2011 | WO2011104174A1 Lithographic apparatus and device manufacturing method |
| 09/01/2011 | WO2011104173A1 Lithographic apparatus and device manufacturing method |
| 09/01/2011 | WO2011104172A1 Lithographic apparatus and device manufacturing method |
| 09/01/2011 | WO2011104171A1 Lithographic apparatus and device manufacturing method |
| 09/01/2011 | WO2011104127A1 Latent acids and their use |
| 09/01/2011 | WO2011104045A1 Method and apparatus for treatment of self-assemblable polymer layers for use in lithography |
| 09/01/2011 | WO2011103972A1 Exposure device for producing printing originals and use of an exposure device |
| 09/01/2011 | WO2011081285A3 Polymer containing an aromatic ring for a resist underlayer, and resist underlayer compound including the polymer |
| 09/01/2011 | WO2011080311A4 Exposure method |
| 09/01/2011 | US20110212866 Water-rich stripping and cleaning formulation and method for using same |
| 09/01/2011 | US20110212403 Method and apparatus for enhanced dipole lithography |
| 09/01/2011 | US20110212402 Photosensitive resin composition and its application |
| 09/01/2011 | US20110212401 Radiation-sensitive resin composition, and resist pattern formation method |
| 09/01/2011 | US20110212394 Exposure apparatus, measurement method, stabilization method, and device fabrication method |
| 09/01/2011 | US20110212392 Photomask blank, photomask, and methods of manufacturing the same |