Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2014
12/25/2014US20140377705 Lithographic printing plate precursors and processes for preparing lithographic printing plates
12/25/2014US20140377704 Method of forming protective film for touch panel electrode, photosensitive resin composition and photosensitive element, and method of manufacturing touch panel
12/25/2014US20140377692 Mask for microlithography and scanning projection exposure method utilizing the mask
12/25/2014US20140377691 Mask plate and method for detecting exposure defects using the same
12/25/2014US20140376933 Movable body drive method and system, pattern formation method and apparatus, exposure method and apparatus for driving movable body based on measurement value of encoder and information on flatness of scale, and device manufacturing method
12/25/2014US20140376086 Catadioptric projection objective with two intermediate images and no more than four lenses between the aperture stop and image plane
12/25/2014US20140375976 Movable body drive method and system, pattern formation method and apparatus, exposure method and apparatus for driving movable body based on measurement value of encoder and information on flatness of scale, and device manufacturing method
12/25/2014US20140375975 Stage System and a Lithographic Apparatus
12/25/2014US20140375974 Source-collector device, lithographic apparatus, and device manufacturing method
12/25/2014US20140375973 Lithographic apparatus and device manufacturing method
12/25/2014US20140375972 Lithographic apparatus and device manufacturing method
12/25/2014US20140375971 Lithographic apparatus and device manufacturing method
12/25/2014US20140374677 Colored composition, colored photosensitive composition, color filter and liquid crystal display device equipped with same, organic el display device, and solid-state image sensor
12/25/2014US20140374611 Continuous Generation of Extreme Ultraviolet Light
12/25/2014US20140374379 Pattern forming method
12/25/2014US20140374143 Dry film, layered structure, printed wiring board, and process for producing layered structure
12/25/2014US20140373742 Method of manufacturing a high-resolution flexographic printing plate
12/24/2014CN104246973A 用于形成导电图形的基材以及使用所述基材形成的导电图形 Conductive patterns and using a substrate for the substrate to form a conductive pattern formed
12/24/2014CN104246618A 掩模单元以及基板处理装置 Mask units and the substrate processing apparatus
12/24/2014CN104246617A Euv投射光刻的照明光学单元及包含该照明光学单元的光学系统 Euv projection lithography illumination optical unit and an optical system including the illumination optical unit.
12/24/2014CN104246616A 微光刻投射曝光设备的光学系统 Microlithographic projection exposure apparatus optical system
12/24/2014CN104246615A 无掩模曝光装置 Maskless exposure device
12/24/2014CN104246614A 含有添加剂的含硅极紫外抗蚀剂下层膜形成用组合物 Silicon EUV resist underlayer film forming composition containing the additive composition
12/24/2014CN104246613A 处理光敏结构的方法 Approach to sensitive structures
12/24/2014CN104246612A 负型感光性硅氧烷组合物 Negative photosensitive silicone composition
12/24/2014CN104246611A 黑色树脂膜、静电电容型输入装置及它们的制造方法及具备其的图像显示装置 Black resin film, the capacitance-type input device and manufacturing method thereof and an image display apparatus which includes
12/24/2014CN104246610A 可光致固化的组合物 The photocurable composition
12/24/2014CN104246609A 感光性树脂组合物、固化物、层间绝缘膜、tft 有源阵列基板及液晶显示装置 The photosensitive resin composition, cured product, an interlayer insulating film, tft active matrix substrate and liquid crystal display device
12/24/2014CN104246608A 感光性树脂组合物、硬化膜的制造方法、硬化膜、有机el显示装置及液晶显示装置 The photosensitive resin composition, cured film, method of manufacturing, the hardened film, an organic el display device and liquid crystal display device
12/24/2014CN104246607A 感光性膜、静电电容型输入装置的制造方法及静电电容型输入装置、以及具备其的图像显示装置 Photosensitive film, method of manufacturing the capacitance type input device and an electrostatic capacitance type input device, and an image display apparatus which includes
12/24/2014CN104246606A 复合树脂组合物及其用途、用立体石印术制备牙组件的方法 Composite resin composition and uses thereof, with a stereolithography method for preparing dental assembly
12/24/2014CN104246605A 可固化且可图案化的油墨以及印刷方法 And can be patterned curable ink and a printing method
12/24/2014CN104246604A 用于ctp柔版印刷原版的感光性树脂组合物及由其制得的印刷原版 The photosensitive resin composition for flexographic printing original plate ctp and printing original plate obtained therefrom
12/24/2014CN104246548A 彩色滤光片用色材分散液、彩色滤光片用着色树脂组合物、彩色滤光片、以及液晶显示装置及有机发光显示装置 Color filter with a color material dispersion liquid, a color filter with colored resin composition, a color filter, and liquid crystal display devices and organic light emitting display device
12/24/2014CN104246062A 在基材上形成图像之前处理基材的套件和方法 Kit and method for processing a substrate before forming an image on a substrate
12/24/2014CN104246017A 抗蚀剂密合性提高剂和铜配线制造方法 Resist adhesion improver and a copper wiring manufacturing method
12/24/2014CN104245846A 具有自由基交联性基团的聚硅氧烷组合物 Having a radical crosslinking group polysiloxane composition
12/24/2014CN104241518A 一种声表面波器件晶圆钝化方法 A surface acoustic wave device wafer passivation method
12/24/2014CN104241328A Pmoled阵列基板及其制作方法、显示装置和掩模板 Pmoled array substrate and method of manufacturing the display device and the mask
12/24/2014CN104241100A 小尺寸图形的制作方法 Small graphic production methods
12/24/2014CN104240601A 金属标牌的制作方法 Production methods metal signs
12/24/2014CN104238288A 一种用于去除光阻残留物的清洗液 A method for removing photoresist residues of the cleaning fluid
12/24/2014CN104238287A 一种去除光阻残留物的清洗液 A method of removing photoresist residues of cleaning fluid
12/24/2014CN104238286A 半导体装置的制造方法 The method of manufacturing a semiconductor device
12/24/2014CN104238285A 可动态调焦的激光直写式光刻系统 Dynamically focusing the laser direct-write lithography system
12/24/2014CN104238284A 一种基于光栅泰伯效应的检焦方法 A specimen grating focus method based on Talbot effect
12/24/2014CN104238283A 曝光装置、曝光方法、以及组件制造方法 Exposure apparatus, exposure method, and device manufacturing method
12/24/2014CN104238282A 极紫外光刻含缺陷掩模衍射谱的快速严格仿真方法 EUVL mask fast rigorous simulation of diffraction spectra containing defects
12/24/2014CN104238281A 应用于远距离的光束稳定装置和光束稳定方法 Applied to the beam stabilizer and beam stabilization method distances
12/24/2014CN104238280A 半导体装置的制造方法 The method of manufacturing a semiconductor device
12/24/2014CN104238279A 校正光束图案化的方向和位置的方法 Correcting beam pattern in the direction and position of the methods
12/24/2014CN104238278A 曝光装置以及制造物品的方法 Exposure apparatus and method of manufacturing goods
12/24/2014CN104238277A 一种浸没式光刻机及其流场维持方法 An immersion lithography machine and method for maintaining the flow field
12/24/2014CN104238276A 一种大掩模整形装置、方法及应用 One kind of big plastic mask device, method and application
12/24/2014CN104238275A 六自由度微动台及其应用 Six degrees of freedom micro station and its application
12/24/2014CN104238274A 浸没式光刻机浸没流场维持装置及方法 Immersion immersion lithography apparatus and method for maintaining the flow field
12/24/2014CN104238273A 一种工件台安全防护装置 A work station security guards
12/24/2014CN104238272A 曝光系统与曝光方法 Exposure system and exposure method
12/24/2014CN104238271A 能低温固化的负型感光性组合物 Low temperature curing can be negative photosensitive composition
12/24/2014CN104238270A 组合物、图案的形成方法、晶粒及显示装置的制造方法 Producing a composition, a pattern forming method, and a display device of the grain
12/24/2014CN104238269A 一种感光性树脂组合物及其应用 A photosensitive resin composition and its Applications
12/24/2014CN104238268A 以三苯乙烯为主体的硫鎓盐类光生酸剂、制备方法及其应用 With three styrene as the main sulfonium salt photoacid generators, preparation method and application
12/24/2014CN104238267A 滤色器用着色组合物和滤色器 The coloring composition for color filter and a color filter
12/24/2014CN104238266A 感光性树脂组合物、黑色矩阵、彩色滤光片及液晶显示器 The photosensitive resin composition, a black matrix, color filters and liquid crystal display
12/24/2014CN104238265A 感光性树脂组成物及其应用 The photosensitive resin composition and its application
12/24/2014CN104238264A 一种溶液辅助软压印方法 Assisted soft imprint method of a solution
12/24/2014CN104238263A 压印装置、压印方法和制造物品的方法 The method of marking device, method and article of manufacture of stamping
12/24/2014CN104238261A 掩模图案生成方法、记录介质和信息处理装置 A mask pattern generation method, a recording medium and an information processing apparatus
12/24/2014CN104238204A 像素电极的制造方法 The method of manufacturing the pixel electrode
12/24/2014CN104238092A 一种用于桌面stepper光刻机的投影物镜 A projection lens for desktop stepper lithography
12/24/2014CN104238065A 一种用于光刻投影物镜中可动机构的锁紧装置 A lithographic projection objective in the movable means for locking mechanism
12/24/2014CN104237984A 高精度多台阶微透镜阵列的制作方法 Multi-step method of making high-precision micro lens array
12/24/2014CN104237983A 高效制作高精度多台阶微透镜阵列的方法 Efficient production of high-precision multi-step method of microlens array
12/24/2014CN104231154A 抗蚀剂用共聚物以及抗蚀剂用组合物 Resist, and a resist copolymer composition
12/24/2014CN104231150A 碱溶性树脂聚合物及其制备方法 Alkali-soluble resin polymer and its preparation method
12/24/2014CN103387765B 一种阻焊油墨或光刻胶用光敏性组合物 One kind of solder resist ink or photoresist composition with photosensitivity
12/24/2014CN103257533B 一种光刻机的自动调焦方法 Automatic focusing method lithography
12/24/2014CN103186054B 载物装置及曝光装置 Loading apparatus and exposure apparatus
12/24/2014CN103135366B 用于极紫外光刻掩模缺陷探测的双焦斜入射干涉显微装置 For EUVL mask defect detection bifocal oblique incident interference microscopy device
12/24/2014CN103000585B 掩模型只读存储器的制造方法 The method of manufacturing a mask read only memory
12/24/2014CN102890432B 一种通过加曝图形制作掩模板的方法 Method of making a mask by adding exposure Graphics
12/24/2014CN102879999B 形成正像的方法 As the method of forming
12/24/2014CN102510869B 用于负性工作辐射敏感性平版印刷板的辐射敏感性涂料组合物的共聚物、包含所述共聚物的聚合颗粒和共聚粘合剂 Copolymers are used in negative-working radiation-sensitive lithographic printing plate of the radiation sensitive coating composition, comprising polymeric particles of the copolymer and copolymer binder
12/24/2014CN102483584B 照射系统、光刻设备和调节照射模式的方法 Illumination system, lithographic apparatus and a method of adjusting the irradiation pattern
12/24/2014CN102159997B 反射光学元件及其制造方法 The reflective optical element and manufacturing method thereof
12/24/2014CN101405839B 移动体驱动系统及方法、图案形成装置及方法、曝光装置及方法、组件制造方法 Movable body drive system and method, the patterning device and a method, apparatus and method, an exposure device manufacturing method
12/23/2014US8918744 Substrate-topography-aware lithography modeling
12/23/2014US8918742 Methods and systems for pattern design with tailored response to wavefront aberration
12/23/2014US8917433 Optical system of a microlithographic projection exposure apparatus
12/23/2014US8917432 Multiplexing EUV sources in reticle inspection
12/23/2014US8917380 Lithographic apparatus and method
12/23/2014US8917379 Projection exposure methods and systems
12/23/2014US8917378 Exposure method, exposure apparatus, and method for producing device with plurality of projection optical systems and pattern having first partial pattern area and second partial area having overlaid area with first partial pattern area
12/23/2014US8916978 Interconnect structure and method of fabricating
12/23/2014US8916621 Photoresist compositions
12/23/2014US8916338 Processes and compositions for removing substances from substrates
12/23/2014US8916337 Dual hard mask lithography process
12/23/2014US8916336 Patterning method using thiosulfate polymer and metal nanoparticles
12/23/2014US8916335 Photo-curable transfer sheet, process for the preparation of optical information recording medium using the sheet, and optical information recording medium
12/23/2014US8916334 Micro-composite material for three-dimensional printing
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