Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2011
11/16/2011CN101655668B Micro-image device and chip-balancing method for micro-image device
11/16/2011CN101644897B Method for manufacturing nonwoven metal porous plate used for printing
11/16/2011CN101526742B Manufacturing method of liquid resin printing plate
11/16/2011CN101398627B Coating treatment method, coating treatment apparatus, and computer-readable storage medium
11/16/2011CN101374880B Molding method for lithography techniques
11/16/2011CN101278239B Process for producing substrate with metal wiring
11/16/2011CN101223476B A method of nanopatterning, a cured resist film use therein, and an article including the resist film
11/16/2011CN101192003B Photocurable organic material and method of fabricating array substrate for liquid crystal display device using the same
11/16/2011CN101189551B 固化性树脂组合物及其固化物 The curable resin composition and a cured product
11/16/2011CN101080467B Actinic energy ray curable resion composition and use thereof
11/15/2011US8059269 Particle inspection apparatus, exposure apparatus, and device manufacturing method
11/15/2011US8059262 Calculation program, and exposure method for calculating light intensity distribution formed on image plane
11/15/2011US8059261 Masking device, lithographic apparatus, and device manufacturing method
11/15/2011US8059258 Liquid jet and recovery system for immersion lithography
11/15/2011US8057988 Catalyst for microelectromechanical systems microreactors
11/15/2011US8057987 Patterning method of semiconductor device
11/15/2011US8057986 Method for forming resist pattern and method for manufacturing a semiconductor device
11/15/2011US8057985 Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process
11/15/2011US8057984 Photosensitive self-assembled monolayer for selective placement of hydrophilic structures
11/15/2011US8057983 liquid immersion lithography, solves problem of defect caused by residual fluid droplets on the resist film; blend of resin containing no fluorine and acid labile group, and an acrylic fluoro-copolymer with units of a fluoromonomer and units of acid labile, lactone, or hydroxy-functional group
11/15/2011US8057982 Monomer, resist composition, and patterning process
11/15/2011US8057981 Resist composition, resist protective coating composition, and patterning process
11/15/2011US8057980 Translucent, transparent, or semi-translucent microlense sheetings with composite images that float above or below the sheeting; two-dimensional or three-dimensional; imaging by focusing energy; tamperproof; documents
11/15/2011US8057969 Dye-containing negative curable composition, color filter and method for producing the same
11/15/2011US8057966 Manufacturing method of photomask for multiple exposure and semiconductor device manufacturing method using above photomask
11/15/2011US8057965 Mask and method of fabricating the same
11/15/2011US8057963 Maskless vortex phase shift optical direct write lithography
11/15/2011US8057725 Capillary imprinting technique
11/15/2011US8057691 Method of manufacturing printing plate and method of manufacturing liquid crystal display device using the same
11/10/2011WO2011140120A1 Medical devices, methods of producing medical devices, and projection photolithography apparatus for producing medical devices
11/10/2011WO2011139782A1 Separation control substrate/template for nanoimprint lithography
11/10/2011WO2011139774A2 Method for forming an organic device
11/10/2011WO2011139338A2 Processless development of printing plate
11/10/2011WO2011139337A2 Ball-spacer method for planar object leveling
11/10/2011WO2011139111A1 Resin composition, insulating film using the same, and electronic component
11/10/2011WO2011139073A2 Negative photoresist composition, and method for patterning device
11/10/2011WO2011138938A1 Supporting device and light exposure device
11/10/2011WO2011138871A1 Method for manufacturing semiconductor device and apparatus for manufacturing semiconductor device
11/10/2011WO2011138540A1 Method of topographical and electrical nanostructuration of a thin film of electret polymer and thin film of electret polymer obtained
11/10/2011WO2011138287A1 Color filter for low temperature applications
11/10/2011WO2011138259A1 Euv collector
11/10/2011WO2011138237A1 Fabrication of nanometer and micrometer structures with continuous reliefs
11/10/2011WO2011138176A1 Color filter for low temperature applications
11/10/2011WO2011137917A1 Illumination system of a microlithographic projection exposure apparatus
11/10/2011WO2011100050A3 Process gas confinement for nanoimprinting lithography
11/10/2011WO2011054799A3 Urethanes used as additives in a photopolymer formulation
11/10/2011US20110276125 Medical Devices, Methods of Producing Medical Devices, and Projection Photolithography Apparatus for Producing Medical Devices
11/10/2011US20110275020 Methods Of Forming Photoresist Patterns
11/10/2011US20110275019 Hardmask composition having antireflective properties and method of patterning material on substrate using the same
11/10/2011US20110275018 Circuit architecture on an organic base and related manufacturing method
11/10/2011US20110275017 Method for preparing a printing form
11/10/2011US20110275016 Ablation layer, photosensitive resin structure, and method for producing relief printing plate using the photosensitive resin structure
11/10/2011US20110274895 Method for manufacturing optical disc master and method for manufacturing optical disc
11/10/2011US20110274853 Negative photoresist composition and patterning method for device
11/10/2011US20110274423 Impulse Actuated MEMS Devices
11/10/2011US20110274393 Erasable Ion Implanted Optical Couplers
11/10/2011US20110273698 Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses
11/10/2011US20110273697 Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
11/10/2011US20110273696 Method for manufacturing optical disc master and method for manufacturing optical disc
11/10/2011US20110273694 Individual mirror for constructing a faceted mirror, in particular for use in a projection exposure system for microlithography
11/10/2011US20110273693 Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses
11/10/2011US20110273692 Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses
11/10/2011US20110273683 Lithographic apparatus and device manufacturing method
11/10/2011US20110273681 Vacuum system for immersion photolithography
11/10/2011US20110273680 Immersion photolithography system and method using microchannel nozzles
11/10/2011US20110273677 Lithographic apparatus and device manufacturing method
11/10/2011US20110273676 Immersion photolithography system and method using microchannel nozzles
11/10/2011US20110272840 Light Transmissive Mold and Apparatus For Imprinting a Pattern Onto a Material Applied on a Semiconductor Workpiece and Related Methods
11/10/2011US20110272810 Structure and method for air gap interconnect integration
11/10/2011US20110272295 Electrochemical Biosensor Structure and Measuring Method Using the Same
11/10/2011DE102010028655A1 EUV-Kollektor EUV collector
11/10/2011DE102009055184B4 Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage An optical system, in particular of a microlithographic projection exposure apparatus
11/10/2011DE102009054540B4 Beleuchtungsoptik für die EUV-Mikrolithographie Illumination optics for EUV microlithography
11/10/2011CA2794903A1 Ball-spacer method for planar object leveling
11/09/2011EP2385427A2 Method for preparing a printing form
11/09/2011EP2385426A2 Maskless exposure apparatus and method of alignment for overlay in maskless exposure
11/09/2011EP2385072A1 Novel compound, polymerizable composition, color filter and process for produciton thereof, solid-state imaging element, and lithographic printing original plate
11/09/2011EP2384875A1 Device of producing wafer lens and method of producing wafer lens
11/09/2011EP2384458A1 Negative resist pattern forming method, developer and negative chemical-amplification resist composition used therefor, and resist pattern
11/09/2011EP2384457A2 Coating compositions
11/09/2011EP2384456A1 Method for patterning nano-scale patterns of molecules on a surface of a material
11/09/2011EP1939234B1 Resin composition for optical three-dimensional molded object
11/09/2011EP1807734B1 Lithography processes using phase change compositions
11/09/2011EP1751625B1 Method of making a photopolymer printing plate
11/09/2011EP1668422B1 Lithography illumination device
11/09/2011EP1526406B1 Photomask
11/09/2011CN202033584U Manual exposure machine vacuum pumping guiding groove structure
11/09/2011CN202033583U Positive CTcP (computer to conventional plate) photoresist offset printing plate
11/09/2011CN202033582U CTcP (Computer-to-conventional plate) photostencil emulsions offset plate
11/09/2011CN1974697B Organic anti-reflective coating polymer, anti-reflective coating composition and method of preparation thereof
11/09/2011CN1940723B Photosensitive resin composition and laminating article thereof
11/09/2011CN1916759B Pressure impression die comprising cycloolefin copolymer
11/09/2011CN102239450A Multi-beam exposure scanning method and apparatus, and method for manufacturing printing plate
11/09/2011CN102239449A Multi-beam exposure scanning method and apparatus, and method for manufacturing printing plate
11/09/2011CN102239448A Method and apparatus for making liquid flexographic printing elements
11/09/2011CN102239447A Flexographic element and method of imaging
11/09/2011CN102237265A Method for controlling pattern uniformity of semiconductor device
11/09/2011CN102236273A Method of aligning photomask with base material and method of manufacturing printed circuit board
11/09/2011CN102236272A Device and method for peeling SU-8 photoresist by utilizing supercritical water
11/09/2011CN102236271A Equipment and method for drying photoresist