| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/21/2011 | CN101251698B Liquid crystal display panel and method for making the same |
| 09/21/2011 | CN101231458B Grey mask and pattern transfer printing method |
| 09/21/2011 | CN101030034B Method and apparatus for separating a stamper from a patterned substrate |
| 09/21/2011 | CN101013261B Mold for imprint, process for producing minute structure using the mold, and process for producing the mold |
| 09/20/2011 | US8023122 Method and system for measuring patterned structures |
| 09/20/2011 | US8023100 Exposure apparatus, supply method and recovery method, exposure method, and device producing method |
| 09/20/2011 | US8022376 Method for manufacturing semiconductor device or photomask |
| 09/20/2011 | US8022111 Piperazino sensitisers |
| 09/20/2011 | US8021829 Method of forming photoresist pattern and method of manufacturing perpendicular magnetic recording head |
| 09/20/2011 | US8021828 Photoresist compositions and methods related to near field masks |
| 09/20/2011 | US8021827 Materials for lithographic plates coatings, lithographic plates and coatings containing same, methods of preparation and use |
| 09/20/2011 | US8021826 Copolymer and composition for organic and antireflective layer |
| 09/20/2011 | US8021825 Optical waveguides and methods thereof |
| 09/20/2011 | US8021824 Polymer compound, resist composition and method of forming resist pattern |
| 09/20/2011 | US8021823 Positive resist composition, method of forming resist pattern, and polymeric compound |
| 09/20/2011 | US8021822 Positive resist compositions and patterning process |
| 09/20/2011 | US8021821 Photosensitive conductive paste for transferring and photosensitive transfer sheet |
| 09/20/2011 | US8021820 Coating composition for marking substrates |
| 09/20/2011 | US8021819 Sulfonium compound, photosensitive composition containing the compound and pattern-forming method using the photosensitive composition |
| 09/20/2011 | US8021818 Printing plate, method of manufacturing of printing plate and liquid crystal display device using the same |
| 09/20/2011 | US8021726 Compositions and processes for preparing color filter elements using alkali metal fluorides |
| 09/20/2011 | US8021713 Bit-patterned magnetic media formed in filler layer recesses |
| 09/20/2011 | US8021534 Electroforming mold and method for manufacturing the same, and method for manufacturing electroformed component |
| 09/20/2011 | US8021485 Positioning apparatus |
| 09/20/2011 | US8021203 Electroluminescent element |
| 09/20/2011 | CA2461039C Photosensitive element for use as flexographic printing plate |
| 09/15/2011 | WO2011112325A1 Methods for producing photosensitive microparticles, non-aqueous dispersions thereof and articles prepared therewith |
| 09/15/2011 | WO2011111965A2 Photosensitive organic insulation composition for an oled device |
| 09/15/2011 | WO2011111964A2 Photosensitive resin composition having excellent heat resistance and mechanical properties, and protective film for a printed circuit board |
| 09/15/2011 | WO2011111878A1 Liquid immersion member and exposure apparatus |
| 09/15/2011 | WO2011111807A1 Polymerizable monomer, polymer, resist material using same, and pattern formation method therefor |
| 09/15/2011 | WO2011111805A1 Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same |
| 09/15/2011 | WO2011111641A1 Radiation-sensitive resin composition |
| 09/15/2011 | WO2011111582A1 Collector mirror assembly and extreme ultraviolet light source device using said collector mirror assembly |
| 09/15/2011 | WO2011111479A1 Photomask, exposure device, and method for producing liquid crystal display panel |
| 09/15/2011 | WO2011111424A1 Positive photosensitive resin composition, method for forming cured film, cured film, liquid crystal display device, and organic el display device |
| 09/15/2011 | WO2011111327A1 Alignment method and flat panel display manufacture method |
| 09/15/2011 | WO2011110467A2 System for removing contaminant particles, lithographic apparatus, method for removing contaminant particles and method for manufacturing a device |
| 09/15/2011 | WO2011110383A1 Radiation source, lithographic apparatus and device manufacturing method |
| 09/15/2011 | WO2011054818A3 Novel non-crystallizing methacrylates, production and use thereof |
| 09/15/2011 | WO2011053093A3 Printing plate for liquid crystal display and manufacturing method thereof, method for printing using same, and method for manufacturing replication master mold and printing plate using same |
| 09/15/2011 | US20110223546 Method and system for modifying substrate relief features using ion implantion |
| 09/15/2011 | US20110223545 Use of photosensitized epon epoxy resin 1002f for mems and biomems applications |
| 09/15/2011 | US20110223544 Resist pattern coating agent and resist pattern forming method using the same |
| 09/15/2011 | US20110223543 Radiation system, radiation collector, radiation beam conditioning system, spectral purity filter for radiation system and method for forming a spectral purity filter |
| 09/15/2011 | US20110223542 Patch production |
| 09/15/2011 | US20110223541 Method for fabricating semiconductor device |
| 09/15/2011 | US20110223540 Gumming compositions with nano-particles for improving scratch sensitivity in image and non-image areas of lithographic printing plates |
| 09/15/2011 | US20110223539 Photosensitive resin composition for protective film of printed wiring board for semiconductor package |
| 09/15/2011 | US20110223538 Photosensitive organic insulator composition for oled device |
| 09/15/2011 | US20110223537 Radiation-sensitive resin composition and polymer |
| 09/15/2011 | US20110223536 Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same |
| 09/15/2011 | US20110223535 Photoresist comprising nitrogen-containing compound |
| 09/15/2011 | US20110223393 Exposure apparatus, method of forming patterned layer, method of forming patterned photoresist layer, active device array substrate and patterned layer |
| 09/15/2011 | US20110221749 Photolithographed Micro-Mirror Well For 3D Tomogram Imaging of Individual Cells |
| 09/15/2011 | US20110221077 Water repellant composition for substrate to be exposed, method for forming resist pattern, electronic device produced by the formation method, treatment method for imparting water repellency to substrate to be exposed, water repellant set for substrate to be exposed, and treatment method for imparting water repellency to substrate to be exposed using the same |
| 09/15/2011 | US20110220287 Exposure condition setting method, substrate processing apparatus, and computer program |
| 09/15/2011 | DE102010002822A1 Lighting system for use in microlithography projection exposure system for lighting reticle in object field for manufacturing semiconductor components by extreme UV lithography process, has selection device provided with selection mirror |
| 09/15/2011 | DE102010002727A1 Reflective optical element for use in extreme UV lithography device for extreme UV wavelength region, has reflective surface comprising upper ruthenium oxide layer, ruthenium layer, silicon nitride layer and silicon layer |
| 09/15/2011 | CA2789027A1 Methods for producing photosensitive microparticles, non-aqueous dispersions thereof and articles prepared therewith |
| 09/14/2011 | EP2365391A2 Lithographic apparatus and lithographic apparatus cleaning method |
| 09/14/2011 | EP2365390A2 Lithographic apparatus and method |
| 09/14/2011 | EP2365389A1 Positive-working lithographic printing plate precursor for infrared laser and process for making lithographic printing plate |
| 09/14/2011 | EP2365098A2 Antireflective coatings for high-resolution photolithographic synthesis of dna array |
| 09/14/2011 | EP2364796A2 Casting mold |
| 09/14/2011 | EP2364462A2 Imprint lithography apparatus and method |
| 09/14/2011 | EP2171541B1 Method for examining a wafer with regard to a contamination limit and euv projection exposure system |
| 09/14/2011 | EP2171540B1 Hydrocarbon getter for lithographic exposure tools |
| 09/14/2011 | EP2145231B1 Photoactivable nitrogen bases |
| 09/14/2011 | CN201974639U 印刷线路板显影机风干段结构 Developing machine drying sections printed circuit board structure |
| 09/14/2011 | CN201974638U 冲版机水洗内循环装置 Circulation within the device version of the machine washing |
| 09/14/2011 | CN201974637U 冲版机正逆转双毛刷 Version of the machine is reversed double brush |
| 09/14/2011 | CN201974636U 具有警报器的冲版机 Version of the machine with a siren |
| 09/14/2011 | CN201974635U 曝光机积算光量装置 Means the amount of light exposure machine Totalizer |
| 09/14/2011 | CN201974634U 翻转式网版曝光机 Flip-screen exposure machine |
| 09/14/2011 | CN201974633U 一种金属标贴制模装置 Metal labels molding apparatus |
| 09/14/2011 | CN201969705U 冲版机上胶辊自动清洗装置 Cots version of the machine on automatic cleaning device |
| 09/14/2011 | CN1981238B Display panel including patterned spacer |
| 09/14/2011 | CN1961619B Lithography equipment and using method thereof |
| 09/14/2011 | CN1940722B Novel tarc material for impregnation type microimage process and method for impregnation type microimage process |
| 09/14/2011 | CN1904732B Photosensitive resin composition for photosensitive clearance material |
| 09/14/2011 | CN1900824B Coating compositions for use with an overcoated photoresist |
| 09/14/2011 | CN1892425B Pigmented photoresist composition and cured matter thereof |
| 09/14/2011 | CN1890733B Process for producing original disc for optical disc and original disc for optical disc |
| 09/14/2011 | CN1821873B Photosensitive resin compound |
| 09/14/2011 | CN1684002B Flat plate printing apparatus and device manufacturing method |
| 09/14/2011 | CN1672098B Method for forming and correcting lithographic template having a repaired gap defect |
| 09/14/2011 | CN1664707B Scouring agent and flushing fluid for the planography |
| 09/14/2011 | CN102187282A Resist pattern coating agent and resist pattern forming method using same |
| 09/14/2011 | CN102187281A Euv lithography device and method for processing an optical element |
| 09/14/2011 | CN102187280A Exposure apparatus and method for the assembly of the same, and device manufacturing method |
| 09/14/2011 | CN102187279A Bottom antireflective coating compositions |
| 09/14/2011 | CN102187278A Photosensitive resin composition, method for forming silica coating film, and apparatus and member each comprising silica coating film |
| 09/14/2011 | CN102187277A Positive photosensitive resin composition for spray coating and method for producing through electrode using same |
| 09/14/2011 | CN102187276A Thermally reactive resist material, laminated body for thermal lithography using the material, and mold manufacturing method using the material and the laminated body |
| 09/14/2011 | CN102186904A Polyamide resin and composition thereof |
| 09/14/2011 | CN102186890A Fluorine-containing sulfonates having polymerizable anions and manufacturing method therefor, fluorine-containing resins, resist compositions, and pattern-forming method using same |
| 09/14/2011 | CN102186815A Sulfonium derivatives and the use therof as latent acids |
| 09/14/2011 | CN102186650A System and resin for rapid prototyping |
| 09/14/2011 | CN102186649A Improvements for rapid prototyping apparatus |