G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2011
11/09/2011	CN102236270A Focus detection device applicable to double workpiece table projection lithography machine
11/09/2011	CN102236269A Planning method for stepping and scanning motion trail of projection photoetching machine
11/09/2011	CN102236268A Photoetching projection objective wave aberration detection method based on space image frequency spectrum
11/09/2011	CN102236267A Laser interference lithographic system
11/09/2011	CN102236266A Exposure device having an array of light emitting diodes
11/09/2011	CN102236265A Lithographic apparatus and method of manufacturing article
11/09/2011	CN102236264A Fluid handling structure, lithographic apparatus and device manufacturing method
11/09/2011	CN102236263A Film frame of exposure machine
11/09/2011	CN102236262A Method for determining best focal length of photoetching machine
11/09/2011	CN102236261A Method, device and system for processing off-axis signals based on orthogonalization model
11/09/2011	CN102236260A Wave aberration correction system and method
11/09/2011	CN102236259A Radiation sensitivity resin composition for display element, interlayer insulation film, protective film and spacer and forming method thereof
11/09/2011	CN102236258A Photosensitive resin composition and colour filter formed by same and liquid crystal display assembly containing colour filter
11/09/2011	CN102236257A Coloring photosensitive composition, manufacture method for color filter, color filter, and liquid crystal display device
11/09/2011	CN102236256A Coloring photonasty resin composition, pattern forming method, color filter and producing method thereof and display device
11/09/2011	CN102236255A Colored photosensitive resin composition, pattern forming method, color filter and manufacture thereof and display device
11/09/2011	CN102236254A Radiation sensitive composition
11/09/2011	CN102236253A Multi-phase high-silicon photoresist imaging method for micro-photoetching process, multi-phase high-silicon photoresist and use
11/09/2011	CN102236252A Apparatus and method of fabricating thin film pattern
11/09/2011	CN102236251A Template repair method, pattern forming method, and template repair apparatus
11/09/2011	CN102236199A Apparatus and method of fabricating flat panel display device
11/09/2011	CN102234247A Novel compound, radioactive ray sensitivity composition, solidified film and forming method thereof
11/09/2011	CN101949734B Method for improving measurement precision of beam polarization degree
11/09/2011	CN101840879B Xy stage device, semiconductor checking device and semiconductor exposure device
11/09/2011	CN101825810B Liquid crystal display panel and manufacturing method thereof
11/09/2011	CN101727010B Method for preparing biomimetic colour super-hydrophobic coating by multi-beam interference photoetching technology
11/09/2011	CN101520608B Optical focus sensor, inspection apparatus and a lithographic apparatus
11/09/2011	CN101464629B Paste composition and roasted article pattern
11/09/2011	CN101419408B Exposal system and control method thereof
11/09/2011	CN101375372B Exposure method, exposure apparatus, photomask and photomask manufacturing method
11/09/2011	CN101364055B Neutral developer solution for positive light-sensitive polyimides photo resist
11/09/2011	CN101344720B Gray level mask, defect correcting method, manufacturing method and design transfer method
11/09/2011	CN101295614B Composition for forming electrodes,electrode and plasma display panel
11/09/2011	CN101291969B Polymer and compositions
11/09/2011	CN101263426B Photosensitive composition comprising triazine-based photoactive compound containing oxime ester
11/09/2011	CN101231471B System for switching benches of photo-etching machine silicon slice benches by transition supporting device
11/09/2011	CN101221900B Reflowing process device and reflowing process method
11/09/2011	CN101211102B Apparatus for removing haze in photo mask and method for removing haze in a photo mask
11/09/2011	CN101105625B Light solidifying composition and pattern forming method using the same
11/09/2011	CN101101443B Photoresist composition and method for preparing color-filtering sheet substrate using same
11/09/2011	CN101086620B Salt adapted for acid generating agent and chemical enlarging type positive corrosion-resisting agent composition containing the same
11/08/2011	US8054557 Lithography projection objective, and a method for correcting image defects of the same
11/08/2011	US8054448 Apparatus and method for providing fluid for immersion lithography
11/08/2011	US8054447 Exposure apparatus, exposure method, method for producing device, and optical part
11/08/2011	US8054443 Developing method and developing apparatus
11/08/2011	US8053862 Integrated circuit fuse
11/08/2011	US8053487 Multifunctional acrylates used as cross-linkers in dental and biomedical self-etching bonding adhesives
11/08/2011	US8053180 Developing method and developing unit
11/08/2011	US8053179 Method for manufacturing substrate for making microarray
11/08/2011	US8053177 Light blocking plate, lens module having same and method for making same
11/08/2011	US8053175 Method of forming measuring targets for measuring dimensions of substrate in substrate manufacturing process
11/08/2011	US8053174 Manufacturing method for wiring
11/08/2011	US8053173 Multi-functional linear siloxane compound, a siloxane polymer prepared from the compound, and a process for forming a dielectric film by using the polymer
11/08/2011	US8053172 Photoresists and methods for optical proximity correction
11/08/2011	US8053171 Substrate having film pattern and manufacturing method of the same, manufacturing method of semiconductor device, liquid crystal television, and EL television
11/08/2011	US8053170 Process for on-press developing high speed laser sensitive lithographic printing plate
11/08/2011	US8053169 Ink composition, inkjet recording method, printed material, and process for producing lithographic printing plate
11/08/2011	US8053168 Printing plate and system using heat-decomposable polymers
11/08/2011	US8053167 Curable compositions containing hydroxythiol compound, and cured products thereof
11/08/2011	US8053166 Optical waveguides and methods thereof
11/08/2011	US8053165 Hydroxyl-containing monomer, polymer, resist composition, and patterning process
11/08/2011	US8053164 Resist composition and method for forming a pattern using the same
11/08/2011	US8053163 Method of fine patterning semiconductor device
11/08/2011	US8053162 Substrate and imageable element with hydrophilic interlayer
11/08/2011	US8053161 Resist composition, resin for use in the resist composition, compound for use in the synthesis of the resin, and pattern-forming method using the resist composition
11/08/2011	US8053159 inorganic-based compound, at least one absorbing compound, and at least one material modification agent; absorbing compound comprises at least one benzene ring and a reactive group selected from the group comprising hydroxyl groups, amine groups, carboxylic acid groups and substituted silyl groups
11/08/2011	US8053158 Photosensitive compositions useful for forming active patterns, methods of forming such active patterns and organic memory devices incorporating such active patterns
11/08/2011	US8053156 Toner, and toner production process
11/08/2011	US8053149 Method for producing color filter for image sensor
11/08/2011	US8052498 Method of forming a color filter touch sensing substrate
11/03/2011	WO2011136848A1 Force curve analysis method for planar object leveling
11/03/2011	WO2011136286A1 Photosensitive composition, photosensitive film, photosensitive laminate, method for forming permanent pattern, and printed board
11/03/2011	WO2011136074A1 Positive radiation-sensitive composition, interlayer insulating film for display element, and formation method for same
11/03/2011	WO2011136073A1 Positive radiation-sensitive composition, interlayer insulating film for display element, and formation method for same
11/03/2011	WO2011135947A1 Positive radiation-sensitive composition for discharge nozzle coating method, interlayer insulating film for display element, and formation method for same
11/03/2011	WO2011135887A1 Photosensitive resin composition
11/03/2011	WO2011135867A1 Inspecting apparatus and inspecting method
11/03/2011	WO2011134857A1 Method of fabricating semiconductor quantum dots using nanoimprint lithography
11/03/2011	WO2011134692A1 Spectral purity filter
11/03/2011	WO2011134433A1 Optical waveguide fabrication method
11/03/2011	WO2011134142A1 Plate material for direct platemaking of ink-jet printing and ink-jet printing method
11/03/2011	WO2011105277A3 Resin composition for polyester base material, and dry film and printed circuit boards using same
11/03/2011	WO2011081322A3 Composition for the bottom layer of a resist, and method using same to manufacture a semiconductor integrated circuit device
11/03/2011	WO2011081321A3 Composition for the bottom layer of a resist, and method using same to manufacture a semiconductor integrated circuit device
11/03/2011	WO2011078968A3 Method and system for fracturing a pattern, and for charged particle beam lithography with multiple exposure passes
11/03/2011	WO2011066450A3 Adhesion layers in nanoimprint lithography
11/03/2011	WO2011037435A3 Composition for forming a pattern for a nano-/microfluidic channel, and apparatus for forming a pattern using same
11/03/2011	US20110269861 Solvent compositions containing chlorofluoroolefins or fluoroolefins
11/03/2011	US20110269309 Photoresist composition, method of forming pattern by using the photoresist composition, and method of manufacturing thin-film transistor substrate
11/03/2011	US20110269078 Substrate treatment to reduce pattern roughness
11/03/2011	US20110269077 Method and apparatus for measurement and control of photomask to substrate alignment
11/03/2011	US20110269076 Surface modifying material, method of forming resist pattern, and method of forming pattern
11/03/2011	US20110269075 Method of fabricating color filter with flexible substrate
11/03/2011	US20110269074 Novel polymers and photoresist compositions
11/03/2011	US20110269073 Method for applying a resist layer, uses of adhesive materials, and adhesive materials and resist layer
11/03/2011	US20110269072 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same
11/03/2011	US20110269071 Actinic ray-sensitive or radiation-sensitive resin composition, chemical amplification resist composition, and resist film and pattern forming method using the composition
11/03/2011	US20110269070 Photoacid generators and photoresists comprising same
11/03/2011	US20110269061 Developing method
11/03/2011	US20110267867 Semiconductor device

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