| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/22/2011 | US20110229827 Method and Lithography Device with a Mask Reflecting Light |
| 09/22/2011 | US20110229826 Semiconductor device manufacturing method to form resist pattern, and substrate processing apparatus |
| 09/22/2011 | US20110229825 Production method of liquid crystal display device and liquid crystal display device |
| 09/22/2011 | US20110229824 method of manufacturing a semiconductor integrated circuit device |
| 09/22/2011 | US20110229823 Fuel cell fabrication using photopolymer based processes |
| 09/22/2011 | US20110229822 Methods for protecting a die surface with photocurable materials |
| 09/22/2011 | US20110229821 Method of Photochemical Hydrolysis-Polycondensation of Cross-Linkable Chromophores with Steric Hindrance, Catalysed by a Photogenerated Acid, and the Applications Thereof |
| 09/22/2011 | US20110229807 Photomask blank, photomask, method of manufacturing the same, and method of manufacturing a semiconductor device |
| 09/22/2011 | US20110229699 Fully crosslinked chemically structured monolayers |
| 09/22/2011 | US20110229661 Positive photosensitive resin composition and cured film forming method using the same |
| 09/22/2011 | US20110229120 Rinsing method and developing method |
| 09/22/2011 | US20110228246 Projection objective for a microlithographic projection exposure apparatus |
| 09/22/2011 | US20110228244 Illumination optical system for projection lithography |
| 09/22/2011 | US20110228243 Mirror, Lithographic Apparatus and Device Manufacturing Method |
| 09/22/2011 | US20110228241 Lithographic apparatus and device manufacturing method |
| 09/22/2011 | US20110228237 Reflective optical element and euv lithography appliance |
| 09/22/2011 | US20110227208 Structure and Manufacture Method For Multi-Row Lead Frame and Semiconductor Package |
| 09/22/2011 | US20110226145 Process for making lithographic printing plate and lithographic printing plate |
| 09/22/2011 | DE102011005144A1 Reflektives optisches Element, Projektionssystem und Projektionsbelichtungsanlage The reflective optical element projection system and projection exposure apparatus |
| 09/22/2011 | DE102011004615A1 Beleuchtungsoptik für die Projektionslithografie Illumination optics for projection lithography |
| 09/22/2011 | DE102010011220A1 Laser processing apparatus for processing object, comprises laser beam generator producing optical axis, adapter device for displacing focus position along optical axis and adapting numerical aperture of the generator, and deflection unit |
| 09/21/2011 | EP2367058A1 Fabrication method of cylindrical gratings |
| 09/21/2011 | EP2367057A2 Optical filter and analytical instrument |
| 09/21/2011 | EP2367056A2 Method of preparing lithographic printing plate |
| 09/21/2011 | EP2366751A2 Photosensitive adhesive composition, and film adhesive, adhesive sheet, adhesive pattern, semiconductor wafer with adhesive layer and semiconductor device using the photosensitive adhesive composition |
| 09/21/2011 | EP2366546A2 Process for making lithographic printing plate and lithographic printing plate |
| 09/21/2011 | EP2366544A1 Radiation sensitive composition |
| 09/21/2011 | EP2366129A1 Stack of negative-working imageable elements |
| 09/21/2011 | EP1984788B1 Optical integrator for an illumination system of a microlithographic projection exposure apparatus |
| 09/21/2011 | EP1939930B1 Article loading/unloading method and article loading/unloading device, exposure method and exposure apparatus, and method of manufacturing device |
| 09/21/2011 | EP1775756B1 Euv light source, euv exposure equipment and semiconductor device manufacturing method |
| 09/21/2011 | EP1499923B1 Photopolymerizable compositions and flexographic printing plates derived therefrom |
| 09/21/2011 | CN201984283U 曝光机迈拉膜涨紧框架 Exposure Mylar film tensioning frame |
| 09/21/2011 | CN1987570B Metal line, method of manufacturing the same, display substrate having the same and method of manufacturing the display substrate |
| 09/21/2011 | CN1931858B Monomer and polymer for photoresist having spirocyclic ketal group, and photoresist composition containing the polymer |
| 09/21/2011 | CN1673859B Assembly of a reticle holder and a reticle |
| 09/21/2011 | CN1584631B Dye-containing resist composition and color filter using same |
| 09/21/2011 | CN1501178B Fore boundary point technique in photoresist etching |
| 09/21/2011 | CN102197489A Underlayer film for image formation |
| 09/21/2011 | CN102197340A Exposure apparatus and photomask |
| 09/21/2011 | CN102197339A Photosensitive resin composition, photosensitive adhesive film, and light-receiving device |
| 09/21/2011 | CN102197338A Composite stamp for embossing |
| 09/21/2011 | CN102197128A Gluconic acid containing photoresist cleaning composition for multi-metal device processing |
| 09/21/2011 | CN102197100A An antireflective coating composition comprising fused aromatic rings |
| 09/21/2011 | CN102197087A An antireflective coating composition comprising fused aromatic rings |
| 09/21/2011 | CN102196913A 一种平版印版 A planographic printing plate |
| 09/21/2011 | CN102194673A Photoresists and methods for use thereof |
| 09/21/2011 | CN102194663A Wet processing apparatus, wet processing method and storage medium |
| 09/21/2011 | CN102193346A Non-contact quick pre-positioning method and device for substrate of LED (light-emiting diode) automatic exposure machine |
| 09/21/2011 | CN102193345A Decompression drying method and decompression drying device |
| 09/21/2011 | CN102193344A Method for removing photoresist in deep n-well process |
| 09/21/2011 | CN102193343A Developing apparatus and developing method |
| 09/21/2011 | CN102193342A Coating and developing apparatus and developing method |
| 09/21/2011 | CN102193341A Method and device for processing photoresist |
| 09/21/2011 | CN102193340A Image processing method by projection photo-etching focusing |
| 09/21/2011 | CN102193339A Maskless photoetching alignment system |
| 09/21/2011 | CN102193338A Device and method for carrying out field measurement on wave aberration of projection objective of photoetching machine adopting extended light sources |
| 09/21/2011 | CN102193337A A lithographic apparatus, an illumination system, a projection system and a method of manufacturing a device using a lithographic apparatus |
| 09/21/2011 | CN102193336A Lithographic apparatus and method |
| 09/21/2011 | CN102193335A Cover for a substrate table, substrate table for a lithographic apparatus, lithographic apparatus, and device manufacturing method |
| 09/21/2011 | CN102193334A Illumination optical system for projection lithography |
| 09/21/2011 | CN102193333A Lithographic apparatus, cover for use in a lithographic apparatus and method for designing a cover for use in a lithographic apparatus |
| 09/21/2011 | CN102193332A Lithographic apparatus and method |
| 09/21/2011 | CN102193331A Lithographic apparatus and method |
| 09/21/2011 | CN102193330A Lithographic apparatus and device manufacturing method |
| 09/21/2011 | CN102193329A Lithographic apparatus and device manufacturing method |
| 09/21/2011 | CN102193328A Lithographic apparatus and a method of manufacturing a device using a lithographic apparatus |
| 09/21/2011 | CN102193327A Lithographic apparatus and device manufacturing method |
| 09/21/2011 | CN102193326A Proximity exposure device, carrying stage temperature control method and manufacturing method for panel substrate |
| 09/21/2011 | CN102193325A System for controlling active vibration isolation device |
| 09/21/2011 | CN102193324A Joint debugging device and joint debugging method for workpiece table interferometer and mask table interferometer |
| 09/21/2011 | CN102193323A Double-stage system of lithography machine |
| 09/21/2011 | CN102193322A Detection device and adjusting method for objective lens roof of photo-etching machine |
| 09/21/2011 | CN102193321A Controlling method and controlling loop of workpiece-stage vertical position |
| 09/21/2011 | CN102193320A Alignment device for photoetching machines and alignment method thereof |
| 09/21/2011 | CN102193319A Double-platform exchange system for wafer stage of photoetching machine |
| 09/21/2011 | CN102193318A Method for treating on Si-BARC |
| 09/21/2011 | CN102193317A Method for manufacturing films |
| 09/21/2011 | CN102193316A Positive photosensitive resin composition, formation method of curing film, curing film, organic el display device and liquid crystal display device |
| 09/21/2011 | CN102193315A Colouring photosensitive resin composition |
| 09/21/2011 | CN102193314A Photosensitive colourized composition and colour filter |
| 09/21/2011 | CN102193313A 光致抗蚀剂组合物 The photoresist composition of |
| 09/21/2011 | CN102193312A Curing composition, colour filter and manufacturing method thereof, liquid crystal display and image display apparatus |
| 09/21/2011 | CN102193311A Colored photosensitive resin compound |
| 09/21/2011 | CN102193310A Method for forming grating for machine tool measurement in two-step solidifying rolling pressing forming manner |
| 09/21/2011 | CN102193309A Process for making a lithographic printing plate and lithographic printing plate |
| 09/21/2011 | CN102193308A Microlithography masks including image reversal assist features, microlithography systems including such masks, and methods of forming such masks |
| 09/21/2011 | CN102193236A Colorful film substrate and manufacturing method thereof |
| 09/21/2011 | CN102193121A Reflective optical element, projection system, and projection exposure apparatus |
| 09/21/2011 | CN102192988A Substrate mould for microfluidic chip and manufacturing method thereof |
| 09/21/2011 | CN102189737A Driving system for scanning or recording mechanism of copy machine |
| 09/21/2011 | CN102188918A Solution supplying unit and substrate treating apparatus having the same |
| 09/21/2011 | CN101689030B Debris prevention system, radiation system, and lithographic apparatus |
| 09/21/2011 | CN101681122B Lithographic apparatus and method |
| 09/21/2011 | CN101614962B Method, device and system for acquiring bias parameters and increasing resolution of photoetching equipment |
| 09/21/2011 | CN101566854B Method for controlling position of movable object, positioning system, and lithographic apparatus |
| 09/21/2011 | CN101566799B Method for preparing hollowed-out polyimide evaporation shadow mask |
| 09/21/2011 | CN101410760B Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system |
| 09/21/2011 | CN101356452B Resin composition for optical material, resin film for optical material, and optical waveguide |
| 09/21/2011 | CN101349872B Photolithography exposure apparatus, system and photolithography patterning method |