G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2011
10/13/2011	US20110249338 Microfabricated member and method for manufacturing the same, and etching apparatus
10/13/2011	US20110249307 Hologram and associated methods of fabrication thereof and use in security/authentication applications
10/13/2011	US20110249245 Method of cooling an optical element, lithographic apparatus and method for manufacturing a device
10/13/2011	US20110248388 Multi-layer chip overlay target and measurement
10/13/2011	US20110248278 Single scan irradiation for crystallization of thin films
10/13/2011	US20110247660 Photoresist stripping solution
10/13/2011	US20110247516 New Alkali Soluble Resin
10/13/2011	US20110247507 Method for producing a base material for screen printing, and base material of this type
10/13/2011	DE102010030913A1 Method for manufacturing substrate for extreme-UV mirror of projection system of extreme-UV lithography system, involves processing substrate in spatially-resolved manner at operating temperature based on measurement of surface shape
10/12/2011	EP2375289A2 Moving/guiding apparatus and exposure apparatus using the same
10/12/2011	EP2375288A2 developer-soluble metal alkoxide coatings for microelectronic applications
10/12/2011	EP2375286A2 Treated substratum with hydrophilic region and water-repellent region and process for producing the same
10/12/2011	EP2375285A2 Photosensitive composition and pattern-forming method using the photosensitive composition
10/12/2011	EP2374145A2 Spin-on spacer materials for double- and triple-patterning lithography
10/12/2011	EP2374044A1 Method of controlling surface roughness of a flexographic printing plate
10/12/2011	EP2374043A1 Multi-beam exposure scanning method and apparatus, and method for manufacturing printing plate
10/12/2011	EP2374042A1 Multi-beam exposure scanning method and apparatus, and method for manufacturing printing plate
10/12/2011	EP2300879B1 Extreme uv radiation generating device comprising a contamination captor and method of purifying tin in said device
10/12/2011	EP1763707B1 method for producing resist profiles
10/12/2011	EP1542077B1 Process for preventing development defect
10/12/2011	EP1264216B1 Method of reducing defects
10/12/2011	EP1145607B1 Production of photoresist coatings
10/12/2011	CN202008577U Sealing connecting piece and developing system
10/12/2011	CN202008576U Positive UV-CTP (ultraviolet-computer to plate) planographic plate material
10/12/2011	CN202008537U Sheet and fixing device thereof
10/12/2011	CN1985217B Non-aqueous microelectronic cleaning compositions containing fructose
10/12/2011	CN1975573B Side chain unsaturated polymer, radiation sensitive resin composition and spacer for liquid crystal display element
10/12/2011	CN1734352B Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor device
10/12/2011	CN1702549B Pattern data manufacturing method, pattern checking method and application thereof
10/12/2011	CN1683997B Cyanoadamantyl compounds and polymers and photoresists comprising same
10/12/2011	CN1495528B Photoetching projector and reflector assembly for said device
10/12/2011	CN102217009A Method for producing substrate having patterned conductive polymer film and substrate having patterned conductive polymer film
10/12/2011	CN102216987A Ultra thin alignment walls for di-block copolymer
10/12/2011	CN102216855A A photoresist stripping composition for manufacturing LCD
10/12/2011	CN102216854A Environmentally friendly polymer stripping compositions
10/12/2011	CN102216853A A lithographic apparatus, a radiation system, a device manufacturing method and a debris mitigation method
10/12/2011	CN102216852A Photopolymer resin composition
10/12/2011	CN102216851A Imprint lithography apparatus and method
10/12/2011	CN102216849A An optical imaging writer system
10/12/2011	CN102216400A Radiation curable coating materials
10/12/2011	CN102215636A Circuit board wet processing device
10/12/2011	CN102214742A Method for preparing two-dimensional photonic crystal structure GaN (gallium nitride) based LED (light emitting diode)
10/12/2011	CN102214547A Apparatus and method for haze control in a semiconductor process
10/12/2011	CN102214492A Method for making concave-surface X-ray focusing pinhole
10/12/2011	CN102213921A Solder-dissolution-preventing stripping liquid for etching PCB (Printed Circuit Board) as well as preparation method and application thereof
10/12/2011	CN102213920A Carrying device and exposure machine equipped with same
10/12/2011	CN102213919A Gluing method for photoresist having hanger bracket structure
10/12/2011	CN102213918A Positive type radiation-sensitive composition, inter-layer insulating film and forming method therefor
10/12/2011	CN102213917A Black-colored photosensitive resin composition, black matrix prepared by using thereof and color filter comprising the black matrix
10/12/2011	CN102213916A Coloring composition, color filter and color liquid crystal display element
10/12/2011	CN102213915A Photosensitive resin composition for color filter, and color filter using the same
10/12/2011	CN102213914A Semiconductor lithography process
10/12/2011	CN102213913A Methods for enhancing resolution of optical mask and manufacturing high-resolution optical mask
10/12/2011	CN102213857A Color filtering base plate and manufacturing method thereof
10/12/2011	CN102213779A Lens and method for producing lens
10/12/2011	CN102212304A Flexible circuit conductive composition, preparation method and using method thereof
10/12/2011	CN102212165A Resin for alkali-soluble binder and photosensitive resin composition containing the resin
10/12/2011	CN102212100A Cholate photoacid generators and photoresists comprising same
10/12/2011	CN101799634B Multichannel collecting and correcting device of alignment signal of photoetching machine
10/12/2011	CN101794085B Method for focusing adjustment of wafer coated with photoresist prior to electron beam exposure
10/12/2011	CN101676798B Method of producing microlens arrays
10/12/2011	CN101676797B Method of producing surface acoustic wave devices by exposing X-rays in a direct writing way
10/12/2011	CN101587302B Photoetching illuminating system
10/12/2011	CN101526707B TFT-LCD array base plate structure and manufacturing method thereof
10/12/2011	CN101510058B Method for measuring and correcting level error of work head position
10/12/2011	CN101465284B Substrate processing appratus
10/12/2011	CN101436006B Double-surface position alignment apparatus and method
10/12/2011	CN101435991B Method for making colorful optical filter
10/12/2011	CN101387761B Center aligning assembling and regulating apparatus and method for optical system
10/12/2011	CN101223478B Black paste composition, method of forming black matrix pattern by using the same, and the black matrix pattern formed
10/12/2011	CN101201542B Coating compositions for photolithography
10/12/2011	CN101017326B Coating compositions for use with an overcoated photoresist
10/11/2011	US8035903 Positioning unit and alignment device for an optical element
10/11/2011	US8035824 Differential critical dimension and overlay metrology apparatus and measurement method
10/11/2011	US8035798 Lithographic apparatus and device manufacturing method
10/11/2011	US8035797 Projection exposure apparatus, cleaning and maintenance methods of a projection exposure apparatus, and device manufacturing method
10/11/2011	US8035795 Apparatus and method for maintaining immersion fluid in the gap under the protection lens during wafer exchange in an immersion lithography machine
10/11/2011	US8034698 Systems and methods for inducing crystallization of thin films using multiple optical paths
10/11/2011	US8034547 Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method
10/11/2011	US8034546 Use of methanofullerne derivatives as resist materials and method for forming a resist layer
10/11/2011	US8034545 Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide
10/11/2011	US8034544 Method for forming fine contact hole pattern of semiconductor device
10/11/2011	US8034543 Angled-wedge chrome-face wall for intensity balance of alternating phase shift mask
10/11/2011	US8034542 Conductive film and manufacturing method thereof, and transparent electromagnetic shielding film
10/11/2011	US8034540 System and method employing secondary back exposure of flexographic plate
10/11/2011	US8034539 Exposure apparatus and method for producing device
10/11/2011	US8034538 Negative-working imageable elements
10/11/2011	US8034537 Positive resist composition and pattern forming method
10/11/2011	US8034536 Resist composition and method of forming resist pattern
10/11/2011	US8034534 Fluorinated polymers for use in immersion lithography
10/11/2011	US8034533 Fluorine-free heteroaromatic photoacid generators and photoresist compositions containing the same
10/11/2011	US8034532 High contact angle topcoat material and use thereof in lithography process
10/11/2011	US8034531 Photosensitive resin composition comprising a halogen-free colorant
10/11/2011	US8034529 Photosensitive resin composition and photosensitive element
10/11/2011	US8034516 Photomasks, methods of forming photomasks, and methods of photolithographically-patterning substrates
10/11/2011	US8034515 Pattern forming method, pattern designing method, and mask set
10/11/2011	US8034190 Substrate processing apparatus and substrate processing method
10/11/2011	US8033814 Device for holding a template for use in imprint lithography
10/06/2011	WO2011123433A2 Method of slimming radiation-sensitive material lines in lithographic applications
10/06/2011	WO2011122707A1 Colored composition, inkjet ink, color filter and method of producing the same, solid-state image sensor and display device

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