| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 10/05/2011 | CN102207608A Catadioptric projection objective |
| 10/05/2011 | CN102207600A Optical projection system |
| 10/05/2011 | CN102205688A Positive-working lithographic printing plate precursor for infrared laser and process for making lithographic printing plate |
| 10/05/2011 | CN101916046B Free-form surface lens used for double ring-shaped uniform illumination |
| 10/05/2011 | CN101894736B Coating developing machine |
| 10/05/2011 | CN101726779B Method for producing holographic double balzed grating |
| 10/05/2011 | CN101699350B Gold foil composite paper hot pressing process |
| 10/05/2011 | CN101676750B Full-ring photon sieve and method of producing same |
| 10/05/2011 | CN101651099B Method for removing photoresist layer |
| 10/05/2011 | CN101593668B Method for monitoring gluing developing equipment |
| 10/05/2011 | CN101578320B Novel polyimide precursor composition, use thereof and production method thereof |
| 10/05/2011 | CN101546135B Charged-particle beam writing method and charged-particle beam writing apparatus |
| 10/05/2011 | CN101546134B Electron beam writing apparatus and method |
| 10/05/2011 | CN101419401B Multiple image concealing false proof process |
| 10/05/2011 | CN101403868B Constant temperature method and device for mask plate developing solution |
| 10/05/2011 | CN101382742B Developing method for mask plate |
| 10/05/2011 | CN101382736B Photo mask verification system and program |
| 10/05/2011 | CN101290446B TFT-LCD array substrate and method of manufacture |
| 10/05/2011 | CN101216664B Method for producing equal edition breadth holographic moulding film and its molding device |
| 10/04/2011 | US8030477 Methods for the synthesis of arrays of DNA probes |
| 10/04/2011 | US8030368 Photoinitiated reactions |
| 10/04/2011 | US8030056 Substrate patterning using a digital optical chemistry micromirror imager |
| 10/04/2011 | US8029975 Fused aromatic structures and methods for photolithographic applications |
| 10/04/2011 | US8029974 Metal oxide-containing film-forming composition, metal oxide-containing film-formed substrate, and patterning process |
| 10/04/2011 | US8029973 Lithographic method and carrier substrate |
| 10/04/2011 | US8029972 Resist composition and method of forming resist pattern |
| 10/04/2011 | US8029971 Photopatternable dielectric materials for BEOL applications and methods for use |
| 10/04/2011 | US8029969 Material and method for photolithography |
| 10/04/2011 | US8029968 copolymer of 2-methyl-2-adamantyl methacrylate, gamma -butyrolactone methacrylate, norbornane lactone methacrylate, 3-hydroxy-1-adamantyl acrylate, upon action by an acid, increases alkali solubility; an acid generating agent e.g. 4-methylphenyldiphenylsulfonium nonafluorobutanesulfonate generates acid |
| 10/04/2011 | US8029951 Tetraazaporphyrin dye and an azomethine dye |
| 10/04/2011 | US8029877 Curable resin composition, curable resin composition for forming photosensitive pattern, color filter, liquid crystal panel substrate and liquid crystal panel |
| 09/29/2011 | WO2011118983A2 Lithography apparatus and lithography method |
| 09/29/2011 | WO2011118939A2 Photocurable and thermocurable resin composition, and dry film solder resist |
| 09/29/2011 | WO2011118855A1 Pattern forming method and resist composition |
| 09/29/2011 | WO2011118853A1 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same |
| 09/29/2011 | WO2011118850A1 Black curable composition, light-shielding color filter for a solid-state imaging device and method of producing the same, solid-state imaging device, wafer level lens, and camera module |
| 09/29/2011 | WO2011118824A1 Pattern forming method, chemical amplification resist composition and resist film |
| 09/29/2011 | WO2011118726A1 Negative type resist composition, method for producing relief pattern using the resist composition, and electronic part using the resist composition |
| 09/29/2011 | WO2011118644A1 Surface layer film-forming composition and resist pattern formation method |
| 09/29/2011 | WO2011118490A1 Radiation-sensitive resin composition |
| 09/29/2011 | WO2011118457A1 Master planographic printing plate and manufacturing method therefor |
| 09/29/2011 | WO2011118456A1 Planographic printing master plate and production method therefor |
| 09/29/2011 | WO2011118171A1 Photosensitive resin composition and light receiving device |
| 09/29/2011 | WO2011118052A1 Photosensitive resin composition, printing plate precursor and flexographic printing plate |
| 09/29/2011 | WO2011117872A1 System and method for controlling a lithography process |
| 09/29/2011 | WO2011117009A1 Lithographic apparatus and spectral purity filter |
| 09/29/2011 | WO2011116897A1 A beam line for a source of extreme ultraviolet (euv) radiation |
| 09/29/2011 | WO2011116878A2 Spectrometer and examination device having such a spectrometer |
| 09/29/2011 | WO2011116792A1 Optical system, exposure apparatus, and waverfront correction method |
| 09/29/2011 | WO2011094383A3 Methods and systems of material removal and pattern transfer |
| 09/29/2011 | WO2011094317A3 Micro-conformal templates for nanoimprint lithography |
| 09/29/2011 | WO2011092020A3 Arrangement for use in a projection exposure tool for microlithography having a reflective optical element |
| 09/29/2011 | WO2011073039A3 Imaging optics |
| 09/29/2011 | WO2011053100A3 Acrylate resin, photoresist composition comprising same, and photoresist pattern |
| 09/29/2011 | WO2010147245A3 Exposure apparatus and device manufacturing method |
| 09/29/2011 | US20110237053 Method and Apparatus for the Formation of an Electronic Device |
| 09/29/2011 | US20110236837 Switchable Antireflective Coatings |
| 09/29/2011 | US20110236836 Method for forming fine pattern |
| 09/29/2011 | US20110236835 Silsesquioxane Resins |
| 09/29/2011 | US20110236834 Electrode, electronic device and method for manufacturing the same |
| 09/29/2011 | US20110236833 Double Patterning Method |
| 09/29/2011 | US20110236832 Lithographic processing solutions and methods of use |
| 09/29/2011 | US20110236831 Acetal compound, polymer, resist composition, and patterning process |
| 09/29/2011 | US20110236830 Lithographic printing plate for in-solidus development on press |
| 09/29/2011 | US20110236829 Double-Sided Color Photographic Paper |
| 09/29/2011 | US20110236828 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same |
| 09/29/2011 | US20110236827 Resin and photoresist composition containing the same |
| 09/29/2011 | US20110236826 Patterning process, resist composition, and acetal compound |
| 09/29/2011 | US20110236825 Photoresist composition and method of forming photoresist pattern using the same |
| 09/29/2011 | US20110236824 Positive resist composition and method of forming resist pattern |
| 09/29/2011 | US20110236823 Novel polymers and photoresist compositions |
| 09/29/2011 | US20110236809 Method for examining a wafer with regard to a contamination limit and euv projection exposure system |
| 09/29/2011 | US20110236805 MEMS lithography mask with improved tungsten deposition topography and method for the same |
| 09/29/2011 | US20110236803 Photopolymer formulation for producing visible holograms |
| 09/29/2011 | US20110236802 Method for fabricating the holographic grating |
| 09/29/2011 | US20110236651 Methods of forming sheeting with a composite image that floats and sheeting with a composite image that floats |
| 09/29/2011 | US20110236011 Substrate processing apparatus and substrate processing method |
| 09/29/2011 | US20110235007 Environmental system including a transport region for an immersion lithography apparatus |
| 09/29/2011 | US20110235006 Exposure apparatus, exposure method, method for manufacturing device |
| 09/29/2011 | US20110234954 Method of fabricating a liquid crystal lens, liquid crystal lens and liquid crystal alignment substrate for liquid crystal lens provided by the same |
| 09/29/2011 | US20110234946 Transparent product that gives image only at one side |
| 09/29/2011 | US20110233619 exposure mask used for manufacturing a semiconductor device having impurity layer and a semiconductor device |
| 09/29/2011 | DE102010013298A1 Positionierverfahren für eine optische Anordnung einer Projektionsbelichtungsanlage Positioning method for an optical arrangement of a projection exposure apparatus |
| 09/28/2011 | EP2369413A2 Illumination system and lithographic apparatus |
| 09/28/2011 | EP2369412A2 Imprint apparatus and method of manufacturing an article |
| 09/28/2011 | EP2369371A2 Wafer lens array and method for manufacturing the same |
| 09/28/2011 | EP2368155A2 Three-dimensional articles using nonlinear thermal polymerization |
| 09/28/2011 | EP2368154A1 Wafer chuck for euv lithography |
| 09/28/2011 | EP2368153A1 Optical fiber, method of preparation thereof and device |
| 09/28/2011 | EP2250535B1 Debris mitigation device with rotating foil trap |
| 09/28/2011 | EP1980890B1 Cata-dioptric imaging system, exposure device, and device manufacturing method |
| 09/28/2011 | EP1973147B1 Reflective mask blanc for euv lithography |
| 09/28/2011 | EP1743222B1 Optical component having an improved thermal behavior |
| 09/28/2011 | CN201993578U 行辘清洁装置 OK reel cleaning device |
| 09/28/2011 | CN201993577U 高速数字扫描直写光刻装置 High-speed digital scanning direct-write lithography system |
| 09/28/2011 | CN1879060B Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for manufacturing printed circuit board |
| 09/28/2011 | CN1873534B Photosensitive resin composition, method of manufacturing a thin-film transistor substrate, and method of manufacturing a common electrode substrate using the same |
| 09/28/2011 | CN1754128B Method for producing resist substrates |
| 09/28/2011 | CN1677246B Lithographic apparatus and device manufacturing method |
| 09/28/2011 | CN102203677A Exposure unit and method for exposing substrate |