| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/05/2012 | WO2012002114A1 Exposure system |
| 01/05/2012 | WO2012000528A1 Optical system and multi facet mirror |
| 01/05/2012 | WO2011139338A3 Processless development of printing plate |
| 01/05/2012 | WO2011139337A9 Ball-spacer method for planar object leveling |
| 01/05/2012 | WO2011118939A3 Photocurable and thermocurable resin composition, and dry film solder resist |
| 01/05/2012 | WO2011111965A3 Photosensitive organic insulation composition for an oled device |
| 01/05/2012 | WO2011111964A3 Photosensitive resin composition having excellent heat resistance and mechanical properties, and protective film for a printed circuit board |
| 01/05/2012 | US20120003591 Method of forming pattern and developer for use in the method |
| 01/05/2012 | US20120003590 Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same |
| 01/05/2012 | US20120003589 Polymer for forming resist protection film, composition for forming resist protection film, and method of forming patterns of semiconductor devices using the composition |
| 01/05/2012 | US20120003588 Method of Improving Print Performance in Flexographic Printing Plates |
| 01/05/2012 | US20120003587 Method of forming fine patterns using a block copolymer |
| 01/05/2012 | US20120003586 Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same and pattern forming method |
| 01/05/2012 | US20120003585 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition |
| 01/05/2012 | US20120003584 Materials for lithographic plates coatings, lithographic plates and coatings containing same, methods of preparation and use |
| 01/05/2012 | US20120003583 Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the composition |
| 01/05/2012 | US20120003582 Photoresist and patterning process |
| 01/05/2012 | US20120003437 Photosensitive composition, pattern forming material and photosensitive film using the same, pattern forming method, pattern film, antireflection film, insulating film, optical device, and electronic device |
| 01/05/2012 | US20120003436 Photosensitive composition, pattern forming material, and photosensitive film, pattern forming method, pattern film, low refractive index film, optical device and solid-state imaging device each using the same |
| 01/05/2012 | US20120001135 Antireflective Coatings for Via Fill and Photolithography Applications and Methods of Preparation Thereof |
| 01/05/2012 | US20120000385 Lithographic printing plate material and lithographic printing plate |
| 01/05/2012 | DE102011076625A1 Exposure system for structured exposure of photosensitive layer to manufacture e.g. organic LED display during microlithography process, has light sources coupled with micro optics so that light is directed toward photosensitive layer |
| 01/05/2012 | DE102010030758A1 Steuerung kritischer Abmessungen in optischen Abbildungsprozessen für die Halbleiterherstellung durch Extraktion von Abbildungsfehlern auf der Grundlage abbildungsanlagenspezifischer Intensitätsmessungen und Simulationen Critical dimension control in optical imaging processes for semiconductor production by extraction of image defects based illustration of plant-specific intensity measurements and simulations |
| 01/05/2012 | DE102010030755A1 Verfahren und System zur Überwachung von Ausreißern in optischen Lithographieprozessen bei der Herstellung von Mikrostrukturbauelementen Method and system for monitoring of outliers in optical lithography processes in the manufacture of micro-structural devices |
| 01/05/2012 | DE102005056703B4 TFT - Arraysubstrat und zugehöriges Herstellungsverfahren TFT - array substrate and manufacturing method thereof |
| 01/04/2012 | EP2402818A1 Photosensitive composition, pattern forming material, and photosensitive film, pattern forming method, pattern film, low refractive index film, optical device and solid-state imaging device each using the same |
| 01/04/2012 | EP2402817A1 Block copolymer composition for flexographic printing plates |
| 01/04/2012 | EP2402399A1 Dispersion composition, polymerizable composition, opaque color filter, liquid crystal display element equipped with opaque color filter, solid state imaging element, wafer-level lens, and imaging unit equipped with wafer-level lens |
| 01/04/2012 | EP2402377A1 Polymer for forming resist protection film, composition for forming resist protection film, and method of forming patterns of semiconductor devices using the composition |
| 01/04/2012 | EP2402315A1 Oxime ester photoinitiators |
| 01/04/2012 | EP2401655A1 Multipurpose acidic, organic solvent based microelectronic cleaning composition |
| 01/04/2012 | EP2401654A1 Resist composition for negative-tone development and pattern forming method using the same |
| 01/04/2012 | EP2401352A2 Stripping compositions for cleaning ion implanted photoresist from semiconductor device wafers |
| 01/04/2012 | EP2401061A1 Polymer-containing solvent purifying process |
| 01/04/2012 | EP2132600B1 Split axes stage design for semiconductor applications |
| 01/04/2012 | EP2078983B1 Composition for formation of upper layer film, and method for formation of photoresist pattern |
| 01/04/2012 | CN202102243U Improvement device for PCB (printed circuit board) dry film development board placing platform |
| 01/04/2012 | CN202102242U Image developing platform of screen printing plate |
| 01/04/2012 | CN1991584B Light solidification pigmentation composition and color filter, and liquid crystal display device |
| 01/04/2012 | CN1749858B Method for manufacturing a flexographic printing master |
| 01/04/2012 | CN102308379A Colored ceramic vacuum chuck and manufacturing method thereof |
| 01/04/2012 | CN102308364A 激光曝光装置 Laser exposure apparatus |
| 01/04/2012 | CN102308260A A hardmask process for forming a reverse tone image using polysilazane |
| 01/04/2012 | CN102308259A Exposure method, color filter manufacturing method, and exposure device |
| 01/04/2012 | CN102308258A Ultra low post exposure bake photoresist materials |
| 01/04/2012 | CN102308257A Photosensitive paste and process for production of pattern using the same |
| 01/04/2012 | CN102307909A Photosensitive resin composition |
| 01/04/2012 | CN102306632A Planarization method suitable for photoetching technology |
| 01/04/2012 | CN102306622A Burning method |
| 01/04/2012 | CN102305990A Substrates and methods of using those substrates |
| 01/04/2012 | CN102304068A Photoacid generators and photoresists comprising the same |
| 01/04/2012 | CN101955595B Method for guiding fixed-point cell growth by preparing chemical micro-patterns on surfaces of various materials |
| 01/04/2012 | CN101900844B Method for reactive ion beam etching of blazed convex grating |
| 01/04/2012 | CN101893826B Photosensitive circuit board making method and circuit board making machine |
| 01/04/2012 | CN101840012B Artificial compound eye lens with controllable curvature and preparation method thereof |
| 01/04/2012 | CN101639629B Internal-drum imaging device |
| 01/04/2012 | CN101604122B Lithographic apparatus and device manufacturing method |
| 01/04/2012 | CN101398634B Lithographic apparatus and device manufacturing method, and measurement systems |
| 01/04/2012 | CN101387792B Method for manufacturing light alignment film and alignment liquid |
| 01/04/2012 | CN101371194B High resistivity compositions |
| 01/04/2012 | CN101369098B Curing resin composition, sealing material for liquid crystal display device and liquid crystal display device |
| 01/04/2012 | CN101344722B Process for manufacturing colorful filtering substrates |
| 01/04/2012 | CN101226331B UV curable liquid pre-polymer, and liquid crystal display device using the same and manufacturing method thereof |
| 01/04/2012 | CN101154035B Fine mold and method for regenerating fine mold |
| 01/04/2012 | CN101144987B Chemical solution and method for processing substrate by using the same |
| 01/04/2012 | CN101097399B Moulds fabricating method |
| 01/04/2012 | CN101021683B Chemical-amplification positive photoresist composition |
| 01/03/2012 | US8091046 Set of masks, method of generating mask data and method for forming a pattern |
| 01/03/2012 | US8089707 Diaphragm changing device |
| 01/03/2012 | US8089611 Exposure apparatus and method for producing device |
| 01/03/2012 | US8089610 Environmental system including vacuum scavenge for an immersion lithography apparatus |
| 01/03/2012 | US8088875 (Meth)acrylate, polymer and resist composition |
| 01/03/2012 | US8088566 Photoresists; using compound containing an orgaooxygen or organosulfur compound |
| 01/03/2012 | US8088565 Exposure system and pattern formation method |
| 01/03/2012 | US8088564 Base soluble polymers for photoresist compositions |
| 01/03/2012 | US8088563 Reducing risk of detachment of photoresist from underlying substrate during development of photoresist pattern using fluid developer by controlling surface composition of the underlying substrate so that contact angle formed between substrate with developer is 20 degrees or greater |
| 01/03/2012 | US8088562 Heat sensitive ; coating hydrophilic support with hydrophobic thermoplastic resin; photopolymerization using photoinitiator; exposure; heating;development; antideposit agents |
| 01/03/2012 | US8088561 Method of making a lithographic printing plate |
| 01/03/2012 | US8088560 Method of making a lithographic printing plate |
| 01/03/2012 | US8088559 Method of making a photopolymer printing plate |
| 01/03/2012 | US8088558 Method of making a lithographic printing plate |
| 01/03/2012 | US8088557 Method of forming patterns |
| 01/03/2012 | US8088556 Thiopyran derivative, polymer, resist composition, and method for manufacturing semiconductor device using such resist composition |
| 01/03/2012 | US8088555 Multiple step printing methods for microbarcodes |
| 01/03/2012 | US8088554 Bottom resist layer composition and patterning process using the same |
| 01/03/2012 | US8088553 Positive resist composition, method of forming resist pattern, and polymeric compound |
| 01/03/2012 | US8088552 Photosensitive composition and lithographic printing original plate using the composition |
| 01/03/2012 | US8088551 Methods of utilizing block copolymer to form patterns |
| 01/03/2012 | US8088550 Positive resist composition and pattern forming method |
| 01/03/2012 | US8088549 Radiation-sensitive elements with developability-enhancing compounds |
| 01/03/2012 | US8088548 Bottom antireflective coating compositions |
| 01/03/2012 | US8088546 Underlayer coating forming composition for lithography containing naphthalene ring having halogen atom |
| 01/03/2012 | US8088537 Resist top coat composition and patterning process |
| 01/03/2012 | US8087446 Method and apparatus for production of a cast component |
| 01/03/2012 | US8087354 Method of forming visible image for on-press developable lithographic printing plate |
| 01/03/2012 | CA2532458C Clear photopolymerizable systems for the preparation of high thickness coatings |
| 12/29/2011 | WO2011162408A1 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film |
| 12/29/2011 | WO2011162303A1 Radiation-sensitive composition |
| 12/29/2011 | WO2011162217A1 Colored resin composition, color filter, liquid crystal display device, and organic el display |
| 12/29/2011 | WO2011162146A1 Exposure apparatus and device fabrication method |