Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2011
11/24/2011WO2011145743A1 Determination of a commutation offset and a compensation map for a stage
11/24/2011WO2011145742A1 Polymerizable composition
11/24/2011WO2011145703A1 Radiation-sensitive resin composition, method for forming resist pattern, polymer and compound
11/24/2011WO2011145702A1 Radiation-sensitive resin composition, method for forming resist pattern, polymer and compound
11/24/2011WO2011145663A1 Composition for formation of overlay film for immersion exposure and method for formation of photo-resist pattern
11/24/2011WO2011145111A1 Micro/nano photoconductor
11/24/2011WO2011144553A1 Device and method for producing flexographic printing sleeves
11/24/2011WO2011144389A1 Illumination optics for a metrology system for examining an object using euv illumination light and metrology system comprising an illumination optics of this type
11/24/2011WO2011144387A1 Lithographic apparatus and device manufacturing method
11/24/2011WO2011110467A3 System for removing contaminant particles, lithographic apparatus, method for removing contaminant particles and method for manufacturing a device
11/24/2011US20110287995 Resist remover composition and method for removing resist using same
11/24/2011US20110287371 Component of an immersion system, an immersion lithographic apparatus and a device manufacturing method
11/24/2011US20110287370 Method for making micron or submicron cavities
11/24/2011US20110287368 Method of manufacturing electronic device
11/24/2011US20110287367 Method and apparatus for verifying stitching accuracy of stitched chips on a wafer
11/24/2011US20110287366 Photoresist composition comprising photoinitiators, and transparent thin film and liquid crystal display device using the composition
11/24/2011US20110287365 Lithographic printing plate precursors
11/24/2011US20110287364 Lithographic printing plate precursor
11/24/2011US20110287363 High-resolution photolithographic method for forming nanostructures, in particular in the manufacture of integrated electronic devices
11/24/2011US20110287362 Resist composition, method of forming resist pattern, novel compound, and acid generator
11/24/2011US20110287361 Photoacid generators and photoresists comprising same
11/24/2011US20110287360 Photoresist composition and method of forming pattern by using the same
11/24/2011US20110287349 Multi-chip reticle photomasks
11/24/2011US20110287347 Thin film evaluation method, mask blank, and transfer mask
11/24/2011US20110287346 Mask blank manufacturing method, transfer mask manufacturing method, mask blank, and transfer mask
11/24/2011US20110287345 Electron beam drawing apparatus, electron beam drawing method, semiconductor device manufacturing mask manufacturing method, and semiconductor device manufacturing template manufacturing method
11/24/2011US20110287344 Reflective photomask, manufacturing method of the photomask, and pattern formation method
11/24/2011US20110287343 Hologram recording material and hologram recording medium
11/24/2011US20110287234 Negative resist pattern forming method, developer and negative chemical-amplification resist composition used therefor, and resist pattern
11/24/2011US20110286713 Photosensitive resin composition, optical waveguide film, film for forming optical waveguide, optical interconnect, opto-electric hybrid circuit board, electronic device, and a method of manufacturing an optical waveguide film
11/24/2011US20110286319 Charged particle beam writing apparatus, write data creation method and charged particle beam writing method
11/24/2011US20110285978 Illumination system for a microlithographic projection exposure apparatus
11/24/2011US20110285977 Lithographic apparatus and device manufacturing method
11/24/2011US20110285956 Phase-type diffraction device, manufacturing method thereof and image pick-up apparatus
11/24/2011US20110284855 Resin composition and display device using the same
11/24/2011DE112004000774T5 Reagenz zur Ausbildung einer Feinstruktur und ein Verfahren zur Herstellung desselben Reagent to form a fine structure and a method of manufacturing the same
11/24/2011DE102010029049A1 Beleuchtungsoptik für ein Metrologiesystem für die Untersuchung eines Objekts mit EUV-Beleuchtungslicht sowie Metrologiesystem mit einer derartigen Beleuchtungsoptik Illumination optics for a metrology system for scanning an object with EUV illumination light and metrology system with an illumination optics
11/24/2011DE102010021539A1 Projektionsobjektiv mit Blenden Projection lens with an aperture
11/24/2011DE102006054820B4 Verfahren zur Korrektur von Platzierungsfehlern A method of correcting placement errors
11/23/2011EP2388800A1 Active Spectral Control of DUV Light Source
11/23/2011EP2388650A1 Illumination system for illuminating a mask in a microlithographic exposure apparatus
11/23/2011EP2388649A1 Illumination system for illuminating a mask in a microlithographic exposure apparatus
11/23/2011EP2388142A1 Screen material and structure of a screen printing form
11/23/2011EP2388119A1 An imprint lithography process
11/23/2011EP2387735A1 Nonpolymeric binders for semiconductor substrate coatings
11/23/2011EP2387598A1 Black matrix for colour filters
11/23/2011EP1796143B1 Substrate holder, stage apparatus, and exposure apparatus
11/23/2011EP1508157B1 High efficiency solid-state light source and methods of use and manufacture
11/23/2011EP0999474B1 Photoresist resin composition and method for forming a pattern
11/23/2011CN202049331U 散射曝光系统 Scattering exposure system
11/23/2011CN1940724B Photosensitive resin composition, protective film and separator of LCD panel, forming method thereof and lcd panel
11/23/2011CN1918514B Photosensitive resin composition and cured product thereof
11/23/2011CN1916762B Photosensitive resin composition, cushion for display panel and display panel
11/23/2011CN1755523B Chemically amplified resist composition
11/23/2011CN1690861B Optical illumination system, exposure apparatus and device fabrication method
11/23/2011CN102257437A Pre-alignment apparatus and pre-alignment method
11/23/2011CN102257436A Wafer chuck for EUV lithography
11/23/2011CN102257435A Silicon-containing resist underlayer film formation composition having anion group
11/23/2011CN102257434A Ablation layer, photosensitive resin structure, and method for producing relief printing plate using the photosensitive resin structure
11/23/2011CN102257433A Stack of negative-working imageable elements
11/23/2011CN102257432A Cationic radiation curable compositions
11/23/2011CN102257431A Positive-type photosensitive resin composition, method for producing resist pattern, semiconductor device, and electronic device
11/23/2011CN102257430A Carrier solvent compositions, coatings compositions, and methods to produce thick polymer coatings
11/23/2011CN102257421A Optical module for guiding a radiation beam
11/23/2011CN102256929A Polymerizable photoinitiators and radiation curable compositions
11/23/2011CN102256928A Cyclohexane oxidation process byproduct stream derivatives and methods for using the same
11/23/2011CN102256927A Cyclohexane oxidation process byproduct derivatives and methods for using the same
11/23/2011CN102256429A Collector for EUV light source
11/23/2011CN102253612A Aligning method for dry films
11/23/2011CN102253611A Method of detecting alignment mark and method of manufacturing printed circuit board
11/23/2011CN102253608A Method for removing photoresist on photomask
11/23/2011CN102253607A Method for optimizing coherent factor of photoetching machine lighting system
11/23/2011CN102253606A System and method for carrying out in-situ detection on odd aberration of projection objective for photoetching machines
11/23/2011CN102253605A Multiple parallel laser beam grating direct writing device and grating direct writing method
11/23/2011CN102253604A Method for detecting quality of space image
11/23/2011CN102253603A Alignment detection device for photoetching equipment
11/23/2011CN102253602A Lighting dose real-time controlling apparatus in photolithography system
11/23/2011CN102253601A Method for improving thermostability of 7350 photoresist
11/23/2011CN102253600A Chemically amplified negative resist composition and patterning process
11/23/2011CN102253599A Red-colored composition for color filter, and color filter
11/23/2011CN102253598A Resin composition for production of optical waveguide, and optical waveguide produced by using the resin composition
11/23/2011CN102253597A Compression type gas pressure method-based nano-scale pressure printing device
11/23/2011CN102253596A Compositions and processes for immersion lithography
11/23/2011CN102253524A Manufacturing method of colorful filtering substrate
11/23/2011CN102253522A Liquid crystal display and manufacturing method thereof
11/23/2011CN102253521A Liquid crystal display device and manufacturing method thereof
11/23/2011CN102253477A Reflective, refractive and projecting optical system
11/23/2011CN102253464A Projection objective and projection exposure machine
11/23/2011CN102253436A Method for manufacturing micro lens array based on digital mask lithography technology
11/23/2011CN102253435A Micromachining method for manufacturing polymer cylindrical microlens by electric field induction
11/23/2011CN102250044A Piperazino photoinitiation sensitiser
11/23/2011CN102249182A Method for preparing magnetic/polymer composite material three-dimensional micro/nano device capable of being remotely magnetically driven
11/23/2011CN101907827B Positive-type photosensitive resin composition and protrusion for liquid crystal orientation control prepared from same
11/23/2011CN101825848B Developing solution of thermosensitive positive-type photosensitive plate for printing and preparation method thereof
11/23/2011CN101799625B Hyperbranched polyester micro-optical photoresist
11/23/2011CN101740359B Nickel stripping method in method for manufacturing low-temperature polysilicon
11/23/2011CN101535849B Color filter, and liquid crystal display device and ccd device each using the color filter
11/23/2011CN101417747B Conveyer table mechanism
11/23/2011CN101398632B Lithographic apparatus and method of cleaning a lithographic apparatus
11/23/2011CN101398612B Photomask, manufacturing method thereof and pattern transfer printing method