| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 12/21/2011 | CN102289158A 辐射系统和光刻设备 Radiation system and lithographic apparatus |
| 12/21/2011 | CN102289157A 复合光子筛投影式光刻系统 A composite photonic sieve projection lithography system |
| 12/21/2011 | CN102289156A 一种光刻机NA-Sigma配置的优化方法 An optimization method lithography NA-Sigma configuration |
| 12/21/2011 | CN102289155A 一种基于紫外led光源的光刻机 Based ultraviolet lithography machine led light |
| 12/21/2011 | CN102289154A 一种用于光刻投影物镜安装的调平定位装置 Leveling a lithographic projection lens positioning device for installation |
| 12/21/2011 | CN102289153A 一种制版光刻设备静态稳定性测量方法 One kind of plate lithography apparatus static stability of the measurement method |
| 12/21/2011 | CN102289152A 光学系统波像差检测装置 The optical system aberration detection device |
| 12/21/2011 | CN102289151A 涂敷方法和涂敷装置 The coating method and the coating apparatus |
| 12/21/2011 | CN102289150A 感光性树脂组合物 The photosensitive resin composition |
| 12/21/2011 | CN102289149A 光生酸剂、其制备方法以及含有该光生酸剂的抗蚀剂组合物 Photoacid generator, their preparation and resist composition containing the photo-acid agent |
| 12/21/2011 | CN102289148A 植入式微针尖电极及其制作方法 Micro tip electrode implantation and its production method |
| 12/21/2011 | CN102289147A 制备半导体和热塑性有机物复合微纳结构的方法 The method of preparation of organic semiconductors and thermoplastic composite micro-nano structures |
| 12/21/2011 | CN102289092A 一种硅基液晶屏贴合固化方法 A silicon-based LCD screen fit curing methods |
| 12/21/2011 | CN102289015A 一种制作大高宽比x射线衍射光栅的方法 A method for making high aspect ratio, a method of x-ray diffraction gratings |
| 12/21/2011 | CN102286218A 颜料树脂组合物、喷墨方式滤色器用树脂组合物、滤色器以及液晶显示装置 Pigment resin composition, the ink jet method for a color filter resin composition, a color filter and a liquid crystal display device |
| 12/21/2011 | CN102285299A 物体表面金属化装饰方法 Decorative surface metallization methods |
| 12/21/2011 | CN102285298A 一种物体表面金属化装饰方法 An object decorative surface metallization methods |
| 12/21/2011 | CN102285269A 光聚合型平版印刷版本体 Photopolymerizable lithographic printing version body |
| 12/21/2011 | CN102285201A 激光雕刻用凸版印刷版原版、凸版印刷版的制版方法以及凸版印刷版 Laser engraving letterpress printing plate precursor, letterpress printing plate method and letterpress printing |
| 12/21/2011 | CN101916047B 一种采用自由曲面透镜实现离轴照明的光刻曝光装置 Lithographic exposure apparatus using the free curved lens to achieve off-axis illumination |
| 12/21/2011 | CN101916044B 一种用于双四极均匀照明的自由曲面透镜 A double quadrupole uniform illumination free curved lens |
| 12/21/2011 | CN101916043B 厚胶介质补偿紫外光垂直光刻工艺三维光强分布模拟方法 Medium thick rubber vertical compensation UV lithography process simulation method of three-dimensional light intensity distribution |
| 12/21/2011 | CN101907834B 真空显影机构 Developing institutional vacuum |
| 12/21/2011 | CN101807012B 一种直写光刻机的自动聚焦光路结构 A direct-write lithography autofocus optical structure |
| 12/21/2011 | CN101799633B 一种离线测量成像系统最佳物面的方法和装置 A method and apparatus for optimal imaging system off-line measurement of the object plane |
| 12/21/2011 | CN101788769B 曝光形成半导体器件当层的方法 The method of the semiconductor device when the layer is exposed to form |
| 12/21/2011 | CN101764080B 双大马士革工艺中的灰化处理方法 Dual damascene process of ashing method |
| 12/21/2011 | CN101727005B 用于等离子体显示板电极的感光树脂组合物 For a plasma display of the photosensitive resin composition of the electrode plate |
| 12/21/2011 | CN101692439B 薄膜晶体管数组基板的制作方法 Making thin film transistor array substrate method |
| 12/21/2011 | CN101644902B 基板处理方法与设备及其供液装置 Substrate processing method and apparatus and equipment for liquid |
| 12/21/2011 | CN101620383B 烤箱及烘烤方法 Oven and bake method |
| 12/21/2011 | CN101520612B 彩色光刻胶的清洗剂 Color photoresist cleaning agent |
| 12/21/2011 | CN101436005B 分段形标记对准信号处理方法 Segment-shaped mark on the signal processing method |
| 12/21/2011 | CN101436004B 硅片预对准的方法 Method wafer prealignment |
| 12/21/2011 | CN101435996B 一种感光型介质粉体涂料及用其制备阴极绝缘层的方法 One photosensitizing type dielectric powder coating and process for preparing the cathode insulation methods |
| 12/21/2011 | CN101398633B 光刻设备和器件制造方法以及测量系统 A lithographic apparatus and device manufacturing method and a measurement system |
| 12/21/2011 | CN101395537B 感光性有机膜用显影液组合物 Photosensitive organic film with the developer composition |
| 12/21/2011 | CN101382743B 同轴双面位置对准系统及位置对准方法 Coaxial sided position and alignment system alignment method |
| 12/21/2011 | CN101376316B 一种高温彩烤瓷板油画制作方法 A high-temperature color porcelain plate painting production methods |
| 12/21/2011 | CN101346665B 表面保护薄膜 Surface protection film |
| 12/21/2011 | CN101313385B 光刻法用洗涤液及使用该洗涤液的曝光装置的洗涤方法 Photolithography and the solution was washed with the washing method using the exposure apparatus of the washing liquid |
| 12/21/2011 | CN101303523B 薄膜图案层制造方法及紫外光源装置 Thin film pattern layer manufacturing method and ultraviolet light source device |
| 12/21/2011 | CN101266405B 放射线敏感性树脂组合物,液晶显示面板用间隔体及其形成方法,和液晶显示面板 The radiation-sensitive resin composition, the liquid crystal display panel and method of forming the spacer, and a liquid crystal display panel |
| 12/21/2011 | CN101174104B 确定光刻投影装置最佳物面和最佳像面的方法及相关装置 Determining optimal lithographic projection apparatus and the object plane of the best image plane method and related apparatus |
| 12/21/2011 | CN101086615B 印刷抗蚀剂及其制备方法和利用该印刷抗蚀剂的图案化方法 Printing resist its preparation method and use a patterned resist printing method |
| 12/21/2011 | CN101046968B 具有微纹的磁头及其制造方法 Has a head and a manufacturing method of micro-patterned |
| 12/21/2011 | CN101023394B 着色碱性显影性感光性树脂组合物和使用了该着色碱性显影性感光性树脂组合物的彩色滤光片 Colored alkali-developable photosensitive resin composition and a color filter using the colored alkali-developable photosensitive resin composition |
| 12/21/2011 | CN101019074B 使用聚硅氧烷模具的平版印刷技术 Polysiloxane mold lithography |
| 12/20/2011 | USRE43036 Filter for extreme ultraviolet lithography |
| 12/20/2011 | US8080886 Integrated circuit semiconductor device with overlay key and alignment key and method of fabricating the same |
| 12/20/2011 | US8080478 Method of producing mask |
| 12/20/2011 | US8080429 Evaluation method for chemical solution, qualification method for chemical solution and method for manufacturing semiconductor device |
| 12/20/2011 | US8080366 In-line process for making thin film electronic devices |
| 12/20/2011 | US8080365 Thiopyran derivative, polymer, resist composition, and method for manufacturing semiconductor device using such resist composition |
| 12/20/2011 | US8080364 Pattern formation method |
| 12/20/2011 | US8080363 Resin for hydrophobitizing resist surface, method for manufacturing the resin, and positive resist composition containing the resin |
| 12/20/2011 | US8080362 Positive resist composition |
| 12/20/2011 | US8080361 Positive photosensitive composition and method of forming pattern using the same |
| 12/20/2011 | US8080350 Positive photosensitive resin composition, and semiconductor device and display therewith |
| 12/20/2011 | US8080349 Exposure mask and method for manufacturing semiconductor device using the same |
| 12/15/2011 | WO2011155683A1 Method for active phase correction using negative index metamaterials, exposure imaging device and system using same, and method for improving the resolution of the exposure imaging device using the negative index metamaterials |
| 12/15/2011 | WO2011155412A1 Photosensitive resin composition, photosensitive element comprising the composition, method for formation of septum for image display device, process for production of image display device, and image display device |
| 12/15/2011 | WO2011155382A1 Photosensitive siloxane composition, cured film formed form same, and element having cured film |
| 12/15/2011 | WO2011155347A1 Resist pattern formation method and pattern miniaturisation agent |
| 12/15/2011 | WO2011154244A1 Illumination optical system for euv projection lithography |
| 12/15/2011 | WO2011154227A1 Optical system of a microlithographic projection exposure apparatus |
| 12/15/2011 | WO2011153654A1 Heat-conducting element, assembly and use of the same |
| 12/15/2011 | WO2011122354A3 Exposure apparatus, exchange method of object, exposure method, and device manufacturing method |
| 12/15/2011 | WO2011107302A3 Imprint lithography |
| 12/15/2011 | US20110307211 Method For Measuring The Position Of A Mark In A Deflector System |
| 12/15/2011 | US20110306534 Multipurpose acidic, organic solvent based microelectronic cleaning composition |
| 12/15/2011 | US20110305997 Methods of forming a pattern in a material and methods of forming openings in a material to be patterned |
| 12/15/2011 | US20110305996 Beam Pen Lithography |
| 12/15/2011 | US20110305995 Resin film forming method |
| 12/15/2011 | US20110305994 Nano plasmonic parallel lithography |
| 12/15/2011 | US20110305993 Hydrophilic nanoporous materials |
| 12/15/2011 | US20110305991 Positive resist composition and pattern-forming method |
| 12/15/2011 | US20110305990 Method for manufacturing micro-structure |
| 12/15/2011 | US20110305979 Resist top coat composition and patterning process |
| 12/15/2011 | US20110305882 Method for forming thin film pattern and flat display device having the same |
| 12/15/2011 | US20110305851 Reusable Printing Medium and Apparatus and Method Employing the Same |
| 12/15/2011 | US20110305848 Positive photosensitive resin composition for slit coating and using said composition for forming a pattern |
| 12/15/2011 | US20110304851 Scatterometry Method and Measurement System for Lithography |
| 12/15/2011 | US20110304849 Device for calibrating optical scanner, method of manufacturing the device, and method of calibrating optical scanner using the device |
| 12/15/2011 | US20110304782 Phase-type diffraction device, manufacturing method thereof and image pick-up apparatus |
| 12/15/2011 | US20110304671 Inkjet printhead with self-clean ability for inkjet printing |
| 12/15/2011 | DE102011016769A1 EUV-Spiegelmodul EUV mirror module |
| 12/15/2011 | DE102010035602A1 Method for patterning layer on silicon substrate used during manufacturing of microelectronic semiconductor component e.g. dynamic RAM, involves applying hard mask formed with metal oxide, metal nitride, metal carbide and metal silicate |
| 12/15/2011 | DE102010030089A1 Beleuchtungsoptik für die Mikro-Lithografie sowie Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik Illumination optics for micro-lithography and projection exposure apparatus having an illumination optics |
| 12/15/2011 | DE102010030023A1 Optisches System Optical system |
| 12/15/2011 | DE102010029905A1 Optisches System einer mikrolithographischen Projektionsbelichtungsanlage The optical system of a microlithography projection exposure apparatus |
| 12/14/2011 | EP2395543A1 Method for manufacturing a grid of conductive lines with crossed access |
| 12/14/2011 | EP2395397A1 Resist remover composition and method for removing resist using same |
| 12/14/2011 | EP2395396A2 A photosensitive stencil blank and a method for forming a stencil |
| 12/14/2011 | EP2395395A2 Method for Manufacturing Micro-Structure |
| 12/14/2011 | EP2395394A2 Method for printing etch masks using phase-change materials |
| 12/14/2011 | EP2394200A1 Co-crystals and their use |
| 12/14/2011 | EP2393751A1 Method for producing a stamp for hot embossing |
| 12/14/2011 | EP1164435B1 Photosensitive polysilazane composition and method of forming patterned polysilazane film |
| 12/14/2011 | CN202075548U 微结构压印系统 Microstructure embossing system |