G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2011
12/01/2011	US20110294073 Preparing method of metal powder and method of manufacturing inner electrode of multilayer ceramic capacitor using the same
12/01/2011	US20110294072 Methods of manufacturing semiconductor devices using photolithography
12/01/2011	US20110294071 Electron gun, lithography apparatus, method of manufacturing article, and electron beam apparatus
12/01/2011	US20110294070 Monomer, polymer, chemically amplified positive resist composition, and patterning process
12/01/2011	US20110294069 Photoresist compositions and methods of forming photolithographic patterns
12/01/2011	US20110294068 Self-Segregating Multilayer Imaging Stack With Built-In Antireflective Properties
12/01/2011	US20110294067 Photosensitive resin composition
12/01/2011	US20110294066 Positive photosensitive resin composition, cured film using the same, protecting film, insulating film, semiconductor device, and display device
12/01/2011	US20110294050 Pigment dispersion composition, red colored composition, colored curable composition, color filter for a solid state imaging device and method for producing the same, and solid state imaging device
12/01/2011	US20110294049 Polymerizable composition, cured film, color filter, method of producing color filter and solid-state image sensor
12/01/2011	US20110294047 Photomask blank, resist pattern forming process, and photomask preparation process
12/01/2011	US20110294046 Photo mask and method for fabricating image sensors
12/01/2011	US20110293900 Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same
12/01/2011	US20110293888 Patterned inorganic layers, radiation based patterning compositions and corresponding methods
12/01/2011	US20110293305 Development method, method of manufacturing photomask, method of manufacturing semiconductor device and development device
12/01/2011	US20110291243 Planarizing etch hardmask to increase pattern density and aspect ratio
12/01/2011	US20110290134 Imprint mask, method for manufacturing the same, and method for manufacturing semiconductor device
12/01/2011	US20110289771 Method for producing conductive sheet and method for producing touch panel
12/01/2011	DE102010047838A1 Optical element e.g. front surface mirror, for use in optical system of microlithography projection exposure system, has base material, where doping atoms are provided in material and stimulated to anti-stokes fluorescence by light
12/01/2011	DE102010029339A1 Optisches System für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren Optical system for a microlithography projection exposure apparatus and microlithographic exposure method
11/2011
11/30/2011	EP2390906A1 Apparatus and method for electrostatic discharge (ESD) reduction
11/30/2011	EP2390896A1 Electron gun, lithography apparatus, method of manufacturing article, and electron beam apparatus
11/30/2011	EP2390722A1 Photoresist compositions and methods of forming photolithographic patterns
11/30/2011	EP2390721A2 Patterned polymeric structures, particularly microstructures, and methods for making same
11/30/2011	EP2390272A1 Polymerizable composition, cured film, color filter, method of producing color filter and solid-state image sensor
11/30/2011	EP2389615A1 Large area, homogeneous array fabrication including substrate temperature control
11/30/2011	EP2389614A1 Large area, homogeneous array fabrication including homogeneous substrates
11/30/2011	EP2389613A1 Large area, homogeneous array fabrication including controlled tip loading vapor deposition
11/30/2011	EP2389612A1 A photoresist image-forming process using double patterning
11/30/2011	EP2241448B1 A letterpress printing original plate for laser engraving and a letterpress printing plate obtained therefrom
11/30/2011	EP1393115B1 Systems and methods for scanning a beam of light across a specimen
11/30/2011	CN202057962U 显影槽自动消泡装置 Developing tank automatic anti-foaming device
11/30/2011	CN202057961U 氨水显影机稳压除味装置 Developers ammonia odor regulator device
11/30/2011	CN202057960U Visible/infrared target simulator film making technology
11/30/2011	CN202057959U 涂布装置 Coating device
11/30/2011	CN202057958U 一种光刻胶喷涂设备 A photoresist coating equipment
11/30/2011	CN202052476U 显影母液的自动配制及输送装置 Automatic preparation and delivery means for developing the mother liquor
11/30/2011	CN1932646B 曝光装置 Exposure device
11/30/2011	CN1841214B 在抗蚀剂剥离室中从衬底上除去抗蚀剂的方法 The method of removing the resist from the substrate in the resist stripping chamber
11/30/2011	CN1800975B 分步重复光照纳米压印装置 Step and repeat light nanoimprinter
11/30/2011	CN1705913B 负型青紫色激光感光性组合物、图像形成材料、图像形成元件和图像形成方法 A negative blue-violet laser photosensitive composition, an image forming material, the image forming element and the image forming method
11/30/2011	CN1550894B 化学放大型光刻胶组合物 Chemical amplification type resist composition
11/30/2011	CN102265221A 图案形成方法和半导体装置的制造方法、以及抗蚀剂图案的被覆层的形成材料 Pattern forming method and a method of manufacturing a semiconductor device, and forming a resist pattern of the material of the coating layer
11/30/2011	CN102265220A 确定特性的方法 The method of determining the characteristics of
11/30/2011	CN102265219A 投射曝光设备中的光学元件的重力补偿 Projection exposure apparatus gravity compensation optical element
11/30/2011	CN102265218A 用于在材料表面上构图分子的纳米级图案的方法 A method for nanoscale patterning on the surface of patterned molecule
11/30/2011	CN102265217A 采用压印材料的衬底平坦化及方法 A substrate using imprint planarizing material and method
11/30/2011	CN102264802A 可uv固化的无机-有机混合树脂及其制备方法 Uv curing can be inorganic - organic hybrid resin and preparation method
11/30/2011	CN102262361A 浸没液体、曝光装置及曝光方法 A liquid immersion exposure apparatus and exposure method
11/30/2011	CN102262360A 曝光装置 Exposure device
11/30/2011	CN102262359A 照射系统和光刻设备 Illumination system and lithography equipment
11/30/2011	CN102262358A 一种内层板双面对位装置和方法 One kind of inner panel double face positioning device and method
11/30/2011	CN102262357A 光刻胶和光刻胶图形的优化方法 Optimization photoresist and the photoresist pattern
11/30/2011	CN102262356A 光刻胶图形的优化方法和接触孔的形成方法 The method of forming a resist pattern optimization method and contact holes
11/30/2011	CN102262355A 具预定图案的滚轮的制作方法 The method of making the roller having a predetermined pattern
11/30/2011	CN102262354A 多色调光掩模的制造方法和图案转印方法 Method for producing multi-tone photomask and pattern transfer method
11/30/2011	CN102262353A 多色调光掩模的制造方法和图案转印方法 Method for producing multi-tone photomask and pattern transfer method
11/30/2011	CN102262350A 曝光机的曝光程序的验证方法及其使用的掩模 Exposure machine authentication methods and procedures used in the exposure mask
11/30/2011	CN102260870A 一种亚微米尺寸二维介质柱型光子晶体的制备方法 A method for preparing a two-dimensional medium submicron size cylindrical photonic crystals
11/30/2011	CN101923287B 一种含有二苯硫醚基酮肟酯类光引发剂的感光性组合物及其应用 A diphenyl sulfide ketoxime ester photoinitiator comprises a photosensitive composition and Applications
11/30/2011	CN101846888B 曝光机台、阵列基板、图案化薄膜、光刻胶层及形成方法 Exposure machine, the array substrate, a patterned film, and method of forming the photoresist layer
11/30/2011	CN101727014B 控制特征尺寸的光刻方法及光刻系统 Lithographic feature size control method and lithography system
11/30/2011	CN101702051B 一种投影光刻物镜中的镜片倾斜微调机构 A projection lithography objective lens tilt in fine-tuning mechanism
11/30/2011	CN101615570B 真空处理装置 Vacuum processing apparatus
11/30/2011	CN101614967B 用于光学元件的更换设备 Replacement of equipment for optical elements
11/30/2011	CN101598907B 衬底台、光刻设备和器件制造方法 Substrate table, lithographic apparatus and device manufacturing method
11/30/2011	CN101592874B 降低天线效应的光刻方法 Antenna effect of reducing the lithographic method
11/30/2011	CN101587304B 图形转移方法 Pattern transfer method
11/30/2011	CN101566801B 防止镜片碰撞的方法及装置 Prevent the lens from collision method and apparatus
11/30/2011	CN101566792B 彩色滤光片之重工流程 Heavy flow of color filters
11/30/2011	CN101561524B 彩色滤光片及其制造方法 A color filter and manufacturing method thereof
11/30/2011	CN101529339B 低蚀刻性光刻胶清洗剂及其清洗方法 Low etch photoresist cleaning agent and cleaning method
11/30/2011	CN101498897B 边缘曝光装置及其控制方法 Edge exposure apparatus and control method
11/30/2011	CN101470351B 一种防静电柔性固体感光树脂版及其制备方法 An electrophotographic photosensitive resin plate flexible solid defense and its preparation method
11/30/2011	CN101441431B 全息光栅制作中实时监测曝光量的方法 Real-time monitoring method of making the exposure holographic gratings
11/30/2011	CN101441414B 柔性感光树脂版的生产工艺 Flexible photosensitive resin version of the production process
11/30/2011	CN101424881B 光刻投射装置 Lithographic projection apparatus
11/30/2011	CN101356475B 光固化性·热固化性阻焊剂组合物及使用其的印刷电路板 · The photo-curable thermosetting solder resist composition and a printed circuit board using thereof
11/30/2011	CN101329513B 双扫描式硅片调焦调平测量装置及系统 Dual scanning wafers focus leveling measurement device and system
11/30/2011	CN101315520B 一种pcb油墨组合物、其制法、应用和印制电路板 One kind pcb ink composition, its production method, application, and printed circuit board
11/30/2011	CN101311831B 用于凹球面器件旋涂光刻胶的辅助装置 Auxiliary devices for concave spherical device photoresist spin coating
11/30/2011	CN101295145B 用水蒸汽和稀释气体增强的氢灰化 Diluting with water vapor and hydrogen gas enhanced ashing
11/30/2011	CN101241309B 利用间距偏移量校准次纳米关键尺寸的方法 The use of sub-nanometer spacing offset calibration method for critical dimension
11/30/2011	CN101206405B 化学放大型抗蚀剂组合物 Chemically amplified resist composition
11/30/2011	CN101185027B 接枝图案形成方法和导电图形成方法 Graft pattern forming method and the conductive pattern forming method
11/30/2011	CN101126900B 一种基于金属局域化效应的光刻方法 A lithographic method based on metal localization effect
11/30/2011	CN101124519B 喷墨记录头、它的制备方法和喷墨记录头用组合物 Ink jet recording head, its preparation method and composition for ink jet recording head
11/30/2011	CN101055431B 图像形成方法和装置 The image forming method and apparatus
11/30/2011	CN101006393B 碱性显影型感光性树脂组合物、带有使用它形成的液晶分割取向控制突起的基板和滤色器、以及液晶显示装置 Alkali-developable photosensitive resin composition, which is formed with a split liquid crystal alignment control projection and a color filter substrate, and a liquid crystal display device
11/29/2011	USRE42980 Method for applying a resist layer, uses of adhesive materials, and adhesive materials and resist layer
11/29/2011	US8068213 Photomask, method of lithography, and method for manufacturing the photomask
11/29/2011	US8067148 Pattern forming method
11/29/2011	US8067147 Removable pellicle for immersion lithography
11/29/2011	US8067146 coating a photoresist film over substrates having undercoatings, forming overcoatings comprising pattern hardening films and exposing and development by immersion lithography
11/29/2011	US8067145 Developing solution and method for producing lithography printing plate
11/29/2011	US8066930 Forming a layer on a substrate
11/29/2011	US8066819 using water-free, gaseous sulfur trioxide as an agent to remove various organic coatings, films, layers and residues from the surface of a substrate such as semiconductor and non-semiconductor devices and displays so that it is completely removed by subsequent chemical or physical treatment
11/24/2011	WO2011146548A1 Lithographic printing plate precursors and a method of providing a lithographic printing plate
11/24/2011	WO2011146142A1 Synthesis of nanopeapods by galvanic displacement of segmented nanowires
11/24/2011	WO2011145750A1 Photosensitive resin composition, photosensitive film, rib pattern formation method, hollow structure and formation method for same, and electronic component

1 ... 197 198 199 200 201 202 203 204 205 206 207 208 209 210 211 212 213 214 215 216 217 ... 1272