G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2011
11/03/2011	US20110267714 Novel compound, polymerizable composition, color filter, and method of producing the same, solid-state imaging device, and planographic printing plate precursor
11/03/2011	US20110267591 Apparatus for Method for Immersion Lithography
11/03/2011	DE102010028496A1 Alignment device for positioning and/or adjustment of mirror position sensor in projection exposure system for microlithography, has evaluation unit comparing image of mirror position sensor captured by camera with reference image
11/03/2011	CA2794720A1 Force curve analysis method for planar object leveling
11/02/2011	EP2383613A2 Cleaning apparatus and cleaning method
11/02/2011	EP2383612A1 Lithographic printing plate precursor and plate making method thereof
11/02/2011	EP2383611A2 Photoacid generators and photoresists comprising same
11/02/2011	EP2382510A1 Illumination system for microlithography
11/02/2011	EP2382070A2 Method for making and decorating concrete structures
11/02/2011	EP2238513B1 Illumination method
11/02/2011	EP2005251B1 Device and method of controlling a device for microstructuring a storage medium
11/02/2011	EP1709488B1 Method of forming photosensitive printing sleeves
11/02/2011	EP1628158B1 Photosensitive structure for flexographic printing
11/02/2011	EP1511632B1 Method and device for transferring a pattern from a stamp to a substrate
11/02/2011	EP1099140B1 Maskless photolithography system
11/02/2011	CN1900828B Exposure apparatus, setting method, exposure method and manufacturing method of components
11/02/2011	CN1802609B Developer composition for resists and method for formation of resist pattern
11/02/2011	CN1624588B Immersion lithographic system and method of manufacturing semiconductor device
11/02/2011	CN102231051A Pneumatic automatic focusing device and method of photoetching machine
11/02/2011	CN102231050A Method for improving process efficiency of photoetching machine
11/02/2011	CN102231049A Large-area projection lithography system and alignment method thereof
11/02/2011	CN102231048A Method for detecting wave aberration of projection objective on basis of self-centering of space images
11/02/2011	CN102231047A Ultraviolet light curing device and alarm method thereof
11/02/2011	CN102231046A Grating moire fringe focal plane measuring method
11/02/2011	CN102231045A Photoetching method and semiconductor device
11/02/2011	CN101916045B Free-form surface lens for quadripole uniform illumination
11/02/2011	CN101738874B Method for simulating photoresist development
11/02/2011	CN101676805B Lithographic apparatus and device manufacturing method
11/02/2011	CN101646978B Photosensitive resin composition
11/02/2011	CN101625455B Projection optical system, exposure device as well as method for producing the device
11/02/2011	CN101384969B Processing liquid for resist substrate and method of processing resist substrate using the same
11/02/2011	CN101320136B Polarization conversion element, lighting optical device, exposure system, and exposure method
11/02/2011	CN101283492B Method and apparatus for driving semiconductor lasers, and method and apparatus for deriving drive current patterns for semiconductor lasers
11/02/2011	CN101213490B 感光性树脂组合物 The photosensitive resin composition
11/02/2011	CN101201544B Semiconductor photolithography method
11/02/2011	CN101183216B Photosensitive composition
11/02/2011	CN101145513B Method for forming fine pattern of semiconductor device
11/02/2011	CN101135842B Method for copying nano autogram formwork
11/02/2011	CN101114123B Photo-setting property composition and color filter using the composition
11/02/2011	CN101065709B Process for producing resist pattern and conductor pattern
11/02/2011	CN101046624B Pattern defect detection device, pattern defect detection method and manufacturing method for photomask
11/02/2011	CN101031997B Measurement method, exposure method and device manufacturing method
11/01/2011	US8049188 Method of cleaning a surface region covered with contaminant or undesirable material
11/01/2011	US8049042 Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer
11/01/2011	US8048617 Method for manufacturing patterned thin-film layer
11/01/2011	US8048616 Double patterning strategy for contact hole and trench in photolithography
11/01/2011	US8048615 Silicon-containing resist underlayer coating forming composition for forming photo-crosslinking cured resist underlayer coating
11/01/2011	US8048614 Semiconductor integrated circuit device fabrication method
11/01/2011	US8048613 Alkali development-type solder resist, cured product thereof, and printed wiring board prepared by using the same
11/01/2011	US8048612 Polymer and chemically amplified resist composition comprising the same
11/01/2011	US8048611 Polyorganosiloxane, resin composition, and patterning process
11/01/2011	US8048610 Sulfonium salt-containing polymer, resist composition, and patterning process
11/01/2011	US8048609 Radiation-sensitive compositions and elements containing poly(vinyl hydroxyaryl carboxylic acid ester)s
11/01/2011	US8048608 Laser marking
11/01/2011	US8048607 Compound having polymethine-chain structure, image forming material, planographic printing plate precursor, and image forming method using the same, method of making planographic printing plate, and planographic printing method
11/01/2011	US8048606 Imaging methods
11/01/2011	US8048605 Ink contains a binder and ammonium octamolybdate; melt-extrudable, forming polymer film, irradiation with laser light to form images; fire-retardant, smoke-suppressors, tamper-proof labels
11/01/2011	US8048604 Hydrofluoroalkanesulfonic acids and salts from fluorovinyl ethers
11/01/2011	US8048498 Compositions and processes for preparing color filter elements using vanadium catalysts
11/01/2011	US8047828 Imprint apparatus, imprint method, and mold for imprint
11/01/2011	US8047023 Method for producing titania-doped fused silica glass
10/2011
10/27/2011	WO2011133680A2 Novel dual-tone resist formulations and methods
10/27/2011	WO2011133663A1 Functionalizing biosensors using a multiplexed dip pen array
10/27/2011	WO2011132764A1 Pattern forming method, chemical amplification resist composition and resist film
10/27/2011	WO2011132641A1 Composition for formation of lithographic resist underlayer film which contains resin containing polyimide structure
10/27/2011	WO2011131431A1 Collector mirror assembly and method for producing extreme ultraviolet radiation
10/27/2011	WO2011131390A1 Method and apparatus for loading a substrate
10/27/2011	WO2011131289A1 Imaging optics, and a projection exposure apparatus for microlithography having such an imaging optics
10/27/2011	WO2011131121A1 Gumming device and method
10/27/2011	WO2011094672A3 Nanoimprint lithography processes for forming nanoparticles
10/27/2011	WO2011081323A3 Composition for the bottom layer of a photoresist, and method using same to manufacture semiconductor device
10/27/2011	WO2011081316A3 Composition for the bottom layer of a resist, and method using same to manufacture a semiconductor integrated circuit device
10/27/2011	US20110262872 Method of forming resist pattern and resist composition
10/27/2011	US20110262871 Novel tarc material for immersion watermark reduction
10/27/2011	US20110262870 Purge ring with split baffles for photonic thermal processing systems
10/27/2011	US20110262869 Method of aligning photomask with base material and method of manufacturing printed circuit board
10/27/2011	US20110262868 Method of detecting alignment mark and method of manufacturing printed circuit board
10/27/2011	US20110262867 Method of creating an evaluation map, system, method of manufacturing a semiconductor device and computer program product
10/27/2011	US20110262866 Exposure apparatus and device manufacturing method
10/27/2011	US20110262865 Radiation-sensitive resin composition and polymer
10/27/2011	US20110262864 Method of forming resist pattern and negative tone-development resist composition
10/27/2011	US20110262863 Near-infrared absorptive layer-forming composition and multilayer film
10/27/2011	US20110262862 Near-infrared absorptive layer-forming composition and multilayer film
10/27/2011	US20110262861 Photosensitive composition
10/27/2011	US20110262860 Novel dual-tone resist formulations and methods
10/27/2011	US20110262859 Upper layer-forming composition and resist patterning method
10/27/2011	US20110262849 Photomask and pattern formation method using the same
10/27/2011	US20110262848 Manufacturing method for exposure mask, generating method for mask substrate information, mask substrate, exposure mask, manufacturing method for semiconductor device and server
10/27/2011	US20110262847 Mask blank providing system, mask blank providing method, mask blank transparent substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method
10/27/2011	US20110262846 Methods of manufacturing a mask blank substrate, a mask blank, a photomask, and a semiconductor device
10/27/2011	US20110262845 Method for modulating light of photorefractive composition without external bias voltage
10/27/2011	US20110261444 Catadioptric Projection Objective With Mirror Group
10/27/2011	US20110261345 Exposure apparatus and device manufacturing method
10/27/2011	US20110261343 Reflective optical element, optical system euv and lithography device
10/27/2011	US20110261334 Apparatus for Method for Immersion Lithography
10/27/2011	US20110261333 Exposure apparatus, device manufacturing method using same, and gas supply device
10/27/2011	US20110261331 Exposure apparatus and device manufacturing method
10/27/2011	US20110261330 Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure apparatus and exposure method, device manufacturing method
10/27/2011	US20110260200 Method of fabricating non-metal led substrate and non-metal led substrate and method of fabricating led device using the non-metal led substrate and led device with the non-metal led substrate
10/27/2011	CA2794418A1 Functionalizing biosensors using a multiplexed dip pen array

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