G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2011
12/28/2011	CN101322073B 正型感光性树脂组合物及使用该组合物的半导体器件和显示器 The positive-type photosensitive resin composition and use of the composition of a semiconductor device and a display
12/28/2011	CN101263429B 使用膜形成组合物的图案形成方法 Film-forming composition using a pattern forming method
12/28/2011	CN101256361B 光阻剂 Photoresist
12/28/2011	CN101255233B 含硅高分子化合物及其制造方法、耐热性树脂组合物及耐热性薄膜 Silicon-containing polymer compound and its manufacturing method, heat-resistant resin composition and a heat-resistant film
12/28/2011	CN101216672B 流体喷射装置 The fluid ejection device
12/28/2011	CN101206394B 曝光掩模及使用该曝光掩模制造半导体器件的方法 Exposure mask and method of using the exposure mask manufacturing a semiconductor device
12/28/2011	CN101204868B 用于处理可重复成像的印版的方法 The method of treatment may be repeated for the imaging of a printing plate
12/28/2011	CN101142528B 感光性树脂组合物、印刷电路板以及半导体封装基板 The photosensitive resin composition, a printed circuit board and a semiconductor package substrate
12/28/2011	CN101042543B 用于清洗抗蚀剂脱膜剂的化学清洗组合物 The resist remover used for cleaning chemical cleaning compositions
12/27/2011	US8085381 Cleanup method for optics in immersion lithography using sonic device
12/27/2011	US8084193 Self-segregating multilayer imaging stack with built-in antireflective properties
12/27/2011	US8084192 Method for forming resist pattern
12/27/2011	US8084189 Method of imaging and developing positive-working imageable elements
12/27/2011	US8084188 Radiation-sensitive resin composition
12/27/2011	US8084187 Resist composition and pattern forming method using the same
12/27/2011	US8084186 Hardmask process for forming a reverse tone image using polysilazane
12/27/2011	US8084185 Substrate planarization with imprint materials and processes
12/27/2011	US8084184 Composition for removing photoresist and method of manufacturing an array substrate using the same
12/27/2011	US8084183 Resist composition for electron beam, X-ray, or EUV, and pattern-forming method using the same
12/27/2011	US8084182 On-press developable elements and methods of use
12/27/2011	US8082976 Method and apparatus for production of a cast component
12/22/2011	WO2011159929A1 Systems and methods for reducing overhang on electroplated surfaces of printed circuit boards
12/22/2011	WO2011159876A2 Process and materials for making contained layers and devices made with same
12/22/2011	WO2011159081A2 Method for forming pattern, and pattern structure
12/22/2011	WO2011158912A1 Illuminating optical system, expose device, and device production method
12/22/2011	WO2011158817A1 Resist composition, resist pattern formation method, polymeric compound, and compound
12/22/2011	WO2011158760A1 Exposure apparatus
12/22/2011	WO2011158714A1 Roller mold manufacturing device and manufacturing method
12/22/2011	WO2011158687A1 Pattern formation method, and radiation-sensitive resin composition
12/22/2011	WO2011158630A1 Photomask, and laser annealing device and exposure device which use same
12/22/2011	WO2011158106A1 Plate for producing stereotype and method for producing said plate for producing stereotype
12/22/2011	WO2011157684A1 Optical system
12/22/2011	WO2011157601A2 Illumination optical system for microlithography and projection exposure system with an illumination optical system of this type
12/22/2011	WO2011157407A1 Apparatus and method for the locally resolved measurement of a radiation distribution produced using a lithography mask
12/22/2011	WO2011113704A3 Photorepeater for extreme-ultraviolet lithography
12/22/2011	WO2011056358A3 Lithographic printing plate precursors
12/22/2011	WO2010147243A3 Exposure apparatus, exposure method and device manufacturing method
12/22/2011	WO2009002644A8 Methods of making hierarchical articles
12/22/2011	US20110312164 Forming an electrode having reduced corrosion and water decomposition on surface using a custom oxide layer
12/22/2011	US20110311921 Composition For Stripping And Cleaning And Use Thereof
12/22/2011	US20110311920 Naphthalene derivative, resist bottom layer material, resist bottom layer forming method, and patterning process
12/22/2011	US20110311919 Method for fabricating an image sensor device
12/22/2011	US20110311918 Production method of liquid crystal display device and liquid crystal display device
12/22/2011	US20110311917 Resist composition for immersion exposure and method of forming resist pattern using the same
12/22/2011	US20110311916 Thermally ablatable lithographic printing plate precursors
12/22/2011	US20110311915 Photosensitive resist underlayer film forming composition
12/22/2011	US20110311914 Resist composition for negative-tone development and pattern forming method using the same
12/22/2011	US20110311913 Positive resist composition and method of forming resist pattern
12/22/2011	US20110311912 Positive resist composition and method of forming resist pattern
12/22/2011	US20110311911 Method of proving authenticity, signal conversion method, polymer welding method, method of producing lithographic printing plate, ink for printing, toner, and heat ray-shielding material, each using naphthalocyanine compound, and method of producing naphthalocyanine compound
12/22/2011	US20110311906 Photopolymer compositions as printable formulations
12/22/2011	US20110311905 Method for producing holographic photopolymers on polymer films
12/22/2011	US20110311788 Silphenylene-containing photocurable composition, pattern formation method using same, and optical semiconductor element obtained using the method
12/22/2011	US20110311781 Method of patterning photosensitive material on a substrate containing a latent acid generator
12/22/2011	US20110311763 Method for producing two-dimensionally patterned carbon nanotube and two-dimensionally patterned carbon nanotube
12/22/2011	US20110310492 Mask used for fabrication of microlens, and fabrication method for microlens using the mask
12/22/2011	US20110310487 Optical body, wall member, fitting, and solar shading device
12/22/2011	US20110310375 Illumination optical system, exposure apparatus and device manufacturing method
12/22/2011	US20110310368 Method and system for thermally conditioning an optical element
12/22/2011	US20110310367 Lithographic apparatus and device manufacturing method
12/22/2011	US20110310338 Production method of liquid crystal display device and liquid crystal display device
12/22/2011	US20110308942 Microelectrode array sensor for detection of heavy metals in aqueous solutions
12/22/2011	US20110308846 Conductive film and method for producing the same
12/22/2011	DE102010044970A1 Cleaning module for cleaning multi-layer mirror of extreme UV projection exposure system of semiconductor lithography plant, has heating element for heating hydrogen at temperature below dissociation temperature of hydrogen
12/22/2011	DE102010030261A1 Vorrichtung sowie Verfahren zum ortsaufgelösten Vermessen einer von einer Lithographie-Maske erzeugten Strahlungsverteilung Apparatus and method for spatially resolved measurement of a radiation distribution generated by a lithography mask
12/21/2011	EP2397905A1 Magnetic holding device and method for holding a substrate
12/21/2011	EP2397904A1 Treatment of synthetic quartz glass substrate
12/21/2011	EP2397903A2 Photoactive compound and photosensitive resin composition containing the same
12/21/2011	EP2397902A1 Positive photosensitive resin composition, cured film using same, protective film, insulating film, semiconductor device, and display device
12/21/2011	EP2397901A1 Resist pattern swelling material, and method for patterning using same
12/21/2011	EP2397899A1 Mask holding device
12/21/2011	EP2397508A1 Silphenylene-containing photocurable composition, pattern formation method using same, and optical semiconductor element obtained using the method
12/21/2011	EP2397232A1 Coating method and coating apparatus
12/21/2011	EP2396794A1 Multilayer mirror and lithographic apparatus
12/21/2011	EP2396703A1 A hardmask process for forming a reverse tone image using polysilazane
12/21/2011	EP2396702A1 Developer waste reuse
12/21/2011	EP2396701A1 Multi-table lithographic systems
12/21/2011	EP2396700A1 Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type
12/21/2011	EP2396359A1 Photo polymer compositions as printable formulations
12/21/2011	EP2396358A1 Method for producing holographic photopolymers on polymer films
12/21/2011	EP2396299A1 Liquid radiation curable resins for additive fabrication comprising a triaryl sulfonium borate cationic photoinitiator
12/21/2011	EP2396173A1 Negative-working imageable elements
12/21/2011	EP1761823B1 Method of forming plated product using negative photoresist composition
12/21/2011	EP1675164B1 Multilayer film reflection mirror, production method for multilayer film reflection mirror, and exposure system
12/21/2011	EP1554634B1 Lithography system
12/21/2011	CN1989455B 肟衍生物和它们作为潜伏酸的用途 Oxime derivatives and their use as latent acid
12/21/2011	CN1975577B 光敏组合物 Photosensitive composition
12/21/2011	CN1936705B 光致抗蚀剂组合物及利用它制备薄膜晶体管基底的方法 The photoresist compositions and methods which use a thin film transistor substrate prepared
12/21/2011	CN1922727B 半导体器件及ic卡、ic标签、rfid、转发器、票据、证券、护照、电子装置、包和外衣的制造方法 Method for manufacturing semiconductor devices and ic cards, ic tags, rfid, transponder, notes, securities, passports, electronic devices, packages and outerwear
12/21/2011	CN1892426B 光刻胶组合物,薄膜图案形成方法、tft阵列面板制造方法 Photoresist composition, a thin film pattern forming method, tft array panel manufacturing method
12/21/2011	CN1841213B 显影方法及半导体装置的制造方法 The method of manufacturing a semiconductor device and a developing method
12/21/2011	CN102292676A 使用复杂二维交织方案的图像读取和写入 The use of complex two-dimensional interleaving scheme to read and write the image
12/21/2011	CN102292675A 正型感光性树脂组合物 The positive photosensitive resin composition
12/21/2011	CN102292674A 光纤、其制备方法及装置 Optical fiber, its preparation method and apparatus
12/21/2011	CN102292659A 减振器件 Shock absorber parts
12/21/2011	CN102290365A 基板保持装置、具备其之曝光装置及方法、元件制造方法 Substrate holding apparatus, which includes the exposure apparatus and method, device manufacturing method
12/21/2011	CN102290364A 基板保持装置、具备其之曝光装置、元件制造方法 Substrate holding apparatus, which includes the exposure apparatus, device manufacturing method
12/21/2011	CN102290129A 导电膜及其制备方法 Conductive film and its preparation method
12/21/2011	CN102289160A 光致蚀刻剂用显影液及其制备方法与应用 Photo-etching agent with the developer and its preparation method and application
12/21/2011	CN102289159A 用于除去光致抗蚀剂的组合物及利用其形成半导体图案的方法 Removing the photoresist composition and by the method for forming a semiconductor pattern which is

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