| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 12/08/2011 | DE102006027356B4 Lichtempfindliche Zusammensetzung, insbesondere Photolack A photosensitive composition, in particular photoresist |
| 12/07/2011 | EP2393106A1 Curable composition for transfer material and urea compound containing (meth)acryloyl group |
| 12/07/2011 | EP2392971A1 Surface treatment method and surface treatment apparatus, exposure method and exposure apparatus, and device manufacturing method |
| 12/07/2011 | EP2392970A2 Method and apparatus for controlling a lithographic apparatus |
| 12/07/2011 | EP2392969A2 Patterned inorganic layers, radiation based patterning compositions and corresponding methods |
| 12/07/2011 | EP2392621A2 Pigment dispersion composition, red colored composition, colored curable composition, color filter for a solid state imaging device and method for producing the same, and solid state imaging device |
| 12/07/2011 | EP2391924A2 Process for producing a photomask on a photopolymeric surface |
| 12/07/2011 | EP1720199B1 Optical system, exposure system, and exposure method |
| 12/07/2011 | CN202067075U 一种减压干燥设备 One kind of vacuum drying equipment |
| 12/07/2011 | CN202067074U 可循环的显影系统 The developing system may cycle |
| 12/07/2011 | CN202067073U 可自动调平的光刻平台 Automatic leveling lithography platform |
| 12/07/2011 | CN1991593B 支持机构及使用支持机构的掩模载台 Support organizations and agencies that support the mask stage |
| 12/07/2011 | CN1979344B 使用曝光掩模的曝光方法 Exposure method using an exposure mask |
| 12/07/2011 | CN1955846B 适合于酸生成剂的盐和含有该盐的化学放大型抗蚀剂组合物 Suitable salt of an acid generating agent and a chemically amplified resist composition containing the salt |
| 12/07/2011 | CN1940719B 灰调掩模及其制造方法 Gray tone mask and its manufacturing method |
| 12/07/2011 | CN1936703B 灰调掩模及其制造方法 Gray tone mask and its manufacturing method |
| 12/07/2011 | CN1849560B 感光性树脂组合物及使用该组合物的图案形成方法 The photosensitive resin composition and the composition using a pattern forming method |
| 12/07/2011 | CN1739063B 来自有多个环氧部分的小芯分子的减反射底涂层 From a small part of the core molecule more epoxy antireflective undercoat |
| 12/07/2011 | CN1637594B 曝光掩模和使用该曝光掩模的曝光方法 Exposure mask and using the exposure mask exposure method |
| 12/07/2011 | CN102272885A 具有静电放电保护结构的光刻掩模版 Photolithographic mask has ESD protection structures |
| 12/07/2011 | CN102272680A 显影装置、显影液的处理方法、印刷版的制造方法以及过滤装置 The developing device, developer processing method, and a method for producing a printing plate filter means |
| 12/07/2011 | CN102272679A 控制柔版印刷板的表面粗糙度的方法 Surface roughness of control flexographic printing plates |
| 12/07/2011 | CN102272678A 检验方法和设备、光刻设备、光刻处理单元和器件制造方法 Inspection method and apparatus, lithographic apparatus and a lithographic device manufacturing method of the processing unit |
| 12/07/2011 | CN102272677A 光固化性树脂组合物、其干膜及固化物以及使用它们的印刷电路板 The photocurable resin composition and the use of dry film and cured product thereof a printed circuit board |
| 12/07/2011 | CN102272676A 感光性树脂组合物、以及使用了该组合物的感光性元件、抗蚀剂图案的形成方法和印刷线路板的制造方法 The photosensitive resin composition, and the use of the composition of the photosensitive element, resist pattern forming method and printed wiring board manufacturing method |
| 12/07/2011 | CN102272675A 使用双重构图的光致抗蚀剂成像方法 Using double patterned photoresist image forming method |
| 12/07/2011 | CN102272636A 构造尤其用于微光刻投射曝光系统的分面镜的个体反射镜 Configured particularly for microlithography projection exposure system an individual mirror facet mirror |
| 12/07/2011 | CN102272227A 可辐射固化树脂组合物以及使用这种组合物的快速三维成像方法 The radiation curable resin composition and the use of such compositions, three-dimensional imaging method of rapid |
| 12/07/2011 | CN102269940A 一种光刻胶烘焙装置 A photoresist baking device |
| 12/07/2011 | CN102269939A 显影方法 Developing methods |
| 12/07/2011 | CN102269938A 基于空间像自适应降噪的投影物镜波像差检测方法 Projection lens aberration detection methods like adaptive noise reduction based on space |
| 12/07/2011 | CN102269937A 光刻机投影物镜波像差在线检测装置及方法 Lithography projection lens aberration line detection device and method |
| 12/07/2011 | CN102269936A 一种仿真飞蛾复眼光学减反射结构图案的方法和系统 An optical compound eyes of moths simulation method and system for anti-reflection structure pattern |
| 12/07/2011 | CN102269935A 位移装置、光刻设备以及定位方法 Displacement means, lithographic apparatus and a positioning method |
| 12/07/2011 | CN102269934A 曝光装置 Exposure device |
| 12/07/2011 | CN102269933A 光刻胶喷嘴更换辅助定位半自动固定装置 Semi-automatic nozzle replacement photoresist assisted positioning fixtures |
| 12/07/2011 | CN102269932A 放射线敏感性树脂组合物、固化膜、固化膜的形成方法以及显示元件 The radiation-sensitive resin composition, a cured film, the cured film forming method and a display device |
| 12/07/2011 | CN102269931A 光生酸剂、其制备方法以及含有该光生酸剂的抗蚀剂组合物 Photoacid generator, their preparation and resist composition containing the photo-acid agent |
| 12/07/2011 | CN102269930A 一种用于整片晶圆纳米压印自适应承片台 An entire wafer chip nanoimprint adaptive bearing units |
| 12/07/2011 | CN102269929A 图案化的无机层、基于辐射的图案化组合物和相应方法 Patterning the inorganic layer, radiation based patterning compositions and corresponding methods |
| 12/07/2011 | CN102269928A 压印装置以及利用该压印装置的压印方法 Imprint imprint apparatus and a method utilizing the marking device |
| 12/07/2011 | CN102269927A 防伪微结构颜料及其制造工艺 Security pigments microstructure and its manufacturing process |
| 12/07/2011 | CN102269924A 基于Abbe矢量成像模型的非理想光刻系统ATTPSM的优化方法 Abbe lithography systems based on non-ideal imaging model ATTPSM vector optimization methods |
| 12/07/2011 | CN102269834A 一种彩色滤光片及其制造方法 A color filter and manufacturing method thereof |
| 12/07/2011 | CN102269833A 光谱装置、检测装置以及光谱装置的制造方法 Spectroscopy apparatus manufacturing method, the detecting means and the spectral means |
| 12/07/2011 | CN102269829A 微透镜模辊及其制作方法 Microlens mold roll and production methods |
| 12/07/2011 | CN101872120B 一种图形化石墨烯的制备方法 Preparation method of patterned graphene |
| 12/07/2011 | CN101762975B 巴比妥酸类化合物作为添加剂的热敏ctp感热成像液 Barbituric acids as additives thermal ctp thermal imaging solution |
| 12/07/2011 | CN101634813B 改进照明系统、曝光装置和形成线/间隔电路图形的方法 Improved illumination system, an exposure apparatus and a forming line / space pattern was the method |
| 12/07/2011 | CN101593673B 制造平板显示器所使用的基板处理装置和方法 Substrate processing apparatus and method for flat panel displays used |
| 12/07/2011 | CN101510059B 曝光装置和曝光方法以及器件制造方法 Exposure apparatus and exposure method, and device manufacturing method |
| 12/07/2011 | CN101493535B 连续性微透镜阵列的制造方法 The method of manufacturing a microlens array Continuity |
| 12/07/2011 | CN101479667B 修正/修复光刻投影物镜的方法 Fix / repair method lithographic projection lens |
| 12/07/2011 | CN101458456B 套刻精度的控制方法和装置 Overlay control method and apparatus |
| 12/07/2011 | CN101452225B 光刻胶掩模图形的显影方法 Photoresist mask pattern developing method |
| 12/07/2011 | CN101452207B 一种纳米压印光刻机 A nano-imprint lithography |
| 12/07/2011 | CN101441410B 一种制作纳米级图形的方法 A method of producing nanoscale patterns |
| 12/07/2011 | CN101441372B 液晶显示器的静电放电保护装置及其制造方法 A liquid crystal display device and manufacturing method of electrostatic discharge protection |
| 12/07/2011 | CN101403856B 组合物、干膜、固化物和印刷线路板 Composition, dry film, cured and printed wiring board |
| 12/07/2011 | CN101401036B 感光性树脂层压体 The photosensitive resin laminate |
| 12/07/2011 | CN101398561B 彩色滤光片基板及其制造方法以及应用它的液晶显示面板 A color filter substrate and its manufacturing method, and its application liquid crystal display panel |
| 12/07/2011 | CN101373339B 一种厚膜光刻胶的清洗剂 A thick film photoresist cleaning agent |
| 12/07/2011 | CN101223479B 正型抗蚀剂组合物的制备方法、正型抗蚀剂组合物和抗蚀图案形成方法 Prepared positive resist composition, a positive resist composition and a resist pattern forming method |
| 12/07/2011 | CN101183215B 黑色糊剂组合物、黑色矩阵图案形成方法、黑色矩阵图案 Black paste composition, the black matrix pattern forming method of the black matrix pattern |
| 12/07/2011 | CN101126905B 具有对焦机构的直写光刻装置 Focus mechanism has direct-write lithography system |
| 12/07/2011 | CN101089734B 光刻胶残留物的清洗方法 The method of cleaning photoresist residue |
| 12/07/2011 | CN101086630B 具有用于感测其姿态的设备的烘烤单元及其使用方法 Baking unit and method of use for sensing its posture having a device |
| 12/07/2011 | CN101034254B 用于增强的光刻图案化的方法和系统 For enhancing lithographic patterning method and system |
| 12/07/2011 | CN101018819B 制备光敏树脂的固化产物的方法 The method of producing a photosensitive resin cured product of |
| 12/06/2011 | US8072700 Optical apparatus for use in photolithography |
| 12/06/2011 | US8072615 Alignment method, alignment system, and product with alignment mark |
| 12/06/2011 | US8072576 Exposure apparatus and method for producing device |
| 12/06/2011 | US8071279 Plane waves to control critical dimension |
| 12/06/2011 | US8071277 Method and system for fabricating three-dimensional structures with sub-micron and micron features |
| 12/06/2011 | US8071276 Method for making alignment mark on substrate |
| 12/06/2011 | US8071275 Methods for planarizing unevenness on surface of wafer photoresist layer and wafers produced by the methods |
| 12/06/2011 | US8071274 Plate includes on substrate a photosensitive layer developable with ink or a fountain solution; hardening upon exposure to radiation; white light stability; forming visible images; increase hydrophobic of substrate |
| 12/06/2011 | US8071273 Polyimide precursor, resin composition comprising the polyimide precursor, pattern forming method using the resin composition, and articles produced by using the resin composition |
| 12/06/2011 | US8071272 Method of forming patterns |
| 12/06/2011 | US8071271 Conductive film and method for producing the same |
| 12/06/2011 | US8071270 Polyhydric compound and chemically amplified resist composition containing the same |
| 12/06/2011 | US8071264 Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask |
| 12/06/2011 | US8070919 Method for preparing one dimensional spin photonic crystal device and one dimensional spin photonic crystal device prepared by the same |
| 12/01/2011 | WO2011149803A1 Replication method |
| 12/01/2011 | WO2011149035A1 Pattern forming method and actinic-ray- or radiation-sensitive resin composition |
| 12/01/2011 | WO2011149029A1 Insulation pattern forming method and insulation pattern forming material for damascene process |
| 12/01/2011 | WO2011148018A1 Method for moulding the surfaces of curable materials |
| 12/01/2011 | WO2011147948A1 Nanoimprint lithography |
| 12/01/2011 | WO2011147775A1 Apparatus and method for electrostatic discharge (esd) reduction |
| 12/01/2011 | WO2011147658A1 Optical system for a microlithographic projection apparatus |
| 12/01/2011 | WO2011147628A1 Multilayer mirror |
| 12/01/2011 | WO2011147053A1 Active prospective intelligent monitoring method for liquid film and device thereof |
| 12/01/2011 | WO2011113591A3 Optical collector for collecting extreme ultraviolet radiation, method for operating such an optical collector, and euv source with such a collector |
| 12/01/2011 | WO2011101260A3 Sulfonamide-containing photoresist compositions and methods of use |
| 12/01/2011 | WO2011098604A3 Method and device for active wedge error compensation between two objects that can be positioned substantially parallel to each other |
| 12/01/2011 | WO2011092241A3 Mold for nanoprinting lithography, and methods for producing same |
| 12/01/2011 | US20110294243 Photoresist composition and method of forming photoresist pattern using the same |
| 12/01/2011 | US20110294076 Method for making patterned roller |
| 12/01/2011 | US20110294075 Patterning method |
| 12/01/2011 | US20110294074 Exposure apparatus and exposing method using the apparatus |