| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/11/2012 | CN102317863A Photoactive compound and photosensitive resin composition containing the same |
| 01/11/2012 | CN102317862A Photosensitive resin composition which is curable at a low temperature, and dry film produced using same |
| 01/11/2012 | CN102317861A Positive photosensitive resin composition, cured film using same, protective film, insulating film, semiconductor device, and display device |
| 01/11/2012 | CN102317337A Method for producing holographic photopolymers on polymer films |
| 01/11/2012 | CN102317336A Photo polymer compositions as printable formulations |
| 01/11/2012 | CN102317258A Sulfonium salt, photo-acid generator, and photosensitive resin composition |
| 01/11/2012 | CN102317075A Negative-working imageable elements |
| 01/11/2012 | CN102315749A Variable reluctance device, stage apparatus, lithographic apparatus and device manufacturing method |
| 01/11/2012 | CN102315316A Manufacture method for photovoltaic cell and semiconductor element |
| 01/11/2012 | CN102315091A Coating and developing apparatus and method |
| 01/11/2012 | CN102315090A Coating and developing apparatus |
| 01/11/2012 | CN102314102A Treatment of synthetic quartz glass substrate |
| 01/11/2012 | CN102314101A Cleaning composition for removing polyimide |
| 01/11/2012 | CN102314100A PS (Photoshop) version retouching paste containing dimethyl sulfate |
| 01/11/2012 | CN102314099A Method for removing photoresist layer on wafer |
| 01/11/2012 | CN102314098A Thermo-sensitive CTP (cytidine triphosphate) version developing solution and preparation method thereof |
| 01/11/2012 | CN102314097A Method of calibrating spatial position between spatial light modulator center and camera center |
| 01/11/2012 | CN102314096A Method for manufacturing a long micro lens array |
| 01/11/2012 | CN102314095A Adaptive centering wave aberration detection method of projection lens in mask aligner |
| 01/11/2012 | CN102314094A Optical system of mask aligner |
| 01/11/2012 | CN102314093A Local exposure apparatus, and local exposure method |
| 01/11/2012 | CN102314092A Position sensor and lithographic apparatus |
| 01/11/2012 | CN102314091A Lithography machine capable of adjusting size of lighting spot of alignment system |
| 01/11/2012 | CN102314090A Preparation method of CTCP (Client-to-Client Protocol) version |
| 01/11/2012 | CN102314089A Photo-curable coloring composition for color filter, color filter, method of producing color filter and liquid crystal display device |
| 01/11/2012 | CN102314088A Photosensitive resin composition and panel structure applied by same |
| 01/11/2012 | CN102314087A Diazo naphthoquinone type CTCP (Client-to-Client Protocol) coating solution and preparation method thereof |
| 01/11/2012 | CN102314086A Photosensitive resin composition for black resist, and light shielding film for color filter |
| 01/11/2012 | CN102314085A Photoresist and patterning process |
| 01/11/2012 | CN102314084A Light sensitization composition using p-toluenesulfonylhydrazide hydrazone compound and application of light sensitization composition |
| 01/11/2012 | CN102314083A Photosensitive composition adopting composite dissolution-resistant agent/dissolution inhibitor and application of same |
| 01/11/2012 | CN102314082A Method for manufacturing electronic grade synthetic quartz glass substrate |
| 01/11/2012 | CN102314081A Coating and developing apparatus and method |
| 01/11/2012 | CN102314080A Resin composition for laser engraving, relief printing plate precursor for laser engraving, process for producing relief printing plate and relief printing plate |
| 01/11/2012 | CN102314079A Resin composition for laser engraving, relief printing plate precursor for laser engraving and process for producing same, and relief printing plate and process for making same |
| 01/11/2012 | CN102314078A Photoetching method |
| 01/11/2012 | CN102314077A Method for performing planarization photoetching process on gate poly |
| 01/11/2012 | CN102314074A Mask plate and mask plate manufacturing method |
| 01/11/2012 | CN102314073A Photoetching plate and overlaying method thereof |
| 01/11/2012 | CN102313508A Light path alignment device of laser interferometer and method |
| 01/11/2012 | CN102311681A UV curing silver nanowire ink and its preparation method and application method |
| 01/11/2012 | CN102311529A Diazoresin, photosensitive resin composition and photosensitive film for screen plate |
| 01/11/2012 | CN102311371A Compound, polymer comprising the same and chemically amplified resist composition comprising the polymer |
| 01/11/2012 | CN102311344A Compound, polymer comprising the same and resist protective film composition comprising the polymer |
| 01/11/2012 | CN102311094A Method for producing nano fluid pathway with large area and available size base on SU-8 photosensitive resist |
| 01/11/2012 | CN102310063A Cleaning system for honeycomb-shaped plasma free radicals |
| 01/11/2012 | CN102024687B Method for improving gluing capacity |
| 01/11/2012 | CN101762977B Thermosensitive CTP thermolabile imaging liquid using luminol compound as additive |
| 01/11/2012 | CN101762976B Active etherate of pyrogallol acetonide resin as heat-sensitive CTP thermo-sensitive imaging liquid of dissolution inhibitor |
| 01/11/2012 | CN101750908B Developer solution component |
| 01/11/2012 | CN101697280B Photo-induced polymer holographic material mixed with nano-silicon dioxide and preparation method thereof |
| 01/11/2012 | CN101685271B Method for detecting wafer edge cleaning width of wafer |
| 01/11/2012 | CN101681124B Clamping device and object loading method |
| 01/11/2012 | CN101609267B 光刻设备 Lithography equipment |
| 01/11/2012 | CN101523290B High resolution imaging process using an in-situ image modifying layer |
| 01/11/2012 | CN101517493B Method for developing and sealing of lithographic printing plates |
| 01/11/2012 | CN101501574B Long length flexible circuits and method of making same |
| 01/11/2012 | CN101467102B Use of supercritical fluid to dry wafer and clean lens in immersion lithography |
| 01/11/2012 | CN101458451B Light path structure suitable for femtosecond laser two-photon mirco-nano processing system |
| 01/11/2012 | CN101414132B Developing apparatus |
| 01/11/2012 | CN101400706B Photocurable/thermosetting resin composition, cured product and printed wiring board |
| 01/11/2012 | CN101384959B Radiation curable resin composition and rapid three dimensional imaging process using the same |
| 01/11/2012 | CN101315523B Ploting device |
| 01/11/2012 | CN101303529B High viscosity coating liquid coating device of slit coating machine and coating method thereof |
| 01/11/2012 | CN101286003B Drum die structure and method of manufacture |
| 01/11/2012 | CN101281373B Apparatus for automatically cleaning carrying platform |
| 01/11/2012 | CN101281369B Photoresist composition and method for forming photoresist pattern using the same |
| 01/11/2012 | CN101271271B Positive photoresist |
| 01/11/2012 | CN101211113B Chemically amplified corrosion-resisting agent composition |
| 01/11/2012 | CN101192001B Welding-proof film forming method and photosensitive composition |
| 01/11/2012 | CN101097373B Mother glass for liquid crystal display and method of fabricating liquid crystal display using the same |
| 01/11/2012 | CN101004559B Method for enhancing adhesion force of graphics in photoetching procedure |
| 01/10/2012 | US8094425 Combination current sensor and relay |
| 01/10/2012 | US8094379 Optical arrangement of autofocus elements for use with immersion lithography |
| 01/10/2012 | US8094288 Lithographic apparatus and device manufacturing method |
| 01/10/2012 | US8094285 Method for manufacturing a reflection plate |
| 01/10/2012 | US8093159 Manufacturing method of semiconductor device, and semiconductor device |
| 01/10/2012 | US8092986 Exposure methods |
| 01/10/2012 | US8092985 Method of making a planographic printing plate |
| 01/10/2012 | US8092984 Lithographic printing plate having specific polymeric binders |
| 01/10/2012 | US8092983 Coating hydrophilic support with hydrophobic thermoplastic resin; photopolymerization using photoinitiator; exposure; heating; applyin gum solution to remove unexposed material |
| 01/10/2012 | US8092982 Photosensitive paste composition, barrier rib prepared using the composition and plasma display panel comprising the barrier rib |
| 01/10/2012 | US8092981 Negative photoresist composition and method of manufacturing array substrate using the same |
| 01/10/2012 | US8092980 Photosensitive element |
| 01/10/2012 | US8092979 Resist polymer and resist composition |
| 01/10/2012 | US8092978 Positive resist composition for electron beam, X-ray or EUV and pattern forming method using the same |
| 01/10/2012 | US8092977 additional resin contains an oxime sulfonate group, which is insoluble in an alkali developer and becomes soluble in alkali developer by acid generating from acid generator; use in ultramicrolithography; resolution, sensitivity, good defocus latitude, good pattern profile, line edge roughness |
| 01/10/2012 | US8092976 High resolution, reduced pattern falling, and good sensitivity and good dissolution contrast achieved even in EUV (extreme ultra violet) exposure, reduction in the line edge roughness |
| 01/10/2012 | US8092959 Means for transferring a pattern to an object |
| 01/10/2012 | US8092958 Irradiating the resist layer through a mask to expose an upper surface of the wafer |
| 01/10/2012 | US8092899 Method of activating a silicon surface for subsequent patterning of molecules onto said surface |
| 01/05/2012 | WO2012003051A1 Multi-layer compressible foam sheet and method of making the same |
| 01/05/2012 | WO2012003019A1 Polyurethane (meth) acrylates using modifield hydroxythiols |
| 01/05/2012 | WO2012002590A1 Compound having photosensitivity, polymer formed by polymerizing the compound, and production method thereof |
| 01/05/2012 | WO2012002519A1 Pattern forming method, chemical amplification resist composition and resist film |
| 01/05/2012 | WO2012002470A1 Radiation-sensitive resin composition, polymer, and compound |
| 01/05/2012 | WO2012002413A1 Composition for photocurable imprint, and method for formation of pattern using the composition |
| 01/05/2012 | WO2012002361A1 Fluorine-based surfactant, and coating composition and resist composition each using same |
| 01/05/2012 | WO2012002346A1 Chemical liquid for forming protective film for wafer pattern, method for preparing chemical liquid, and method for treating wafer |
| 01/05/2012 | WO2012002134A1 Photosensitive resin composition, photosensitive resin composition film, and semiconductor device using the photosensitive resin composition or the photosensitive resin composition film |