G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2011
10/06/2011	WO2011122705A1 Multibeam exposure scanning method and apparatus, and method of manufacturing printing plate
10/06/2011	WO2011122703A1 Multibeam exposure scanning method and apparatus, and method of manufacturing printing plate
10/06/2011	WO2011122590A1 Photoresist composition and resist pattern forming method
10/06/2011	WO2011122588A1 Radiation-sensitive resin composition and polymer
10/06/2011	WO2011122545A1 Laser-engravable flexographic printing plate precursor
10/06/2011	WO2011122473A1 Photosensitive composition and photosensitive lithographic printing plate material
10/06/2011	WO2011122378A1 Method for producing lithographic printing plate
10/06/2011	WO2011122354A2 Exposure apparatus, exchange method of object, exposure method, and device manufacturing method
10/06/2011	WO2011122336A1 Radiation-sensitive resin composition and pattern forming method
10/06/2011	WO2011122257A1 Uv irradiation device and inkjet printer
10/06/2011	WO2011122028A1 Photosensitive resin composition
10/06/2011	WO2011122027A1 Photo-curable thermosetting resin composition
10/06/2011	WO2011122025A1 Photocurable resin composition
10/06/2011	WO2011121960A1 Method for producing positive photosensitive resin composition, positive photosensitive resin composition, and filter
10/06/2011	WO2011121265A1 Plastics colouration
10/06/2011	WO2011120821A1 Method for operating a projection exposure apparatus with correction of imaging aberrations induced by the mask
10/06/2011	WO2011099646A3 Manufacturing method of exposure apparatus and device manufacturing method
10/06/2011	WO2011073441A3 Reflective mask for euv lithography
10/06/2011	WO2011065589A3 Substrate carrier device, substrate carrying method, substrate supporting member, substrate holding device, exposure apparatus, exposure method and device manufacturing method
10/06/2011	WO2011050048A3 Methods of making patterned structures of fluorine-containing polymeric materials and fluorine-containing polymers
10/06/2011	US20110245898 Laser apparatus, light therapy apparatus, exposure apparatus, device manufacturing method, and object inspection apparatus
10/06/2011	US20110245128 Composition for removing a photoresist and method of manufacturing semiconductor device using the composition
10/06/2011	US20110244688 Method of producing mask
10/06/2011	US20110244683 Fabricating Voids Using Slurry Protect Coat Before Chemical-Mechanical Polishing
10/06/2011	US20110244639 Method for manufacturing a pattern formed body, method for manufacturing a functional element, and method for manufacturing a semiconductor element
10/06/2011	US20110244404 Photoresist Processing Methods
10/06/2011	US20110244403 Method of slimming radiation-sensitive material lines in lithographic applications
10/06/2011	US20110244402 Method of slimming radiation-sensitive material lines in lithographic applications
10/06/2011	US20110244401 Reduced pitch multiple exposure process
10/06/2011	US20110244400 Norbornene-Type Polymers, Compositions Thereof and Lithographic Process Using Such Compositions
10/06/2011	US20110244399 Method of forming resist pattern and negative tone-development resist composition
10/06/2011	US20110244398 Patterning method
10/06/2011	US20110244397 Methods of Fabricating a Microarray
10/06/2011	US20110244396 Exposure apparatus, exchange method of object, exposure method, and device manufacturing method
10/06/2011	US20110244395 Apparatus and method for haze control in a semiconductor process
10/06/2011	US20110244394 Method for producing resin solution for photoresist, photoresist composition, and pattern-forming method
10/06/2011	US20110244393 Photosensitive resin composition and method for producing liquid discharge head
10/06/2011	US20110244392 Positive resist composition, method of forming resist pattern and polymeric compound
10/06/2011	US20110244391 Composition and method for reducing pattern collapse
10/06/2011	US20110244379 Method for forming convex pattern, exposure apparatus and photomask
10/06/2011	US20110244378 Device and method for providing wavelength reduction with a photomask
10/06/2011	US20110244197 Method of modifying chemically amplified resist pattern, modifier for chemically amplified resist pattern, and resist pattern structure
10/06/2011	US20110244188 Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation
10/06/2011	US20110242515 EUV collector system with enhanced EUV radiation collection
10/06/2011	US20110241173 Resist pattern formating method
10/06/2011	DE102011015266A1 EUV-Kollektorsystem mit verbesserter EUV-Strahlungssammlung EUV collector system with improved EUV radiation collection
10/06/2011	DE102011011972A1 Entwicklungsvorrichtung und Entwicklungsverfahren Developing device and development process
10/05/2011	EP2372458A1 Silicon-containing resist underlayer film formation composition having anion group
10/05/2011	EP2372457A1 Positive-type photosensitive resin composition, method for producing resist pattern, semiconductor device, and electronic device
10/05/2011	EP2372456A2 Novel polymers and photoresist compositions
10/05/2011	EP2372455A2 Photoacid generators and photoresists comprising the same
10/05/2011	EP2372454A1 Photopolymer formulation for producing visible holograms
10/05/2011	EP2372408A2 Reflector, optical element, interferometer system, stage device, exposure apparatus, and device fabricating method
10/05/2011	EP2372404A1 High transmission, high aperture projection objective and projection exposure apparatus
10/05/2011	EP2371470A2 Method and apparatus for production of a cast component
10/05/2011	EP2370859A2 A photosensitive composition
10/05/2011	EP2370858A1 Method and apparatus for making liquid flexographic printing elements
10/05/2011	EP2370502A1 Uv-curable inorganic-organic hybrid resin and method for preparation thereof
10/05/2011	EP1862855B1 Photosensitive resin composition
10/05/2011	EP1756669B1 Imprinting lithography using the liquid/solid transition of metals and their alloys
10/05/2011	EP1727663B1 Photocurable compositions
10/05/2011	EP1710094B1 Process for producing laser engravable printing substrate
10/05/2011	EP1708026B1 Photosensitive polymer composition, process for producing pattern, and electronic part
10/05/2011	EP1664929B1 Systems and methods for fabricating microstructures by imaging a radiation sensitive layer sandwiched between outer layers, and microstructures fabricated thereby
10/05/2011	EP1636835B1 System and method for integrating in-situ metrology within a wafer treatment process
10/05/2011	EP1631616B1 Novel surface-active polysiloxane photoinitiators
10/05/2011	EP1568723B1 Photo- and thermo-setting resin composition and printed wiring boards made by using the same
10/05/2011	EP1548062B1 Optical material containing photocurable fluoropolymer and photocurable fluororesin composition
10/05/2011	EP1509560B1 Actinic radiation curable compositions and their use
10/05/2011	CN202003139U Soft-drying device
10/05/2011	CN202003138U Exposure machine capable of cleaning maskplate
10/05/2011	CN1841211B Lithographic apparatus and device manufacturing method utilizing data filtering
10/05/2011	CN1802607B Photoacid generators with perfluorinated multifunctional anions
10/05/2011	CN102209937A Coating compositions
10/05/2011	CN102209936A Apparatus and method for thermally developing flexographic printing elements
10/05/2011	CN102209935A Methods and systems for parameter-sensitive and orthogonal gauge design for lithography calibration
10/05/2011	CN102209634A Improvements in or relating to printing
10/05/2011	CN102209633A Improvements in or relating to printing
10/05/2011	CN102208335A Method and apparatus for template surface treatment, and pattern forming method
10/05/2011	CN102207695A Alignment system and alignment method for photolithographic device
10/05/2011	CN102207693A Heating device and heating method
10/05/2011	CN102207692A Method for determining distribution of illumination intensity of image formed by mask plate through photoetching system
10/05/2011	CN102207691A Optical system of microlithographic exposure system
10/05/2011	CN102207690A Multi-SLM (Spatial Light Modulator) exposure and data processing method
10/05/2011	CN102207689A Alignment system and align mark precision extraction method of write-through lithography machine
10/05/2011	CN102207688A Lithographic apparatus and device manufacturing method
10/05/2011	CN102207687A Lighting device
10/05/2011	CN102207686A Positioning method for an optical arrangement of a projection illumination system
10/05/2011	CN102207685A Controlling device for injection and recovery of magnetofluid for immersion lithography machine
10/05/2011	CN102207684A Installation and maintenance mechanism used in illumination top module of lithography machine
10/05/2011	CN102207683A Mask alignment surface shape detection device for DUV (deep ultra violet) photolithographic device
10/05/2011	CN102207682A Resist coating method, resist coating device, and method for manufacturing photomask plate and photomask using the resist coating method
10/05/2011	CN102207681A Alkali-developable photosensitive resin composition, and partition suitable for display element and display element formed by employing same
10/05/2011	CN102207680A Photosensitive resin composition
10/05/2011	CN102207679A Phototonus resin composition
10/05/2011	CN102207678A Photoresist comprising nitrogen-containing compound
10/05/2011	CN102207677A Radiosensitive composition
10/05/2011	CN102207676A Method and system for manufacturing semiconductor device by using photoetching technology
10/05/2011	CN102207675A Photo mask and manufacturing method thereof
10/05/2011	CN102207609A Catadioptric projection objective

1 ... 206 207 208 209 210 211 212 213 214 215 216 217 218 219 220 221 222 223 224 225 226 ... 1272