G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2011
10/19/2011	EP2376422A1 Cyclohexane oxidation process byproduct stream derivatives and methods for using the same
10/19/2011	EP2376421A1 Cyclohexane oxidation process byproduct derivatives and methods for using the same
10/19/2011	EP1853882B1 Systems for protecting internal components of an euv light source from plasma-generated debris
10/19/2011	EP1656242B1 Capillary imprinting technique
10/19/2011	EP1589375B1 Resist composition
10/19/2011	EP1340123B1 Systems and methods for exposing substrate periphery
10/19/2011	CN202013483U Dynamic balance mechanism used in computer to plate (CTP) plate-making device
10/19/2011	CN202013482U Device automatically switching exposure positions in CTP plate processing equipment
10/19/2011	CN1916770B Method of selecting a grid model for correcting a process recipe and lithographic assembly using the same
10/19/2011	CN1869816B Photosensitive composition and color filter formed thereof
10/19/2011	CN1757439B Substrate processing device and method
10/19/2011	CN1749856B Curable jettable liquid for flexography
10/19/2011	CN102224460A Imaging particulate composition, paper and process, and imaging of paper using dual wavelength light
10/19/2011	CN102224459A Fast freeform source and mask co-optimization method
10/19/2011	CN102224458A Composition, process of preparation and method of application and exposure for light imaging paper
10/19/2011	CN102221791A Photoresist stripper composition
10/19/2011	CN102221790A Immersion lithographic apparatus
10/19/2011	CN102221789A Method for evaluating and filtering noise of space images of photoetching machine
10/19/2011	CN102221788A Fluid handling structure, lithographic apparatus and a device manufacturing method
10/19/2011	CN102221787A Integrated mounting and calibrating device of high-precision exposure lens unit
10/19/2011	CN102221786A Axial positioning maintaining device of optical element
10/19/2011	CN102221785A Photolithographic illumination device using mercury lamp light source
10/19/2011	CN102221784A Glue coating device and glue coating method
10/19/2011	CN102221783A Chemically amplified positive resist composition and pattern forming process
10/19/2011	CN102221782A Positive radiation sensitive composition, interlayer insulation film and forming method thereof
10/19/2011	CN102221781A Positive radiation sensitive composition, interlayer insulation film and forming method thereof
10/19/2011	CN102221780A Chemically amplified negative resist composition for EB or EUV lithography and patterning process
10/19/2011	CN102221779A Coloring composition applied in color filter, color filter and colored liquid crystal display element
10/19/2011	CN102221778A Coloring composition applied in color filter, color filter and display element
10/19/2011	CN102221777A White photosensitive resin component and white matrix as well as colorful optical filter and reflection type displayer component thereof
10/19/2011	CN102221775A Substrate manufacturing method, blank manufacturing method, regenerating photomask and manufacturing method thereof
10/19/2011	CN102221737A Fine adjuster for projection photoetching objective
10/19/2011	CN102221723A Grating manufacture method
10/19/2011	CN102218414A Optical irradiation equipment and optical irradiation method
10/19/2011	CN101748621B Process method of blind embossing jacquard satin reactive print of towel
10/19/2011	CN101699352B Method for removing sulfate radicals from photomask
10/19/2011	CN101663164B Photopolymerizable flexographic printing elements and hard flexographic printing formes which are produced therefrom
10/19/2011	CN101576720B Device and method for recovering silver in developing solution of plasma flat panel display
10/19/2011	CN101570515B Curcumin substituted uracil derivative, preparation method and use thereof
10/19/2011	CN101436564B Substrate processing apparatus, substrate washing apparatus and substrate processing apparatus
10/19/2011	CN101427182B Composite patterning devices for soft lithography
10/19/2011	CN101390016B Photopolymerizable composition
10/18/2011	USRE42849 Lithographic apparatus and device manufacturing method
10/18/2011	US8042067 Pattern forming method and system, and method of manufacturing a semiconductor device
10/18/2011	US8040491 Exposure method, substrate stage, exposure apparatus, and device manufacturing method
10/18/2011	US8040048 Process for forming an organic electronic device including an organic device layer
10/18/2011	US8039807 Exposure apparatus, exposure method, and method for producing device
10/18/2011	US8039205 Fluidic MEMS device
10/18/2011	US8039204 Manufacturing method of silicon carbide semiconductor apparatus
10/18/2011	US8039202 copolymer containing monomers selected from acrylic acid, methacrylic acid, vinyl alcohol, hydroxystyrenes, acrylic ester of chromophore group or 1,1,1,3,3,3-hexafluoro-2-propanol group; vinyl ether terminated crosslinking agent; solvent resistant, impervious to interdiffusion of photoresist
10/18/2011	US8039201 Antireflective coating composition and process thereof
10/18/2011	US8039200 Photosensitive composition and pattern-forming method using the photosensitive composition
10/18/2011	US8039199 Negative resist composition for immersion exposure and method of forming resist pattern
10/18/2011	US8039198 Sulfonium salt-containing polymer, resist composition, and patterning process
10/18/2011	US8039197 Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
10/18/2011	US8039196 Method of forming fine patterns using a block copolymer
10/18/2011	US8039195 Si device making method by using a novel material for packing and unpacking process
10/18/2011	US8039194 Photoacid generators for extreme ultraviolet lithography
10/18/2011	US8039193 Tissue markings and methods for reversibly marking tissue employing the same
10/18/2011	US8039180 Scattering bar OPC application method for sub-half wavelength lithography patterning
10/18/2011	US8038863 Composite stamper for imprint lithography
10/18/2011	US8038749 Composition for removing photoresist layer and method for using it
10/13/2011	WO2011127014A1 Norbornene-type polymers, comositions thereof and lithographic process using such compositions
10/13/2011	WO2011125977A1 Cleaning method, device manufacturing method, exposure apparatus, and device manufacturing system
10/13/2011	WO2011125913A1 Developer for processing planographic printing plate precursor, method for preparing planographic printing plate using the developer, and method for printing
10/13/2011	WO2011125839A1 Composition for forming resist underlayer film and pattern forming method
10/13/2011	WO2011125820A1 Solder resist composition and printed circuit board
10/13/2011	WO2011125686A1 Radiation-sensitive resin composition and polymer
10/13/2011	WO2011125685A1 Radiation-sensitive resin composition
10/13/2011	WO2011125684A1 Radiation-sensitive resin composition, resist pattern formation method, polymer and compound
10/13/2011	WO2011125630A1 Adamantyl (meth)acrylate monomer and (meth)acrylic polymer that contains repeating units derived from the monomer
10/13/2011	WO2011125605A1 Mask pattern formation method and manufacturing method for semiconductor device
10/13/2011	WO2011125604A1 Curable resin composition, dry film using same, and printed wiring board
10/13/2011	WO2011125571A1 Resist developer, method for forming a resist pattern and method for manufacturing a mold
10/13/2011	WO2011125420A1 Periphery exposure apparatus and periphery exposure method
10/13/2011	WO2011125401A1 Exposure method and exposure device
10/13/2011	WO2011125291A1 Homoadamantane derivative, method for producing same, and photosensitive material for photoresist
10/13/2011	WO2011124434A1 Euv radiation source and euv radiation generation method
10/13/2011	WO2011102534A3 Laser device, extreme ultraviolet light generation device, and method for maintaining the devices
10/13/2011	WO2011098325A3 Lithographic apparatus and device manufacturing method
10/13/2011	WO2011097514A3 Templates having high contrast alignment marks
10/13/2011	WO2011094696A3 Ultra-compliant nanoimprint lithography template
10/13/2011	WO2011091900A3 Faceted mirror for use in microlithography
10/13/2011	WO2011089157A3 Photosensitive substance having thioxanthones as photo-deactivatable photoinitiators for producing small structures
10/13/2011	WO2011080016A3 Methods of directed self-assembly and layered structures formed therefrom
10/13/2011	WO2011072307A3 Compositions comprising base-reactive component and processes for photolithography
10/13/2011	WO2011051791A3 Method and system for lithography hotspot correction of a post-route layout
10/13/2011	WO2010134643A8 Object exchange method, carrier system, exposure method and apparatus, and device manufacturing method
10/13/2011	US20110251059 Photochemical modification of solid materials
10/13/2011	US20110250745 Methods of forming patterns, and methods of forming integrated circuits
10/13/2011	US20110250544 Bottom antireflective coating compositions
10/13/2011	US20110250543 Pattern forming method
10/13/2011	US20110250542 Sulfonyl photoacid generators and photoresists comprising same
10/13/2011	US20110250541 Pattern forming method, method for manufacturing semiconductor device, and material for forming coating layer of resist pattern
10/13/2011	US20110250540 Semiconductor lithography process
10/13/2011	US20110250539 Fluorinated monomer, polymer, resist composition, and patterning process
10/13/2011	US20110250538 Photoacid generators and photoresists comprising same
10/13/2011	US20110250537 Cholate photoacid generators and photoresists comprising same
10/13/2011	US20110250532 Method of lifting off and fabricating array substrate for liquid crystal display device using the same
10/13/2011	US20110250396 Positive-type photosensitive resin composition, method for production of resist pattern, semiconductor device, and electronic device

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