Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/2011
11/23/2011CN101387835B Substrate processing device and processing method thereof
11/23/2011CN101313248B Method of making a lithographic printing plate
11/23/2011CN101300527B Antimony-free photocurable resin composition and three dimensional article
11/23/2011CN101295143B Photoresist leftover cleaning agent
11/23/2011CN101211109B Liquid crystal display device and fabrication method thereof
11/23/2011CN101154041B Radiation sensitive resin composition, and formation of interlayer insulating film and microlens
11/23/2011CN101128917B Exposure method and apparatus, and electronic component manufacturing method, illumination optical device
11/23/2011CN101073021B Transmitting optical element and objective for a microlithographic projection exposure apparatus
11/22/2011US8064730 Device manufacturing method, orientation determination method and lithographic apparatus
11/22/2011US8064044 Exposure apparatus, exposure method, and device producing method
11/22/2011US8064041 Projection objective for a microlithographic projection exposure apparatus
11/22/2011US8064040 Projection objective, projection exposure apparatus and reflective reticle for microlithography
11/22/2011US8064037 Immersion exposure apparatus and device manufacturing method with no liquid recovery during exposure
11/22/2011US8063245 Phosphazene compound, photosensitive resin composition and use thereof
11/22/2011US8063007 Removing agent composition and removing/cleaning method using same
11/22/2011US8062836 Method for manufacturing an optical filter for a stereoscopic image display device
11/22/2011US8062835 Method of manufacturing master plate, method of manufacturing microneedle patch and apparatus exposure apparatus
11/22/2011US8062834 Method for manufacturing transparent electrode pattern and method for manufacturing electro-optic device having the transparent electrode pattern
11/22/2011US8062833 Chalcogenide layer etching method
11/22/2011US8062832 Method for on-press developing high speed laser sensitive lithographic plate
11/22/2011US8062831 Carboxyl-containing lactone compound, polymer, resist composition, and patterning process
11/22/2011US8062830 Chemically amplified positive resist composition
11/22/2011US8062829 Chemically amplified resist composition and chemically amplified resist composition for immersion lithography
11/22/2011US8062828 Positive resist composition and patterning process
11/22/2011US8062827 Multilayer positive-working imageable elements and their use
11/22/2011US8062826 Adjust solubility of alkali developer using acid; radiation with actinic radiation
11/22/2011US8062825 Positive resist composition and resist pattern forming method
11/22/2011US8062824 Thermally imageable dielectric layers, thermal transfer donors and receivers
11/22/2011US8062810 Method of correcting a mask pattern and method of manufacturing a semiconductor device
11/17/2011WO2011143080A1 Writing an image on flexographic media
11/17/2011WO2011142600A2 Photoresist stripper composition
11/17/2011WO2011142403A1 Radiation-sensitive resin composition for immersion exposure, curing pattern forming method and curing pattern
11/17/2011WO2011142391A1 Photosensitive resin composition and display device
11/17/2011WO2011142360A1 Photosensitive conductive film, method for forming conductive membrane, and method for forming conductive pattern
11/17/2011WO2011141046A1 Process of operating a lithographic system comprising a manipulation of an optical element of the lithographic system
11/17/2011WO2011080023A3 Spin-on formulation and method for stripping an ion implanted photoresist
11/17/2011WO2011071753A3 Generation of combinatorial patterns by deliberate tilting of a polymer-pen array
11/17/2011WO2011068884A3 A system for producing patterned silicon carbide structures
11/17/2011US20110281434 Methods of Forming Patterned Photoresist Layers Over Semiconductor Substrates
11/17/2011US20110281221 Applications of semiconductor nano-sized particles for photolithography
11/17/2011US20110281220 Pattern formation method
11/17/2011US20110281219 Apparatus and Method for Thermally Developing Flexographic Printing Elements
11/17/2011US20110281218 Polyimide precursor, resin composition comprising the polyimide precursor, pattern forming method using the resin composition, and articles produced by using the resin composition
11/17/2011US20110281217 Negative photosensitive insulating resin composition and method for patterning using the same
11/17/2011US20110281208 Hybrid Multi-Layer Mask
11/17/2011US20110281206 Exposure apparatus, mask plate and exposing method
11/17/2011US20110281040 Liquid crystal display element, positive type radiation sensitive composition, interlayer insulating film for liquid crystal display element, and formation method thereof
11/17/2011US20110280531 Resin composition for production of optical waveguide, and optical waveguide produced by using the resin composition
11/17/2011US20110279818 Spectrometry apparatus, detection apparatus, and method for manufacturing spectrometry apparatus
11/17/2011US20110279801 Apparatus and a method for illuminating a light-sensitive medium
11/17/2011US20110279800 Lithographic apparatus and device manufacturing method
11/17/2011US20110279795 Lithographic apparatus and device manufacturing method
11/17/2011US20110279794 Exposure apparatus and device manufacturing method
11/17/2011US20110279793 Method for manufacturing optical disc master and method for manufacturing optical disc
11/17/2011US20110279759 Dispersed composition, polymerizable composition, light shielding color filter, liquid crystal display device having light shielding color filter, solid-state imaging device, wafer-level lens, and imaging unit having wafer level lens
11/17/2011US20110278049 Photosensitive resin composition and dry film comprising the same
11/17/2011DE102010047839A1 Optical element e.g. lens, for optical system of microlithography projection exposure system to deflect or redirect light for manufacturing highly integrated electric circuit, has two dopant atoms stimulated with exciting light
11/17/2011DE102010029018A1 Vorrichtung und Verfahren zum Herstellen von Flexodrucksleeves Apparatus and method for producing Flexodrucksleeves
11/16/2011EP2386074A2 Method of selecting a set of illumination conditions of a lithographic apparatus for optimizing an integrated circuit physical layout
11/16/2011EP2089773B1 Movable phase step micro mirror having a multilayer substrate and a method for its manufacture
11/16/2011EP1646493B1 Viscosity reducible radiation curable resin composition
11/16/2011EP1066123B1 Improvement in aqueous stripping and cleaning compositions
11/16/2011CN202041765U Light source device and exposure machine with same
11/16/2011CN202041764U Clamp used for sheet part
11/16/2011CN1808282B Exposure apparatus and device manufacturing method
11/16/2011CN1800989B Apparatus and process for forming a printing form having a cylindrical support
11/16/2011CN1716104B Composition for removing photoresist residue and polymer residue
11/16/2011CN102246100A Method for forming projected pattern, exposure apparatus and photomask
11/16/2011CN102246099A Actuator system, lithographic apparatus, method of controlling the position of a component and device manufacturing method
11/16/2011CN102246098A System for transferring data and use thereof
11/16/2011CN102246097A Techniques for marking product housings
11/16/2011CN102246096A Hardmask composition with improved storage stability for forming resist underlayer film
11/16/2011CN102246095A Positive photosensitive organic-inorganic hybrid insulator composition
11/16/2011CN102245723A Wet-etchable antireflective coatings
11/16/2011CN102245385A An imageable article
11/16/2011CN102245367A Method for forming structure and method for manufacturing liquid ejecting head
11/16/2011CN102245348A A positioning system and method
11/16/2011CN102244086A Solid-state imaging device, manufacturing method thereof, and electronic device
11/16/2011CN102243446A Substrate table, a lithographic apparatus, a method of flattening an edge of a substrate and a device manufacturing method
11/16/2011CN102243445A Optical system, inspection system and manufacturing method
11/16/2011CN102243444A Exposure equipment, mask plate and exposure method
11/16/2011CN102243443A Detection method for pattern offset between exposure areas and test pattern
11/16/2011CN102243442A Light source amplitude modulation apparatus for silicon wafer pointing
11/16/2011CN102243441A Temperature control device, projection exposure device using temperature control device, and temperature control method
11/16/2011CN102243440A Lithography machine for monitoring positional precision of wafer stage
11/16/2011CN102243439A Chemically amplified positive resist composition for EB or EUV lithography and patterning process
11/16/2011CN102243438A Method for manufacturing nano-scale periodic structured photonic crystals
11/16/2011CN102243437A Method for manufacturing groove substrate of optical fiber array assembly
11/16/2011CN102243436A Electric-field-induced micro-compounding method under geometrical restraint
11/16/2011CN102243435A Method for preparing micro-nanometer fluid system through compound developing of positive and negative photoresists
11/16/2011CN102243386A Liquid crystal display device, positive radiation-sensitive composition, interlayer insulating film for liquid crystal display device and method for forming the same
11/16/2011CN102243330A Production method for micro-retarder without alignment layer
11/16/2011CN102243327A Holographic grating manufactured by HfO2/SiO2 sol-gel glass
11/16/2011CN102243138A Focal plane detection device for projection lithography
11/16/2011CN102242053A Biochip with polymer three-dimensional nanostructure
11/16/2011CN102241209A Preparation method for regenerated waterless offset printing plate
11/16/2011CN101907769B Silicon on insulator (SOI) wafer double-mask etching-based vertical comb teeth driven torsional micro-mirror and manufacturing method thereof
11/16/2011CN101833243B Resist composition, method for forming resist pattern, and semiconductor device and method for manufacturing the same
11/16/2011CN101750889B Photosensitive resin composite, preparation method thereof, and method for preparing SCE conductive film thereby
11/16/2011CN101687407B Imageable elements and methods of use in negative working lithographic printing plates
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