| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 12/29/2011 | WO2011161267A1 Method for producing a component and component produced by the method |
| 12/29/2011 | WO2011161243A1 Method and apparatus for analyzing and / or repairing of an euv mask defect |
| 12/29/2011 | WO2011160861A1 Lithographic apparatus and method |
| 12/29/2011 | WO2011160262A1 Low volatile phenylglyoxylate |
| 12/29/2011 | US20110318696 Illumination optical system and optical systems for microlithography |
| 12/29/2011 | US20110318695 Arbitrary pattern direct nanostructure fabrication methods and system |
| 12/29/2011 | US20110318694 Source-collector module with GIC mirror and tin vapor LPP target system |
| 12/29/2011 | US20110318693 Actinic-ray- or radiation-sensitive resin composition, and resist film and pattern forming method using the same |
| 12/29/2011 | US20110318692 Photoactive compound and photosensitive resin composition containing the same |
| 12/29/2011 | US20110318691 Resist composition for semiconductor, and resist film and pattern forming method using the same |
| 12/29/2011 | US20110318690 Compound, resin and photoresist composition |
| 12/29/2011 | US20110318689 Light-sensitive lithographic printing plate material |
| 12/29/2011 | US20110318688 Salt, acid generator and resist composition |
| 12/29/2011 | US20110318687 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the composition |
| 12/29/2011 | US20110318686 Positive photosensitive resin composition |
| 12/29/2011 | US20110318673 System and method for test pattern for lithography process |
| 12/29/2011 | US20110318542 Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition and Patterning Method Using Same |
| 12/29/2011 | US20110317143 Lithographic apparatus and device manufacturing method |
| 12/29/2011 | US20110317116 Liquid crystal display apparatus and manufacturing method thereof |
| 12/29/2011 | US20110316188 Method for producing structure and method for producing liquid discharge head |
| 12/29/2011 | US20110316116 Photosensitive resin composition, adhesive film and light-receiving device |
| 12/29/2011 | US20110315077 Template, manufacturing method, and processing method |
| 12/29/2011 | US20110315034 Lithographic printing plate |
| 12/29/2011 | DE102010025222A1 Controllable mirror assembly for use as non-contact activatable passive component in optical system for projection exposure apparatus for microlithography, has light source that delivers light beam alignable on actuator element |
| 12/29/2011 | DE102005038913A9 Oberste Antireflektionsbeschichtungszusammensetzung und Verfahren zur Musterausbildung für eine Halbleitervorrichtung unter Verwendung derselbigen Top anti-reflective coating composition and method for patterning a semiconductor device using derselbigen |
| 12/28/2011 | EP2400345A1 Catadioptric Illumination System for Metrology |
| 12/28/2011 | EP2400344A1 Positive photosensitive resin composition |
| 12/28/2011 | EP2399905A1 Sulfonium salt, photo-acid generator, and photosensitive resin composition |
| 12/28/2011 | EP2399743A2 Resin composition for laser engraving, relief printing plate precursor for laser engraving and process for producing same, and process for making relief printing plate |
| 12/28/2011 | EP2399279A1 Substrate support structure, clamp preparation unit, and lithography system |
| 12/28/2011 | EP2399278A1 Method of clamping a substrate and clamp preparation unit |
| 12/28/2011 | EP2399171A1 Organic solvent development or multiple development pattern-forming method using electron beams or euv rays |
| 12/28/2011 | EP2399170A1 Projection illumination method, projection illumination system, laser beam source and bandwidth narrowing module for a laser beam source |
| 12/28/2011 | EP2399169A2 Acid-sensitive, developer-soluble bottom anti-reflective coatings |
| 12/28/2011 | EP2399168A1 Chemical amplification resist composition, and mold preparation method and resist film using the same |
| 12/28/2011 | EP2399167A1 Nanolithography process |
| 12/28/2011 | EP2398733A1 Device for grasping and active release of micro and nano objects |
| 12/28/2011 | EP2398628A2 Gel polymer pen lithography |
| 12/28/2011 | EP1794655B1 A material composition for nano- and micro-lithography |
| 12/28/2011 | EP1716457B1 Projection system with a polarization-modulating element having a variable thickness profile |
| 12/28/2011 | EP1636653B1 Adhesion method using gray-scale photolithography |
| 12/28/2011 | CN202093316U 烘焙装置 Baking equipment |
| 12/28/2011 | CN202093315U 冷却装置 Cooling device |
| 12/28/2011 | CN202087088U 超声波除泡装置和涂布装置 Ultrasonic Debubblers device and coating unit |
| 12/28/2011 | CN1977219B 制造微细结构的方法、制造排液头的方法以及排液头 Method of manufacturing a fine structure, a method of manufacturing a liquid discharge head and liquid discharge head |
| 12/28/2011 | CN1885160B 基板处理装置 Substrate processing apparatus |
| 12/28/2011 | CN1841204B 外围曝光装置 Peripheral exposure device |
| 12/28/2011 | CN1837958B 平版印刷版原版及其制造方法 Lithographic printing plate precursor and its manufacturing method |
| 12/28/2011 | CN102301283A 抗蚀剂剥离剂组合物以及使用该组合物的抗蚀剂剥离方法 Resist stripping compositions and use of the composition of a resist lift-off method |
| 12/28/2011 | CN102301282A 防腐蚀性光致抗蚀剂剥离剂组合物 Anti-corrosive photoresist stripper composition |
| 12/28/2011 | CN102301281A 用于微光刻的照明系统 An illumination system for microlithography |
| 12/28/2011 | CN102301280A 卷到卷数字光刻法 Roll-to-roll digital photolithography |
| 12/28/2011 | CN102301279A 正型感光性绝缘树脂组合物及使用该组合物的图形形成方法 The positive photosensitive insulating resin composition and the use of the graphical method of forming the composition |
| 12/28/2011 | CN102301278A 连接印刷板与印刷筒的手段 Means connected to the printing plate and printing cylinder |
| 12/28/2011 | CN102301277A 使用非线性热聚合的三维制品 Three-dimensional nonlinear thermal polymerization products |
| 12/28/2011 | CN102300719A 激光雕刻用树脂组合物、激光雕刻用凸版印刷版原版、凸版印刷版及制备凸版印刷版的方法 The resin composition for laser engraving, laser engraving letterpress printing plate precursor, letterpress printing and letterpress printing plate preparation |
| 12/28/2011 | CN102299085A Packaged semiconductor device having improved locking properties |
| 12/28/2011 | CN102299047A 热处理装置和热处理方法 Heat treatment apparatus and heat treatment method |
| 12/28/2011 | CN102298943A 曝光装置和曝光方法 Exposure apparatus and exposure method |
| 12/28/2011 | CN102298277A 一种用于厚膜光刻胶的清洗液 A thick film photoresist cleaning solution |
| 12/28/2011 | CN102298276A 硅片去胶装置及方法 Apparatus and method for silicon to glue |
| 12/28/2011 | CN102298275A 一种显影方法 A developing method |
| 12/28/2011 | CN102298274A 曝光方法及装置、维护方法、以及组件制造方法 Exposure method and apparatus maintenance method, and device manufacturing method |
| 12/28/2011 | CN102298273A 基于二极照明的空间像传感器角度响应的测量方法 Based on measurements of the spatial image dipole illumination angle sensor response |
| 12/28/2011 | CN102298272A 一种光刻机中的片夹上片自动轴向定位锁紧装置 A lithographic machine holder topsheet automatic axial positioning locking device |
| 12/28/2011 | CN102298271A 一种投影物镜柔性机构调平装置 A projection lens flexible mechanism leveling device |
| 12/28/2011 | CN102298270A 微影投射设备、气体洗涤方法、装置制造方法及洗涤气体的供应系统 Lithographic projection apparatus, a gas cleaning method, device manufacturing method and a gas supply system was washed |
| 12/28/2011 | CN102298269A 测量系统、方法和光刻设备 Measurement systems, methods, and a lithographic apparatus |
| 12/28/2011 | CN102298268A 光刻设备和光刻设备冷却方法 Lithography equipment and lithography equipment cooling methods |
| 12/28/2011 | CN102298267A 光刻设备 Lithography equipment |
| 12/28/2011 | CN102298266A 制造标准晶圆的方法 Methods wafer manufacturing standards |
| 12/28/2011 | CN102298265A 共聚物组合物、光刻介电组合物及电气或电子器件 Copolymer composition lithography dielectric compositions and electrical or electronic components |
| 12/28/2011 | CN102298264A 固化膜形成用放射线敏感性树脂组合物及其制造方法、固化膜及其形成方法及显示元件 Cured film-forming radiation-sensitive resin composition and a manufacturing method, and a cured film forming method and a display device |
| 12/28/2011 | CN102298263A 滤色器用着色组合物、滤色器及其制造方法、蒽醌化合物以及液晶显示装置 The coloring composition for color filter, a color filter and manufacturing method thereof, an anthraquinone compound and a liquid crystal display device |
| 12/28/2011 | CN102298262A 一种热固化感光树脂组合物 A heat-curing the photosensitive resin composition |
| 12/28/2011 | CN102298261A 感光性粘接剂、粘接薄膜、粘接薄片以及粘接剂图案 The photosensitive adhesive, adhesive film, adhesive sheet and adhesive pattern |
| 12/28/2011 | CN102298260A 使用间隔物和自对准辅助图案的多重图案化光刻 And using self-aligned spacer multiple patterning auxiliary pattern lithography |
| 12/28/2011 | CN102298259A 光刻方法 Photolithography process |
| 12/28/2011 | CN102298235A 液晶显示装置的制造方法和液晶显示装置 The method of manufacturing a liquid crystal display device and a liquid crystal display device |
| 12/28/2011 | CN102298204A 用于量测的反射折射照射系统 Used to measure the illumination system catadioptric |
| 12/28/2011 | CN102298198A 一种大视场光刻投影物镜 One kind of large field of lithographic projection lens |
| 12/28/2011 | CN102298196A 一种大视场宽谱线光刻投影物镜 One kind of large field wide spectrum of lithographic projection lens |
| 12/28/2011 | CN102295739A 固化性树脂组合物 Curable resin composition |
| 12/28/2011 | CN101900941B 高含氟负性光刻胶及其在聚合物光波导器件中的应用 Highly fluorinated negative photoresist and its application in polymer optical waveguide devices |
| 12/28/2011 | CN101807010B 纳米精度六自由度磁浮微动台及应用 Six degrees of freedom nanometer precision micro maglev station and application |
| 12/28/2011 | CN101770166B 一种用于纳米压印光刻系统的两平动精密定位工作台 A nano-imprint lithography system of two translational Precision Positioning Table |
| 12/28/2011 | CN101738662B 百纳米级窄线宽多种形貌全息光栅光刻胶图样的制备方法 One hundred nanometer narrow linewidth variety of morphologies holographic grating photoresist pattern preparation |
| 12/28/2011 | CN101726997B 用于纳米压印光刻系统的六自由度精密定位工作台 Nanoimprint lithography system for six degrees of freedom Precision Positioning Table |
| 12/28/2011 | CN101718950B 薄膜构图方法及制造液晶显示装置的方法 Film patterning method and a method of manufacturing a liquid crystal display device |
| 12/28/2011 | CN101710564B 基板处理系统 A substrate processing system |
| 12/28/2011 | CN101710229B 用于纳米压印光刻系统的两平动一转动精密定位工作台 Nanoimprint lithography systems for two translational and one rotational precision positioning table |
| 12/28/2011 | CN101696257B 连苯三酚缩丙酮树脂的活性醚化物及其合成方法 Even active ether compounds reduced pyrogallol acetone resin and synthetic methods |
| 12/28/2011 | CN101692151B 一种基于软模板纳米压印技术的硅纳米线制作方法 Silicon nanowire production method based on nanoimprint technology soft template |
| 12/28/2011 | CN101661199B 半透过式液晶显示装置的阵列基板制造方法 Array substrate device manufacturing method and a half through the liquid crystal display |
| 12/28/2011 | CN101659391B 一种圆滑曲面微结构的制作方法 A method of making smooth the surface microstructure of |
| 12/28/2011 | CN101641645B 器件制造方法、光刻设备 Device manufacturing method, a lithographic apparatus |
| 12/28/2011 | CN101620381B 一种光固版的制版工艺 A light version of the solid plate-making process |
| 12/28/2011 | CN101592859B 一种立体光刻快速成形光敏树脂及其制备方法和应用 One kind of stereolithography rapid prototyping photosensitive resin and its preparation method and application |
| 12/28/2011 | CN101569036B 负极基材 Negative electrode base |
| 12/28/2011 | CN101517490B 包括旋转污染物陷阱的设备 The device includes a rotating trap pollutants |