G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/2011
10/26/2011	EP2381312A2 Alkaline liquid developer for lithographic printing plate and method for preparing lithographic printing plate
10/26/2011	EP2381311A2 Exposure apparatus, device manufacturing method using same, and gas supply device
10/26/2011	EP2381310A1 Fluid handling structure, lithographic apparatus and device manufacturing method
10/26/2011	EP2381309A1 Ablation layer, photosensitive resin structure, and method for producing relief printing plate using the photosensitive resin structure
10/26/2011	EP2381308A2 Positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device
10/26/2011	EP2381307A1 Device and process for microcontact printing
10/26/2011	EP2380062A1 Thermosensitive imaging composition and lithographic plate comprising the same
10/26/2011	EP2380061A1 Method and composition for producing optical elements having a gradient structure
10/26/2011	EP1765591B1 Apparatus and method for thermally developing flexographic printing elements
10/26/2011	EP1428416B1 Discharge source with gas curtain for protecting optics from particles
10/26/2011	EP1410109B1 Photosensitive resin composition
10/26/2011	CN1802265B Positive tone bi-layer imprint lithography method and compositions therefor
10/26/2011	CN102227687A Photoresist remover composition, method for removing photoresist of multilayer metal circuit board, and method for producing multilayer metal circuit board
10/26/2011	CN102227686A Method for forming resist pattern
10/26/2011	CN102227685A Gumming compositions with nano-particles for improving scratch sensitivity in image and non-image areas of lithographic printing plates
10/26/2011	CN102227684A Method for manufacturing lithographic printing plate, developer for original lithographic printing plate, and replenisher for developing original lithographic printing plate
10/26/2011	CN102227683A Methods for performing photolithography using barcs having graded optical properties
10/26/2011	CN102227682A Pattern forming method using developer containing organic solvent and rinsing solution for use in pattern forming method
10/26/2011	CN102227681A Curable resin composition and reflective sheet
10/26/2011	CN102227680A Photosensitive composition
10/26/2011	CN102227662A Support elements for optical element
10/26/2011	CN102227474A Resin composition and display device formed using same
10/26/2011	CN102227458A Anti-reflective underlayer composition
10/26/2011	CN102226869A Device manufacturing method and immersion lithographic apparatus
10/26/2011	CN102226868A Method for production of three-dimensional micro-molded product
10/26/2011	CN102226853A Beam splitter apparatus and system
10/26/2011	CN102225924A Photoacid generators and photoresists comprising same
10/26/2011	CN102225389A Capacitance type ultrasonic transducer and manufacturing method thereof
10/26/2011	CN101881926B Method for coating mask body of SiO2 on glass substrate
10/26/2011	CN101799569B Method for producing convex double blazed grating
10/26/2011	CN101673062B Device for removing photoresist by whole wet method
10/26/2011	CN101673060B Method for injecting ions after photoetching
10/26/2011	CN101592867B Coating machine platform and method for cleaning nozzle of coating machine platform
10/26/2011	CN101521153B Method of manufacturing semiconductor device, and resist coating and developing system
10/26/2011	CN101470347B Production method of two-dimension photon crystal with annular hole array structure
10/26/2011	CN101410948B Exposure method and apparatus, maintenance method and device manufacturing method
10/26/2011	CN101384967B Optical integrator for an illumination system of a microlithographic projection exposure apparatus
10/26/2011	CN101359183B Reactive force processing device
10/26/2011	CN101320214B Method and device for monitoring change of light blockage coating weight
10/26/2011	CN101098927B Chemicals compositions
10/25/2011	US8046843 Nanometer scale instrument for biochemically, chemically, or catalytically interacting with a sample material
10/25/2011	US8045136 Stage drive method and stage unit, exposure apparatus, and device manufacturing method
10/25/2011	US8044441 Electrode patterning layer comprising polyamic acid or polyimide, and electronic device employing it
10/25/2011	US8044009 A stripping solvent selected from dialkylsulfones, dimethyl sulfoxide, tetrahydrothiophene-1,1-dioxides, dimethylacetamide and dimethylformamide, hydrogen peroxide as an oxidizing agent, ammonium fluoride, ammonium bifluoride or hydrogen fluoride, hydrochloric acid and water; noncorrosive to wafers
10/25/2011	US8043799 Soft mold, method of manufacturing the same, and patterning method using the same
10/25/2011	US8043798 Method of forming fine patterns
10/25/2011	US8043796 Manufacturing method of semiconductor device
10/25/2011	US8043795 Method of forming resist pattern
10/25/2011	US8043794 Method of double patterning, method of processing a plurality of semiconductor wafers and semiconductor device
10/25/2011	US8043793 Method for manufacturing electroluminescence element
10/25/2011	US8043792 Composition for formation of antireflection film and pattern formation method using the same
10/25/2011	US8043791 Positive photosensitive composition, pattern forming method using the composition and resin for use in the composition
10/25/2011	US8043790 Printing original plate capable of being laser-engraved
10/25/2011	US8043789 Photosensitive compound and photoresist composition including the same
10/25/2011	US8043788 Alkali soluble resin; immersion lithography
10/25/2011	US8043787 Negative-working imageable elements with improved abrasion resistance
10/25/2011	US8043786 Acid generators, sulfonic acids, sulfonyl halides, and radiation sensitive resin compositions
10/25/2011	US8043772 Manufacturing method and manufacturing system of semiconductor device
10/25/2011	US8043550 Manufacturing method of display device and mold therefor
10/25/2011	US8043467 Liquid processing apparatus and liquid processing method
10/25/2011	CA2495304C Thick radiation sensitive devices
10/20/2011	WO2011130446A1 Improved cantilevers for deposition
10/20/2011	WO2011130300A1 Photoresist film and methods for abrasive etching and cutting
10/20/2011	WO2011129369A1 Exposure apparatus, substrate processing apparatus, and device manufacturing method
10/20/2011	WO2011129312A1 Negative photosensitive resin composition, cured film, and member for touch panel
10/20/2011	WO2011129210A1 Negative photosensitive resin composition, and protective film and touch panel member using the same
10/20/2011	WO2011129186A1 Photosensitive resin composition, photoresist film using same, method for forming resist pattern, and method for manufacturing printed wiring board
10/20/2011	WO2011129182A1 Addition copolymer, photosensitive resin composition, and color filter
10/20/2011	WO2011128383A1 Electron-beam lithography method with correction of line ends by insertion of contrast patterns
10/20/2011	WO2011128348A1 Method of electron-beam lithography with correction of corner roundings
10/20/2011	WO2011128162A1 Substrate handling apparatus and lithographic apparatus
10/20/2011	WO2011128120A1 Method for providing an ordered layer of self-assemblable polymer for use in lithography
10/20/2011	WO2011128063A1 Method and device for the spatially periodic modification of a substrate surface using an f-theta lens
10/20/2011	WO2011104389A3 Method for stress-adjusted operation of a projection exposure system and corresponding projection exposure system
10/20/2011	WO2011074775A3 Cylindrical magnetic levitation stage and lithography
10/20/2011	WO2011062446A3 Photosensitive resin composition
10/20/2011	WO2011059280A3 Nonaqueous resist stripper composition
10/20/2011	WO2011052925A3 Photosensitive resin composition
10/20/2011	US20110256486 Photolithography focus improvement by reduction of autofocus radiation transmission into substrate
10/20/2011	US20110256485 Etchant composition, patterning conductive layer and manufacturing flat panel, display device using the same
10/20/2011	US20110256484 Method for producing comb-shaped electrode
10/20/2011	US20110256483 Residue removing liquid composition and method for cleaning semiconductor element using same
10/20/2011	US20110256482 Photosensitive resin composition, method of manufacture thereof and articles including the same
10/20/2011	US20110256481 Photoresists and methods of use thereof
10/20/2011	US20110256351 Anti-counterfeit film with an amphichroic pattern and a preparation method thereof
10/20/2011	US20110255181 Replacement apparatus for an optical element
10/20/2011	US20110255069 Compositions and processes for immersion lithography
10/20/2011	US20110255061 Compositions comprising base-reactive component and processes for photolithography
10/20/2011	US20110254178 Positive-type photosensitive resin composition, method for producing resist pattern, semiconductor device, and electronic device
10/20/2011	US20110254140 Photoresists and methods for use thereof
10/20/2011	US20110254133 Photoresists and methods for use thereof
10/20/2011	US20110253425 Roll-to-roll digital photolithography
10/20/2011	US20110252993 Photopolymerizable flexographic printing elements for printing with uv inks
10/20/2011	DE102010029321A1 Verfahren und Vorrichtung zur räumlich periodischen Modifikation einer Substratoberfläche Method and apparatus for spatially periodic modification of a substrate surface
10/20/2011	CA2795920A1 Improved cantilevers for deposition
10/19/2011	EP2378362A1 Resist pattern coating agent and resist pattern forming method using the same
10/19/2011	EP2378361A1 Method for preparing lithographic printing plate
10/19/2011	EP2376983A1 Roll-to-roll digital photolithography
10/19/2011	EP2376982A1 Substrate planarization with imprint materials and processes
10/19/2011	EP2376584A1 Wet-etchable antireflective coatings

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