G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/2011
12/14/2011	CN202075449U 一种光固化细小结构光纤束发射装置 A photocurable fine structure of the fiber bundle emitting means
12/14/2011	CN1997940B 用接触印刷对液晶元进行微结构化的方法 Contact printing using a liquid crystal element is finely structured approach
12/14/2011	CN1768306B 含有环氧化合物和羧酸化合物的光刻用形成下层膜的组合物 Lithography containing an epoxy compound and a carboxylic acid compound represented by the underlayer coating forming composition
12/14/2011	CN102282215A 滤色器用黑色基体 Color filters, black matrix
12/14/2011	CN102280438A 微影过程中临界尺寸的测试标记 Lithography process, the critical dimension of the test mark
12/14/2011	CN102279533A 一种光刻机机中的输片双稳态水平锁紧装置 A lithographic machine machine sprocket bistable horizontal locking means
12/14/2011	CN102279532A 一种光刻机投影物镜镜头的装调装置 A lithographic projection objective lens machine alignment device
12/14/2011	CN102279531A 固态浸没透镜微影术 The solid immersion lens lithography
12/14/2011	CN102279530A 基于双相锁相放大原理的检焦装置的检焦方法 Coke inspection method based on the principle of two-phase lock-in amplifier device detection coke
12/14/2011	CN102279529A 柔性双边驱动设备的位置控制装置、及相关参数的整定方法 Location flexible tuning method bilateral driven equipment control devices, and related parameters
12/14/2011	CN102279528A 用于滤色器的蓝色树脂组合物以及利用其的滤色器 Blue resin compositions for color filters and color filter using its
12/14/2011	CN102279527A 感光性树脂组合物 The photosensitive resin composition
12/14/2011	CN102279526A 滤色器用着色组合物和滤色器 The coloring composition for color filter and a color filter
12/14/2011	CN102279525A Low-pollution photoresist composition
12/14/2011	CN102279524A Environment-friendly photoresist composition
12/14/2011	CN102279523A Photoresist composition
12/14/2011	CN102279522A 滤色器用着色组合物及滤色器 The coloring composition for color filter and a color filter
12/14/2011	CN102279521A 光生酸剂、其制备方法以及含有该光生酸剂的抗蚀剂组合物 Photoacid generator, their preparation and resist composition containing the photo-acid agent
12/14/2011	CN102279520A 新聚合物和光致抗蚀剂组合物 Novel polymers and photoresist compositions
12/14/2011	CN102279519A 一种三维微/纳结构的流体介电泳力扫描压印成形方法 A three-dimensional micro / fluid dielectrophoresis force scanning imprint method of forming nanostructures
12/14/2011	CN102279518A 一种金属掺杂全空间或准全空间光子晶体制作方法 The whole space or quasi whole space photonic crystal fabrication method of a metal-doped
12/14/2011	CN102279517A 纳米压印方法 Nanoimprint method
12/14/2011	CN102279516A 校准标准片的制备方法及用该标准片进行校准的方法 Tablets prepared calibration standards and method of calibration of the standard sheet
12/14/2011	CN102279506A 照相模块及其制造方法 Camera module and manufacturing method thereof
12/14/2011	CN102279459A 一种投影物镜 A projection lens
12/14/2011	CN102279457A 单倍大视场光刻投影物镜 Haplotype large field of lithographic projection lens
12/14/2011	CN102279454A 一种光刻投影物镜中镜片的支撑装置 A lithographic projection objective lens supporting means in
12/14/2011	CN102276589A 染料化合物 Dye compound
12/14/2011	CN102275447A 一种镜面花纹板生产方法 One kind of mirror checkered production methods
12/14/2011	CN101950065B 深紫外全球面光刻物镜 DUV lithography objective global surface
12/14/2011	CN101840164B 一种光刻机投影物镜波像差在线检测装置及方法 A lithographic projection lens aberration machine line detection device and method
12/14/2011	CN101806974B 彩膜基板及其制造方法和液晶显示面板 Color film substrate and manufacturing method and LCD panel
12/14/2011	CN101750885B 二自由度精密定位工作台 Two DOF Precision Positioning Table
12/14/2011	CN101727007B 一种用于高深宽比纳米图形加工的反射式表面等离子体成像光刻方法 Reflective surface plasmon imaging lithography process for high aspect NONSTOICHIOMETRIC graphics processing
12/14/2011	CN101684181B 一种光敏聚酰亚胺及其柔性线路板 A photosensitive polyimide and flexible circuit boards
12/14/2011	CN101581880B 半导体封装件及其制造方法 Semiconductor package and its manufacturing method
12/14/2011	CN101512437B 感光性树脂组合物、感光性元件、抗蚀图的形成方法及印刷电路板的制造方法 Method for producing a photosensitive resin composition, a photosensitive element, resist pattern forming method and a printed circuit board
12/14/2011	CN101449208B 感光性树脂组合物以及层压体 The photosensitive resin composition and laminate
12/14/2011	CN101448862B 感光性树脂及感光性树脂组合物 Photosensitive resin and a photosensitive resin composition
12/14/2011	CN101405838B 移动体驱动方法及移动体驱动系统、图案形成方法及装置、曝光方法及装置、组件制造方法、以及校正方法 The movable body drive method and the movable body drive system, a pattern forming method and apparatus, exposure method and apparatus, device manufacturing method, and a correction method
12/14/2011	CN101393400B 液体感光性树脂凸版表面除粘方法 Liquid photosensitive resin letterpress surface adhesive removal method
12/14/2011	CN101346664B 掩模坯料及光掩模 Mask blanks and photomasks
12/14/2011	CN101344725B 涂敷装置、基板的交接方法及涂敷方法 Interfacing method of coating apparatus, the substrate and the coating method
12/14/2011	CN101341444B 感光片以及制造该感光片的方法和装置 Photosensitive sheet and a method and apparatus for manufacturing the photosensitive sheet
12/14/2011	CN101295133B 多层光记录介质的制造方法 Multilayer optical recording medium manufacturing method
12/14/2011	CN101263427B 感光性着色组合物、滤色片基板及半透射型液晶显示装置 Photosensitive coloring composition, a color filter substrate and a transflective type liquid crystal display device
12/14/2011	CN101263424B 光敏组合物、转印材料、遮光膜及其制备方法、显示装置用滤色器、显示装置用衬底和显示装置 Photosensitive composition, the transfer material, the light-shielding film and method, a display device with a color filter, a display device and a display device using the substrate
12/14/2011	CN101231479B 浸润式微影方法、浸润式微影系统及其封闭板的对准方法 Immersion lithography method, immersion lithography system and its closure plate alignment method
12/14/2011	CN101206411B 采用聚焦光刻成形亚波长微纳结构的制作方法 Focus production methods using subwavelength lithography forming micro-nano structures
12/14/2011	CN101073039B 形成抗反射涂层的方法 The method of forming an antireflective coating
12/14/2011	CN101071276B 位移测量系统、光刻设备、位移测量方法和装置制造方法 Displacement measuring system, lithographic apparatus and device manufacturing method displacement measurement method
12/14/2011	CN101044432B 碱性显影型感光性树脂组合物、带有使用其形成的液晶分割取向控制用突起的基板以及液晶显示装置 Alkali-developable photosensitive resin composition, which is formed with the use of liquid crystal alignment control projection split substrate, and a liquid crystal display device
12/14/2011	CN101032879B 光纤阵列装置、成像头装置和成像装置 An optical fiber array apparatus, an imaging apparatus and an imaging head apparatus
12/14/2011	CN101025567B 固化性树脂组合物、固化膜的形成方法以及固化膜 Curable resin composition, a cured film and a cured film forming method
12/14/2011	CN101017328B 正型感光性树脂前体组合物以及使用它的显示装置 The positive photosensitive resin precursor composition and a display device using it
12/13/2011	US8078996 Method and system for correcting a mask pattern design
12/13/2011	US8077391 Wavefront aberration measuring method, mask, wavefront aberration measuring device, exposure apparatus, and device manufacturing method
12/13/2011	US8077287 Method of preparing components, prepared component, lithographic apparatus and device manufacturing method
12/13/2011	US8077280 Thin film transistor substrate of horizontal electric field type liquid crystal display device and fabricating method thereof
12/13/2011	US8077245 Apparatus for imaging using an array of lenses
12/13/2011	US8076655 Method of cleaning optical surfaces of an irradiation unit in a two-step process
12/13/2011	US8076654 Sample surface inspection apparatus and method
12/13/2011	US8076057 Methods of making extrusion dies
12/13/2011	US8076056 Method of making sub-resolution pillar structures using undercutting technique
12/13/2011	US8076055 Passivation of multi-layer mirror for extreme ultraviolet lithography
12/13/2011	US8076054 Composition for forming adhesive layer and relief printing plate using the same, and method for manufacturing relief printing plate
12/13/2011	US8076053 Upper layer-forming composition and photoresist patterning method
12/13/2011	US8076052 Positive-working imageable elements with chemical resistance
12/08/2011	WO2011152922A1 Method of producing a relief image from a liquid photopolymer resin
12/08/2011	WO2011152539A1 Lithographic printing plate precursor, plate making method thereof and novel polymer compound
12/08/2011	WO2011152379A1 Colored resin composition, colored cured film, color filter, liquid crystal display device, organic el display, and solid-state imaging element
12/08/2011	WO2011152292A1 Process for producing fine pattern
12/08/2011	WO2011152277A1 Color-filter coloring composition, color filter, and display element
12/08/2011	WO2011152235A1 Laser exposure method and product
12/08/2011	WO2011152207A1 Developing apparatus
12/08/2011	WO2011152066A1 Oxime ester compound, process for producing oxime ester compound, photopolymerization initiator, and photosensitive composition
12/08/2011	WO2011152058A1 Photosensitive resin composition, and method for producing photosensitive resin composition
12/08/2011	WO2011151719A1 Antireflective coating composition and process for manufacturing microelectronic device
12/08/2011	WO2011151243A1 Lithography method for doubled pitch
12/08/2011	WO2011151121A1 Measurement of a structure on a substrate
12/08/2011	WO2011151109A1 Self-assemblable polymer and method for use in lithography
12/08/2011	WO2011107602A3 Methods and device for laser processing
12/08/2011	US20110300490 High-resolution microscopy and photolithography devices using focusing micromirrors
12/08/2011	US20110300489 Method For Providing A Conductive Material Structure On A Carrier
12/08/2011	US20110300488 Antireflective Coating Composition and Process Thereof
12/08/2011	US20110300487 Method for producing a matrix of individual electronic components and matrix produced thereby
12/08/2011	US20110300486 Directly imageable waterless planographic printing plate precursor and method for producing same
12/08/2011	US20110300485 Organic solvent development or multiple development pattern-forming method using electron beams or euv rays
12/08/2011	US20110300484 Sulfonium derivatives and the use therof as latent acids
12/08/2011	US20110300483 Self-Segregating Multilayer Imaging Stack With Built-In Antireflective Properties
12/08/2011	US20110300482 Sulfonium salt, photo-acid generator, and photosensitive resin composition
12/08/2011	US20110300473 Method for nanopatterning using nanomasks and light exposure
12/08/2011	US20110300472 Exposure Apparatus Inspection Mask and Exposure Apparatus Inspection Method
12/08/2011	US20110300398 Method of Producing a Relief Image From a Liquid Photopolymer Resin
12/08/2011	US20110299055 Beam transforming element, illumination optical apparatus, exposure apparatus, and exposure method with two optical elements having different thicknesses
12/08/2011	US20110299016 Colored photosensitive resin composition, coating film of colored photosensitive resin composition, photosensitive resin transfer material, method of foaming photosensitive resin layer, color filter, method for producing color filter, and liquid crystal display device
12/08/2011	US20110297084 Apparatus for Direct Fabrication of Nanostructures
12/08/2011	DE19758946B4 Photoinitiatormischungen, deren Verwendung und sie enthaltende photopolymerisierbare Zusammensetzungen Photoinitiator mixtures, their use and compositions containing them photopolymerizable
12/08/2011	DE102010029765A1 Beleuchtungsoptik für die EUV-Projektionslithografie Illumination optics for EUV projection lithography
12/08/2011	DE102010029651A1 Verfahren zum Betrieb einer Projektionsbelichtungsanlage für die Mikrolithographie mit Korrektur von durch rigorose Effekte der Maske induzierten Abbildungsfehlern Method for operating a projection exposure system for microlithography with correction of induced through rigorous mask effects of aberrations

1 ... 195 196 197 198 199 200 201 202 203 204 205 206 207 208 209 210 211 212 213 214 215 ... 1272