| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/28/2011 | CN102203676A Scatterometer and lithographic apparatus |
| 09/28/2011 | CN102203675A Illuminating optic for EUV microlithography |
| 09/28/2011 | CN102203674A Lithographic apparatus, programmable patterning device and lithographic method |
| 09/28/2011 | CN102203673A Photosensitive resin composition and base |
| 09/28/2011 | CN102203672A Imprint lithography system and method |
| 09/28/2011 | CN102203671A Strain and kinetics control during separation phase of imprint process |
| 09/28/2011 | CN102203136A Photoinitiator mixtures |
| 09/28/2011 | CN102201365A Method for producing semiconductor device |
| 09/28/2011 | CN102201333A Photoresists and methods for use thereof |
| 09/28/2011 | CN102200700A Stripping liquid as well as preparation method and application |
| 09/28/2011 | CN102200699A Method for removing uncured photosensitive composition film or uncured photosensitive composition |
| 09/28/2011 | CN102200698A Cable stage of silicon wafer stage of photo-etching machine |
| 09/28/2011 | CN102200697A System and method for detecting wave aberration of photoetching projection objective |
| 09/28/2011 | CN102200696A Method for determining optimal photoetching process parameters by using focusing and exposure matrix |
| 09/28/2011 | CN102200695A System error self-corrected online detecting device of projection objective lens wave aberration of photo-etching machine |
| 09/28/2011 | CN102200694A Light irradiation device |
| 09/28/2011 | CN102200693A Illumination system and lithographic apparatus |
| 09/28/2011 | CN102200692A Method for controlling exposure energy |
| 09/28/2011 | CN102200691A Online measuring mark and method of projection objective lens image surface of photo-etching machine |
| 09/28/2011 | CN102200690A On-line measuring mark of image plane of lithography machine projection objective and measuring method |
| 09/28/2011 | CN102200689A Hybrid maglev gravity compensation apparatus |
| 09/28/2011 | CN102200688A Photosensitive resin composition, black matrix prepared from the photosensitive resin composition, and application of the black matrix |
| 09/28/2011 | CN102200687A Imprint apparatus and method of manufacturing an article |
| 09/28/2011 | CN102200624A Photo-etching projection lens |
| 09/28/2011 | CN102200428A High-precision vertical position measurement device |
| 09/28/2011 | CN102199282A Hydrophilic monomer, hydrophilic photoresist composition, and formation method for resist pattern |
| 09/28/2011 | CN102199119A Oxime ester photoinitiators |
| 09/28/2011 | CN101986208B Support structure of lithographic apparatus |
| 09/28/2011 | CN101840162B Exposure unit and pattern forming method |
| 09/28/2011 | CN101533231B Off-axis alignment system and alignment method |
| 09/28/2011 | CN101452083B Optical element and method for manufacturing same |
| 09/28/2011 | CN101446770B Substrates and methods of using those substrates |
| 09/28/2011 | CN101446763B Device for automatically adjusting dynamic balance of exposure roller |
| 09/28/2011 | CN101405660B Processes for monitoring the levels of oxygen and/or nitrogen species in a substantially oxygen and nitrogen-free plasma ashing process |
| 09/28/2011 | CN101344727B Focusing and leveling detection device and method |
| 09/28/2011 | CN101258445B Lithographic method |
| 09/28/2011 | CN101221363B Lithographic apparatus and device manufacturing method |
| 09/28/2011 | CN101187776B Method for transferring self-assembled dummy pattern to substrate |
| 09/28/2011 | CN101131546B Wet etching solution |
| 09/28/2011 | CN101122739B Sub-wavelength continuous surface micro-structure preparation method based on negative refractive rate lens |
| 09/28/2011 | CN101082770B Pattern forming method and pattern forming apparatus |
| 09/27/2011 | USRE42741 Lithographic apparatus and device manufacturing method |
| 09/27/2011 | US8027813 Method and system for reconstructing aberrated image profiles through simulation |
| 09/27/2011 | US8027027 Exposure apparatus, and device manufacturing method |
| 09/27/2011 | US8027018 Method and device for producing exposed structures |
| 09/27/2011 | US8026048 Developing apparatus and developing method |
| 09/27/2011 | US8026047 Resist pattern forming method, supercritical processing solution for lithography process, and antireflection film forming method |
| 09/27/2011 | US8026046 Reliably reproducing a clock signal based on wobbling shapes of track grooves of respective information storage layers; in mastering step, metal dies for the information storage layers having a shape that specifies a track groove whose shape factor differs from one information storage layer to another |
| 09/27/2011 | US8026045 Method of manufacturing wiring circuit board |
| 09/27/2011 | US8026044 Method of forming fine patterns of semiconductor device |
| 09/27/2011 | US8026043 Method of making a lithographic printing plate |
| 09/27/2011 | US8026042 Polymer for organic anti-reflective coating layer and composition including the same |
| 09/27/2011 | US8026041 Imageable elements useful for waterless printing |
| 09/27/2011 | US8026040 Silicone coating composition |
| 09/27/2011 | US8026039 Radiation-sensitive resin composition |
| 09/27/2011 | US8026038 Metal oxide-containing film-forming composition, metal oxide-containing film, metal oxide-containing film-bearing substrate, and patterning method |
| 09/27/2011 | US8026037 Si-polymers and photoresists comprising same |
| 09/27/2011 | US8026036 Photosensitive resin composition and circuit substrate employing the same |
| 09/27/2011 | US8026035 Etch-resistant disilane and saturated hydrocarbon bridged silicon-containing polymers, method of making the same, and method of using the same |
| 09/27/2011 | US8026024 Mask blank and method for manufacturing transfer mask |
| 09/27/2011 | US8026022 Long-length fiber Bragg creating sequential UV writing by probing phase mask |
| 09/27/2011 | US8025833 Curable composition for nanoimprint, and patterning method |
| 09/27/2011 | US8025831 Imprinting of supported and free-standing 3-D micro- or nano-structures |
| 09/27/2011 | US8025830 UV nanoimprint lithography process and apparatus |
| 09/27/2011 | US8025732 Apparatus for processing a substrate |
| 09/27/2011 | CA2466611C Heat-curable resin composition |
| 09/22/2011 | WO2011116039A1 Method and system for modifying substrate patterned features using ion implantation |
| 09/22/2011 | WO2011115488A1 Active vibration isolation system, arrangement and method |
| 09/22/2011 | WO2011115233A1 Extreme ultraviolet light generation system |
| 09/22/2011 | WO2011115217A1 Radiation-sensitive resin composition and resist pattern formation method |
| 09/22/2011 | WO2011115190A1 Radiation-sensitive resin composition |
| 09/22/2011 | WO2011115157A1 Resist removal device and resist removal method |
| 09/22/2011 | WO2011115139A1 Electron-beam exposure method and electron-beam exposure device |
| 09/22/2011 | WO2011115138A1 Radiation-sensitive resin composition and resist pattern formation method |
| 09/22/2011 | WO2011115125A1 Color developing photosensitive composition, lithographic printing original plate, and method for producing same |
| 09/22/2011 | WO2011115100A1 Photocurable/thermosetting resin composition, dry film thereof and cured substance therefrom, and printed circuit board using same |
| 09/22/2011 | WO2011114995A1 Silane coupling agent, negative-type photosensitive resin composition, curable film and touch panel component |
| 09/22/2011 | WO2011114889A1 Extreme ultraviolet light source device and location adjustment method for light focusing optical means |
| 09/22/2011 | WO2011114887A1 Irradiance distribution detection method in extreme ultraviolet light source device, and location adjustment method for light focusing optical means |
| 09/22/2011 | WO2011114885A1 Method of cleaning electronic material and cleaning system |
| 09/22/2011 | WO2011114883A1 Resist pattern formation device, resist pattern formation method, and wafer lens production method |
| 09/22/2011 | WO2011114846A1 Photosensitive conductive paste and method for forming conductive pattern |
| 09/22/2011 | WO2011114593A1 Photosensitive resin composition and photosensitive element using same, resist pattern formation method and printed circuit board manufacturing method |
| 09/22/2011 | WO2011113706A1 Fabrication method of cylindrical gratings |
| 09/22/2011 | WO2011113704A2 Photorepeater for extreme-ultraviolet lithography |
| 09/22/2011 | WO2011113682A1 Method and apparatus for alignment optimization with respect to plurality of layers |
| 09/22/2011 | WO2011113663A1 Inspection for lithography |
| 09/22/2011 | WO2011113591A2 Optical collector for collecting extreme ultraviolet radiation, method for operating such an optical collector, and euv source with such a collector |
| 09/22/2011 | WO2011113347A1 Nanometer-precision six-degree-of-freedom magnetic suspension micro-motion table and application thereof |
| 09/22/2011 | WO2011091891A3 Arrangement for and method of characterising the polarisation properties of an optical system |
| 09/22/2011 | WO2011080308A4 Capacitive sensing system |
| 09/22/2011 | WO2011052954A3 Composition for cleaning photoresist pattern and forming protective film |
| 09/22/2011 | WO2011050442A9 Gallotannic compounds for lithographic printing plate coating compositions |
| 09/22/2011 | WO2011006265A4 Copolymers for near-infrared radiation-sensitive coating compositions for positive-working thermal lithographic printing plates |
| 09/22/2011 | US20110230058 Composition for forming resist underlayer film with reduced outgassing |
| 09/22/2011 | US20110229832 Pattern forming method using developer containing organic solvent and rinsing solution for use in the pattern forming method |
| 09/22/2011 | US20110229831 Apparatus for processing substrate and method of doing the same |
| 09/22/2011 | US20110229830 Inspection Method For Lithography |
| 09/22/2011 | US20110229829 Lithography material and lithography process |
| 09/22/2011 | US20110229828 Aromatic ring containing polymer, underlayer composition including the same, and associated methods |