Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
01/2012
01/18/2012CN102323717A High fluorine-containing aromatic-aliphatic negative photoresist and application thereof to preparing polymer waveguide devices
01/18/2012CN102323716A Method for transferring and manufacturing pattern with nanometer structure
01/18/2012CN102323635A Method for manufacturing holographic dual-blazed grating
01/18/2012CN102323634A Manufacturing method for holographic dual-blazed grating
01/18/2012CN102323633A Manufacturing method for holographic dual-blazed grating
01/18/2012CN102321212A Polymer, chemically amplified positive resist composition and pattern forming process
01/18/2012CN101876792B Normal-temperature hole sealing technology of CTP base
01/18/2012CN101796614B Position measuring system and position measuring method, mobile body device, mobile body driving method, exposure device and exposure method, pattern forming device, and device manufacturing method
01/18/2012CN101750892B Photosensitive resin composite and color filter therefrom
01/18/2012CN101643940B Manufacturing method of hexagonal silicon slice
01/18/2012CN101609268B Lithographic apparatus and method
01/18/2012CN101568883B Photosensitive resin composition, photosensitive element, method for resist pattern formation, and method for manufacturing printed wiring board
01/18/2012CN101535898B A method and a system for reducing overlay errors within exposure fields by apc control strategies
01/18/2012CN101446760B Double patterning strategy for contact hole and trench
01/18/2012CN101405840B Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
01/18/2012CN101405657B Photosensitive composition, photosensitive film, permanent pattern forming method, and printed board
01/18/2012CN101374878B Positive photosensitive resin composition and cured film obtained therefrom
01/18/2012CN101354536B Apparatus and method for controlling distribution of photoresist
01/18/2012CN101284643B Method for fabricating a structure for a microelectromechanical systems (MEMS) device
01/18/2012CN101276152B Drawing apparatus
01/18/2012CN101208298B Hydrofluoroalkanesulfonic acids and salts from fluorovinyl ethers
01/18/2012CN101124516B Pattern formation material, pattern formation device, and pattern formation method
01/18/2012CN101051189B Lithographic processing cell and device manufacturing method
01/17/2012US8098012 Photo-sensitive composition, photo-sensitive paste composition for barrier ribs comprising the same, and method for preparing barrier ribs for plasma display panel
01/17/2012US8097402 Using electric-field directed post-exposure bake for double-patterning (D-P)
01/17/2012US8097401 Self-forming top anti-reflective coating compositions and, photoresist mixtures and method of imaging using same
01/17/2012US8097400 Method for forming an electronic device
01/17/2012US8097399 Photocurable compositions
01/17/2012US8097398 Method for manufacturing semiconductor device
01/17/2012US8097397 Material for formation of protective film, method for formation of photoresist pattern, and solution for washing/removal of protective film
01/17/2012US8097396 Reduced defects; improved shape and stability of latent image; comprised of acrylate copolymer having lactone ring and polycyclic ring containing monomers; increased alkali solubility under action of acid generator upon exposure
01/17/2012US8097386 Positive-type photosensitive resin composition, method for producing patterns, and electronic parts
01/17/2012US8097329 Thin film device having thin film elements and thin film pattern on thin film elements, and method of fabricating the same
01/17/2012US8097311 Seamless master and method of making same
01/17/2012US8097189 Method for manufacturing optical disc master and method for manufacturing optical disc
01/17/2012US8097118 Method for manufacturing liquid ejection head
01/17/2012US8097092 Method of cleaning and after treatment of optical surfaces in an irradiation unit
01/17/2012CA2416412C Dry multilayer inorganic alloy thermal resist for lithographic processing and image creation
01/12/2012WO2012006521A1 Enhanced densification of silicon oxide layers
01/12/2012WO2012005813A1 Method of improving print performance in flexographic printing plates
01/12/2012WO2012005418A1 Compound containing an aromatic ring for a resist underlayer, resist underlayer composition including same, and method for forming a pattern of a device using same
01/12/2012WO2012005203A1 Triarylmethane-based colorant, coloring composition, color filter, and display element
01/12/2012WO2012004976A1 Method for forming cured film
01/12/2012WO2012004745A1 A method and apparatus for printing a periodic pattern with large depth of focus
01/12/2012WO2012004319A1 Method for producing finely structured surfaces
01/12/2012WO2011138340A3 Substrates for mirrors for euv lithography and their production
01/12/2012WO2011087896A3 Nanopatterning method and apparatus
01/12/2012US20120009795 Chemically amplified resist material and pattern formation method using the same
01/12/2012US20120009662 Method of fabricating microfluidic systems
01/12/2012US20120009529 Patterning process
01/12/2012US20120009528 Coating and developing apparatus and method
01/12/2012US20120009527 Patterning process
01/12/2012US20120009526 Method of Forming Fine Patterns
01/12/2012US20120009525 Method and apparatus for printing a periodic pattern with a large depth of focus
01/12/2012US20120009524 Material and method for photolithography
01/12/2012US20120009523 Method for forming contact hole of semiconductor device
01/12/2012US20120009522 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same
01/12/2012US20120009521 Resist composition, method of forming resist pattern, compound and acid generator
01/12/2012US20120009520 Positive resist composition and method of forming resist pattern
01/12/2012US20120009519 Compound, resin and photoresist composition
01/12/2012US20120009509 Generation method, creation method, exposure method, device fabrication method, storage medium, and generation apparatus
01/12/2012US20120009508 Laser marking hologram having a volume hologram with interference fringes using selective irradiation
01/12/2012US20120009390 Guided self-assembly of block copolymer line structures for integrated circuit interconnects
01/12/2012US20120008125 Imaging optics and projection exposure installation for microlithography with an imaging optics
01/12/2012US20120008124 Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type
01/12/2012US20120008117 Lithographic apparatus and device manufacturing method
01/12/2012US20120008111 Exposure apparatus, and device manufacturing method
01/12/2012US20120006788 Chemical amplification resist composition, and mold preparation method and resist film using the same
01/12/2012DE102011004607A1 Weight compensation device of actuator used in lithography device, has axial permanent magnets whose poles are connected to coils for feeding magnetic flux of magnetic circuits formed by magnets, to coils
01/11/2012EP2405301A1 Manufacturing method for multi-level metal parts through a LIGA type process and parts obtained using the method
01/11/2012EP2405300A1 Manufacturing method for multi-level metal parts through an LIGA type method and parts obtained using the method
01/11/2012EP2404755A1 Flat film and method for manufacturing same
01/11/2012EP2404222A1 Rotor optics imaging method and system with variable dose during sweep
01/11/2012EP2404221A1 Illumination system for use in a stereolithography apparatus
01/11/2012EP2404220A1 Illumination system for use in a stereolithography apparatus
01/11/2012EP2404219A1 Rotor imaging system and method with variable-rate pixel clock
01/11/2012EP2404218A1 Illumination system, lithographic apparatus and method of forming an illumination mode
01/11/2012EP2150854B1 Die for micro-contact printing and method for the production thereof
01/11/2012EP2142960B1 Negative photoresist resistant to concentrated aqueous bases for silicon wet-etch without silicon nitride
01/11/2012EP2109001B1 Positive photosensitive resin composition
01/11/2012EP2083326B1 Photosensitive resin composition, insulating film, protective film, and electronic equipment
01/11/2012EP2024790B1 Nanoparticle patterning process
01/11/2012EP1901336B1 Exposure apparatus
01/11/2012EP1685447B1 Method for producing flexographic printing forms by thermal development
01/11/2012EP1649325B1 Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system
01/11/2012EP1576040B1 Patterned polymeric structures, particularly microstructures, and methods for making same
01/11/2012EP1563343B1 Antireflective compositions for photoresists
01/11/2012EP1269258B1 Organic polymeric antireflective coatings deposited by chemical vapor deposition
01/11/2012CN202110374U Developing line defoaming device
01/11/2012CN1979337B Method for producing liquid ejecting recording head
01/11/2012CN1954272B Hologram recording material and hologram recording medium
01/11/2012CN1954271B Hologram recording material and hologram recording medium
01/11/2012CN1752846B Mask patterns including gel layers for semiconductor device fabrication and methods of forming the same
01/11/2012CN102318010A Multilayer mirror and lithographic apparatus
01/11/2012CN102317869A Developer waste reuse
01/11/2012CN102317868A Projection illumination method, projection illumination system, laser beam source and bandwidth narrowing module for a laser beam source
01/11/2012CN102317867A Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type
01/11/2012CN102317866A Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type
01/11/2012CN102317865A Multi-table lithographic systems
01/11/2012CN102317864A Photosensitive resin composition, and photosensitive element, resist pattern formation method and printed circuit board production method each utilizing same