| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/25/2012 | CN101529338B Method of neutralizing developer waste liquid containing tetraalkylammonium hydroxide |
| 01/25/2012 | CN101510051B Inspection method and equipment, photolithography equipment and method for manufacturing photolithography processing unit and device |
| 01/25/2012 | CN101424814B PDLC grating of LCD equipment and making method |
| 01/25/2012 | CN101416116B Method for forming surface unevenness |
| 01/25/2012 | CN101393399B Laser direct imaging apparatus |
| 01/25/2012 | CN101349867B Organic-inorganic compound sensitization resin composition and LCD element using sclerotium thereof |
| 01/25/2012 | CN101324751B Multiple tools using a single data processing unit |
| 01/25/2012 | CN101299134B Lithographic apparatus and method |
| 01/25/2012 | CN101071267B Photoresist compositions |
| 01/25/2012 | CN101030042B Lithographic apparatus and device manufacturing method |
| 01/24/2012 | US8103976 Photo mask set for forming multi-layered interconnection lines and semiconductor device fabricated using the same |
| 01/24/2012 | US8102504 Exposure apparatus, exposure method, and method for producing device |
| 01/24/2012 | US8102502 Lithographic apparatus and device manufacturing method |
| 01/24/2012 | US8102501 Immersion lithography fluid control system using an electric or magnetic field generator |
| 01/24/2012 | US8101519 Mold, manufacturing method of mold, method for forming patterns using mold, and display substrate and display device manufactured by using method for forming patterns |
| 01/24/2012 | US8101341 Patterning process |
| 01/24/2012 | US8101340 Method of inhibiting photoresist pattern collapse |
| 01/24/2012 | US8101339 Photosensitive resin composition, photosensitive element comprising the same, method of forming resist pattern, and process for producing printed wiring board |
| 01/24/2012 | US8101338 Method of forming micro pattern of semiconductor device |
| 01/24/2012 | US8101336 Photocurable and thermosetting resin composition, cured product thereof, and printed circuit board |
| 01/24/2012 | US8101335 Resist composition and patterning process |
| 01/24/2012 | US8101334 Image processing method and image processing apparatus |
| 01/24/2012 | US8101333 Method for formation of miniaturized pattern and resist substrate treatment solution for use in the method |
| 01/24/2012 | US8101332 Negative-working lithographic printing plate precursor and method of lithographic printing using same |
| 01/24/2012 | US8101325 Azo compound, curable composition, color filter, and method of producing the same |
| 01/24/2012 | US8100055 Photosensitive layer soluble or dispersible in ink and/or fountain solution and capable of hardening upon exposure to laser |
| 01/19/2012 | WO2012009197A2 Projection system with metrology |
| 01/19/2012 | WO2012008736A2 Positive-type photosensitive resin composition and black bank of an organic light-emitting device including same |
| 01/19/2012 | WO2012008686A2 Printing plate and method of manufacturing the same |
| 01/19/2012 | WO2012008606A1 Liquid immersion member and immersion exposure apparatus |
| 01/19/2012 | WO2012008605A1 Liquid immersion member and immersion exposure apparatus |
| 01/19/2012 | WO2012008604A1 Liquid immersion member and immersion exposure apparatus |
| 01/19/2012 | WO2012008546A1 Radiation-sensitive resin composition, polymer, and resist pattern forming method |
| 01/19/2012 | WO2012008538A1 Polysiloxane composition and method of pattern formation |
| 01/19/2012 | WO2012008510A1 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the same |
| 01/19/2012 | WO2012008472A1 Photosensitive resin composition and cured product thereof |
| 01/19/2012 | WO2012008360A1 Coloring agent, coloring composition, color filter and display element |
| 01/19/2012 | WO2012008310A1 Developer liquid for photoresist and developing apparatus |
| 01/19/2012 | WO2012008204A1 Method for forming conductive film pattern |
| 01/19/2012 | US20120015307 Coating and developing apparatus and method, and storage medium |
| 01/19/2012 | US20120015306 Illumination optical system, exposure apparatus, and device manufacturing method |
| 01/19/2012 | US20120015305 Digital optical chemistry micromirror imager |
| 01/19/2012 | US20120015304 Method for fabricating an interposer |
| 01/19/2012 | US20120015303 Drawing apparatus and method of manufacturing article |
| 01/19/2012 | US20120015302 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same |
| 01/19/2012 | US20120015301 Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition |
| 01/19/2012 | US20120015300 Photosensitive resin composition |
| 01/19/2012 | US20120015299 Resist composition, method of forming resist pattern, novel compound, and acid generator |
| 01/19/2012 | US20120015298 Photosensitive resin composition and cured film |
| 01/19/2012 | US20120015297 Resist composition, method of forming resist pattern, novel compound, and acid generator |
| 01/19/2012 | US20120015296 Photosensitive resin composition for flexographic printing having excellent solvent resistance |
| 01/19/2012 | US20120015295 Infrared-sensitive composition for printing plate precursors |
| 01/19/2012 | US20120015294 Imaging element having a photoluminescent tag and process of using the imaging element to form a recording element |
| 01/19/2012 | US20120015293 Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same |
| 01/19/2012 | US20120015289 Alignment method and method for manufacturing flat panel display |
| 01/19/2012 | US20120015288 Member for masking film, process for producing masking film using the same, and process for producing photosensitive resin printing plate |
| 01/19/2012 | US20120015286 Mask blank substrate, mask blank, photomask, and methods of manufacturing the same |
| 01/19/2012 | US20120014646 Optical fiber, method of preparation thereof and device |
| 01/19/2012 | US20120013878 Projection Exposure System, Beam Delivery System and Method of Generating a Beam of Light |
| 01/19/2012 | US20120013874 Lithographic apparatus and device manufacturing method |
| 01/19/2012 | US20120013872 Lithographic apparatus and device manufacturing method |
| 01/19/2012 | US20120013870 Lithographic apparatus and device manufacturing method |
| 01/19/2012 | US20120013869 Lithographic apparatus and device manufacturing method |
| 01/19/2012 | US20120013868 Lithographic apparatus and device manufacturing method |
| 01/19/2012 | US20120013867 Lithographic apparatus and device manufacturing method |
| 01/19/2012 | US20120013861 Apparatus and method for providing fluid for immersion lithography |
| 01/19/2012 | US20120012366 Polyamic acid, polyimide, photosensitive resin composition comprising the same, and dry film manufactured from the same |
| 01/19/2012 | DE19946447B4 Teilchenoptisches Abbildungssystem für Lithographiezwecke A particle imaging system for lithography purposes |
| 01/19/2012 | DE102010031527A1 Verfahren zur Herstellung von Flexodruckformen umfassend die Bestrahlung mit UV-LEDs A process for preparing flexographic printing plates comprising the irradiation with UV-LEDs |
| 01/19/2012 | DE102010027596A1 Verfahren zur Herstellung eines Gitters und Phasenkontrast-Röntgensystem A process for producing a grid and phase contrast X-ray system |
| 01/19/2012 | DE102006042987B4 Verfahren zum Betrieb einer EUV-Lithographievorrichtung, reflektives optisches Element für EUV-Lithographievorrichtung und Verfahren zu dessen Reinigung Method for operating an EUV lithography apparatus reflective optical element for EUV lithography apparatus and method for cleaning |
| 01/18/2012 | EP2408008A1 Film for spacer formation, semiconductor wafer, and semiconductor device |
| 01/18/2012 | EP2407828A1 Optical element and illumination optics for microlithography |
| 01/18/2012 | EP2406688A1 Reducing foam formation |
| 01/18/2012 | EP2406687A1 Negative-working imageable elements with overcoat |
| 01/18/2012 | EP2406686A1 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition |
| 01/18/2012 | EP2406318A2 Radiation curable resin composition and rapid three-dimensional imaging process using the same |
| 01/18/2012 | EP2406207A1 Process for the preparation of crystalline mixtures of alpha-hydroxycarbonyl derivatives of alpha-methylstyrene dimers |
| 01/18/2012 | EP2285836B1 Photoinitiator mixtures |
| 01/18/2012 | EP1947682B1 Multilayer reflecting mirror, multilayer reflecting mirror manufacturing method, optical system, exposure apparatus and device manufacturing method |
| 01/18/2012 | EP1614000B1 Immersion lithographic apparatus |
| 01/18/2012 | EP1543384B1 Composition which forms an electrically-conducting protective coat and a method for structuring a photoresist using the protective layer |
| 01/18/2012 | CN202120037U Exposure device and stepper |
| 01/18/2012 | CN202120036U Exposing machine with temperature adjusting function |
| 01/18/2012 | CN1690852B Glass composition for silver paste, photosensitive silver paste using same, electrode pattern and plasma display panel |
| 01/18/2012 | CN102326234A Substrate treatment device and treatment method |
| 01/18/2012 | CN102325843A Dispersion composition, polymerizable composition, opaque color filter, liquid crystal display element equipped with opaque color filter, solid state imaging element, wafer-level lens, and imaging unit equipped with wafer-level lens |
| 01/18/2012 | CN102325819A Starting liquid for forming protective film, protective film, and wired substrate having protective film |
| 01/18/2012 | CN102324397A Substrate processing system and substrate transfer method |
| 01/18/2012 | CN102323728A Development defoaming device |
| 01/18/2012 | CN102323727A Lithographic apparatus and device manufacturing method |
| 01/18/2012 | CN102323726A Method for realizing high-precision gray scale exposure by scanning |
| 01/18/2012 | CN102323725A Method of preparing a substrate for lithography, a substrate, a device manufacturing method, a sealing coating applicator and a sealing coating measurement apparatus |
| 01/18/2012 | CN102323724A Liquid immersion exposure apparatus, producing method thereof, exposure apparatus and device producing method |
| 01/18/2012 | CN102323723A Optimization method of optical proximity effect correction based on Abbe vector imaging model |
| 01/18/2012 | CN102323722A Method for acquiring mask space image based on Abbe vector imaging model |
| 01/18/2012 | CN102323721A Method for obtaining space image of non-ideal lithography system based on Abbe vector imaging model |
| 01/18/2012 | CN102323720A Flexible micro-positioning platform based on driving of piezoelectric ceramics |
| 01/18/2012 | CN102323719A Continuous exposure method and device |
| 01/18/2012 | CN102323718A Defect monitoring method of photoresist coating process |