Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
02/2012
02/01/2012CN101300317B 用于193nm沉浸平版印刷的水可浇铸-水可剥离的面涂层 For 193nm immersion lithography is water castable - Water strippable topcoats
02/01/2012CN101273302B 光掩模和使用该光掩模的曝光方法 Use of the photomask and a photomask exposure method
02/01/2012CN101266951B 显示装置的栅极驱动电路以及制作显示装置的器件的方法 The gate driving circuit of the display device and the production method of the display device of the device
02/01/2012CN101246231B 一种半反半透彩色滤光片的制作方法 A semi-reflective semi-transparent color filter manufacturing method
02/01/2012CN101122751B 用于一显影机台的液体回收装置及包含该装置的显影机台 A developing machine for liquid recovery units and contains a developing machine of the device
02/01/2012CN101107567B 正型抗蚀剂组合物及抗蚀图案的形成方法 The method for forming a positive type resist composition and a resist pattern
01/2012
01/31/2012US8107162 Catadioptric projection objective with intermediate images
01/31/2012US8107085 Methods and systems for interferometric analysis of surfaces and related applications
01/31/2012US8107055 Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure method, device manufacturing method
01/31/2012US8106195 Polymer and compositions
01/31/2012US8106107 Compositions and methods for use in three dimensional model printing
01/31/2012US8105765 Method of manufacturing a semiconductor device
01/31/2012US8105764 Patterning process
01/31/2012US8105763 Method of forming plated product using negative photoresist composition and photosensitive composition used therein
01/31/2012US8105762 Method for forming pattern using printing process
01/31/2012US8105761 Ink jet recording head manufacturing method
01/31/2012US8105760 Patterning process and pattern surface coating composition
01/31/2012US8105759 Photosensitive resin composition, and, photosensitive element, method for forming resist pattern, method for manufacturing printed wiring board and method for manufacturing partition wall for plasma display panel using the composition
01/31/2012US8105756 Method for preparing a printing form using vibrational energy
01/31/2012US8105755 Method for processing of photopolymer printing plates with overcoat
01/31/2012US8105753 System, method and apparatus for pattern clean-up during fabrication of patterned media using forced assembly of molecules
01/31/2012US8105752 Photosensitive polyimides
01/31/2012US8105751 Planographic printing plate precursor and pile of planographic printing plate precursors
01/31/2012US8105749 Polymer compound, positive resist composition, and method of forming resist pattern
01/31/2012US8105748 Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process
01/31/2012US8105747 Positive resist composition and method of forming resist pattern
01/31/2012US8105746 Tertiary alcohol derivative, polymer compound and photoresist composition
01/31/2012US8105745 Radiation crosslinker
01/31/2012US8105738 Developing method
01/31/2012US8105457 Method for joining at least a first member and a second member, lithographic apparatus and device manufacturing method, as well as a device manufactured thereby
01/31/2012US8104515 Microfabricated elastomeric valve and pump systems
01/26/2012WO2012012067A1 D1492 liquid bapo photoinitiator and its use in radiation curable compositions
01/26/2012WO2012011605A1 Liquid immersion member and cleaning method
01/26/2012WO2012011497A1 Light irradiation device for exposure apparatus, method for controlling light irradiation device, exposure apparatus, and exposure method
01/26/2012WO2012011411A1 Fluid processing device and fluid processing method
01/26/2012WO2012010459A1 Method for producing flexographic printing plates using uv-led irradiation
01/26/2012WO2012010458A1 Method and apparatus for determining an overlay error
01/26/2012WO2012009968A1 Photoresist cleaning solution
01/26/2012WO2010084033A3 Composition for post chemical-mechanical polishing cleaning
01/26/2012US20120021361 Radiation-protection device
01/26/2012US20120021360 Method of manufacturing liquid ejection head
01/26/2012US20120021359 Upper layer-forming composition and resist patterning method
01/26/2012US20120021358 Process for making lithographic printing plate, developer for lithographic printing plate precursor, and replenisher for lithographic printing plate precursor development
01/26/2012US20120021357 Positive-type photosensitive insulating resin composition, and pattern forming method using same
01/26/2012US20120021356 Lithographic printing plate support and presensitized plate
01/26/2012US20120021355 Coating composition for duv filtering, method of forming photoresist pattern using the same and method of fabricating semiconductor device by using the method
01/26/2012US20120021354 Colored curable composition, color resist, ink-jet ink, color filter and method for producing the same, solid-state image pickup device, image display device, liquid crystal display, organic el display, and colorant compound and tautomer thereof
01/26/2012US20120021342 Photomask having transcribing pattern and method of forming photoresist pattern using the same
01/26/2012US20120021341 Substrate to be processed having laminated thereon resist film for electron beam and organic conductive film, method for manufacturing the same, and resist patterning process
01/26/2012US20120021190 Photosensitive resin composition, method for forming silica coating film, and apparatus and member each comprising silica coating film
01/26/2012US20120021139 Manufacturing method of display device and mold therefor
01/26/2012US20120019805 Calculation method, generation method, program, exposure method, and mask fabrication method
01/26/2012US20120019800 Lithography projection objective, and a method for correcting image defects of the same
01/26/2012US20120019798 Positioning unit and alignment device for an optical element
01/26/2012US20120019792 Liquid jet and recovery system for immersion lithography
01/26/2012US20120018891 Methods to form self-aligned permanent on-chip interconnect structures
01/26/2012DE102011078231A1 Light modulation device for use in lighting system for micro lithography projection exposure plant to manufacture e.g. semiconductor components, has prism surface whose angle is measured such that total beams are steered on another surface
01/26/2012DE10085131B3 Strahlpositionierung beim mikrolithographischen Schreiben Beam positioning in microlithography letter
01/26/2012CA2804841A1 Method for producing flexographic printing plates using uv-led irradiation
01/25/2012EP2410379A2 Substrate to be processed having laminated thereon resist film for electron beam and organic conductive film, method for manufacturing the same, and resist pattering process
01/25/2012EP2409195A2 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
01/25/2012EP2113811B1 Composition for antireflective coating
01/25/2012EP1754191B1 Characterizing a digital imaging system
01/25/2012EP1743278B1 High throughput image for processing inspection images
01/25/2012CN202126568U Filter of PCB (Printed Circuit Board) developing solution
01/25/2012CN202126567U Tossing and painting machine
01/25/2012CN202126566U Hole sealing groove for producing photosensitive printing PS plates
01/25/2012CN1983024B Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask
01/25/2012CN1743957B Apparatus and method for coating photoresist
01/25/2012CN102334070A Exposure apparatus
01/25/2012CN102334069A Multipurpose acidic, organic solvent based microelectronic cleaning composition
01/25/2012CN102334068A Block copolymer composition for flexographic printing plates
01/25/2012CN102333797A Compounds, fluorine-containing polymers, and radiation -sensitive resin compositions
01/25/2012CN102332276A Manufacturing method of master disc for optical disc, and master disc for optical disc
01/25/2012CN102331689A Method and equipment for stripping photoresistance
01/25/2012CN102331688A Pupil uniformity compensation device
01/25/2012CN102331687A Step optical processing system and processing method
01/25/2012CN102331686A Immersion lithography system
01/25/2012CN102331685A Method for improving resolution of digital maskless photoetching
01/25/2012CN102331684A Photosensitive element, formation method of corrosion-resisting pattern, manufacture method of printing circuit wiring board and printing circuit wiring board
01/25/2012CN102331634A Display device, laser transfer printing method and laser transfer printing color plate
01/25/2012CN102331616A Fully-spherical projection objective
01/25/2012CN102331596A Colored resin composition and method for forming multicolor optical filter
01/25/2012CN102331595A Liquid crystal display panel, colour filter and manufacturing method of colour filter
01/25/2012CN102331594A Method for manufacturing step-type phase grating
01/25/2012CN102331593A Self-supporting nano-transmission grating with high duty ratio and manufacturing method thereof
01/25/2012CN102329403A Polymer for forming resist protection film, composition for forming resist protection film, and method of forming patterns of semiconductor devices using the composition
01/25/2012CN102328905A Manufacturing device nano structure array and production method
01/25/2012CN101930174B Two-photon photo-acid generator containing triphenylamine as electron donating group and preparation method thereof
01/25/2012CN101924087B Inversed-chip lug structure and manufacturing process thereof
01/25/2012CN101923283B Nano-imprint resist and nano-imprint method adopting same
01/25/2012CN101923282B Nano-imprint resist and nano-imprint method adopting same
01/25/2012CN101916038B Method for processing round arrays by electronic beam photo-etching
01/25/2012CN101847576B Method for preparing ultra-narrow groove
01/25/2012CN101819385B Exposing method and device manufacturing method
01/25/2012CN101762993B Method for removing photoresist and method for manufacturing connecting hole
01/25/2012CN101673058B Lithographic apparatus and device manufacturing method
01/25/2012CN101634805B Peripheral shading mask structure used for manufacturing semiconductor wafer and manufacturing method thereof
01/25/2012CN101592865B Printing plate producing method applying liquid photosensitive resin bag, and apparatus thereof
01/25/2012CN101551603B Method for patterning a photosensitive layer