| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/02/2012 | WO2012013751A1 Euv exposure apparatus |
| 02/02/2012 | WO2012013748A1 Euv exposure apparatus |
| 02/02/2012 | WO2012013747A1 Euv exposure apparatus |
| 02/02/2012 | WO2012013746A1 Euv exposure apparatus |
| 02/02/2012 | WO2012013638A1 Lithographic targets for uniformity control |
| 02/02/2012 | WO2012013559A1 Arrangement for and method of damping a shock loading of an optical system |
| 02/02/2012 | WO2012013451A1 Lithographic apparatus and device manufacturing method |
| 02/02/2012 | WO2012013320A2 Method and apparatus for qualifying optics of a projection exposure tool for microlithography |
| 02/02/2012 | WO2012013241A1 Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type |
| 02/02/2012 | WO2012013227A1 Facet mirror device |
| 02/02/2012 | WO2011072199A3 Water-soluble degradable photo-crosslinker |
| 02/02/2012 | WO2011051648A3 A method of making a patterned dried polymer and a patterned dried polymer |
| 02/02/2012 | US20120028871 Stripping compositions for cleaning ion implanted photoresist from semiconductor device wafers |
| 02/02/2012 | US20120028811 Device for rapid identification of nucleic acids for binding to specific chemical targets |
| 02/02/2012 | US20120028198 Upper layer-forming composition and photoresist patterning method |
| 02/02/2012 | US20120028197 Transmission optical system, illumination optical system, exposure apparatus, and device manufacturing method |
| 02/02/2012 | US20120028196 Method of forming pattern and organic processing liquid for use in the method |
| 02/02/2012 | US20120028195 Composition for Coating over a Photoresist Pattern |
| 02/02/2012 | US20120028194 Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask |
| 02/02/2012 | US20120028193 Birefringence pattern builder |
| 02/02/2012 | US20120028191 Azide Functionalized Poly(3-Hexylthiophene) and Method of Forming Same |
| 02/02/2012 | US20120028190 Polymer, chemically amplified negative resist composition, and patterning process |
| 02/02/2012 | US20120028189 Radiation-sensitive resin composition, method for forming resist pattern, polymer and compound |
| 02/02/2012 | US20120028188 Photoresist composition |
| 02/02/2012 | US20120028174 Defense System in Advanced Process Control |
| 02/02/2012 | US20120026435 Color filter and color filter manufacturing method |
| 02/02/2012 | US20120026102 Electronic apparatus and method of fabricating the same |
| 02/02/2012 | US20120024816 Method for fabricating touch sensor panels |
| 02/02/2012 | DE102010038697A1 Verfahren und Vorrichtung zur Qualifizierung einer Optik einer Projektionsbelichtungsanlage für die Mikrolithographie Method and apparatus for classifying a look of a projection exposure system for microlithography |
| 02/02/2012 | DE102005033916B4 Ausrichtung eines MTJ-Stapels an Leiterbahnen in Abwesenheit von Topographie Orientation of a MTJ stack of printed conductors in the absence of topography |
| 02/01/2012 | EP2413195A2 Pattern forming method |
| 02/01/2012 | EP2413194A2 Pattern forming method |
| 02/01/2012 | EP2413193A2 Exposure apparatus including the exposure head and control method thereof |
| 02/01/2012 | EP2413192A1 Polymerizable monomers |
| 02/01/2012 | EP2413191A1 Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith |
| 02/01/2012 | EP2413190A1 Curable coloring composition, color filter and method for producing same, and quinophthalone dye |
| 02/01/2012 | EP2413189A1 A method for spreading a conformable material between a substrate and a template |
| 02/01/2012 | EP2412733A1 Polymer, chemically amplified negative resist composition, and patterning process |
| 02/01/2012 | EP2412686A2 Highly reflective, hardened silica-titania article and method of making |
| 02/01/2012 | EP2412665A1 Process for manufacturing a micromechanical structure having a buried area provided with a filter |
| 02/01/2012 | EP2412004A2 Methods of forming patterns on substrates |
| 02/01/2012 | EP2411874A1 Compositions and methods for removing organic substances |
| 02/01/2012 | EP2411873A1 Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same and pattern forming method |
| 02/01/2012 | EP2411499A2 Compositions and methods for removing organic substances |
| 02/01/2012 | EP2411475A1 Pigment dispersion, colored curable composition, color filter and method of manufacturing the same |
| 02/01/2012 | EP2411430A1 Photoresist composition |
| 02/01/2012 | EP2114675B1 Photopolymerizable flexographic printing elements and hard flexographic printing formes which are produced therefrom |
| 02/01/2012 | EP2087403B1 Imprint method for forming a relief layer and use of it as an etch mask |
| 02/01/2012 | EP1810078B1 Method for thermally processing photosensitive printing sleeves |
| 02/01/2012 | CN202133860U 光刻对准标记 Lithography alignment marks |
| 02/01/2012 | CN202133859U 改善光照均匀性的光刻机 Improve illumination uniformity Lithography |
| 02/01/2012 | CN202133858U 一种大面积投影光刻系统 One kind of large-area projection lithography system |
| 02/01/2012 | CN202133857U 差分调整装置 Differential adjustment device |
| 02/01/2012 | CN202133856U 减振平台 Vibration Platform |
| 02/01/2012 | CN1955840B 光掩膜基板的制造方法 The method of manufacturing a photomask substrate |
| 02/01/2012 | CN1752852B 用于剥离光刻胶的组合物及薄膜晶体管阵列面板制造方法 The photoresist stripping compositions and method of manufacturing the thin film transistor array panel for |
| 02/01/2012 | CN102341908A Film for spacer formation, semiconductor wafer, and semiconductor device |
| 02/01/2012 | CN102341888A Methods of forming patterns |
| 02/01/2012 | CN102341756A Reducing foam formation |
| 02/01/2012 | CN102341755A Optical lithography apparatus |
| 02/01/2012 | CN102341754A Illumination system, lithographic apparatus and method of forming an illumination mode |
| 02/01/2012 | CN102341753A Photosensitive resin composition, and photosensitive element, resist pattern formation method and printed circuit board production method each utilizing same |
| 02/01/2012 | CN102341738A Imaging optics and projection exposure installation for microlithography with imaging optics of this type |
| 02/01/2012 | CN102341366A Adamantane derivative, method for producing same, polymer using same as starting material, and resin composition |
| 02/01/2012 | CN102339774A Substrate cleaning apparatus, coating and developing apparatus having the same and substrate cleaning method |
| 02/01/2012 | CN102339747A Zero scale forming method |
| 02/01/2012 | CN102339733A Method for controlling critical size of graph on uneven silicon slice surface |
| 02/01/2012 | CN102338995A ITO (indium tin oxide) membrane photoetching automatic recognition positioning method |
| 02/01/2012 | CN102338994A Cleaning solution for photoresist |
| 02/01/2012 | CN102338993A Device and method for removing glue from sample wafer |
| 02/01/2012 | CN102338992A Assembly of a reticle holder and a reticle |
| 02/01/2012 | CN102338991A Prealignment method for laser displacement sensor control |
| 02/01/2012 | CN102338990A Substrate processing apparatus, substrate processing method and non-transitory computer storage medium |
| 02/01/2012 | CN102338989A Parallel laser direct write device for prolonging focal depth |
| 02/01/2012 | CN102338988A Method for improving overlay test accuracy |
| 02/01/2012 | CN102338987A Lithographic device |
| 02/01/2012 | CN102338986A Organic-inorganic composite laser thermal-etching film and micro-nano graph preparation method |
| 02/01/2012 | CN102338985A Environment-friendly type photosensitive resist for hydroxyl-containing hydrocarbyl bicyclic guanidine senecionine generation agent |
| 02/01/2012 | CN102338984A Coating and developing apparatus, coating and developing method, and storage medium |
| 02/01/2012 | CN102338983A Method of fabricating pattern |
| 02/01/2012 | CN102338982A Methods of forming photolithographic patterns |
| 02/01/2012 | CN102336910A Low temperature curable polyimide resin and method of preparing the same |
| 02/01/2012 | CN102336873A Curable resin composition |
| 02/01/2012 | CN102336707A Pyridone azo chloro compounds |
| 02/01/2012 | CN101963766B 一种用于光刻机的掩模预对准装置及方法 A lithography mask device and a method for pre-alignment |
| 02/01/2012 | CN101930090B 一种多圆环光束整形器及其制作方法 A multi-ring beam shaper and its production method |
| 02/01/2012 | CN101813893B 一种采用曝光方式标定曝光能量需求分布的方法 One kind of exposure using the exposure mode calibration method for the distribution of energy demand |
| 02/01/2012 | CN101813888B 一种重氮感光胶热稳定性和光化学活性的调控方法 One kind of diazo photosensitive plastic thermal stability and photochemical activity regulation method |
| 02/01/2012 | CN101750904B 用于平板显示设备的制造工艺的曝光装置 Process for the manufacture of flat panel display apparatus of an exposure apparatus |
| 02/01/2012 | CN101676804B 光刻设备和运行该设备的方法 The lithographic apparatus and method of operation of the device |
| 02/01/2012 | CN101556905B 热处理装置和热处理方法 Heat treatment apparatus and heat treatment method |
| 02/01/2012 | CN101551592B 图案描画装置及图案描画方法 Apparatus and method for pattern design drawing drawing |
| 02/01/2012 | CN101526754B 掩模版承版台及其光刻设备 Reticle and lithography equipment bearing version sets |
| 02/01/2012 | CN101482700B 着色感光性树脂组成物 The colored photosensitive resin composition |
| 02/01/2012 | CN101477265B 液晶显示装置、多视角液晶显示面板及其制造方法 The liquid crystal display device, and method of manufacturing the multi-angle panel LCD |
| 02/01/2012 | CN101434894B 用于清洗半导体基质上无机残渣含有铜特效腐蚀抑制剂的含水清洗组合物 The aqueous cleaning composition for cleaning a semiconductor substrate of the inorganic residue containing copper corrosion inhibitor effects |
| 02/01/2012 | CN101382739B 微型平台装置 Mini-platform device |
| 02/01/2012 | CN101359188B 带状工件的曝光装置及带状工件的曝光装置的聚焦调整方法 The focus adjustment method for the belt-like work of the exposure apparatus and exposure apparatus |
| 02/01/2012 | CN101355019B 基板清洗装置及具有该基板清洗装置的基板处理装置 Substrate cleaning apparatus and a substrate processing apparatus having the substrate cleaning apparatus |
| 02/01/2012 | CN101344728B 一种光刻机投影物镜波像差在线测量装置及方法 A lithographic projector lens apparatus and method for the wavefront aberration measurement line |