| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/09/2012 | US20120034564 Positive resist composition and pattern forming method |
| 02/09/2012 | US20120034563 Resist composition and method for producing resist pattern |
| 02/09/2012 | US20120034562 Coating composition for use with an overcoated photoresist |
| 02/09/2012 | US20120034561 Resist polymer and resist composition |
| 02/09/2012 | US20120034560 Radiation-sensitive resin composition, method for forming resist pattern and polymer |
| 02/09/2012 | US20120034559 Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith |
| 02/09/2012 | US20120034558 Photolithography material for immersion lithography processes |
| 02/09/2012 | US20120034557 Method for preparing alignment mark for multiple patterning |
| 02/09/2012 | US20120034554 Method for Fracturing and Forming a Pattern Using Circular Characters with Charged Particle Beam Lithography |
| 02/09/2012 | US20120034553 Photomask Blank, Photomask, and Pattern Transfer Method Using Photomask |
| 02/09/2012 | US20120034419 Methods of producing structures using a developer-soluble layer with multilayer technology |
| 02/09/2012 | US20120033296 Projection objective for a microlithographic projection exposure apparatus |
| 02/09/2012 | US20120033192 Exposure apparatus, exposure method, and device producing method |
| 02/09/2012 | US20120032898 Projected capacitive touch panel and fabrication method thereof |
| 02/09/2012 | US20120032377 Apparatus and method for aligning surfaces |
| 02/09/2012 | US20120032336 Self-aligned permanent on-chip interconnect structure formed by pitch splitting |
| 02/09/2012 | US20120031556 Sacrificial Polymer Compositions Including Polycarbonates Having Repeat Units Derived from Stereospecific Polycyclic 2,3-Diol Monomers |
| 02/08/2012 | EP2416218A1 Precursor for direct printing-type waterless lithographic printing plate and method for producing same |
| 02/08/2012 | EP2416217A1 Member for masking film, process for producing masking film using same, and process for producing photosensitive resin printing plate |
| 02/08/2012 | EP2414898A1 Extreme ultraviolet light source with a debris-mitigated and cooled collector optics |
| 02/08/2012 | EP2414897A1 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same |
| 02/08/2012 | EP2414896A1 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same |
| 02/08/2012 | EP2414895A1 Laser imaging |
| 02/08/2012 | EP2414884A1 Imaging optics and projection exposure installation for microlithography with an imaging optics of this type |
| 02/08/2012 | EP2414174A1 Relief printing plate, plate-making method for the relief printing plate and plate-making apparatus for the relief printing plate |
| 02/08/2012 | EP2279454B1 Photopolymerizable flexographic printing elements for printing with uv inks |
| 02/08/2012 | EP2260351B1 Negative-working lithographic printing plate precursors with improved abrasion resistance |
| 02/08/2012 | EP1487922B1 Azo dyes |
| 02/08/2012 | CN202142509U 喷淋装置 Sprinkler |
| 02/08/2012 | CN202141887U 带有排气处理设备的干膜制造系统 With an exhaust gas treatment device manufacturing system of a dry film |
| 02/08/2012 | CN1873543B 光致抗蚀剂用剥离液 With a photoresist stripping solution |
| 02/08/2012 | CN1637593B 掩模 Mask |
| 02/08/2012 | CN102349026A Microlithographic projection exposure apparatus |
| 02/08/2012 | CN102349025A Negative-working imageable elements with overcoat |
| 02/08/2012 | CN102348671A Process for the preparation of crystalline mixtures of alpha-hydroxycarbonyl derivatives of alpha-methylstyrene dimers |
| 02/08/2012 | CN102347395A Photovoltaic cell manufacture method |
| 02/08/2012 | CN102346492A Position control system, lithographic apparatus, and method to control a position of a movable object |
| 02/08/2012 | CN102346384A Method for regulating optimum focal plane for silicon chip and exposure device thereof |
| 02/08/2012 | CN102346383A Photoresist cleaning solution |
| 02/08/2012 | CN102346382A Method for cleaning semiconductor component in process of development |
| 02/08/2012 | CN102346381A Apparatus and method for peeling photoresist by high temperature and high pressure water assisted supercritical carbon dioxide |
| 02/08/2012 | CN102346380A Method for optimizing photoetching configuration parameters based on normalization steepest descent method |
| 02/08/2012 | CN102346379A Method for optimizing photoetching configuration parameters based on steepest descent method |
| 02/08/2012 | CN102346378A Exposure method, exposure apparatus, photomask and method for manufacturing photomask |
| 02/08/2012 | CN102346377A Exposure device and exposure method, and manufacturing device and manufacturing method for display panel substrate |
| 02/08/2012 | CN102346376A Lithographic apparatus, computer program product and device manufacturing method |
| 02/08/2012 | CN102346375A Coating treatment method, program, non-transitory computer storage medium and coating treatment apparatus |
| 02/08/2012 | CN102346374A Image forming material, original plate of planographic printing plate and method for manufacturing planographic printing plate |
| 02/08/2012 | CN102346373A Ray-sensitive resin composition, cured film and forming method thereof and color filter |
| 02/08/2012 | CN102346372A Positive photosensitive resin composition and method for forming patterns by using same |
| 02/08/2012 | CN102346371A Photoresist compositions and methods of forming photolithographic patterns |
| 02/08/2012 | CN102346370A Coloring composition, color filter and display element |
| 02/08/2012 | CN102346369A Nanoimprint lithography machine for whole wafer |
| 02/08/2012 | CN102346368A Method for manufacturing double pattern exposure mask and double pattern exposure method |
| 02/08/2012 | CN102346291A Coaxial double-telecentric imaging optics system |
| 02/08/2012 | CN102344691A Dyes and colored compositions |
| 02/08/2012 | CN102344525A Alkali soluble resin polymer and negative-type photosensitive resin composition including same |
| 02/08/2012 | CN102344400A Photoacid generators and photoresists comprising same |
| 02/08/2012 | CN102087480B 一种平面全息光栅曝光光路中实时监测装置的调整方法 A plane holographic grating exposure light path adjusting method of real-time monitoring device |
| 02/08/2012 | CN102081179B 夹角基片有序排列制作微阶梯反射镜的方法 The angle between the substrate ordered method for making micro-stepped reflecting mirror |
| 02/08/2012 | CN102081178B 楔形块上基片有序排列制作微阶梯反射镜的方法 Wedge on a substrate method of making an ordered arrangement of the micro-stepped reflecting mirror |
| 02/08/2012 | CN101872081B 光致形变液晶高分子三维可调谐光子晶体及其制备方法 Light-induced deformation of three-dimensional liquid crystal tunable photonic crystal polymer and its preparation method |
| 02/08/2012 | CN101866114B 光刻装置和器件制造方法 Lithographic apparatus and device manufacturing method |
| 02/08/2012 | CN101819382B 在边缘去除过程中减少晶圆缺陷的方法及晶圆结构 Reducing the edge removal process the wafer and wafer defect of a structural |
| 02/08/2012 | CN101813894B 具有标定精度功能的光刻机投影物镜波像差在线检测装置 Lithography projection lens aberration-line detection device has the function of calibration accuracy |
| 02/08/2012 | CN101794083B 光刻装置和器件制造方法 Lithographic apparatus and device manufacturing method |
| 02/08/2012 | CN101620375B 修正凸块光掩膜图案的方法 Projection light correction method for a mask pattern |
| 02/08/2012 | CN101581852B 彩色滤光片基板及制作方法和液晶显示面板 A color filter substrate and method of manufacturing the liquid crystal display panel |
| 02/08/2012 | CN101566795B 用于生产芯片的加工设备、加工方法和工艺 Processing equipment for the production of chips, processing methods and processes |
| 02/08/2012 | CN101517491B 投影曝光方法和投影曝光系统 A projection exposure method and projection exposure system |
| 02/08/2012 | CN101135852B 图案形成材料及图案形成方法 Pattern forming material and pattern formation method |
| 02/08/2012 | CN101067721B 用于实体成像的材料输送系统 The material delivery system for solid imaging |
| 02/08/2012 | CN101025576B 激光加工装置及其加工方法 The laser processing apparatus and processing method |
| 02/08/2012 | CN101000466B 显影液盛滚筒湿润及清理装置 Sheng moist and the developer roller cleaning device |
| 02/07/2012 | US8111898 Method for facilitating automatic analysis of defect printability |
| 02/07/2012 | US8111378 Exposure method and apparatus, and device production method |
| 02/07/2012 | US8111375 Exposure apparatus and method for manufacturing device |
| 02/07/2012 | US8111373 Exposure apparatus and device fabrication method |
| 02/07/2012 | US8110554 Peptides whose uptake by cells is controllable |
| 02/07/2012 | US8110345 Lines oriented in first direction are created on layer of photosensitive material on substrate using a first standing wave interference pattern with a portion trimmed to create first sub-pattern; semiconductors; interferometric photolithography |
| 02/07/2012 | US8110344 Metal photoetching product and production method thereof |
| 02/07/2012 | US8110342 Method for forming an opening |
| 02/07/2012 | US8110341 Method for manufacturing a semiconductor device by using first and second exposure masks |
| 02/07/2012 | US8110340 Method of forming a pattern of a semiconductor device |
| 02/07/2012 | US8110339 Multi-tone resist compositions |
| 02/07/2012 | US8110338 Heat-sensitive positive-working lithographic printing plate precursor |
| 02/07/2012 | US8110337 Mixture of binder, an unsaturated compound and acid generator; lithography |
| 02/07/2012 | US8110336 Resin and chemically amplified resist composition comprising the same |
| 02/07/2012 | US8110335 Resist patterning process and manufacturing photo mask |
| 02/07/2012 | US8110334 Radiation-sensitive composition |
| 02/07/2012 | US8110333 Resist composition containing novel sulfonium compound, pattern-forming method using the resist composition, and novel sulfonium compound |
| 02/07/2012 | US8110324 Photosensitive resin composition, light-shielding color filter and production process therefor, and image sensor |
| 02/07/2012 | US8110254 Flexible circuit chemistry |
| 02/07/2012 | CA2537023C Processes for fabricating conductive patterns using nanolithography as a patterning tool |
| 02/02/2012 | WO2012015076A1 Polymerizable composition |
| 02/02/2012 | WO2012014700A1 Pattern formation method and polymer alloy base material |
| 02/02/2012 | WO2012014580A1 Photosensitive resin composition, photosensitive element using same, method for forming resist pattern, method for producing lead frame, printed wiring board, and method for producing printed wiring board |
| 02/02/2012 | WO2012014576A1 Negative radiation-sensitive resin composition |
| 02/02/2012 | WO2012014435A1 Compound, radiation-sensitive composition, and method for forming resist pattern |
| 02/02/2012 | WO2012014059A1 A composition for coating over a photoresist pattern |