| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/16/2012 | WO2012021253A1 Epoxy formulations with controllable photospeed |
| 02/16/2012 | WO2012020747A1 Rinse liquid for lithography and method for forming pattern using same |
| 02/16/2012 | WO2012020715A1 Blue curable composition, color filter and method for producing the same, solid-state image pickup device, and liquid crystal display device |
| 02/16/2012 | WO2012020627A1 Radiation sensitive composition and novel compound |
| 02/16/2012 | WO2012020599A1 Photosensitive silicone resin composition |
| 02/16/2012 | WO2012020546A1 Homoadamantane derivatives, process for preparing same, and photoresist compositions |
| 02/16/2012 | WO2012020061A1 Difunctional (meth)acrylate writing monomers |
| 02/16/2012 | WO2012020020A1 Shell of an euv collector mirror for euv lithography |
| 02/16/2012 | WO2012019874A1 Lithography method and apparatus |
| 02/16/2012 | WO2012019598A1 Light integrator for rectangular beam cross sections of different dimensions |
| 02/16/2012 | WO2011077241A8 Antireflective coating composition and process thereof |
| 02/16/2012 | US20120040529 Resist stripping compositions and methods for manufacturing electrical devices |
| 02/16/2012 | US20120040294 Top Coating Composition |
| 02/16/2012 | US20120040293 Reflective mask, manufacturing method for reflective mask, and manufacturing method for semiconductor device |
| 02/16/2012 | US20120040292 Transfer method, transfer apparatus, and method of manufacturing organic light emitting element |
| 02/16/2012 | US20120040291 Composition for forming resist underlayer film for euv lithography |
| 02/16/2012 | US20120040290 Photosensitive resin composition, and photosensitive element, resist pattern formation method and printed circuit board production method each utilizing same |
| 02/16/2012 | US20120040289 Chemically amplified silsesquioxane resist compositions |
| 02/16/2012 | US20120040288 Epoxy formulations with controllable photospeed |
| 02/16/2012 | US20120040280 Simultaneous Optical Proximity Correction and Decomposition for Double Exposure Lithography |
| 02/16/2012 | US20120040276 Method of forming and using photolithography mask having a scattering bar structure |
| 02/16/2012 | US20120038996 Photoresist compositions |
| 02/16/2012 | US20120038896 Maskless Vortex Phase Shift Optical Direct Write Lithography |
| 02/16/2012 | US20120038036 Structure for Multi-Row Leadframe and Semiconductor Package Thereof and Manufacture Method Thereof |
| 02/16/2012 | US20120038021 Overlay mark enhancement feature |
| 02/16/2012 | US20120037860 Dye-containing negative curable composition, color filter and method for producing the same |
| 02/16/2012 | DE112006001768B4 Verwendung eines superkritischen Fluids zum Trocknen der Schreiben und zum Reinigen der Linsen in einer Immersionslithographie Using a supercritical fluid to dry the letter and for cleaning the lenses in an immersion lithography |
| 02/16/2012 | DE112005000504B4 Mehrschichtüberlagerungsmessungs- und Korrekturtechnik für die IC-Herstellung Mehrschichtüberlagerungsmessungs- and correction technique for the IC fabrication |
| 02/16/2012 | DE102011011706A1 Spannungsentkopplungsvorrichtung und -verfahren für gekühlte Spiegelsysteme Voltage decoupling apparatus and method for chilled mirror systems |
| 02/16/2012 | DE102010036955A1 Reflective optical element i.e. collector mirror, for use in optical system of extreme UV lithographic apparatus, has layer whose thickness lies within range such that reflectivity is less than reflectivity in UV wavelength range |
| 02/16/2012 | DE102010034476A1 Optisches Element An optical element |
| 02/16/2012 | DE102010018224A1 Optisches Modul mit einem verstellbaren optischen Element An optical module with an adjustable optical element |
| 02/16/2012 | CA2803389A1 Carboxy ester ketal removal compositions, methods of manufacture, and uses thereof |
| 02/15/2012 | EP2418545A1 Mask carrier, mask handling module and method for adjusting a mask |
| 02/15/2012 | EP2418544A2 Method and system for determining characteristics of substrates employing fluid geometries |
| 02/15/2012 | EP2418543A1 Photosensitive resin composition for flexographic printing having excellent solvent resistance |
| 02/15/2012 | EP2418170A2 Method for arranging fine particles on substrate by physical pressure |
| 02/15/2012 | EP2418169A2 Method for manufacturing printed product by aligning and printing fine particles |
| 02/15/2012 | EP2417241A2 Process and apparatus for removal of contaminating material from substrates |
| 02/15/2012 | EP1404796B1 Ammonia-free alkaline microelectronic cleaning compositions with improved substrate compatibility |
| 02/15/2012 | CN1936708B 减反射硬掩模组合物 Antireflective hardmask composition |
| 02/15/2012 | CN102356353A Illumination system of microlithographic projection exposure apparatus |
| 02/15/2012 | CN102354692A Wafer and a method of dicing a wafer |
| 02/15/2012 | CN102354645A Regeneration method for glass substrate used by flat panel display device |
| 02/15/2012 | CN102354327A Data processing method for scanning maskless photoetching machine |
| 02/15/2012 | CN102354087A Method for improving photoresist exposure precision |
| 02/15/2012 | CN102354086A Real-time calibration method for orthogonality of precision mobile platform |
| 02/15/2012 | CN102354085A Super-resolution direct-writing photoetching machine based on waveguide mode interference and photoetching method thereof |
| 02/15/2012 | CN102354084A Flow field pressure transducer of immersion lithography machine based on PVDF (polyvinylidene fluoride) |
| 02/15/2012 | CN102354052A Digital micro-mirror device and forming method thereof |
| 02/15/2012 | CN102354045A Imaging optical system, projection exposure device and microstructure component production method |
| 02/15/2012 | CN102352150A Liquid photosensitive solder resist white oil and manufacturing method thereof |
| 02/15/2012 | CN102012635B 光刻胶的形成方法 The method of forming a photoresist |
| 02/15/2012 | CN101794072B 制备具有20纳米线宽以下纳米结构基质的方法 Having a line width of 20 nm was prepared following the method of matrix nanostructures |
| 02/15/2012 | CN101604092B 显示面板及其制造方法、显示装置及其色彩还原方法和电子设备 Display panel and method of manufacturing the display device and the color reproduction method and an electronic device |
| 02/15/2012 | CN101414126B 电子束曝光系统 Electron beam exposure system |
| 02/15/2012 | CN101408735B 包括具有复合载体的洛仑兹致动器的光刻设备 Lorentz actuator including a lithographic apparatus having a composite carrier |
| 02/15/2012 | CN101258442B 图案复制掩模、焦距变动测定方法及装置、半导体器件的制造方法 Replication method for producing a mask pattern, a method and apparatus for measuring the focal length changes, the semiconductor device |
| 02/15/2012 | CN101093362B 角分辨分光光刻术的特性测定方法与设备 Angle-resolved spectroscopic characteristics measuring method and apparatus lithography |
| 02/14/2012 | US8116347 Two-stage laser system for aligners |
| 02/14/2012 | US8115902 Exposure apparatus, device manufacturing method, maintenance method, and exposure method |
| 02/14/2012 | US8115036 Fluorine-containing cyclic compound, fluorine-containing polymer compound, resist material using same and method for forming pattern |
| 02/14/2012 | US8114949 (Meth)acrylate, polymer and resist composition |
| 02/14/2012 | US8114948 Photosensitive compositions based on polycyclic polymers |
| 02/14/2012 | US8114584 Antireflective coatings for high-resolution photolithographic synthesis of DNA array |
| 02/14/2012 | US8114577 Method for making light blocking plate |
| 02/14/2012 | US8114576 Laminating a plastic film to the baked, photoresist-laminated substrate, processing one or more electroconductive interconnects, including photolithography, baking, soaking in a liquid, separating film from substrate; complementary metal-oxides semiconductors |
| 02/14/2012 | US8114575 Plate making method of lithographic printing plate precursor |
| 02/14/2012 | US8114574 Photosensitive resin composition |
| 02/14/2012 | US8114573 Topography based patterning |
| 02/14/2012 | US8114572 Laser-ablatable elements and methods of use |
| 02/14/2012 | US8114571 Photoacid generator, resist composition, and patterning process |
| 02/14/2012 | US8114570 Photoacid generator, resist composition, and patterning process |
| 02/14/2012 | US8114569 Maskless photopolymer exposure process and apparatus |
| 02/14/2012 | US8114568 Method of preparing a substrate for lithography, a substrate, a device manufacturing method, a sealing coating applicator and a sealing coating measurement apparatus |
| 02/14/2012 | US8114567 Polyol photosensitizers, carrier gas UV laser ablation sensitizers, and other additives and methods for making and using same |
| 02/14/2012 | US8114566 Photosensitive resin composition for flexographic printing |
| 02/14/2012 | CA2678458C Seamless master and method of making same |
| 02/14/2012 | CA2678282C Seamless master and method of making same |
| 02/14/2012 | CA2678281C Seamless master and method of making same |
| 02/09/2012 | WO2012018502A2 Modular racking system |
| 02/09/2012 | WO2012018375A2 Plasma mediated ashing processes |
| 02/09/2012 | WO2012018374A2 Plasma mediated ashing processes |
| 02/09/2012 | WO2012018181A2 Negative photosensitive resin composition |
| 02/09/2012 | WO2012018097A1 Radiation-sensitive resin composition |
| 02/09/2012 | WO2012018051A1 Cleaning method, device production method, cleaning substrate, immersed member, immersion exposure device, and dummy substrate |
| 02/09/2012 | WO2012017904A1 Microfluidic chip manufacturing method, microfluidic chip, and device for generating surface plasmon resonance light |
| 02/09/2012 | WO2012017896A1 Epoxy resin composition having monocyclic aliphatic hydrocarbon ring |
| 02/09/2012 | WO2012017837A1 Exposure apparatus |
| 02/09/2012 | WO2012017808A1 Microlens exposure device |
| 02/09/2012 | WO2012017792A1 Gravure printing plate and method for producing gravure printing plate |
| 02/09/2012 | WO2012017790A1 Composition for forming resist underlayer film and method for forming resist pattern using same |
| 02/09/2012 | WO2012017783A1 Transmission optical system, illumination optical system, exposure device, and device manufacturing method |
| 02/09/2012 | WO2012016744A1 Imprint lithography |
| 02/09/2012 | WO2012016577A1 Microlithographic projection exposure apparatus |
| 02/09/2012 | WO2012016425A1 Photo-resist washing fluid |
| 02/09/2012 | US20120035083 Antireflective Coatings for High-Resolution Photolithographic Synthesis of DNA Array |
| 02/09/2012 | US20120034778 Double Patterning Strategy for Contact Hole and Trench in Photolithography |
| 02/09/2012 | US20120034566 Micro-channel device and method for fabricating micro-channel device |
| 02/09/2012 | US20120034565 Lithographic printing plate precursor |