Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
02/2012
02/23/2012WO2012022584A1 Substrate for use in metrology, metrology method and device manufacturing method
02/23/2012WO2012022561A1 Inspection method for imprint lithography and apparatus therefor
02/23/2012WO2011157601A3 Illumination optical system for microlithography and projection exposure system with an illumination optical system of this type
02/23/2012WO2011118983A3 Lithography apparatus and lithography method
02/23/2012WO2011116878A3 Spectrometer and examination device having such a spectrometer
02/23/2012US20120045724 Sulfonium salt, resist composition, and patterning process
02/23/2012US20120045723 Vibration isolation device, exposure apparatus, and device manufacturing method using same
02/23/2012US20120045722 Technique to form a self-aligned double pattern
02/23/2012US20120045721 Method for forming a self-aligned double pattern
02/23/2012US20120045720 Developers and method of coloring lithographic printing members
02/23/2012US20120045719 Radiation-sensitive resin composition and compound
02/23/2012US20120045712 Extreme ultraviolet light (euv) photomasks, and fabrication methods thereof
02/23/2012US20120045616 Positive photosensitive resin composition, method for forming cured film, cured film, organic el display device and liquid crystal display device
02/23/2012US20120044468 Lithographic apparatus and device manufacturing method
02/23/2012US20120044191 Touch screen panel and method of manufacturing the same
02/23/2012US20120044187 Capacitive Touch Screen
02/23/2012US20120043634 Method of manufacturing microlens array, method of manufacturing solid-state image sensor, and solid-state image sensor
02/23/2012US20120043457 Optical switching in a lithography system
02/23/2012DE102011079933A1 Optisches Element für die UV- oder EUV-Lithographie Optical element for the UV or EUV lithography
02/23/2012DE102010035111A1 Beleuchtungseinheit und Vorrichtung zur lithografischen Belichtung Lighting unit and device for lithographic exposure
02/23/2012DE102010035047A1 Method for determining process proximity function (PPF) for electron beam exposure of e.g. wafer, involves associating results of line width measurements and exposure amount of patterns, for point-wise determination of PPF
02/23/2012DE102005015274B4 Strahlungsquelle zur Erzeugung kurzwelliger Strahlung Radiation source for generating short-wave radiation
02/22/2012EP2420892A1 Compositions and processes for immersion lithography
02/22/2012EP2420891A1 Compositions and processes for immersion lithography
02/22/2012EP2420890A1 Positive photosensitive resin composition, method for forming cured film, cured film, organic el display device and liquid crystal display device
02/22/2012EP2420889A1 Photosensitive resin composition, adhesive film, and light receiving device
02/22/2012EP2420871A1 Polymerizable composition for color filter, color filter, and solid imaging element
02/22/2012EP2419926A1 Acid-etch resistant, protective coatings
02/22/2012EP2419793A1 Conducting lines, nanoparticles, inks, and patterning
02/22/2012EP2053462B1 Method for fabricating an electronic circuit device
02/22/2012EP2010963B1 Reflective mask blank for euv lithography
02/22/2012EP1866357B1 (meth)acryloyl group-containing aromatic isocyanate compound and production process thereof
02/22/2012EP1523528B1 Polymerisable diketopyrrolopyrroles, use of such compounds in colour filters and polymers prepared from these compounds
02/22/2012EP1216436B1 Method and apparatus for thermal processing of a photosensitive element
02/22/2012CN202150010U 一种基于pvdf的浸没式光刻机流场压力传感器 Immersion lithography machine flow field pressure sensor based on a pvdf
02/22/2012CN1939736B 喷嘴板的制造方法及液滴喷射装置的制造方法 The method of manufacturing apparatus and manufacturing method of the liquid droplet ejection nozzle plate
02/22/2012CN1908812B 执行双重曝光光刻的方法、程序产品和设备 Method of performing double exposure lithography, program product and apparatus
02/22/2012CN1791965B 用于半导体布置的结构和制造半导体布置的方法 The structure and manufacturing method of a semiconductor arrangement for a semiconductor arrangement
02/22/2012CN102362227A Exposure apparatus, exposure method, and method of manufacturing device
02/22/2012CN102362226A Rotating arm for writing or reading an image on a workpiece
02/22/2012CN102362225A Method for forming resist pattern, and device
02/22/2012CN102362224A Method for forming resist pattern, and device
02/22/2012CN102362201A Method for manufacturing microlens array, and microlens array
02/22/2012CN102361913A Novel polyamic acid, polyimide, photosensitive resin composition comprising same, and dry film produced from the composition
02/22/2012CN102361896A Photoresist composition
02/22/2012CN102360171A Optimization method of lithography configuration parameter based on pattern search method
02/22/2012CN102360170A Immersion liquid, exposure apparatus, and exposure process
02/22/2012CN102360169A Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method
02/22/2012CN102360168A Integrated measured pattern and measurement method for lithography process
02/22/2012CN102360167A Exposure apparatus, exposure method, and method for producing device
02/22/2012CN102360166A Semiconductor exposure method
02/22/2012CN102360165A 3-PSR-V parallel mechanism for adjusting immersion units
02/22/2012CN102360164A Method for spraying photoresist
02/22/2012CN102360163A Photosensitive element
02/22/2012CN102360162A Imprinting method and imprinting apparatus
02/22/2012CN102360161A Large-size wafer level nano-patterned sapphire substrate imprinting device and method
02/22/2012CN102360160A 2R1T three degree of freedom space flexible precision positioning platform
02/22/2012CN102360122A Fly-eye lens
02/22/2012CN102360093A Holographic blazed grating manufacturing method
02/22/2012CN102360092A Optical element and method for manufacturing the same
02/22/2012CN102054668B 电子束正性光刻胶Zep 520掩蔽介质刻蚀的方法 Positive electron beam resist Zep 520 etching method masked media
02/22/2012CN102012646B 一种光刻机的调平系统 A lithographic machine leveling system
02/22/2012CN101947894B 一种光学变色防伪油墨的印刷工艺 An optical security ink color printing technology
02/22/2012CN101852987B 一种金属表面可控灰度连续阶调工艺 Gray metal surface controlled process of continuous tone
02/22/2012CN101644899B 曝光装置及器件制造方法 Exposure apparatus and device manufacturing method
02/22/2012CN101581885B 涂敷装置和方法 Coating apparatus and method
02/22/2012CN101414125B 电子束曝光系统 Electron beam exposure system
02/22/2012CN101276140B 灰阶掩模的缺陷修正方法和制造方法、灰阶掩模及图案转印方法 Grayscale mask defect correction method and manufacturing method, gray mask and pattern transfer method
02/22/2012CN101231464B 光致酸生成剂、含它的光致抗蚀剂组合物及用其形成图案的方法 Photoacid-generating agent containing it photoresist pattern is formed using the compositions and methods of their
02/22/2012CN101178538B 图案修改装置 Pattern modifying means
02/22/2012CN101174107B 用于光掩模等离子体蚀刻的方法和装置 A method and apparatus for plasma etching photomasks
02/22/2012CN101142529B 感光性树脂组合物 The photosensitive resin composition
02/22/2012CN101121351B 可再使用的印刷版 Printable version of the re-use of
02/22/2012CN101041794B 清洗液组成物和其用途 Cleaning liquid composition and the use thereof
02/22/2012CN101021684B 形成掩模坯板用抗蚀剂下层的膜的组合物、掩模坯板和掩模 Forming a mask blanks with the resist underlayer film composition of the mask and the mask blanks
02/21/2012US8120763 Device and method for the optical measurement of an optical system by using an immersion fluid
02/21/2012US8120751 Coupling apparatus, exposure apparatus, and device fabricating method
02/21/2012US8120748 Lithographic processing optimization based on hypersampled correlations
02/21/2012US8119392 Tissue engineering; modifying cell surface using micropatterning; amplified polymer containing pyrrolidone units and (meth)acrylate units
02/21/2012US8119335 Methods and apparatus for selective, oxidative patterning of a surface
02/21/2012US8119334 Method of making a semiconductor device using negative photoresist
02/21/2012US8119333 Lithographic method
02/21/2012US8119332 Method for manufacturing coordinate detector
02/21/2012US8119331 Photopolymer composition usable for lithographic plates
02/21/2012US8119330 Coating a hydrophilic support with hydrophobic thermoplastic resin; photopolymerization using photoinitiator; exposure; heating development; applying gum to remove unexposure material
02/21/2012US8119329 Support with hydrophilic surface; photopolymerizable layer including photoinitiator; exposure; heating; applying gum solution to remove unexposed areas
02/21/2012US8119328 Imaging element and method using differential light scattering
02/21/2012US8119327 Hard, cold flowable, photosensitive photoresist coatings; consistant flexibility; strippability; shelf life; prepolymers comprised of such as methyl methacrylate, benzyl methacrylate and glycidyl methacrylate; photocuring with diacrylate monomer or oligimer
02/21/2012US8119326 Lithographic-printing plate precursor and image forming method using the same
02/21/2012US8119325 Method for forming resist pattern, semiconductor device and production method thereof
02/21/2012US8119324 Method of forming pattern, composition for forming upper-layer film, and composition for forming under-layer film
02/21/2012US8119323 Process for producing patterned film and photosensitive resin composition
02/21/2012US8119322 Method for producing self-aligned mask, articles produced by same and composition for same
02/21/2012US8119321 Resist polymer solution and process for producing the same
02/21/2012US8119311 Photosensitive resin composition, light-shielding color filter and production process therefor, and image sensor
02/21/2012US8119304 Fuel cell with fuel passage layer having a wiring pattern
02/21/2012US8119197 Metal mold for use in imprinting processes
02/21/2012US8119041 Non-resonant two-photon absorption induction method and process for emitting light thereby
02/16/2012WO2012021824A2 Carboxy ester ketal removal compositions, methods of manufacture, and uses thereof
02/16/2012WO2012021433A1 Method for forming a three-dimensional memory array using imprint lithography, mask therefor, and memory device obtained thereby
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