Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2012
03/01/2012US20120052448 Determination method, exposure method and storage medium
03/01/2012US20120052447 Lithographic apparatus and device manufacturing method
03/01/2012US20120052446 High resolution, solvent resistant, thin elastomeric printing plates
03/01/2012US20120052445 Image forming material, planographic printing plate precursor, and method for manufacturing a planographic printing plate
03/01/2012US20120052444 Polymerizable composition, and lithographic printing plate precursor, antifouling member and antifogging member each using the same
03/01/2012US20120052443 Resist composition and method for producing resist pattern
03/01/2012US20120052442 Lithographic printing plate precursor and plate making method thereof
03/01/2012US20120052441 Nitrogen-containing organic compound, chemically amplified positive resist composition, and patterning process
03/01/2012US20120052440 Salt and photoresist composition comprising the same
03/01/2012US20120052439 Photo-curing polysiloxane composition and protective film formed from the same
03/01/2012US20120052438 Photoresist composition and method of forming pattern using the same
03/01/2012US20120052437 High resolution, solvent resistant, thin elastomeric printing plates
03/01/2012US20120052421 Manufacturing method of polymer film with photonic crystal structure
03/01/2012US20120052419 Photomask, manufacturing apparatus and method of semiconductor device using the same, and photomask feature layout method
03/01/2012US20120052418 Method for optimizing source and mask to control line width roughness and image log slope
03/01/2012US20120052417 Circuit Apparatus Having a Rounded Trace
03/01/2012US20120052415 Stamps with micrometer-and nanometer-scale features and methods of fabrication thereof
03/01/2012US20120052260 Structure manufacturing method and structure
03/01/2012US20120050703 Euv collector
03/01/2012US20120049063 Sample surface inspection apparatus and method
03/01/2012US20120048600 Circuit Apparatus Having a Rounded Differential Pair Trace
03/01/2012US20120048594 Photosensitive composition, photosensitive film, photosensitive laminate, method of forming a permanent pattern, and printed board
03/01/2012US20120048193 Lithographic apparatus and device manufacturing method
03/01/2012DE112004002491B4 Verfahren zur Herstellung einer kontaktlosen Speicheranordnung A process for preparing a non-contact memory device
03/01/2012DE102011111462A1 Quellkollektormodul mit gic-spiegel und xenon-eis-euv-lpp-target-system Source collector module with gic-mirror-and-ice-xenon euv lpp target system
03/01/2012DE102011111334A1 Quellkollektormodul mit GIC-Spiegel und Zinndraht-EUV-LPP-Target-System Source collector module with GIC mirror and tin wire EUV LPP target system
03/01/2012DE102011111260A1 Quellkollektormodul mit GIC-Spiegel und Zinn-Stab-EUV-LPP-Target-System Source collector module with GIC mirror and tin rod EUV LPP target system
03/01/2012DE102010040108A1 Obskurationsblende Obscuration
03/01/2012DE102010039965A1 EUV-Kollektor EUV collector
03/01/2012DE102010039930A1 Projektionsbelichtungsanlage Projection exposure apparatus
03/01/2012DE102010039927A1 Substrat für Spiegel für die EUV-Lithographie Substrate for mirrors for EUV lithography
03/01/2012DE102007019831B4 Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage Illumination device of a microlithography projection exposure apparatus
02/2012
02/29/2012EP2423751A1 Developing apparatus, method for processing developer liquid, method for producing printing plate, and filtration device
02/29/2012EP2423750A2 Exposure unit and device for lithographic exposure
02/29/2012EP2423749A1 A lithographic apparatus and device manufacturing method
02/29/2012EP2423748A1 Lithographic printing plate precursor and plate making method thereof
02/29/2012EP2288507B1 Substrate and imageable element with hydrophilic interlayer
02/29/2012EP2083019B1 Photocurable/thermosetting resin composition and obtained dry film
02/29/2012EP1907902B1 A method of building a sensor structure
02/29/2012EP1664928B1 Positive photoresist composition and resist pattern formation
02/29/2012EP1509379B1 Methods and apparatus of field-induced pressure imprint lithography
02/29/2012CN202153274U 双视场显微镜 Dual field microscopy
02/29/2012CN1952786B Gas shower, lithographic apparatus and use of a gas shower
02/29/2012CN1749861B Method for optimizing mask pattern formed on the substrate
02/29/2012CN102365590A Shared compliance in a rapid exchange device for reticles, and reticle stage
02/29/2012CN102365589A Exposure method and exposure apparatus
02/29/2012CN102365588A Exposure method and exposure apparatus
02/29/2012CN102365587A Illumination optical system for EUV microlithography and EUV attenuator for an illumination optical system of this kind, illumination system and projection exposure installation having an illumination optical system of this kind
02/29/2012CN102365586A Photosensitive coloring composition and color filter
02/29/2012CN102365585A Photosensitive resin composition for flexographic printing having excellent solvent resistance
02/29/2012CN102365565A Optical assembly
02/29/2012CN102365341A Base-generating agent, photosensitive resin composition, patterning material comprising the photosensitive resin composition, patterning method and article using the photosensitive resin composition
02/29/2012CN102365314A Photosensitive polyimide and photosensitive resin composition comprising same
02/29/2012CN102364660A Method for manufacturing ultrathin line based on common photoetching and oxidation technology
02/29/2012CN102364397A Radiation-sensitive resin composition, cured film, method for forming cured film, and display device
02/29/2012CN102364389A Manufacturing method based on control over angle of contact hole wall of liquid crystal display device
02/29/2012CN102012590B FFS type TFT-LCD array substrate and manufacturing method thereof
02/29/2012CN101906197B Method for synthesizing o-cresol novolac resin
02/29/2012CN101794077B Operating platform and method of automatically installing shims
02/29/2012CN101714371B Method for manufacturing master and method for manufacturing optical disc
02/29/2012CN101639633B Supply pipeline of developing solution
02/29/2012CN101592875B Cleaning method and cleaning machine
02/29/2012CN101533191B TFT-LCD array substrate structure and preparation method thereof
02/29/2012CN101506941B Hardmask composition and related process
02/29/2012CN101471237B Apparatus for treating substrate and method for transferring substrate using the same
02/29/2012CN101458459B Cleaning apparatus and immersion lithographic apparatus
02/29/2012CN101435998B Method for reducing photolithography aligning partial difference caused by photoetching machine lens distortion
02/29/2012CN101354530B Contraposition scale on mask and method for affirming shield part position using the same
02/29/2012CN101276156B Exposure device
02/29/2012CN101142533B Process of imaging a photoresist with multiple antireflective coatings
02/29/2012CN101048442B Poly(imide/azomethine) copolymer, poly(amic acid/azomethine) copolymer and positive type photosensitive resin compositions
02/28/2012US8127257 Designing method of photo-mask and method of manufacturing semiconductor device using the photo-mask
02/28/2012US8125618 Reflective film interface to restore transverse magnetic wave contrast in lithographic processing
02/28/2012US8125612 Exposure apparatus and method for producing device
02/28/2012US8124328 Methods for imaging and processing positive-working imageable elements
02/28/2012US8124327 Method for using compositions containing fluorocarbinols in lithographic processes
02/28/2012US8124326 Methods of patterning positive photoresist
02/28/2012US8124325 Methods and apparatus for the manufacture of microstructures
02/28/2012US8124323 Method for patterning a photosensitive layer
02/28/2012US8124322 Method for manufacturing semiconductor device, and method for processing etching-target film
02/28/2012US8124321 Etching method for use in deep-ultraviolet lithography
02/28/2012US8124320 Method and apparatus for surface tension control in advanced photolithography
02/28/2012US8124318 Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent
02/28/2012US8124317 Planographic printing plate precursor and method of producing a copolymer used therein
02/28/2012US8124316 Photosensitive sheets and method and apparatus for manufacturing the same
02/28/2012US8124314 Radiation-sensitive composition
02/28/2012US8124313 Resist composition, method of forming resist pattern, novel compound, and acid generator
02/28/2012US8124312 Method for forming pattern, and material for forming coating film
02/28/2012US8124311 Photosensitive molecular compound and photoresist composition including the same
02/28/2012US8124310 Positive resist composition and pattern forming method using the same
02/28/2012US8124304 Dye-containing curable composition, color filter and method for producing the same
02/28/2012US8123514 Conforming template for patterning liquids disposed on substrates
02/23/2012WO2012024509A1 Position-sensitive metrology system
02/23/2012WO2012024178A2 Method for high aspect ratio patterning in spin-on layer
02/23/2012WO2012023853A1 Spectral filter for splitting a beam with electromagnetic radiation having wavelengths in the extreme ultraviolet (euv) or soft x-ray (soft x) and the infrared (ir) wavelength range
02/23/2012WO2012023474A1 Coloring agent, coloring composition, color film, and display element
02/23/2012WO2012023381A1 Scanning exposure apparatus using microlens array
02/23/2012WO2012023374A1 Radiation-sensitive composition and novel compound
02/23/2012WO2012023349A1 Pattern-forming method and radiation-sensitive resin composition
02/23/2012WO2012023164A1 Alkali-developable photosensitive resin composition
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