Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2012
03/08/2012WO2012029785A1 Photosensitive composition, and photosensitive film, permanent pattern, permanent pattern formation method and printed substrate
03/08/2012WO2012029758A1 Photosensitive resin composition, oxime sulfonate compound, method for forming cured film, cured film, organic el display device, and liquid crystal display device
03/08/2012WO2012029734A1 Photosensitive composition, cured film formed from same, and element having cured film
03/08/2012WO2012029583A1 Method for producing lithographic printing plate
03/08/2012WO2012029582A1 Method for producing lithographic printing plate
03/08/2012WO2012029481A1 Photosensitive composition, photosensitive film, photosensitive laminate, permanent pattern casting method, and print substrate
03/08/2012WO2012029468A1 Curable resin composition, dry film thereof, cured product of said curable resin composition, and printed circuit board using same
03/08/2012WO2012029330A1 Photosensitive resin composition, and stencil for screen printing using said photosensitive resin composition
03/08/2012WO2012029220A1 Management apparatus for semiconductor manufacturing equipment, and computer program
03/08/2012WO2012028613A1 Substrate for mirrors for euv lithography
03/08/2012WO2012028569A1 Projection exposure apparatus
03/08/2012WO2012028303A1 Optical system for euv projection microlithography
03/08/2012WO2012028158A1 Illumination system of a microlithographic projection exposure apparatus
03/08/2012WO2012008620A3 Liquid recovery apparatus and liquid recovering method, exposure apparatus, device fabricating method
03/08/2012WO2011139337A3 Ball-spacer method for planar object leveling
03/08/2012US20120058644 Resist stripping compositions and methods for manufacturing electrical devices
03/08/2012US20120058633 Methods Of Forming Features Of Integrated Circuitry
03/08/2012US20120058436 Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method
03/08/2012US20120058435 Pattern formation method
03/08/2012US20120058434 Lithographic apparatus, device manufacturing method, and method of applying a pattern to a substrate
03/08/2012US20120058433 Process for producing ink jet head
03/08/2012US20120058432 Methods of forming semiconductor devices using photolithographic shot grouping
03/08/2012US20120058431 Positive photosensitive composition and method of forming pattern using the same
03/08/2012US20120058430 Resist composition, method of forming resist pattern, novel compound, and acid generator
03/08/2012US20120058429 Radiation-sensitive resin composition and polymer
03/08/2012US20120058428 Patterning process and resist composition
03/08/2012US20120058427 Pattern forming method, chemical amplification resist composition and resist film
03/08/2012US20120058421 Phase shift mask and method for manufacturing the same, and method for manufacturing integrated circuit
03/08/2012US20120058367 Spin injection source and manufacturing method thereof
03/08/2012US20120057140 Exposure apparatus, movable body apparatus, flat-panel display manufacturing method, and device manufacturing method
03/08/2012DE112004002199B4 Verfahren zur Herstellung einer Extrem-Ultraviolettstrahlung reflektierenden Maske unter Verwendung von Rasterkraftmikroskop-Lithographie A process for producing extreme ultra-violet radiation of a reflective mask using atomic force microscope lithography
03/08/2012DE102006038294B4 Fassung für ein optisches Element A socket for an optical element
03/07/2012EP2426700A2 Exposure apparatus and device manufacturing method
03/07/2012EP2426558A1 Silicon-containing film-forming composition, silicon-containing film-formed substrate, and patterning process
03/07/2012EP2426557A1 Photosensitive modified polyimide resin composition and use thereof
03/07/2012EP2426556A1 Mould for lithography by thermal nanoprinting, method for preparing same and thermal nanoprinting method using said mould
03/07/2012EP2426154A1 Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition
03/07/2012EP2141534B1 Liquid crystal display device manufacturing method, and liquid crystal display device
03/07/2012EP2042927B1 Composition containing hydroxylated condensation resin for forming film under resist
03/07/2012EP1973748B1 Bragg diffracting security markers
03/07/2012EP1769521B1 Electron beam applying apparatus for recording information
03/07/2012CN202159225U 一种印制线路板简易曝光装置 One kind of simple printed circuit board exposure apparatus
03/07/2012CN1853142B Lithographic projection apparatus, gas purging method, device manufacturing method and purge gas supply system
03/07/2012CN102369484A Light irradiation device for exposure devices, method for controlling turn-on of same, exposure device, exposure method, and substrate
03/07/2012CN102369483A Method and device for imaging a radiation-sensitive substrate
03/07/2012CN102369482A Curable resin composition and printed wiring board
03/07/2012CN102369481A Photosensitive resin composition, adhesive film, and light receiving device
03/07/2012CN102369480A Directly imageable waterless planographic printing plate precursor and method for producing same
03/07/2012CN102368140A Developing method and developing device
03/07/2012CN102368139A High-precision method for detecting wave aberration of system
03/07/2012CN102368138A Large-area TFT (Thin Film transistor) photoetching device and method
03/07/2012CN101663619B Exposure method and exposure apparatus
03/07/2012CN101636694B Photosensitive lithographic printing plate material developable with water
03/07/2012CN101598900B Method for exposing plasma display panels
03/07/2012CN101548203B Photosensitive color resin composition for color filter, color filter, liquid crystal display, and organic el display
03/07/2012CN101528694B Oxime ester compound and photopolymerization initiator containing the compound
03/07/2012CN101436658B Cathode substrate
03/07/2012CN101414124B 电子束曝光系统 Electron beam exposure system
03/07/2012CN101405654B Photosensitive composition, and material for formation of light-shield film for display device or photosensitive transfer material using the composition
03/07/2012CN101276157B Exposure plotting device
03/07/2012CN101140417B Semiconductor device with a bulb-type recess gate
03/06/2012US8130363 Exposure apparatus and method for producing device
03/06/2012US8130361 Exposure apparatus, exposure method, and method for producing device
03/06/2012US8130349 Substrate for a display apparatus including domain forming member disposed thereon
03/06/2012US8129776 Semiconductor device
03/06/2012US8129702 Radiation system with contamination barrier
03/06/2012US8129698 Charged-particle beam writing method and charged-particle beam writing apparatus
03/06/2012US8129322 Photosensitive-resin remover composition and method of fabricating semiconductor device using the same
03/06/2012US8129101 Method for increasing the removal rate of photoresist layer
03/06/2012US8129100 Double patterning process
03/06/2012US8129099 Double patterning process
03/06/2012US8129098 Colored mask combined with selective area deposition
03/06/2012US8129097 Immersion lithography
03/06/2012US8129096 Method for manufacturing conductive member pattern
03/06/2012US8129095 Methods, photomasks and methods of fabricating photomasks for improving damascene wire uniformity without reducing performance
03/06/2012US8129094 Method for manufacturing a semiconductor device
03/06/2012US8129093 Prevention of photoresist scumming
03/06/2012US8129092 Resist pattern thickening material and process for forming resist pattern, and semiconductor device and method for manufacturing the same
03/06/2012US8129091 Method for preparing a composite printing form using a template
03/06/2012US8129090 Process for on-press developable lithographic printing plate involving preheat
03/06/2012US8129089 Use of blended solvents in defectivity prevention
03/06/2012US8129088 Electrode and method for manufacturing the same
03/06/2012US8129087 Block copolymer and substrate processing method
03/06/2012US8129086 Polymerizable compound, polymer, positive resist composition, and patterning process using the same
03/06/2012US8129080 Variable resist protecting groups
03/06/2012US8127675 Lithographic printing plate precursor and lithographic printing method
03/01/2012WO2012026927A1 Leveling devices and methods
03/01/2012WO2012026622A1 Method of forming pattern and developer for use in the method
03/01/2012WO2012026621A1 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern therewith
03/01/2012WO2012026465A1 Resin composition for photoresist
03/01/2012WO2012026400A1 Positive photosensitive siloxane composition
03/01/2012WO2012026265A1 Master planographic printing plate for on-press development, and plate-making method using said master planographic printing plate
03/01/2012WO2012026151A1 Light-sensitive paste, method for forming pattern, and method for producing flat display panel member
03/01/2012WO2012025365A1 Imaging optical system
03/01/2012WO2012025316A1 Imprint lithography method and imprintable medium
03/01/2012WO2012025132A1 Multi facet mirror of a microlithographic projection exposure apparatus
03/01/2012WO2011101259A3 Topcoat composition comprising a polymer containing a repeat unit including a sulfonamide function, photoresist composition containing the same and methods of use
03/01/2012US20120054695 Pattern Verification Method, Pattern Verification System, Mask Manufacturing Method and Semiconductor Device Manufacturing Method
03/01/2012US20120052685 Silicon-containing film-forming composition, silicon-containing film-formed substrate, and patterning process
03/01/2012US20120052449 Method of forming pattern
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