Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2012
03/15/2012US20120061696 Method for manufacturing display and display
03/15/2012US20120061288 Composite substrate carrier
03/15/2012US20120061128 Photosensitive resin, curable resin composition containing the same, dry film thereof, and printed circuit board using them
03/15/2012US20120060711 Method for printing a material onto a substrate
03/15/2012DE19960368B4 System zum mikrolithographischen Schreiben mit verbesserter Genauigkeit System for microlithography letter with improved accuracy
03/15/2012DE102011111244A1 Quellkollektormodul mit GIC-Spiegel- und Xenonflüssigkeits-EUV-LPP-Target-System Source collector module with GIC mirror and xenon liquid EUV LPP target system
03/15/2012DE102011079072A1 Verfahren sowie Anordnung zur Aktuierung eines optischen Elementes Method and arrangement for actuation of an optical element
03/15/2012DE102010044969A1 Verfahren zum Betreiben einer Projektionsbelichtungsanlage sowie Steuervorrichtung A method of operating a projection exposure system and control device
03/15/2012DE102010044875A1 Beleuchtungsvorrichtung zur Erzeugung einer linienförmigen Intensitätsverteilung in einer Arbeitsebene Lighting device for generating a line-shaped intensity distribution in a working plane
03/15/2012DE102005035144B4 Belichtungsmaskenherstellungsverfahren, Zeichnungsvorrichtung und Halbleiterbauelementherstellungsverfahren Exposure mask manufacturing process, drawing device and semiconductor device manufacturing method
03/14/2012EP2428843A1 Photoresist compositions and methods of forming photolithographic patterns
03/14/2012EP2428842A1 Photoresists comprising multi-amide component
03/14/2012EP2428557A1 Cleaning solution
03/14/2012EP2428488A1 Low expansivity, high transmission titania doped silica glass
03/14/2012EP2427804A1 Resist stripping compositions and methods for manufacturing electrical devices
03/14/2012EP2427803A1 Resist stripping compositions and methods for manufacturing electrical devices
03/14/2012EP2427802A1 Optical imaging with reduced immersion liquid evaporation effects
03/14/2012EP2427801A1 Functionalized perfluoropolyether material as a hydrophobic coating
03/14/2012EP1751625B9 Method of making a photopolymer printing plate
03/14/2012CN202166827U 一种涂布设备 A coating apparatus
03/14/2012CN202166826U 一种挡点菲林 One kind of block point film
03/14/2012CN202166825U 一种靶标位加挡油块的挡点菲林 One kind of target bit block block block oil plus point film
03/14/2012CN1983029B Method and device using arf photoresist
03/14/2012CN102378940A Photosensitive resin composite and laminate thereof
03/14/2012CN102378939A Member for masking film, process for producing masking film using same, and process for producing photosensitive resin printing plate
03/14/2012CN102378935A Imaging optics and projection exposure installation for microlithography with an imaging optics of this type
03/14/2012CN102378696A Original plate for lithographic printing plate
03/14/2012CN102376638A Process for making conductive post with footing profile
03/14/2012CN102376626A Method for reducing size of through hole in semiconductor device
03/14/2012CN102376566A Method of forming a pattern structure for a semiconductor device
03/14/2012CN102376552A Method for preventing grid electrode from damage in ion implantation process
03/14/2012CN102376546A Vaporizing apparatus, substrate processing apparatus, coating and developing apparatus, and substrate processing method
03/14/2012CN102376545A Method of forming fine patterns
03/14/2012CN102376544A Nondestructive surface flattening method during semiconductor integrated circuit manufacturing
03/14/2012CN102376543A Development method in semiconductor component manufacture process
03/14/2012CN102376537A Method of manufacturing semiconductor devices
03/14/2012CN102376531A Method for improving photoetching marking signal after epitaxial filling and CMP (corrugated metal pipe) grinding
03/14/2012CN102375352A Environmental compensation alignment system
03/14/2012CN102375351A Signal normalization mask alignment system
03/14/2012CN102375350A Detection layout and detection method of development technology
03/14/2012CN102375349A Method for verifying concentration of developer solution
03/14/2012CN102375348A Fluid handling structure, module for an immersion lithographic apparatus, lithographic apparatus and device manufacturing method
03/14/2012CN102375347A Lithographic apparatus and device manufacturing method
03/14/2012CN102375346A Liquid crystal exposure device
03/14/2012CN102375345A Movable adjusting drive unit for optical elements
03/14/2012CN102375344A Method for controlling change of image quality of lens
03/14/2012CN102375343A Workbench position measuring system
03/14/2012CN102375342A Coating method of photoresist
03/14/2012CN102375341A Manufacturing Method Of Photosensitive Resin Composite, Element And Slushing Compound Pattern, Manufacturing Method Of Lead Frame And Printed Circuit Board
03/14/2012CN102375340A Radioactive Ray Sensitive Resin Composite, Solidification Film, Preparing Method Of Solidification Film, Color Filter And Preparing Method Of Color Filter
03/14/2012CN102375339A Alkali development-type photosensitive resin composition
03/14/2012CN102375338A Coloring composition, method for manufacturing the same, coloring pattern, color filter, color display component and method for manufacturing the color filter
03/14/2012CN102375337A Photosensitive resin composition
03/14/2012CN102375336A Manufacturing Method Of Photosensitive Resin Composition And Solidified Embossing Pattern, And Semiconductor Device
03/14/2012CN102375335A Manufacturing Method Of Resin Composition, Photosensitive Element, Resist Pattern And Circuit Board
03/14/2012CN102375334A Method of manufacturing microlens array, method of manufacturing solid-state image sensor, and solid-state image sensor
03/14/2012CN102375333A Line structure, roller with line and formation method thereof
03/14/2012CN102375332A Suspension photoresist planarization technology for MEMS structure
03/14/2012CN102375331A Circuit board marking system and application method thereof
03/14/2012CN102375330A Method and device for determining optimum focus of exposure equipment
03/14/2012CN102375329A Test mask and method for measuring exposure system parameters therewith
03/14/2012CN102375327A Embedded-attenuated phase shift mask and its manufacturing method
03/14/2012CN102375277A Liquid crystal display device and method of manufacturing the same
03/14/2012CN102375263A Method of manufacturing display apparatus and display apparatus
03/14/2012CN102375238A Micro cylindrical mirror array for generating uniform illumination and designing method thereof
03/14/2012CN102375214A Projection objective lens for large-area photo-etching
03/14/2012CN102375200A Radial adjusting device of adjustable optical element
03/14/2012CN102375177A M*N two-dimensional optical fiber array and manufacturing method thereof
03/14/2012CN102374977A Transmissivity measuring device, transmissivity detecting device of photomask and transmissivity detecting method
03/14/2012CN102374844A Device for measuring vertical position of workpiece bench
03/14/2012CN102004274B Micro lens structure, micro lens technology and bank pattern applied to micro lens technology
03/14/2012CN101808469B Exposure method of printed wiring board
03/14/2012CN101595431B Device manufacturing method and lithographic apparatus
03/14/2012CN101421672B Alkali developable solder resist, cured product of the same and printed wiring board obtained using the same
03/14/2012CN101221260B Method for fabricating color filter array substrate
03/14/2012CN101156226B Exposure method, exposure apparatus, method for manufacturing device, and film evaluation method
03/14/2012CN101103310B Material for pattern formation, apparatus for pattern formation, and method for pattern formation
03/14/2012CN101046626B Method for etching molybdenum when manufacturing photomask
03/13/2012US8135248 Opto-electric hybrid board and manufacturing method thereof
03/13/2012US8134682 Exposure apparatus and method for producing device
03/13/2012US8133664 Methods of forming patterns
03/13/2012US8133663 Pattern forming method and apparatus
03/13/2012US8133661 Superimpose photomask and method of patterning
03/13/2012US8133660 Method of manufacturing a coordinate detector
03/13/2012US8133659 On-track process for patterning hardmask by multiple dark field exposures
03/13/2012US8133658 Non-chemical development of printing plates
03/13/2012US8133657 Method for making a lithographic printing plate
03/13/2012US8133656 Oxime ester compound and photopolymerization initiator containing the same
03/13/2012US8133654 Laser-decomposable resin composition and laser-decomposable pattern-forming material and flexographic printing plate precursor of laser engraving type using the same
03/13/2012US8133653 Positive resist composition for forming thick-film resist, thick-film resist laminate, and method of forming resist pattern
03/13/2012US8133652 Thermally reversible via laser beam
03/13/2012US8133651 Lithographic printing plate comprising alkaline soluble and alkaline insoluble polymeric binders
03/13/2012US8133644 Method of forming an image having multiple phases
03/13/2012US8133642 Metal optical grayscale mask and manufacturing method thereof
03/13/2012US8133550 Polybenzoxazole precursor, photosensitive resin composition using the same, and manufacturing method of semiconductor device
03/08/2012WO2012031058A2 High resolution, solvent resistant, thin elastomeric printing plates
03/08/2012WO2012031056A2 High resolution, solvent resistant, thin elastomeric printing plates
03/08/2012WO2012029938A1 Photoresist residue and polymer residue removing liquid composition
03/08/2012WO2012029806A1 Method for producing photosensitive resin and photosensitive resin composition
03/08/2012WO2012029786A1 Photosensitive composition, as well as photosensitive film, permanent pattern, method for forming permanent pattern, and printed substrate
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