| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) | 
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| 03/21/2012 | CN102385249A Photoresist composition, and preparation method and application thereof  | 
| 03/21/2012 | CN102385248A Photosensitive resin composition  | 
| 03/21/2012 | CN102385247A Photosensitive resin composition  | 
| 03/21/2012 | CN102385246A Colored photosensitive composition, color filter manufacture method, color filter and liquid crystal display device  | 
| 03/21/2012 | CN102385245A Image forming material, planographic printing plate precursor, and method for manufacturing a planographic printing plate  | 
| 03/21/2012 | CN102385244A Black curable resin composition  | 
| 03/21/2012 | CN102385243A Method and apparatus for producing light guide plates  | 
| 03/21/2012 | CN102385162A Light source device  | 
| 03/21/2012 | CN102385082A Production method for compound eye reflecting mirror for EUV photoetching system  | 
| 03/21/2012 | CN102382291A Fluorine-containing (meth)acrylic-modified organosilicon compound and curable composition containing the same  | 
| 03/21/2012 | CN102157361B Method for preparing semiconductor T-shaped gate electrode by utilizing photon beam super-diffraction technology  | 
| 03/21/2012 | CN102034706B Method for controlling growth effect of facet of silicon-germanium (Si-Ge) alloy  | 
| 03/21/2012 | CN101840875B Image capturing device and image capturing control method for measuring aperture of contact hole  | 
| 03/21/2012 | CN101809470B Method of making a colour filter array  | 
| 03/21/2012 | CN101799640B Device and method for determining optimal focal plane position of lithography machine  | 
| 03/21/2012 | CN101770170B Photosensitive composition suitable for heat-sensitive positive computer to plate (CTP) and lithographic plate containing same  | 
| 03/21/2012 | CN101770169B Positive lithograph plate photosensitive composition with high resolution and high sensitivity  | 
| 03/21/2012 | CN101669071B Illumination system for illuminating a mask in a microlithographic exposure apparatus  | 
| 03/21/2012 | CN101666983B Fluid handling structure, lithographic apparatus and device manufacturing method  | 
| 03/21/2012 | CN101655665B Film as well as manufacturing and use method thereof  | 
| 03/21/2012 | CN101625522B Method for preparing dense pattern on thick negative high resolution electron beam resist HSQ  | 
| 03/21/2012 | CN101568572B Polyimide precursor and photosensitive resin composition containing polyimide precursor  | 
| 03/21/2012 | CN101535899B Optical arrangement for immersion lithography with a hydrophobic coating and projection exposure apparatus comprising the same  | 
| 03/21/2012 | CN101512731B Planarization of metal layer over photoresist  | 
| 03/21/2012 | CN101501573B Electronic circuit device and method for fabricating the same  | 
| 03/21/2012 | CN101408728B Resist composition, method of forming resist pattern, novel compound and method of producing the same  | 
| 03/21/2012 | CN101354540B Exposure apparatus and method for producing device  | 
| 03/21/2012 | CN101339324B Processing equipment and its control method  | 
| 03/21/2012 | CN101293239B Coating method and pattern forming method  | 
| 03/21/2012 | CN101251719B Method for minimizing precipitation of developing reactant by reducing ph value mutation  | 
| 03/21/2012 | CN101226335B Method for forming resist pattern, semiconductor device and production method thereof  | 
| 03/21/2012 | CN101202268B Semiconductor device for measuring an overlay error, method for measuring an overlay error, lithographic apparatus and device manufacturing method  | 
| 03/21/2012 | CN101135846B Hologram recording material, process for producing the same and hologram recording medium  | 
| 03/21/2012 | CN101086619B Color photosensitive resin compositions  | 
| 03/21/2012 | CN101084470B Material for pattern formation, apparatus for pattern formation, and method for pattern formation  | 
| 03/21/2012 | CN101079150B Outline definition apparatus and outline definition method, and image processing apparatus  | 
| 03/21/2012 | CN101078879B Radiation sensitive resin composition, alternation compound and forming method thereof  | 
| 03/21/2012 | CN101071268B Photoresist compositions  | 
| 03/21/2012 | CN101051188B Lithographic apparatus and device manufacturing method  | 
| 03/20/2012 | US8141009 Preparing data for hybrid exposure using both electron beam exposure and reticle exposure in lithographic process  | 
| 03/20/2012 | US8139217 Alignment systems and methods for lithographic systems  | 
| 03/20/2012 | US8139202 Apparatus and a method for illuminating a light-sensitive medium  | 
| 03/20/2012 | US8139198 Exposure apparatus, exposure method, and method for producing device  | 
| 03/20/2012 | US8138486 Lithographic apparatus and device manufacturing method  | 
| 03/20/2012 | US8137902 Method of manufacturing mechanical and micromechanical parts  | 
| 03/20/2012 | US8137901 Method for fabricating an image sensor  | 
| 03/20/2012 | US8137900 Electrophoretic display device  | 
| 03/20/2012 | US8137898 Method for manufacturing semiconductor device  | 
| 03/20/2012 | US8137897 Processless development of printing plate  | 
| 03/20/2012 | US8137896 Method of preparing lithographic printing plates  | 
| 03/20/2012 | US8137895 Structure and method for improving photoresist pattern adhesion  | 
| 03/20/2012 | US8137893 Chemical trim of photoresist lines by means of a tuned overcoat  | 
| 03/20/2012 | US8137892 Photobase generator and photocurable resin composition  | 
| 03/20/2012 | US8137891 Bakeable lithographic printing plates with a high resistance to chemicals  | 
| 03/20/2012 | US8137890 Colored photosensitive composition, color filter, and method for manufacturing color filter  | 
| 03/20/2012 | US8137889 Solvent for printing, pattern composition for printing comprising the solvent, and patterning method using the composition  | 
| 03/20/2012 | US8137874 Organic graded spin on BARC compositions for high NA lithography  | 
| 03/20/2012 | US8137869 Reticle, mirror, filter, or mask, provided a transmissive layer with substantially planar surface  | 
| 03/20/2012 | US8137576 Substrate developing method and developing apparatus  | 
| 03/20/2012 | CA2470823C Patterning of solid state features by direct write nanolithographic printing  | 
| 03/15/2012 | WO2012033933A1 Parallel linkage and actuator motor coil designs for a tube carrier  | 
| 03/15/2012 | WO2012033685A1 Large-field unit-magnification catadioptric projection system  | 
| 03/15/2012 | WO2012033230A1 Reflective imaging optical system, exposure apparatus, and method for producing device  | 
| 03/15/2012 | WO2012033212A1 Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method  | 
| 03/15/2012 | WO2012033211A1 Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method  | 
| 03/15/2012 | WO2012033209A1 Exposure apparatus, movable body apparatus, flat-panel display manufacturing method, and device manufacturing method  | 
| 03/15/2012 | WO2012033145A1 Radiation-sensitive resin composition  | 
| 03/15/2012 | WO2012033138A1 Radiation-sensitive resin composition, polymer, and compound  | 
| 03/15/2012 | WO2012033019A1 Acrylic ester derivative, high-molecular compound and photoresist composition  | 
| 03/15/2012 | WO2012033004A1 Resist pattern forming method  | 
| 03/15/2012 | WO2012032905A1 Composition for use in forming layer to be plated, method for manufacturing metal pattern material, and novel polymer  | 
| 03/15/2012 | WO2012032904A1 Film exposure device and film exposure method  | 
| 03/15/2012 | WO2012032903A1 Film exposure device  | 
| 03/15/2012 | WO2012032790A1 Composition having acid-labile dissolution inhibiting group  | 
| 03/15/2012 | WO2012032768A1 Mobile apparatus, exposure apparatus, exposure method, method for manufacturing flat-panel display, and method for manufacturing device  | 
| 03/15/2012 | WO2012032059A1 Method and device for the depollution of a pelliculated reticle  | 
| 03/15/2012 | WO2012031841A1 Lithographic apparatus, euv radiation generation apparatus and device manufacturing method  | 
| 03/15/2012 | WO2012031765A2 Method for operating a projection exposure tool and control apparatus  | 
| 03/15/2012 | WO2012031453A1 Fluoride-containing cleaning liquid  | 
| 03/15/2012 | WO2012011612A3 Cleaning method, immersion exposure apparatus and device fabricating method  | 
| 03/15/2012 | WO2011159876A3 Process and materials for making contained layers and devices made with same  | 
| 03/15/2012 | WO2011142600A3 Photoresist stripper composition  | 
| 03/15/2012 | WO2011139774A3 Method for forming an organic device  | 
| 03/15/2012 | US20120064725 Naphthalene derivative, resist bottom layer material, and patterning process  | 
| 03/15/2012 | US20120064463 Method of Forming Micropatterns  | 
| 03/15/2012 | US20120064462 By-product mitigation in through-silicon-via plating  | 
| 03/15/2012 | US20120064461 Movable body apparatus, exposure apparatus, device manufacturing method, flat-panel display manufacturing method, and object exchange method  | 
| 03/15/2012 | US20120064460 Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method  | 
| 03/15/2012 | US20120064459 Water Repellent Additive for Immersion Resist  | 
| 03/15/2012 | US20120064458 Optical waveguides and methods thereof  | 
| 03/15/2012 | US20120064457 Functionalized perfluoropolyether material as a hydrophobic coating  | 
| 03/15/2012 | US20120064456 Photoresist compositions and methods of forming photolithographic patterns  | 
| 03/15/2012 | US20120064455 Photoresist composition and method of forming pattern using the same  | 
| 03/15/2012 | US20120064441 Method for photo-alignment treatment, mask for photo-alignment treatment, and method for producing alignment film  | 
| 03/15/2012 | US20120064440 Method for design and manufacture of diagonal patterns with variable shaped beam lithography  | 
| 03/15/2012 | US20120064438 Photomask blank and making method, photomask, light pattern exposure method, and design method of transition metal/silicon base material film  | 
| 03/15/2012 | US20120064374 Dot-Patterned Structure, Magnetic Recording Medium, and Method for Production Thereof  | 
| 03/15/2012 | US20120064308 Sheet Having Convex Pattern on Surface and Method for Forming the Convex Pattern  | 
| 03/15/2012 | US20120064252 Cyclohexane oxidation process byproduct derivatives and methods for using the same  | 
| 03/15/2012 | US20120063484 Distributed reflector in a microring resonator  |