Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2012
03/21/2012CN102385249A Photoresist composition, and preparation method and application thereof
03/21/2012CN102385248A Photosensitive resin composition
03/21/2012CN102385247A Photosensitive resin composition
03/21/2012CN102385246A Colored photosensitive composition, color filter manufacture method, color filter and liquid crystal display device
03/21/2012CN102385245A Image forming material, planographic printing plate precursor, and method for manufacturing a planographic printing plate
03/21/2012CN102385244A Black curable resin composition
03/21/2012CN102385243A Method and apparatus for producing light guide plates
03/21/2012CN102385162A Light source device
03/21/2012CN102385082A Production method for compound eye reflecting mirror for EUV photoetching system
03/21/2012CN102382291A Fluorine-containing (meth)acrylic-modified organosilicon compound and curable composition containing the same
03/21/2012CN102157361B Method for preparing semiconductor T-shaped gate electrode by utilizing photon beam super-diffraction technology
03/21/2012CN102034706B Method for controlling growth effect of facet of silicon-germanium (Si-Ge) alloy
03/21/2012CN101840875B Image capturing device and image capturing control method for measuring aperture of contact hole
03/21/2012CN101809470B Method of making a colour filter array
03/21/2012CN101799640B Device and method for determining optimal focal plane position of lithography machine
03/21/2012CN101770170B Photosensitive composition suitable for heat-sensitive positive computer to plate (CTP) and lithographic plate containing same
03/21/2012CN101770169B Positive lithograph plate photosensitive composition with high resolution and high sensitivity
03/21/2012CN101669071B Illumination system for illuminating a mask in a microlithographic exposure apparatus
03/21/2012CN101666983B Fluid handling structure, lithographic apparatus and device manufacturing method
03/21/2012CN101655665B Film as well as manufacturing and use method thereof
03/21/2012CN101625522B Method for preparing dense pattern on thick negative high resolution electron beam resist HSQ
03/21/2012CN101568572B Polyimide precursor and photosensitive resin composition containing polyimide precursor
03/21/2012CN101535899B Optical arrangement for immersion lithography with a hydrophobic coating and projection exposure apparatus comprising the same
03/21/2012CN101512731B Planarization of metal layer over photoresist
03/21/2012CN101501573B Electronic circuit device and method for fabricating the same
03/21/2012CN101408728B Resist composition, method of forming resist pattern, novel compound and method of producing the same
03/21/2012CN101354540B Exposure apparatus and method for producing device
03/21/2012CN101339324B Processing equipment and its control method
03/21/2012CN101293239B Coating method and pattern forming method
03/21/2012CN101251719B Method for minimizing precipitation of developing reactant by reducing ph value mutation
03/21/2012CN101226335B Method for forming resist pattern, semiconductor device and production method thereof
03/21/2012CN101202268B Semiconductor device for measuring an overlay error, method for measuring an overlay error, lithographic apparatus and device manufacturing method
03/21/2012CN101135846B Hologram recording material, process for producing the same and hologram recording medium
03/21/2012CN101086619B Color photosensitive resin compositions
03/21/2012CN101084470B Material for pattern formation, apparatus for pattern formation, and method for pattern formation
03/21/2012CN101079150B Outline definition apparatus and outline definition method, and image processing apparatus
03/21/2012CN101078879B Radiation sensitive resin composition, alternation compound and forming method thereof
03/21/2012CN101071268B Photoresist compositions
03/21/2012CN101051188B Lithographic apparatus and device manufacturing method
03/20/2012US8141009 Preparing data for hybrid exposure using both electron beam exposure and reticle exposure in lithographic process
03/20/2012US8139217 Alignment systems and methods for lithographic systems
03/20/2012US8139202 Apparatus and a method for illuminating a light-sensitive medium
03/20/2012US8139198 Exposure apparatus, exposure method, and method for producing device
03/20/2012US8138486 Lithographic apparatus and device manufacturing method
03/20/2012US8137902 Method of manufacturing mechanical and micromechanical parts
03/20/2012US8137901 Method for fabricating an image sensor
03/20/2012US8137900 Electrophoretic display device
03/20/2012US8137898 Method for manufacturing semiconductor device
03/20/2012US8137897 Processless development of printing plate
03/20/2012US8137896 Method of preparing lithographic printing plates
03/20/2012US8137895 Structure and method for improving photoresist pattern adhesion
03/20/2012US8137893 Chemical trim of photoresist lines by means of a tuned overcoat
03/20/2012US8137892 Photobase generator and photocurable resin composition
03/20/2012US8137891 Bakeable lithographic printing plates with a high resistance to chemicals
03/20/2012US8137890 Colored photosensitive composition, color filter, and method for manufacturing color filter
03/20/2012US8137889 Solvent for printing, pattern composition for printing comprising the solvent, and patterning method using the composition
03/20/2012US8137874 Organic graded spin on BARC compositions for high NA lithography
03/20/2012US8137869 Reticle, mirror, filter, or mask, provided a transmissive layer with substantially planar surface
03/20/2012US8137576 Substrate developing method and developing apparatus
03/20/2012CA2470823C Patterning of solid state features by direct write nanolithographic printing
03/15/2012WO2012033933A1 Parallel linkage and actuator motor coil designs for a tube carrier
03/15/2012WO2012033685A1 Large-field unit-magnification catadioptric projection system
03/15/2012WO2012033230A1 Reflective imaging optical system, exposure apparatus, and method for producing device
03/15/2012WO2012033212A1 Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method
03/15/2012WO2012033211A1 Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method
03/15/2012WO2012033209A1 Exposure apparatus, movable body apparatus, flat-panel display manufacturing method, and device manufacturing method
03/15/2012WO2012033145A1 Radiation-sensitive resin composition
03/15/2012WO2012033138A1 Radiation-sensitive resin composition, polymer, and compound
03/15/2012WO2012033019A1 Acrylic ester derivative, high-molecular compound and photoresist composition
03/15/2012WO2012033004A1 Resist pattern forming method
03/15/2012WO2012032905A1 Composition for use in forming layer to be plated, method for manufacturing metal pattern material, and novel polymer
03/15/2012WO2012032904A1 Film exposure device and film exposure method
03/15/2012WO2012032903A1 Film exposure device
03/15/2012WO2012032790A1 Composition having acid-labile dissolution inhibiting group
03/15/2012WO2012032768A1 Mobile apparatus, exposure apparatus, exposure method, method for manufacturing flat-panel display, and method for manufacturing device
03/15/2012WO2012032059A1 Method and device for the depollution of a pelliculated reticle
03/15/2012WO2012031841A1 Lithographic apparatus, euv radiation generation apparatus and device manufacturing method
03/15/2012WO2012031765A2 Method for operating a projection exposure tool and control apparatus
03/15/2012WO2012031453A1 Fluoride-containing cleaning liquid
03/15/2012WO2012011612A3 Cleaning method, immersion exposure apparatus and device fabricating method
03/15/2012WO2011159876A3 Process and materials for making contained layers and devices made with same
03/15/2012WO2011142600A3 Photoresist stripper composition
03/15/2012WO2011139774A3 Method for forming an organic device
03/15/2012US20120064725 Naphthalene derivative, resist bottom layer material, and patterning process
03/15/2012US20120064463 Method of Forming Micropatterns
03/15/2012US20120064462 By-product mitigation in through-silicon-via plating
03/15/2012US20120064461 Movable body apparatus, exposure apparatus, device manufacturing method, flat-panel display manufacturing method, and object exchange method
03/15/2012US20120064460 Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method
03/15/2012US20120064459 Water Repellent Additive for Immersion Resist
03/15/2012US20120064458 Optical waveguides and methods thereof
03/15/2012US20120064457 Functionalized perfluoropolyether material as a hydrophobic coating
03/15/2012US20120064456 Photoresist compositions and methods of forming photolithographic patterns
03/15/2012US20120064455 Photoresist composition and method of forming pattern using the same
03/15/2012US20120064441 Method for photo-alignment treatment, mask for photo-alignment treatment, and method for producing alignment film
03/15/2012US20120064440 Method for design and manufacture of diagonal patterns with variable shaped beam lithography
03/15/2012US20120064438 Photomask blank and making method, photomask, light pattern exposure method, and design method of transition metal/silicon base material film
03/15/2012US20120064374 Dot-Patterned Structure, Magnetic Recording Medium, and Method for Production Thereof
03/15/2012US20120064308 Sheet Having Convex Pattern on Surface and Method for Forming the Convex Pattern
03/15/2012US20120064252 Cyclohexane oxidation process byproduct derivatives and methods for using the same
03/15/2012US20120063484 Distributed reflector in a microring resonator