Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2012
03/28/2012CN101268151B Colored composition and photosensitive transfer material
03/28/2012CN101243028B Fluorine-containing adamantane derivative, fluorine-containing adamantane derivative having polymerizable group, and resin composition containing same
03/28/2012CN101046640B Lithographic apparatus and device manufacturing method
03/27/2012US8145342 Methods and systems for adjusting operation of a wafer grinder using feedback from warp data
03/27/2012US8144307 Image forming method and apparatus
03/27/2012US8143703 Methods and devices for forming nanostructure monolayers and devices including such monolayers
03/27/2012US8143324 antioxidants with hindered phenol functionality perform better in curing of polybenzocyclobutene materials in air without undue degradation of key properties
03/27/2012US8142989 Textured chamber surface
03/27/2012US8142988 Coating compositions for use with an overcoated photoresist
03/27/2012US8142987 Method of producing a relief image for printing
03/27/2012US8142986 Method of forming fine patterns of semiconductor device
03/27/2012US8142985 Method for manufacturing semiconductor device
03/27/2012US8142984 Lithographically patterned nanowire electrodeposition
03/27/2012US8142983 Lithographic printing plate precursor and method of lithographic printing
03/27/2012US8142982 Lithographic printing plate precursor
03/27/2012US8142980 Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent
03/27/2012US8142979 Resist composition for immersion exposure and method of forming resist pattern using the same
03/27/2012US8142978 Planographic printing plate precursor and printing method using the same
03/27/2012US8142977 mixture of resin which decomposes under acid under exposure to actinic radiation, acid generator
03/27/2012US8142852 Lithographic apparatus and device manufacturing method
03/27/2012US8142673 Compositions for dissolution of low-k dielectric films, and methods of use
03/27/2012US8142250 Method of forming a color filter touch sensing substrate
03/27/2012US8141785 Optical delay module for lengthening the propagation path of a light beam and pulse multiplication or elongation module
03/22/2012WO2012037118A2 Nanoporous metal multiple electrode array and method of making same
03/22/2012WO2012036477A2 Light-sensitive resin composition, a dry film solder resist and a circuit substrate
03/22/2012WO2012036315A1 Method of forming pattern
03/22/2012WO2012036252A1 Movable body apparatus, exposure apparatus, device manufacturing method, flat-panel display manufacturing method, and object exchange method
03/22/2012WO2012036250A1 Radiation-sensitive resin composition, polymer, and method for forming resist pattern
03/22/2012WO2012036205A1 Pattern formation method, and device production method
03/22/2012WO2012036130A1 Phenolic resin composition, and method for producing cured relief pattern and semiconductor
03/22/2012WO2012036128A1 Polymer, resist material containing same, and method for forming pattern using same
03/22/2012WO2012036090A1 Patterning method, chemically-amplified resist composition, and resist film
03/22/2012WO2012036000A1 Positive photosensitive resin composition, method of creating resist pattern, and electronic component
03/22/2012WO2012035950A1 Carbamoyloxyadamantane derivative, polymer compound, and photoresist composition
03/22/2012WO2012035892A1 Drawing method and drawing device
03/22/2012WO2012035857A1 Flexible printed circuit board integrated with reinforcing plate, and method for manufacturing flexible printed circuit board integrated with reinforcing plate
03/22/2012WO2012035666A1 Acrylic ester derivative, alcohol derivative, and method for producing same
03/22/2012WO2012035080A1 Method for producing fluorinated polysilanes
03/22/2012WO2012034995A2 Imaging optical system
03/22/2012WO2012034829A1 Correction for flare effects in lithography system
03/22/2012WO2012034571A1 Illumination system of a microlithographic projection exposure apparatus
03/22/2012WO2011139073A3 Negative photoresist composition, and method for patterning device
03/22/2012US20120070787 Photoresist compositions and methods for shrinking a photoresist critical dimension
03/22/2012US20120070786 Method for monitoring photolithography process and monitor mark
03/22/2012US20120070785 Method of manufacturing micro lens array
03/22/2012US20120070784 System, method and apparatus for fabricating a c-aperture or e-antenna plasmonic near field source for thermal assisted recording applications
03/22/2012US20120070783 Radiation-sensitive resin composition, polymer, and method for forming resist pattern
03/22/2012US20120070782 Self-forming top anti-reflective coating compositions and, photoresist mixtures and method of imaging using same
03/22/2012US20120070781 Base generator, photosensitive resin composition, pattern forming material comprising the photosensitive resin composition, pattern forming method using the photosensitive resin composition and products comprising the same
03/22/2012US20120070780 Photosensitive resin composition, dry film solder resist, and circuit board
03/22/2012US20120070779 Lithographic printing plate precursor
03/22/2012US20120070778 Resin, resist composition and method for producing resist pattern
03/22/2012US20120070767 Set of masks, method of generating mask data and method for forming a pattern
03/22/2012US20120070629 Method for producing optical orientation film, method for producing retardation film, system for producing optical orientation film, optical orientation film and retardation film
03/22/2012US20120070613 Patterened inorganic layers, radiation based patterning compositions and corresponding methods
03/22/2012US20120069315 Imaging optics and projection exposure installation for microlithography with an imaging optics
03/22/2012US20120069314 Imaging optics and projection exposure installation for microlithography with an imaging optics of this type
03/22/2012US20120069312 Imaging optical system and projection exposure installation for microlithography with an imaging optical system of this type
03/22/2012US20120068292 Polymerizable composition, and photosensitive layer, permanent pattern, wafer-level lens, solid-state imaging device and pattern forming method each using the composition
03/22/2012US20120067626 Photosensitive resin composition and circuit board with metal support using the same
03/22/2012US20120067379 Method for washing device substrate
03/22/2012DE10337667B4 Plasma-Strahlungsquelle und Anordnung zur Erzeugung eines Gasvorhangs für Plasma-Strahlungsquellen Plasma radiation source and arrangement for producing a gas curtain for plasma radiation sources
03/22/2012DE102010028941B4 Vorrichtung für eine optische Anordnung und Verfahren zum Positionieren eines optischen Elements einer optischen Anordnung A device for an optical assembly and method for positioning an optical element of an optical assembly
03/21/2012EP2432035A2 Improved method of stripping hot melt etch resists from semiconductors
03/21/2012EP2431826A1 A measurement configuration based on linear scales able to measure to a target also moving perpendicular to the measurement axis
03/21/2012EP2431808A2 Method and apparatus for securing printing forms on a mountable surface
03/21/2012EP2430650A1 Patterning a single integrated circuit layer using automatically-generated masks and multiple masking layers
03/21/2012EP2430499A2 Composition for post chemical-mechanical polishing cleaning
03/21/2012EP2430498A1 Inspection method for lithography
03/21/2012EP2430220A1 Method of nanostructuring a film or a wafer of material of the metal oxide or semi-conductor type
03/21/2012EP1949147B1 Method of producing a diffraction grating element
03/21/2012EP1556740B1 Ionic photoacid generators with segmented hydrocarbon-fluorocarbon sulfonate anions
03/21/2012EP1483628B1 Full phase shifting mask in damascene process
03/21/2012CN202171722U 电路板曝光机冷却系统管道 PCB exposure machine cooling system piping
03/21/2012CN1991586B An optical metrology system and metrology mark characterization device
03/21/2012CN1954264B Positive photosensitive resin composition, and interlayer dielectrics and micro lenses made therefrom
03/21/2012CN1940729B Lithographic apparatus, device manufacturing method and device manufactured thereby
03/21/2012CN1926473B Inorganic paste composition, method for preparing inorganic paste composition, and sheet-shaped unbaked body for producing display panel
03/21/2012CN1878854B Photopolymerizing composition and photopolymerizing recording medium manufactured using the same and used to manufacture 3D optical memory
03/21/2012CN1681084B Method for creating a pattern in a material and semiconductor structure processed therewith
03/21/2012CN1664704B Lithographic apparatus and device manufacturing method
03/21/2012CN102388345A Method for treating waste organic solvents
03/21/2012CN102388344A Detector module with a cooling arrangement, and lithographic apparatus comprising said detector module
03/21/2012CN102388343A Actuator having at least one magnet for a projection exposure system, production method therefor and projection exposure system having a magnet
03/21/2012CN102388086A Polyimide and light-sensitive resin composition comprising the same
03/21/2012CN102385569A Method for calculating periodic medium Fourier coefficient
03/21/2012CN102385263A Method for aligning previous-layer graphs and photomask applicable to method
03/21/2012CN102385262A Development method of photoetching process
03/21/2012CN102385261A Coaxial focusing device and method of photoetching machine
03/21/2012CN102385260A Immersion liquid, exposure apparatus, and exposure process
03/21/2012CN102385259A Wide-field direct-projection type laser photoetching optical system and application thereof
03/21/2012CN102385258A Illumination optical system, exposure apparatus, optical element and device manufacturing method
03/21/2012CN102385257A EUV Collector
03/21/2012CN102385256A Photolithography system
03/21/2012CN102385255A Stage apparatus, lithographic apparatus and method of positioning an object table
03/21/2012CN102385254A Photo-sensitivity resin composition
03/21/2012CN102385253A Photosensitive resin composition, photosensitive element, method for resist pattern formation, and method for manufacturing printed wiring board
03/21/2012CN102385252A Dyeing photosensitive resin combination, colorful color filter and liquid crystal display apparatus with colorful color filter
03/21/2012CN102385251A Radiation-sensitive resin composition, cured film, cured film forming method, color filter and color filter forming method
03/21/2012CN102385250A Ultraviolet laser solidification rapid-prototyping photosensitive resin and manufacture method thereof
1 ... 178 179 180 181 182 183 184 185 186 187 188 189 190 191 192 193 194 195 196 197 198 ... 1272