Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/2012
03/29/2012WO2012039606A1 Lithography system arranged on a foundation, and method for arranging a lithography system on said foundation
03/29/2012WO2012039416A1 Compound and color filter
03/29/2012WO2012039353A1 Spatial light modulator, exposure apparatus, and method for manufacturing device
03/29/2012WO2012039337A1 Silicon-containing composition for formation of resist underlayer film, which contains organic group containing protected aliphatic alcohol
03/29/2012WO2012039233A1 Lithographic printing plate original
03/29/2012WO2012038239A1 Euv microlithography projection exposure apparatus with a heat light source
03/29/2012WO2012038112A1 Illumination optical system with a movable filter element
03/29/2012WO2012011613A3 Cleaning method and apparatus, and device fabricating method
03/29/2012WO2011123433A3 Method of slimming radiation-sensitive material lines in lithographic applications
03/29/2012US20120077343 Resist composition and method for producing semiconductor device
03/29/2012US20120077132 Processess and compositions for removing substances from substrates
03/29/2012US20120077131 Method of forming pattern using actinic-ray or radiation-sensitive resin composition, and pattern
03/29/2012US20120077130 Method for generating a plurality of optimized wavefronts for a multiple exposure lithographic process
03/29/2012US20120077129 Production method of optical waveguide for connector
03/29/2012US20120077128 Substrate edge treatment for coater/developer
03/29/2012US20120077127 Methods Of Forming Patterns
03/29/2012US20120077126 Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition, Top Coat Composition And Pattern Formation Method
03/29/2012US20120077125 Resist composition for immersion exposure, method of forming resist pattern using the same, and fluorine-containing compound
03/29/2012US20120077124 Resist lower layer film-forming composition, polymer, resist lower layer film, pattern-forming method, and method of producing semiconductor device
03/29/2012US20120077123 Organic pigments for colour filters
03/29/2012US20120077122 Pattern forming method, chemical amplification resist composition and resist film
03/29/2012US20120077121 Fluoroalcohol, fluorinated monomer, polymer, resist composition and patterning process
03/29/2012US20120077120 Photoresists comprising multi-amide component
03/29/2012US20120077115 Liquid crystal display device treated by uv irradiation
03/29/2012US20120076997 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern
03/29/2012US20120076996 Resist composition, resist film therefrom and method of forming pattern therewith
03/29/2012US20120076991 Surface-treating agent for pattern formation and pattern-forming method using the surface-treating agent
03/29/2012US20120076982 Structure resulting from chemical shrink process over barc (bottom anti-reflective coating)
03/29/2012US20120075737 Method of manufacturing color filter and color filter
03/29/2012US20120075611 Diaphragm changing device
03/29/2012US20120075609 Optical arrangement of autofocus elements for use with immersion lithography
03/29/2012US20120074400 Multiple edge enabled patterning
03/29/2012US20120073947 Narrow frame touch input sheet, manufacturing method of same, and conductive sheet used in narrow frame touch input sheet
03/29/2012US20120073607 Polymeric or monomeric compositions comprising at least one mono-amide and/or at least one diamide for removing substances from substrates and methods for using the same
03/29/2012DE102011081259A1 Anordnung zur Spiegeltemperaturmessung und/oder zur thermischen Aktuierung eines Spiegels in einer mikrolithographischen Projektionsbelichtungsanlage Mirror arrangement for temperature measurement and / or thermal actuation of a mirror in a microlithography projection exposure apparatus
03/29/2012DE102011080636A1 Extreme UV (EUV) mirror for projection exposure system, has heat conducting layer having preset values of absolute and specific heat conductivity and average thickness, that is arranged between substrate and layer stack
03/29/2012DE102011005826A1 Optical device for e.g. extreme UV projection exposure system for manufacturing semiconductor chips, has sensor device comprising sensor line, where sensor device is formed to examine optic during shift of holder for exposure on wafer
03/29/2012DE102010047050A1 Verfahren zur Charakterisierung einer Struktur auf einer Maske und Vorrichtung zur Durchführung des Verfahrens A method of characterizing a pattern on a mask and apparatus for carrying out the method
03/29/2012DE102010046730A1 Fotolithografisches Verfahren zum Ausbilden einer dreidimensionalen Struktur A photolithographic method for forming a three-dimensional structure
03/29/2012DE102010046395A1 Belichtungsanordnung Exposure arrangement
03/29/2012DE102010041623A1 Spiegel Mirror
03/29/2012DE102010041562A1 Projektionsbelichtungsanlage für die Mikrolithographie sowie Verfahren zur mikrolithographischen Belichtung Projection exposure system for microlithography and processes for microlithography exposure
03/29/2012DE102010041558A1 Projektionsbelichtungsanlage für die Mikrolithographie sowie Verfahren zur mikrolithographischen Belichtung Projection exposure system for microlithography and processes for microlithography exposure
03/29/2012DE102010041556A1 Projektionsbelichtungsanlage für die Mikrolithographie und Verfahren zur mikrolithographischen Abbildung Projection exposure system for microlithography and procedures for microlithography Figure
03/29/2012DE102010041528A1 Projektionsbelichtungsanlage mit optimierter Justagemöglichkeit Projection exposure system with optimized adjustment feature
03/29/2012DE102010041502A1 Mirror for use in projection lens of projection exposure plant for imaging reticule in image plane using extreme UV radiations during microlithography process, has layer arrangement with layers e.g. barrier layers, made of graphene
03/29/2012DE102010041468A1 Baugruppe einer Projektionsbelichtungsanlage für die EUV-Lithographie Assembly of a projection exposure apparatus for EUV lithography
03/29/2012DE102010041298A1 EUV-Mikrolithographie-Projektionsbelichtungsanlage mit einer Heizlichtquelle EUV microlithography projection exposure apparatus with a Heizlichtquelle
03/29/2012DE102010041258A1 Beleuchtungsoptik mit einem beweglichen Filterelement Illumination optics with a movable filter element
03/29/2012DE102009045694B4 Beleuchtungsoptik für die Mikrolithographie sowie Beleuchtungssystem und Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik Illumination optics for microlithography and lighting system and projection exposure apparatus having an illumination optics
03/29/2012DE102008049616B4 Projektionsbelichtungsanlage für die Mikrolithographie zur Herstellung von Halbleiterbauelementen Projection exposure apparatus for microlithography for the production of semiconductor devices
03/29/2012DE102006053074B4 Strukturierungsverfahren unter Verwendung chemisch verstärkter Fotolacke und Belichtungsvorrichtung Structuring process using chemically amplified photoresists and exposure apparatus
03/29/2012DE102006026032B4 Beleuchtungssystem zur Ausleuchtung eines vorgegebenen Beleuchtungsfeldes einer Objektoberfläche mit EUV-Strahlung Lighting system to illuminate a given illumination field of an object surface with EUV radiation
03/29/2012DE10196379B3 Mehrstrahl-Mustergenerator Multi-beam pattern generator
03/28/2012EP2434346A2 Method and apparatus for tensioning a printing form
03/28/2012EP2434345A1 Method and system for evaluating euv mask flatness
03/28/2012EP2434344A1 Photolithographic method for depicting a three-dimensional structure
03/28/2012EP2434343A1 Resist composition, resist film therefrom and method of forming pattern therewith
03/28/2012EP2434342A1 Method for producing curable composition for imprints
03/28/2012EP2434328A1 Lighting assembly
03/28/2012EP2433972A1 Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern
03/28/2012EP2433927A1 Ketoxime ester photoinitiator
03/28/2012EP2433178A1 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition
03/28/2012EP2433164A2 Optimizing total internal reflection multilayer optics through material selection
03/28/2012EP1809477B1 Mandrels for electroforming printing screens, and electroforming apparatus
03/28/2012EP1730225B1 High performance water-based primer
03/28/2012EP1716726B1 Method and device for generating in particular euv radiation and/or soft x-ray radiation
03/28/2012EP1102662B1 Ticket dispensing modules and method
03/28/2012CN202177778U 一种字符菲林 A character film
03/28/2012CN1949082B Method and apparatus for immersion lithography
03/28/2012CN1847982B Coating compositions for use with an overcoated photoresist
03/28/2012CN1577080B Marker structure for alignment or overlay, mask pattern defined it and lithographic projector using the same
03/28/2012CN102395925A Acid-sensitive, developer-soluble bottom anti-reflective coatings
03/28/2012CN102395924A Photosensitive resin composition, photosensitive element utilizing the composition, method for formation of resist pattern, and process for production of printed circuit board
03/28/2012CN102395923A Mask inspection with fourier filtering and image compare
03/28/2012CN102393613A Double workpiece stage rotary exchange device based on synchronous gear direction adjustment
03/28/2012CN102393612A Double-rail double-drive-based three-beat double-workpiece bench exchange apparatus and method thereof
03/28/2012CN102393611A Photoetching machine workpiece stage magnetic preloading balance positioning system
03/28/2012CN102393610A Gyro precession type active stabilizing device for workbench of lithography machine
03/28/2012CN102393609A Device and method for exchanging of double workpiece tables on lintel type single/double guide rails in double-drive stepping scanning
03/28/2012CN102393608A Double workpiece table revolution exchanging method and device based on self rotating direction adjustment of measurement positions
03/28/2012CN102393607A Positive photosensitive resin composition, and semiconductor device and display using same
03/28/2012CN102393606A Heat-sensitive positive image CTP (Computer To Plate) photosensitive resist liquid and preparation method thereof
03/28/2012CN102393605A Photosensitive resin composition, photosensitive element, method for resist pattern formation, and method for manufacturing printed wiring board
03/28/2012CN102393604A Photosensitive resin composition, photosensitive element, method for forming resist pattern, and method for producing printed wiring board
03/28/2012CN102393603A Photocuring resin composition, dry film, curing product and print circuit board
03/28/2012CN102393602A Preparation method of corrosive pattern on stainless steel vacuum cup
03/28/2012CN102393601A Heat treatment method with heat uniformity
03/28/2012CN102393600A Preparation method of nano-imprinting composite template
03/28/2012CN102393560A Catadioptric lithographic projection objective with global spherical surface
03/28/2012CN102391236A Compound and coloring composition
03/28/2012CN101928378B Photosensitive resin and use thereof for preparing liquid photoimageable solder resist ink
03/28/2012CN101923279B Nano-imprint template and preparation method thereof
03/28/2012CN101813890B A lithographic apparatus provided with a swap bridge
03/28/2012CN101639632B Lithographic apparatus
03/28/2012CN101634809B Method for exposing single-sided flexible circuit board
03/28/2012CN101558360B Exposure apparatus
03/28/2012CN101556440B Alignment device
03/28/2012CN101424513B Position measurement system and lithographic apparatus
03/28/2012CN101331594B Processing device, processing method, and plasma source
1 ... 177 178 179 180 181 182 183 184 185 186 187 188 189 190 191 192 193 194 195 196 197 ... 1272