Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
04/2012
04/05/2012US20120082940 Photolithography process for semiconductor device
04/05/2012US20120082939 Active light ray sensitive or radioactive ray sensitive resin composition, and active light ray sensitive or radioactive ray sensitive film and pattern forming method using the same
04/05/2012US20120082936 Radiation-sensitive resin composition
04/05/2012US20120082935 Radiation-sensitive resin composition and resist film formed using the same
04/05/2012US20120082934 Radiation-sensitive resin composition, polymer and compound
04/05/2012US20120082933 Formulations for environmentally friendly photoresist film layers
04/05/2012US20120082932 Inkjet Printable Flexography Substrate and Method of Using
04/05/2012US20120082924 Mask blank, transfer mask, method of manufacturing a transfer mask, and method of manufacturing a semiconductor device
04/05/2012US20120082828 Laser pattern mask and method for fabricating the same
04/05/2012US20120081830 Cosmetic Conductive Laser Etching
04/05/2012US20120081681 Drawing device and drawing method
04/05/2012US20120080218 Transparent conductive film having high optical transmittance and method for manufacturing the same
04/05/2012DE102011083774A1 Verfahren und Vorrichtung zum Bestimmen von Laser korrigierenden Tool-Parametern Method and apparatus for determining corrective laser tool parameters
04/05/2012DE102011080437A1 Abbildendes optisches System für die Mikrolithographie An optical imaging system for microlithography
04/05/2012DE102011004961A1 Arrangement for holding optical element of e.g. optical system in extreme UV-projection exposure system utilized in microlithography for manufacturing e.g. LCD, has adjusting element varying relative position of ball-cap-shaped components
04/05/2012DE102010042901B3 Polarisationsaktuator Polarisationsaktuator
04/05/2012DE102010041746A1 Projektionsbelichtungsanlage der EUV-Mikrolithographie und Verfahren zur mikrolithographischen Belichtung Projection exposure system for EUV microlithography and procedures for microlithography exposure
04/05/2012CA2811891A1 Directly drawing-type waterless lithographic printing original plate
04/04/2012EP2437284A2 Cleaning agent for semiconductor substrate, cleaning method using the cleaning agent, and method for producing semiconductor element
04/04/2012EP2437120A2 An inkjet printable flexography substrate and method of using
04/04/2012EP2436510A1 System and resin for rapid prototyping
04/04/2012EP2435881A1 Method and apparatus for photoimaging a substrate
04/04/2012EP2435880A1 Thermochemical nanolithography components, systems, and methods
04/04/2012EP2247968B1 Optical element, lithographic apparatus including such an optical element and device manufacturing method
04/04/2012EP2100190B1 Projection exposure apparatus for microlithography
04/04/2012EP1929374B1 Method of forming an optical element of an immersion optical lithography system
04/04/2012EP1743217B1 Method for imprint lithography at constant temperature
04/04/2012EP1721218B1 Method and apparatus to determine the value of process parameters based on scatterometry data, semiconductor device produced therewith
04/04/2012EP1716457B9 Projection system with a polarization-modulating element having a variable thickness profile
04/04/2012EP1532490B1 Optical reproduction system, in particular catadioptric reduction lens
04/04/2012EP1479824B1 Lining board for lithographic plate and its manufacturing method, and protected lithographic plate and its stack
04/04/2012EP1400849B1 Positive photosensitive resin compositions and semiconductor device
04/04/2012EP1365930B1 Method and device for mounting and preparing a gemstone or industrial diamond for the formation of a mark on the surface thereof
04/04/2012CN102405441A Photosensitive resin laminate
04/04/2012CN102405276A 从基板去除污染物质的方法和装置 Removing contaminants from the substrate a method and apparatus
04/04/2012CN102405261A Colored curable composition, color resist, ink-jet ink, color filter and method for producing the same, solid-state image pickup device, image display device, liquid crystal display, organic el display, and colorant compound and tautomer thereof
04/04/2012CN102403271A Method for manufacturing film transistor substrate and transflective liquid crystal display
04/04/2012CN102402141A Self-referencing interferometer, alignment system, and lithographic apparatus
04/04/2012CN102402140A Alignment system
04/04/2012CN102402138A Method for manufacturing small-distance conducting wires
04/04/2012CN102402137A 孔的光刻方法 Holes photolithographic method
04/04/2012CN102402136A Apparatus comprising a rotating contaminant trap and method
04/04/2012CN102402135A Method for designing extreme ultraviolet lithography projection objective
04/04/2012CN102402134A 光刻机工件台陀螺定轴式稳定装置 Lithography given workpiece stage gyro stabilizer shaft
04/04/2012CN102402133A Double-workpiece-platform same-phase rotation exchange method based on parallel connection mechanisms, and device thereof
04/04/2012CN102402132A 光刻设备和方法 Lithographic apparatus and method
04/04/2012CN102402131A 一种曝光系统 An exposure system
04/04/2012CN102402130A 曝光装置及光源装置 An exposure apparatus and a light source apparatus
04/04/2012CN102402129A Lithographic apparatus, device manufacturing method, and method of applying a pattern to a substrate
04/04/2012CN102402128A Method of adjusting speed and/or routing of a table movement plan and a lithographic apparatus
04/04/2012CN102402127A 一种硅片预对准装置及方法 One kind of a silicon wafer pre-alignment apparatus and method
04/04/2012CN102402126A 一种用于检测光刻过程中照明条件的结构及其检测方法 Structure and detection method for detecting the lighting conditions in the lithography process
04/04/2012CN102402125A 用于制造锗硅碳器件中的光刻标记结构及其制备方法 Manufacture silicon germanium carbon device lithography mark structure and preparation method for
04/04/2012CN102402124A Method for reducing lithography alignment deviation arising from lens distortion of lithography machine
04/04/2012CN102402123A 一种光刻机焦距监控方法 A lithographic machine monitoring method focal length
04/04/2012CN102402122A 光刻机漏光检测方法及系统 Lithography light leakage detection method and system
04/04/2012CN102402121A 用于光刻的涂料组合物 The coating composition for lithography
04/04/2012CN102402120A Lithographic printing plate support and presensitized plate
04/04/2012CN102402119A 正性光刻胶组成物及其制备方法 And preparation method positive photoresist composition
04/04/2012CN102402118A 制备x射线衍射光学元件的方法 Methods for preparing x-ray diffraction optical element
04/04/2012CN102402080A 液晶面板及其制作方法 LCD panel and manufacturing method thereof
04/04/2012CN102401980A 大曝光视场投影物镜 Large exposure field of the projection objective
04/04/2012CN102401922A 一种亚波长金属-介质光栅反射偏振光变膜及制作方法 One kind of subwavelength metal - dielectric grating reflected polarized light becomes film production methods
04/04/2012CN102399651A 具有改进的基板相容性的无氨碱性微电子清洗组合物 Compatibility of the substrate having an improved non-ammonia alkaline microelectronic cleaning compositions
04/04/2012CN102399648A 一种含氟清洗液 A fluorine-containing cleaning solution
04/04/2012CN102399184A 化合物以及染料 Compounds and dyes
04/04/2012CN102398437A 一种图纹转移方法及表面具有图纹的模具的制备方法 A pattern transfer method and surface preparation of the mold pattern
04/04/2012CN102096315B 整片晶圆纳米压印的装置和方法 Entire wafer nanoimprint apparatus and method
04/04/2012CN101789367B 半导体元件的制法 Method semiconductor element
04/04/2012CN101755240B 一种光刻胶清洗剂 A resist cleaning agents
04/04/2012CN101713912B 光刻光掩模、对准方法和检验对准精确度的方法 Lithography photomask, alignment methods and inspection methods alignment accuracy
04/04/2012CN101611353B 固化皮膜图案形成用组合物及使用其的固化皮膜图案的制作方法 Composition and a cured film pattern using the same method of making a cured film patterning
04/04/2012CN101592860B 光学材料用树脂组合物、光学材料用树脂薄膜及使用其的光导 The resin composition for optical material, optical material, resin film, and using the same lightguide
04/04/2012CN101583245B 导电性部件图案的制造方法 The method of manufacturing a conductive member pattern
04/04/2012CN101553758B 图案的形成方法及其所使用的感光性树脂组合物 And a method of forming a pattern using the photosensitive resin composition of the
04/04/2012CN101539697B 一种薄膜晶体管液晶显示器像素结构及其制造方法 A thin film transistor liquid crystal display pixel structure and its manufacturing method
04/04/2012CN101523298B 一种光刻胶清洗剂 A resist cleaning agents
04/04/2012CN101487980B 光刻装置和器件制造方法 Lithographic apparatus and device manufacturing method
04/04/2012CN101464630B 糊剂组合物和烧成物图案 Baking the paste composition and the pattern thereof
04/04/2012CN101414128B 电子束曝光系统 Electron beam exposure system
04/04/2012CN101398619B 压印装置 Marking device
04/04/2012CN101204880B 液体排出头及其制造方法 The method of manufacturing a liquid discharge head and
04/04/2012CN101144979B 光致抗蚀剂用溶剂以及采用它的狭缝涂敷用光致抗蚀剂组合物 The photoresist with a solvent and the use of its slit coating a photoresist composition
04/03/2012US8148702 Arrangement for the illumination of a substrate with a plurality of individually shaped particle beams for high-resolution lithography of structure patterns
04/03/2012US8148251 Forming a semiconductor device
04/03/2012US8148055 Method for developing a photoresist
04/03/2012US8148054 Immersion multiple-exposure method and immersion exposure system for separately performing multiple exposure of micropatterns and non-micropatterns
04/03/2012US8148053 Method for manufacturing substrate for making microarray
04/03/2012US8148052 Double patterning for lithography to increase feature spatial density
04/03/2012US8148051 Method and system for manufacturing openings on semiconductor devices
04/03/2012US8148050 Method for fabricating probe needle tip of probe card
04/03/2012US8148048 Method of processing on-press developable lithographic printing plate having overcoat
04/03/2012US8148047 Carboxyl resin, hardening composition containing carboxyl resin, and hardened material thereof
04/03/2012US8148045 Oxime ester compound and photopolymerization initiator containing the same
04/03/2012US8148044 Positive photosensitive composition
04/03/2012US8148043 Silsesquioxane resin systems with base additives bearing electron-attracting functionalities
04/03/2012US8148042 Heat-sensitive imaging element
04/03/2012US8147903 Circuit pattern forming method, circuit pattern forming device and printed circuit board
04/03/2012US8147235 Device and method for large area lithography
04/03/2012CA2226287C Novel secretion factors for gram-positive microorganisms, genes encoding them and methods of using it
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