Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
04/2012
04/11/2012CN102414620A 用于立体平版印刷装置的照明系统 An illumination system for stereolithography apparatus
04/11/2012CN102414619A Composition for forming resist underlayer film for euv lithography
04/11/2012CN102414618A 光固化性热固化性树脂组合物 The photocurable and thermosetting resin composition of the
04/11/2012CN102414617A 光固化性热固化性树脂组合物 The photocurable and thermosetting resin composition of the
04/11/2012CN102414616A 使用具有芴骨架的光聚合性聚合物的感光性组合物 Having a fluorene skeleton of the photopolymerizable photosensitive polymer composition
04/11/2012CN102414615A Method and calibration mask for calibrating a position measuring apparatus
04/11/2012CN102414603A Color filter, liquid crystal display device, and exposure mask
04/11/2012CN102412420A Method for structuring a polymer layer and method for encapsulating a microbattery
04/11/2012CN102412255A Method for forming impurity layer, exposure mask and method for producing solid-state imaging device
04/11/2012CN102412143A 一种聚酰亚胺基底上覆阻挡层的铝垫制造工艺 Barrier layer overlying a polyimide substrate poly aluminum pad manufacturing process
04/11/2012CN102411938A 硬盘驱动器用带电路的悬挂基板 Used hard disk drive suspension board with circuit
04/11/2012CN102411386A 一种用于涂胶显影机的温湿度控制器及涂胶显影机 A method for coating developing machine temperature and humidity control and gluing developing machine
04/11/2012CN102411269A 光致抗蚀剂膜的剥离液组合物 The photoresist film stripping solution composition
04/11/2012CN102411268A 光刻装置及提高光刻机套准精度的方法 The lithographic apparatus and improve registration accuracy lithography method
04/11/2012CN102411267A 一种光刻机曝光方法 A lithographic machine exposure method
04/11/2012CN102411266A 一种光刻机曝光方法 A lithographic machine exposure method
04/11/2012CN102411265A 光刻机投影物镜温度均衡装置及均衡方法 Lithography projection objective and balanced method for temperature equalization device
04/11/2012CN102411264A Device and method for equalizing temperature of projection objective for photoetching machine
04/11/2012CN102411263A Source polarization optimization
04/11/2012CN102411262A 一种菲林及其制备方法和使用方法 One kind of film and its preparation method and use
04/11/2012CN102411261A Photosensitive resin composition and circuit board with metal support using the same
04/11/2012CN102408779A 一种油墨组合物及其制备方法和一种不锈钢工件 An ink composition and preparation method and a stainless steel parts
04/11/2012CN102408753A 碱性着色剂、着色组合物、滤色器以及显示元件 Basic coloring agent, a coloring composition, a color filter and a display device
04/11/2012CN102408332A 紫外固化可降解交联单体及其制备方法 UV-curable crosslinkable monomer is biodegradable and its preparation method
04/11/2012CN102407171A 四烷基铵盐水溶液的制造方法 The method of producing an aqueous solution of the tetraalkyl ammonium salt
04/11/2012CN102081180B 可调节倾角挤压基片制作微阶梯反射镜的方法 Adjusting the inclination of the substrate can be extruded micro-stepped reflecting mirror of the production method for
04/11/2012CN101937173B 曝光机的曝光方法 The exposure method of exposing machine
04/11/2012CN101893525B 一种离心式双通道微量液体定量进样装置及其制作方法 A centrifugal dual channel trace quantitative liquid injection device and manufacturing method thereof
04/11/2012CN101506734B Uv量指示剂 Uv volume indicator
04/11/2012CN101436001B 曝光装置、器件制造方法 Exposure apparatus, device manufacturing method
04/11/2012CN101419405B 具备药液预处理装置的狭缝涂敷装置 The coating apparatus includes a slit liquid pretreatment means
04/11/2012CN101370797B 金刚烷衍生物、含有该衍生物的树脂组合物、使用它们的光学电子部件和电子电路用封装剂 Adamantane derivative, a resin composition containing the derivative, using their optical and electronic parts and electronic circuits with the encapsulant
04/11/2012CN101308328B Chemically amplified positive resist composition
04/11/2012CN101137493B 用于制造微复制物品的设备和方法 Apparatus and method for manufacturing a micro replicated article
04/10/2012US8155427 Wafer-scale image archiving and receiving system
04/10/2012US8154708 Lithographic apparatus and device manufacturing method
04/10/2012US8154707 Illumination optical system and exposure apparatus having the same
04/10/2012US8153991 Direct write lithography system
04/10/2012US8153836 Silsesquioxane compound mixture, hydrolyzable silane compound, making methods, resist composition, patterning process, and substrate processing
04/10/2012US8153357 Photosensitive composition remover
04/10/2012US8153356 Method for forming film pattern
04/10/2012US8153355 An immersion boundary between an immersion area contact part and noncontact part on the immersion supporting plate formed when an immersion area is moved according to a predetermined exposure area and an exposure map is determined in advance. then, immersion supporting plate is cleaned while moving jig
04/10/2012US8153354 Sealed cell structure
04/10/2012US8153352 Multicolored mask process for making display circuitry
04/10/2012US8153351 Methods for performing photolithography using BARCs having graded optical properties
04/10/2012US8153350 Method and material for forming high etch resistant double exposure patterns
04/10/2012US8153349 Polymer composition, hardmask composition having antireflective properties, and associated methods
04/10/2012US8153348 Process sequence for formation of patterned hard mask film (RFP) without need for photoresist or dry etch
04/10/2012US8153347 Flexographic element and method of imaging
04/10/2012US8153346 Thermally cured underlayer for lithographic application
04/10/2012US8153345 Laser induced thermal imaging apparatus and laser induced thermal imaging method
04/10/2012US8153340 Photosensitive composition, partition walls and black matrix
04/10/2012US8153337 Photomask and method for fabricating source/drain electrode of thin film transistor
04/10/2012CA2721172C Microfabricated elastomeric valve and pump systems
04/05/2012WO2012044719A1 Norbornane-based pac ballast and positive-tone photosensitive resin composition encompassing the pac
04/05/2012WO2012044569A1 Production methods using two exposure tools and adjacent exposures
04/05/2012WO2012044536A1 Method and system for modifying photoresist using electromagnetic radiation and ion implantion
04/05/2012WO2012044465A1 Production methods using two exposure tools and adjacent exposures
04/05/2012WO2012044286A1 Optical lithography using graphene contrast enhancement layer
04/05/2012WO2012044099A2 Photosensitive resin composition
04/05/2012WO2012044077A2 Light-exposure system
04/05/2012WO2012044070A2 Photosensitive resin composition for organic insulator
04/05/2012WO2012044027A2 Photosensitive resin composition
04/05/2012WO2012043983A2 Light-sensitive resin composition
04/05/2012WO2012043866A1 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern
04/05/2012WO2012043762A1 Composition for forming liquid immersion upper layer film, and polymer
04/05/2012WO2012043685A1 Radiation-sensitive resin composition, polymer, and compound
04/05/2012WO2012043684A1 Radio-sensitive resin composition and pattern forming method
04/05/2012WO2012043497A1 Method for driving spatial light modulator, method for forming pattern for exposure, exposure method, and exposure apparatus
04/05/2012WO2012043415A1 Radio-sensitive resin composition
04/05/2012WO2012043403A1 Pattern forming method, resist underlayer film, and composition for forming resist underlayer film
04/05/2012WO2012043282A1 Direct drawing-type waterless lithographic printing original plate
04/05/2012WO2012043241A1 Lithographic printing plate master and plate making method using the same
04/05/2012WO2012043109A1 Method for producing porous plate for microarray or the like, photosensitive composition used for the method, porous plate for microarray or the like, and substrate for microarray
04/05/2012WO2012043102A1 Acrylamide derivative, polymer compound and photoresist composition
04/05/2012WO2012043001A1 Novel photosensitive resin composition production kit, and use thereof
04/05/2012WO2012042819A1 Pattern forming method, and method for forming metal structure
04/05/2012WO2012042818A1 Pattern forming method
04/05/2012WO2012042817A1 Pattern forming method, substrate manufacturing method, and mold manufacturing method
04/05/2012WO2012041807A1 Mirror, optical system for euv projection exposure system and method of producing a component
04/05/2012WO2012041744A1 Arrangement for mirror temperature measurement and/or thermal actuation of a mirror in a microlithographic projection exposure apparatus
04/05/2012WO2012041720A2 Projection exposure apparatus for euv microlithography and method for microlithographic exposure
04/05/2012WO2012041701A1 Assembly of a projection exposure system for euv lithography
04/05/2012WO2012041589A1 Projection exposure apparatus with optimized adjustment capability
04/05/2012WO2012041461A2 Projection exposure tool for microlithography and method for microlithographic exposure
04/05/2012WO2012041459A2 Imaging optical system for microlithography
04/05/2012WO2012041458A2 Projection exposure tool for microlithography and method for microlithographic exposure
04/05/2012WO2012041457A2 Projection exposure tool for microlithography and method for microlithographic imaging
04/05/2012WO2012041341A1 Projection exposure system and projection exposure method
04/05/2012WO2012041339A1 Optical system of a microlithographic projection exposure apparatus and method of reducing image placement errors
04/05/2012WO2012024178A3 Method for high aspect ratio patterning in spin-on layer
04/05/2012WO2012009197A3 Projection system with metrology
04/05/2012WO2011162146A4 Exposure apparatus and device fabrication method
04/05/2012WO2011133680A3 Novel dual-tone resist formulations and methods
04/05/2012US20120083124 Method of Patterning NAND Strings Using Perpendicular SRAF
04/05/2012US20120082945 Method for using a topcoat composition
04/05/2012US20120082944 Patterning nano-scale patterns on a film comprising unzipping copolymers
04/05/2012US20120082943 Diffractive photo masks and methods of using and fabricating the same
04/05/2012US20120082942 Method and system for modifying photoresist using electromagnetic radiation and ion implantation
04/05/2012US20120082941 Manufacturing method of display device
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