| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/18/2012 | CN102419512A Fine processing method, fine processing apparatus, and recording medium with fine processing program recorded thereon |
| 04/18/2012 | CN102419510A Substrate to be processed, manufacturing method and forming method of resist pattern |
| 04/18/2012 | CN102417792A Preparation method of antifouling material having crossed regular microstructure on surface |
| 04/18/2012 | CN102417758A 液态感光阻焊油墨 Liquid photosensitive solder resist ink |
| 04/18/2012 | CN101963765B 一种投影光刻机中的光束稳定装置 A projection beam lithography machine stabilizing device |
| 04/18/2012 | CN101907781B 一种具有光束会聚功能的光学平板制作方法 An optical plate having a method of making a light beam convergence function |
| 04/18/2012 | CN101887218B 一种光刻机掩模刀口移动装置 A lithographic machine mask edge mobile devices |
| 04/18/2012 | CN101819917B 半导体装置的制造方法及系统 Method and system for manufacturing a semiconductor device |
| 04/18/2012 | CN101770940B 叠层底部抗反射结构及刻蚀方法 Laminated bottom antireflective structure and etching method |
| 04/18/2012 | CN101763124B 用于阻尼物体的方法、主动阻尼系统以及光刻设备 Method for damping of objects, active damping system and lithographic apparatus |
| 04/18/2012 | CN101738869B 光刻机硅片承载台及其使用方法 Lithography wafer load platform and method of use |
| 04/18/2012 | CN101718952B 基于移动编码掩模原理制备多层浮雕结构复合膜层的方法 Mobile coded mask principle of preparing a multilayer composite coatings relief structure-based approach |
| 04/18/2012 | CN101715568B 污染防止系统、光刻设备、辐射源以及制造器件的方法 Pollution prevention system of the lithographic apparatus, the radiation source and the method of manufacturing a device |
| 04/18/2012 | CN101675113B 树脂组合物、干膜及由其得到的加工品 A resin composition obtained by a dry film and processed |
| 04/18/2012 | CN101611470B 移动体装置、图案形成装置及图案形成方法、设备制造方法、移动体装置的制造方法以及移动体驱动方法 The movable body apparatus, a pattern forming apparatus and a pattern forming method, a method of manufacturing apparatus and manufacturing method for a device and a movable body drive method |
| 04/18/2012 | CN101609787B Method for forming patterns of semiconductor device by using mixed assist feature system |
| 04/18/2012 | CN101573662B Precursor for waterless lithographic printing plate |
| 04/18/2012 | CN101517492B 使用半曝光用正型感光性树脂层的透明性固化膜的制造方法 Using the method for producing a positive half-exposed photosensitive resin layer, a transparent cured film, |
| 04/18/2012 | CN101517483B Mask blank and method for manufacturing transfer mask |
| 04/18/2012 | CN101185030B Antireflective hardmask composition and methods for using same |
| 04/18/2012 | CN101178452B 滤色器及使用其的液晶显示装置 A color filter and a liquid crystal display device using the same |
| 04/18/2012 | CN101046630B 用于形成着色层的放射线敏感性组合物、滤色器和彩色液晶显示元件 For forming a colored layer of a radiation sensitive composition, a color filter and a color liquid crystal display element |
| 04/18/2012 | CN101025474B 用于转换数值孔径的光学系统 For converting the numerical aperture of the optical system |
| 04/18/2012 | CN101019077B Holder for a ceiling sign |
| 04/17/2012 | US8159649 Exposure method, exposure apparatus, photomask and method for manufacturing photomask |
| 04/17/2012 | US8159647 Lithographic apparatus and device manufacturing method |
| 04/17/2012 | US8158981 Radiation-sensitive composition, method of forming silica-based coating film, silica-based coating film, apparatus and member having silica-based coating film and photosensitizing agent for insulating film |
| 04/17/2012 | US8158568 Cleaning liquid used in process for forming dual damascene structure and a process for treating substrate therewith |
| 04/17/2012 | US8158338 Resist sensitizer |
| 04/17/2012 | US8158337 Display device uniforming light distribution throughout areas and method for manufacturing same |
| 04/17/2012 | US8158335 High etch resistant material for double patterning |
| 04/17/2012 | US8158334 Methods for forming a composite pattern including printed resolution assist features |
| 04/17/2012 | US8158331 Method of improving print performance in flexographic printing plates |
| 04/17/2012 | US8158330 Resist protective coating composition and patterning process |
| 04/17/2012 | US8158329 Compound and chemically amplified resist composition containing the same |
| 04/17/2012 | US8158328 Composition for formation of anti-reflection film, and method for formation of resist pattern using the same |
| 04/17/2012 | US8158327 Onium salt compound, polymer compound comprising the salt compound, chemically amplified resist composition comprising the polymer compound, and method for patterning using the composition |
| 04/17/2012 | US8158326 Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition |
| 04/17/2012 | US8158325 Compositions and processes for photolithography |
| 04/17/2012 | US8158324 Positive-type photosensitive resin composition |
| 04/17/2012 | US8158308 Negative curable composition, color filter, and method of producing the same |
| 04/12/2012 | WO2012046944A1 Film coating apparatus for semiconductor process |
| 04/12/2012 | WO2012046917A1 (meth)acrylate-based polymer and photosensitive resin composition including same |
| 04/12/2012 | WO2012046896A1 Method for forming micro- or nanoscale patterns using liquid crystal phase and defect structures |
| 04/12/2012 | WO2012046826A1 Black polymerizable composition and method for producing a black layer |
| 04/12/2012 | WO2012046770A1 Resist composition for negative development which is used for foermation of guide pattern, guide pattern formation method, and method for forming pattern on layer containing block copolymer |
| 04/12/2012 | WO2012046607A1 Pattern forming method and radiation-sensitive resin composition |
| 04/12/2012 | WO2012046581A1 Pattern forming method and radiation-sensitive resin composition |
| 04/12/2012 | WO2012046543A1 Resist pattern formation method and radiation-sensitive resin composition |
| 04/12/2012 | WO2012046541A1 Exposure apparatus |
| 04/12/2012 | WO2012046540A1 Scanning exposure device using microlens array |
| 04/12/2012 | WO2012046353A1 Pigment dispersion, production method thereof, photosensitive colored resin composition, inkjet ink and electrophotographic printing toner containing said pigment dispersion, and color filter |
| 04/12/2012 | WO2012046233A2 Global landmark method for critical dimension uniformity reconstruction |
| 04/12/2012 | WO2012045736A1 Oxime ester derivatives of benzocarbazole compounds and their use as photoinitiators in photopolymerizable compositions |
| 04/12/2012 | WO2012045660A1 System and resin for rapid prototyping |
| 04/12/2012 | WO2011009094A3 Leveling devices and methods |
| 04/12/2012 | US20120089180 Adhesive bonding composition and method of use |
| 04/12/2012 | US20120088369 Atomic Layer Deposition Of Photoresist Materials And Hard Mask Precursors |
| 04/12/2012 | US20120088196 Exposure apparatus, exposure method, and blind for exposure apparatus |
| 04/12/2012 | US20120088195 Alignment treatment of liquid crystal display device |
| 04/12/2012 | US20120088194 Method of forming patterns |
| 04/12/2012 | US20120088193 Radiation Patternable CVD Film |
| 04/12/2012 | US20120088192 Underlayer composition and method of imaging underlayer |
| 04/12/2012 | US20120088191 lithographic printing plate precursor |
| 04/12/2012 | US20120088190 Salt and photoresist composition comprising the same |
| 04/12/2012 | US20120088189 Conductive composition, transparent conductive film, display element and integrated solar battery |
| 04/12/2012 | US20120088188 Underlayer composition and method of imaging underlayer composition |
| 04/12/2012 | US20120088072 Microfabricated Particles in Composite Materials and Methods for Producing the Same |
| 04/12/2012 | US20120086926 Lithographic apparatus and device manufacturing method |
| 04/12/2012 | US20120086750 Ink jet recording head and method of producing ink jet recording head |
| 04/12/2012 | DE102005063335B4 Modell für eine fortschrittliche Prozesssteuerung, das eine Solloffsetgröße umfaßt Model for advanced process control, comprising a target offset size |
| 04/12/2012 | DE102005041311B4 Verfahren und System zum automatischen Erkennen belichteter Substrate mit einer hohen Wahrscheinlichkeit für defokussierte Belichtungsfelder A method and system for automatically recognizing exposed substrates with a high probability of exposure fields defocused |
| 04/11/2012 | EP2439591A1 Lithographic printing plate precursor |
| 04/11/2012 | EP2439590A1 Radiation-sensitive resin composition, polymer and method for forming resist pattern |
| 04/11/2012 | EP2439584A1 Method of manufacturing an electrochemical device |
| 04/11/2012 | EP2439050A1 Transfer mold and method for producing transfer mold |
| 04/11/2012 | EP2438619A1 Apparatus and method to fabricate an electronic device |
| 04/11/2012 | EP2438486A1 Chemically amplified positive photoresist composition |
| 04/11/2012 | EP1899766B1 Thermal development system and method of using the same |
| 04/11/2012 | EP1749240B1 Photopolymer printing plate precursor. |
| 04/11/2012 | EP1690138B1 Radiation-sensitive compositions and imageable elements based thereon |
| 04/11/2012 | EP1595250B1 Method for cutting using a variable astigmatic focal beam spot |
| 04/11/2012 | EP1405139B1 Photosensitive polyimide precursor compositions |
| 04/11/2012 | EP1295153B1 Film coated optical lithography elements and method of making |
| 04/11/2012 | CN202189231U 冲版机显影机构 Version of the machine development agency |
| 04/11/2012 | CN202189230U 一种合页对位曝光装置 One kind of hinge alignment exposure apparatus |
| 04/11/2012 | CN202189229U 一种基于紫外led光源的光刻机 Based UV lithography machine led light |
| 04/11/2012 | CN202189228U 电路板曝光机的冷却系统 Cooling system circuit board exposure machine |
| 04/11/2012 | CN202189227U 纳米图形化和超宽频电磁特性测量系统 Nano-patterning and ultra-wideband electromagnetic properties of the measurement system |
| 04/11/2012 | CN202189226U 一种太阳能硅片光刻机中的排屑机构 A solar wafer lithography machine chip organizations |
| 04/11/2012 | CN202189225U 曝光机的光源装置 A light source unit of the exposure machine |
| 04/11/2012 | CN202189224U 保护层处理装置 The protective layer processing device |
| 04/11/2012 | CN202189223U 冲版机操作台 Version of the machine console |
| 04/11/2012 | CN1983036B 作为对准标记的二进制正弦子波长格栅 As a binary sine sub-wavelength grating alignment mark |
| 04/11/2012 | CN102414781A Substrate support structure, clamp preparation unit, and lithography system |
| 04/11/2012 | CN102414625A Method for formation of resist pattern, and developing solution |
| 04/11/2012 | CN102414624A 用于立体平版印刷设备中的照明系统 Stereolithography apparatus for lighting systems |
| 04/11/2012 | CN102414623A 光刻设备和方法 Lithographic apparatus and method |
| 04/11/2012 | CN102414622A 光刻设备和检测器设备 The lithographic apparatus and the detector device |
| 04/11/2012 | CN102414621A Rotor optics imaging method and system with variable dose during sweep |