Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
04/2012
04/25/2012CN102426413A 紫外激光固化布线方法 UV laser curing wiring method
04/25/2012CN102424356A 一种金属纳米颗粒微阵列芯片的制备装置及方法 An apparatus and method for preparing metal nano-particles in the micro-array chips
04/25/2012CN101968565B 提高内窥镜成像质量的方法 Improve the quality of endoscopic imaging methods
04/25/2012CN101937928B 一种消除穿通光刻针孔危害的可控硅结构生产方法 A punch through photolithographic pinhole hazards SCR structure production methods to eliminate
04/25/2012CN101916049B 工作台 Workbench
04/25/2012CN101881930B 光刻装置 Lithographic apparatus
04/25/2012CN101828228B 凹部形成方法、凹-凸制品的制造方法、发光元件的制造方法和光学元件的制造方法 Convex products, a manufacturing method, the manufacturing method of the light emitting element and the optical element - a method of forming a concave portion, a concave
04/25/2012CN101685257B 涂布方法和涂布装置 Coating method and coating apparatus
04/25/2012CN101681809B 曝光装置、曝光方法以及器件制造方法 Exposure apparatus, exposure method and device manufacturing method
04/25/2012CN101544863B 印刷电路板用树脂组合物、干膜以及印刷电路板 A printed circuit board with the resin composition, and a printed circuit board dry film
04/25/2012CN101331432B Method of making a lithographic printing plate
04/25/2012CN101178541B 感光性树脂组合物 The photosensitive resin composition
04/25/2012CN101078811B 偏光变换元件、光学照明装置、曝光装置以及曝光方法 A polarization conversion element, illumination optical apparatus, exposure apparatus and exposure method
04/25/2012CN101042532B 用于形成着色层的放射线敏感性组合物以及滤色器 For forming a colored layer of a radiation sensitive composition and a color filter
04/25/2012CN101031845B Aqueous developable photo-imageable composition precursors for use in photo-patterning methods
04/24/2012US8165430 Optical element and method for its manufacture
04/24/2012US8164734 Vacuum system for immersion photolithography
04/24/2012US8163852 Resist polymer and method for producing the polymer
04/24/2012US8163468 Method of reducing photoresist defects during fabrication of a semiconductor device
04/24/2012US8163467 Dummy light-exposed substrate, method of manufacturing the same, immersion exposure apparatus, and device manufacturing method
04/24/2012US8163466 Method for selectively adjusting local resist pattern dimension with chemical treatment
04/24/2012US8163465 Ablatable elements for making flexographic printing plates
04/24/2012US8163464 Propanoates and processes for preparing the same
04/24/2012US8163463 Photoresist composition, method of forming pattern using the photoresist composition and inkjet print head
04/24/2012US8163462 Photosensitive composition, method for forming pattern, and method for manufacturing semiconductor device
04/24/2012US8163461 Photoacid generator compounds and compositions
04/24/2012US8163460 Underlayer coating forming composition for lithography containing polysilane compound
04/24/2012US8163447 Dispersion resin having unsaturation modifier, pigments, photoinitiator and polypentaerythritol polyacrylate compound; tinctorial strength, storage stability, alkali developability; suppressing generation of residues between pixels
04/24/2012US8163345 Methods utilizing scanning probe microscope tips and products therefor or produced thereby
04/19/2012WO2012051380A2 Composition for and method of suppressing titanium nitride corrosion
04/19/2012WO2012050981A1 Device for high throughput investigations of cellular interactions
04/19/2012WO2012050388A2 Maskless exposure apparatus including spatial filter having phase shifter pattern and exposure method
04/19/2012WO2012050201A1 Photosensitive resin composition and method for producing same
04/19/2012WO2012050065A1 Composition for forming monolayer or multilayer
04/19/2012WO2012050064A1 Lithographic resist underlayer film-forming compound that comprises resin including polyether structure
04/19/2012WO2012050015A1 Polymerizable fluorine-containing sulfonate, fluorine-containing sulfonate resin, resist composition and pattern-forming method using same
04/19/2012WO2012049919A1 Method for forming resist pattern and radiation-sensitive resin composition
04/19/2012WO2012049901A1 Image rendering method and image rendering device
04/19/2012WO2012049638A1 Method and apparatus for printing periodic patterns
04/19/2012WO2012049489A1 A method of casting
04/19/2012WO2012048974A1 Lithographic apparatus
04/19/2012WO2012048720A1 Device and method for the spray treatment of printed circuit boards or conductor sheets
04/19/2012WO2012024006A3 Structures for enhancement of local electric field, light absorption, light radiation, and material detection
04/19/2012WO2011159081A3 Method for forming pattern, and pattern structure
04/19/2012US20120094888 Method for removing an uncured photosensitive composition
04/19/2012US20120094238 Substrate holding device, exposure apparatus, and device manufacturing method
04/19/2012US20120094237 Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same
04/19/2012US20120094236 Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing polymeric compound
04/19/2012US20120094235 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition
04/19/2012US20120094234 Radiation-sensitive resin composition, polymer, and method for forming resist pattern
04/19/2012US20120094233 On-press developable lithographic printing plate precursors
04/19/2012US20120094232 Production method of polyhydroxyimide
04/19/2012US20120094222 Photocurable resin composition, dry film thereof, pattern forming method, and electrical/electronic part protective film
04/19/2012US20120094221 Method of manufacturing color filter substrate for semitransmissive type liquid crystal display device
04/19/2012US20120094220 Photo mask, photolithography method, substrate production method and display panel production method
04/19/2012US20120094092 Method for Defining an Electronically Conductive Metal Structure on a Three-Dimensional Element and a Device Made From the Method
04/19/2012US20120092742 Mask
04/19/2012US20120092632 Diffraction unlimited photolithography
04/19/2012US20120092607 Pixel electrode layer structure of tft-lcd, method for manufacturing the same and mask therefor
04/19/2012US20120091592 Double Patterning Technology Using Single-Patterning-Spacer-Technique
04/19/2012US20120090486 Lithographic printing plate precursors and methods of use
04/19/2012DE102011007828A1 Extreme UV lithography system for use in vacuum housing for bringing perfection to imaging characteristics of projection system, has filling gases and beryllium ions provided in optical path of radiation and including optical element effect
04/19/2012DE102008045059B4 Verfahren zum Belichten eines fotosensitiven Substrats A method of exposing a photosensitive substrate
04/19/2012CA2813211A1 Device for high throughput investigations of cellular interactions
04/18/2012EP2442182A1 Photocurable resin composition, dry film thereof, pattern forming method, and electrical/electronic part protective film
04/18/2012EP2441744A1 Acetylenic diol ethylene oxide/propylene oxide adducts and their use
04/18/2012EP2440979A1 System and method for providing sub-publication content in an electronic device
04/18/2012EP2440978A1 Preparing lithographc printing plates with enhanced contrast
04/18/2012EP2440977A1 Negative-working imageable elements
04/18/2012EP2440976A1 Patterning nano-scale patterns on a film comprising unzipping polymer chains
04/18/2012EP2440690A1 Method for manufacturing a metal microstructure and microstructure obtained according to said method
04/18/2012EP2440618A1 Colored curable composition, color resist, ink-jet ink, color filter and method for producing the same, solid-state image pickup device, image display device, liquid crystal display, organic el display, and colorant compound and tautomer thereof
04/18/2012EP2225106B1 Method and system of preparing printing forms for flexographic printing
04/18/2012EP2185974B1 Imprint method and processing method of substrate
04/18/2012EP2126635B1 Method for improving imaging properties of an optical system, and optical system
04/18/2012EP2125713B1 Sulphonium salt photoinitiators
04/18/2012EP2115522B1 Illumination system of a microlithographic projection exposure apparatus
04/18/2012EP1983017B1 Curable composition containing thiol compound
04/18/2012EP1756671B1 Method for enabling transmission of substantially equal amounts of energy
04/18/2012EP1545878B2 Thermally sensitive multilayer imageable element
04/18/2012CN202196191U 微透镜模辊 Microlens die rolls
04/18/2012CN1892445B 半导体晶片的处理方法及湿浸式光刻的方法 Semiconductor wafer processing method and immersion lithography method
04/18/2012CN1881085B 用于浸没式光刻的组合物和方法 The compositions and methods used for immersion lithography
04/18/2012CN1734355B Apparatus for forming image on plate and inter-sleeve raster scanning method
04/18/2012CN102422385A 箝制基板的方法及箝夹准备单元 The method and the jaw clamping the substrate preparation unit
04/18/2012CN102422228A 抗蚀剂剥离组合物和生产电气装置的方法 The resist stripping composition and production method of the electrical device
04/18/2012CN102422227A 用于光刻技术的检查方法 Check method of lithography for
04/18/2012CN102422226A 确定重叠误差的方法 The method of determining overlay error
04/18/2012CN102422225A 用于微光刻的照明光学系统与光学系统 Microlithography for an illumination optical system and the optical system
04/18/2012CN102422224A 感光性树脂组合物、其干膜和固化物以及使用了它们的印刷电路板 The photosensitive resin composition and the cured dry film, and the use of their printed circuit boards
04/18/2012CN102422223A Patterning nano-scale patterns on a film comprising unzipping polymer chains
04/18/2012CN102420214A 形成强化对准标记的方法以及半导体器件 The method of strengthening the alignment mark is formed and a semiconductor device
04/18/2012CN102419520A Alignment signal simulating generator
04/18/2012CN102419519A Ps版产品显影宽容度的检测方法 Detection Ps version of the product development latitude
04/18/2012CN102419518A Developing machine, developing solution feeding system and method thereof
04/18/2012CN102419517A 一种基于双导轨双驱步进扫描的双工件台交换装置与方法 An apparatus and method based on dual-piece dual-rail two-step scan drive swap
04/18/2012CN102419516A 光照射装置和光照射方法 The light irradiation device and light irradiation method
04/18/2012CN102419515A 聚硅氧烷组合物、聚硅氧烷组合物的制造方法、显示元件的固化膜及其形成方法 Polysiloxane composition, method of producing the silicone composition, cured film of the display element and method of forming
04/18/2012CN102419514A 光固化性树脂组合物及其固化物、干膜、印刷电路板 The photocurable resin composition and a cured dry film, a printed circuit board
04/18/2012CN102419513A Resist composition and method for producing semiconductor device