Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
05/2012
05/02/2012CN102436145A Stereo lithography rapid prototyping photosensitive resin and preparation method thereof
05/02/2012CN102436144A Photosensitive composition and application thereof in positive thermosensitive CTP (computer to plate) plate
05/02/2012CN102436143A High-precision printing circular screen photographic emulsion and preparation method thereof
05/02/2012CN102436142A Black photosensitive resin composition and light blocking layer using the same
05/02/2012CN102436141A Nano hot stamping device
05/02/2012CN102436140A Method for preparing nanoimprint template
05/02/2012CN102436139A Resin composition for laser engraving, relief printing plate precursor for laser engraving and process for producing the same, and relief printing plate and process for making the same
05/02/2012CN102436058A Full spherical catadioptric collimating objective lens applied to deep ultraviolet band
05/02/2012CN102436026A Method for simultaneously manufacturing multiple optical fiber gratings
05/02/2012CN102435058A Drying apparatus, light resistance removing apparatus and drying method
05/02/2012CN102432841A Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer
05/02/2012CN102431962A Preparation method and application of nanoimprint template
05/02/2012CN101694563B Multi-mask photoetching machine silicon wafer stage system in array arrangement
05/02/2012CN101672937B Method for manufacturing artificial bionic compound eyes
05/02/2012CN101652715B Photosensitive resin composition and layered product
05/02/2012CN101533176B A manufacturing method of liquid crystal display panel
05/02/2012CN101379432B Photopolymer composition suitable for lithographic printing plates
05/02/2012CN101339962B Radiation detector, method of manufacturing a radiation detector and lithographic apparatus comprising a radiation detector
05/02/2012CN101140423B Transmission aligning mark combination used for mask alignment and mask alignment method thereof
05/02/2012CN101076758B Matte agent for infrared-sensitive planographic printing plate and use thereof
05/02/2012CN101055433B Heating treatment device
05/02/2012CN101055422B Integrated measuring room for transparent base material
05/01/2012US8169592 Exposure apparatus and method for producing device
05/01/2012US8169590 Exposure apparatus and device fabrication method
05/01/2012US8168691 Vinyl ether resist formulations for imprint lithography and processes of use
05/01/2012US8168690 Solvent-free photocurable resin composition for protective film
05/01/2012US8168689 High optical contrast pigment and colorful photosensitive composition employing the same and fabrication method thereof
05/01/2012US8168577 Post plasma etch/ash residue and silicon-based anti-reflective coating remover compositions containing tetrafluoroborate ion
05/01/2012US8168378 Substrate treatment system, substrate treatment method, and computer readable storage medium
05/01/2012US8168377 Pattern forming method and method of manufacturing semiconductor device by using the same
05/01/2012US8168376 Manufacturing method of optical waveguide device
05/01/2012US8168375 Patterning method
05/01/2012US8168374 Method of forming a contact hole
05/01/2012US8168373 Method for fabricating 3D microstructure
05/01/2012US8168372 semiconductors; microelectronic structures with nanosized features; acetylacetone complexes of titanium or zirconium; ethyl 2-cyano-3-(4-hydroxy-phenyl)-acrylate; crosslinker; solvent
05/01/2012US8168371 Positive photosensitive resin composition
05/01/2012US8168370 Lithographic printing plate precursor and method for preparing lithographic printing plate
05/01/2012US8168369 Photoactive compound and photosensitive resin composition containing the same
05/01/2012US8168368 Miniaturized microparticles
05/01/2012US8168367 Resist composition and patterning process
05/01/2012US8168366 Low activation energy photoresist composition and process for its use
05/01/2012US8168354 Photosensitive composition, partition walls, color filter and organic EL device
05/01/2012US8168109 Stabilizers for vinyl ether resist formulations for imprint lithography
04/2012
04/26/2012WO2012054837A1 Systems and methods related to generating electromagnetic radiation interference patterns
04/26/2012WO2012053600A1 Composition for forming silicon-containing resist underlayer film, which contains fluorine-containing additive
04/26/2012WO2012053527A1 Pattern-forming method and radiation-sensitive composition
04/26/2012WO2012053434A1 Copolymers for lithography and method for producing same, resist composition, method for producing substrate with pattern formed thereupon, method for evaluating copolymers, and method for analyzing copolymer compositions
04/26/2012WO2012053396A1 Resist pattern formation method and radiation-sensitive resin composition
04/26/2012WO2012053302A1 Composition for forming overlaying film for resist for euv lithography
04/26/2012WO2012053211A1 Colored resin composition for use in color filter, color filter, display device, and solid-state imaging element
04/26/2012WO2012053201A1 Colored resin composition for use in color filter, color filter, display device, and solid-state imaging element
04/26/2012WO2012053052A1 Photosensitive resin composition and semiconductor device
04/26/2012WO2012052288A1 Polymerisable photoinitiators for led curable compositions
04/26/2012WO2012018374A3 Plasma mediated ashing processes
04/26/2012WO2012008686A3 Printing plate and method of manufacturing the same
04/26/2012US20120101009 Cyclohexane oxidation process byproduct stream derivatives and methods for using the same
04/26/2012US20120100676 Thin Film Transistor Substrate of Horizontal Electric Field Type Liquid Crystal Display Device and Fabricating Method Thereof
04/26/2012US20120100489 Method for rebalancing a multicomponent solvent solution
04/26/2012US20120100488 Resist pattern improving material, method for forming resist pattern, and method for producing semiconductor device
04/26/2012US20120100487 Resist composition, method of forming resist pattern, and polymeric compound
04/26/2012US20120100486 Sulfonium salt, resist composition, and patterning process
04/26/2012US20120100485 Color motion picture print films
04/26/2012US20120100484 Positive photosensitive resin composition, cured film, protective film, interlayer insulating film, and semiconductor device and display element using the same
04/26/2012US20120100483 Resist composition and method for producing resist pattern
04/26/2012US20120100482 Resist composition and method for producing resist pattern
04/26/2012US20120100481 Actinic ray-sensitive or radiation-sensitive composition and pattern forming method using the same
04/26/2012US20120100480 Compound, fluorine-containing polymer, radiation-sensitive resin composition and method for producing compound
04/26/2012US20120100471 Method of manufacturing color filter substrate
04/26/2012US20120100468 Methods of fabricating a photomask and use thereof
04/26/2012US20120100464 Glass substrate-holding tool
04/26/2012US20120099214 Colored Photosensitive Resin Composition for Preparation of Color Filter of Solid-State Image Sensing Device Using 300 NM or Less Ultrashort Wave Exposure Equipment, Color Filter Using Same, and Solid-State Image Sensing Device Containing Same
04/26/2012US20120097435 Photosensitive modified polyimide resin composition and use thereof
04/26/2012DE102011116354A1 Systeme und Verfahren zum Bilden eines zeitlich gemittelten Linienbildes Systems and methods for forming a line image time-averaged
04/26/2012DE102011080614A1 Illumination device for use in micro-lithographic projection lighting system for illuminating reticule, has depolarizer arranged around rotational axis and partially causing effective depolarization of linearly polarized light
04/26/2012CA2809919A1 Polymerisable photoinitiators for led curable compositions
04/25/2012EP2444846A2 Method for rebalancing a multicomponent solvent solution
04/25/2012EP2444845A1 Radiation-sensitive resin composition
04/25/2012EP2444844A2 Pattern transfer method and apparatus therefor
04/25/2012EP2444829A1 Optical element unit and method of supporting an optical element
04/25/2012EP2444431A1 Carbazole novolak resin
04/25/2012EP2443517A1 Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter
04/25/2012EP2443516A2 Exposure apparatus and device manufacturing method
04/25/2012EP2443515A2 Exposure apparatus and device manufacturing method
04/25/2012EP2443514A1 Lithographic apparatus and method
04/25/2012EP2443513A1 Pattern forming method, chemical amplification resist composition and resist film
04/25/2012EP1774406B1 Optical system having a cleaning arrangement
04/25/2012EP1552342B1 Composition and method for removing etching residue
04/25/2012EP1393132B1 Exposure control for phase shifting photolithographic masks
04/25/2012CN202205026U Dry film manufacturing device provided with waste heat boiler equipment
04/25/2012CN202205025U 一种整片晶圆纳米压印光刻机 An integrin wafer nanoimprint lithography
04/25/2012CN1945444B 对光刻衬底上的正色调抗蚀剂层进行构图的方法 Of positive tone resist layer on a substrate by a photolithography patterning method
04/25/2012CN1800974B 压印光刻 Imprint lithography
04/25/2012CN1786831B Lithographic projection apparatus and actuator
04/25/2012CN102428409A Cleaning method, exposure method, and device manufacturing method
04/25/2012CN102428408A 包括光学校正布置的用于半导体光刻的投射曝光设备 Comprising an optical arrangement for correcting a projection exposure apparatus for semiconductor lithography
04/25/2012CN102428407A Photocurable Thermosetting Resin Composition, Dry Film And Cured Product Thereof, And Printed Wiring Board Using Those Materials
04/25/2012CN102428406A 感光性树脂组合物 The photosensitive resin composition
04/25/2012CN102428395A Method For Manufacturing Optical Elements
04/25/2012CN102428215A Method of nanostructuring a film or a wafer of material of the metal oxide or semi-conductor type
04/25/2012CN102427039A 光阻去除方法 Photoresist removal method
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